MAGNETIC TUNNEL JUNCTION (MTJ) ON PLANARIZED ELECTRODE
    51.
    发明申请
    MAGNETIC TUNNEL JUNCTION (MTJ) ON PLANARIZED ELECTRODE 有权
    平面电极上的磁性隧道结(MTJ)

    公开(公告)号:US20140073064A1

    公开(公告)日:2014-03-13

    申请号:US14086054

    申请日:2013-11-21

    CPC classification number: H01L43/12 H01L43/08

    Abstract: A magnetic tunnel junction (MTJ) with direct contact is manufactured having lower resistances, improved yield, and simpler fabrication. The lower resistances improve both read and write processes in the MTJ. The MTJ layers are deposited on a bottom electrode aligned with the bottom metal. An etch stop layer may be deposited adjacent to the bottom metal to prevent overetch of an insulator surrounding the bottom metal. The bottom electrode is planarized before deposition of the MTJ layers to provide a substantially flat surface. Additionally, an underlayer may be deposited on the bottom electrode before the MTJ layers to promote desired characteristics of the MTJ.

    Abstract translation: 具有直接接触的磁性隧道结(MTJ)被制造成具有较低的电阻,提高的产量和更简单的制造。 较低的电阻提高了MTJ中的读取和写入过程。 MTJ层沉积在与底部金属对准的底部电极上。 蚀刻停止层可以沉积在底部金属附近,以防止围绕底部金属的绝缘体的过蚀刻。 在沉积MTJ层之前将底部电极平坦化以提供基本平坦的表面。 另外,可以在MTJ层之前的底部电极上沉​​积底层以促进MTJ的期望特性。

    MAGNETIC TUNNEL JUNCTION DEVICE
    52.
    发明申请
    MAGNETIC TUNNEL JUNCTION DEVICE 有权
    磁铁隧道连接装置

    公开(公告)号:US20140035075A1

    公开(公告)日:2014-02-06

    申请号:US14048704

    申请日:2013-10-08

    CPC classification number: H01L43/02 H01L27/222 H01L43/08 H01L43/10 H01L43/12

    Abstract: A magnetic tunnel junction device includes a Synthetic Anti-Ferromagnetic (SAF) layer, a first free layer, and second free layer. The magnetic tunnel junction device further includes a spacer layer between the first and second free layers. The first free layer is magneto-statically coupled to the second free layer. A thickness of the spacer layer is at least 4 Angstroms.

    Abstract translation: 磁性隧道结装置包括合成反铁磁(SAF)层,第一自由层和第二自由层。 磁性隧道结装置还包括在第一和第二自由层之间的间隔层。 第一自由层被磁静态耦合到第二自由层。 间隔层的厚度至少为4埃。

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