公开(公告)号：US5586040A

公开(公告)日：1996-12-17

申请号：US419885

申请日：1995-04-11

申请人： Peter M. Baumgart ,  Christopher S. Gudeman ,  Douglas J. Krajnovich ,  Steven W. Meeks ,  Thao A. Nguyen ,  Fior D. Sargent ,  Andrew C. Tam ,  Gerard H. Vurens

发明人： Peter M. Baumgart ,  Christopher S. Gudeman ,  Douglas J. Krajnovich ,  Steven W. Meeks ,  Thao A. Nguyen ,  Fior D. Sargent ,  Andrew C. Tam ,  Gerard H. Vurens

IPC分类号： G11B5/60 ,  G11B5/82 ,  G11B5/84 ,  G11B33/10 ,  G06F19/00 ,  B05D3/06

CPC分类号： G11B5/8408 ,  G11B5/82 ,  G11B5/8404 ,  G11B33/10 ,  G11B5/6011

摘要： Controlled laser texturing of a magnetic recording disk is accomplished by use of a textured test band on the disk and an analyzing laser system to provide feedback to the texturing laser. The analyzing laser system determines, from diffracted laser light, the average height of the laser-induced bumps formed in the test band by the texturing laser. The analyzing laser beam is directed to the substrate surface and overlaps a group of individual bumps formed in a repetitive pattern. A scanning linear photodector array receives light diffracted from the surface. The digitized output of the array is the angular distribution of diffracted light intensities and is used to compute the average height of the bumps in the test band. The disk is then translated radially so that the texturing laser is aligned with the region of the disk where the textured landing zone is to be placed. Then, in response to the computed value of average bump height in the test band, a correction signal or signals is output to modify one or more parameters of the texturing laser so that the texturing laser can form bumps of the correct average height in the textured landing zone.

摘要翻译： 通过使用磁盘上的纹理测试带和分析激光系统来对纹理激光器提供反馈来实现磁记录盘的受控激光纹理化。 分析激光系统通过衍射激光确定通过纹理激光在测试带中形成的激光诱发凸块的平均高度。 分析激光束被引导到衬底表面并与重复形成的一组单独的凸块重叠。 扫描线性光电二极管阵列接收从表面衍射的光。 阵列的数字化输出是衍射光强度的角度分布，用于计算测试带中的凸块的平均高度。 然后盘被径向地转动，使得纹理化激光与要被放置纹理着色区的盘的区域对齐。 然后，响应于测试频带中的平均凸块高度的计算值，输出校正信号或信号以修改纹理化激光器的一个或多个参数，使得纹理化激光器可以形成纹理中正确平均高度的凸起 着陆区。

公开(公告)号：US20220187218A1

公开(公告)日：2022-06-16

申请号：US17685679

申请日：2022-03-03

申请人： Steven W. Meeks ,  Hung Phi Nguyen ,  Alireza Shahdoost Moghaddam

发明人： Steven W. Meeks ,  Hung Phi Nguyen ,  Alireza Shahdoost Moghaddam

IPC分类号： G01N21/958 ,  G01N21/84 ,  G01N21/88 ,  G02B26/10

摘要： An angle independent optical surface inspector capable of generating a light beam, directing the light beam to a sample, and de-scanning a reflected light beam that is reflected from the sample, thereby generating a first de-scanned light beam. The de-scanning is performed at approximately one focal length of a de-scanning lens from an irradiation location where the light beam irradiates the sample. The optical inspector also capable of focusing the first de-scanned light beam, thereby generating a focused light beam, and measuring the location of the focused light beam. The measuring of the location is performed at approximately one focal length of a focusing lens from the focusing lens. The incident angle of the light beam is within ten degrees of Brewster's angle. The focusing is performed by an achromatic lens.

公开(公告)号：US09163987B2

公开(公告)日：2015-10-20

申请号：US12861894

申请日：2010-08-24

申请人： Roman Sappey ,  Steven W. Meeks

发明人： Roman Sappey ,  Steven W. Meeks

IPC分类号： F21V9/16 ,  G01J3/36 ,  G01J3/44 ,  G01N21/64 ,  G01N21/95

CPC分类号： G01J3/36 ,  G01J3/4412 ,  G01N21/6489 ,  G01N21/9501

摘要： A system for defect detection and photoluminescence measurement of a sample may include a radiation source configured to target radiation to the sample. The system may also include an optics assembly positioned above the sample to receive a sample radiation. The system may also include a filter module configured to receive the sample radiation collected by the optics assembly. The filter module may separate the sample radiation collected by the optics assembly into a first radiation portion and a second radiation portion. The system may also include a defect detection module configured to receive the first radiation portion from the filter module. The system may further include a photoluminescence measurement module configured to receive the second radiation portion from the filter module. The defect detection module and the photoluminescence measurement module may be configured to receive the respective first radiation portion and the second radiation portion substantially simultaneously.

摘要翻译： 用于样品的缺陷检测和光致发光测量的系统可以包括被配置为将辐射靶向样品的辐射源。 该系统还可以包括位于样品上方以接收样品辐射的光学组件。 该系统还可以包括被配置为接收由光学组件收集的样品辐射的滤波器模块。 过滤器模块可以将由光学组件收集的样品辐射分离成第一辐射部分和第二辐射部分。 该系统还可以包括被配置为从过滤器模块接收第一辐射部分的缺陷检测模块。 该系统可以进一步包括光致发光测量模块，其被配置为从过滤器模块接收第二辐射部分。 缺陷检测模块和光致发光测量模块可以被配置为基本上同时地接收相应的第一辐射部分和第二辐射部分。

公开(公告)号：US08736831B2

公开(公告)日：2014-05-27

申请号：US13472421

申请日：2012-05-15

申请人： Mahendra Prabhu Ramachandran ,  Steven W. Meeks ,  Romain Sappey

发明人： Mahendra Prabhu Ramachandran ,  Steven W. Meeks ,  Romain Sappey

IPC分类号： G01N21/00 ,  G01N21/95 ,  G01N21/956

CPC分类号： G01N21/9501 ,  G01N21/47 ,  G01N21/8422 ,  G01N21/956 ,  G01N21/95623 ,  G01N21/958

摘要： Various embodiments for substrate inspection are provided.

摘要翻译： 提供了用于基板检查的各种实施例。

公开(公告)号：US08325334B2

公开(公告)日：2012-12-04

申请号：US12858669

申请日：2010-08-18

申请人： Mahendra P. Ramachandran ,  Steven W. Meeks ,  Alireza S. Moghadam ,  Hung P. Nguyen

发明人： Mahendra P. Ramachandran ,  Steven W. Meeks ,  Alireza S. Moghadam ,  Hung P. Nguyen

IPC分类号： G01N21/00 ,  G01N21/55

CPC分类号： G01N21/9503

摘要： An apparatus for inspecting an edge of a substrate. A light source produces a light beam, and a two-dimensional beam deflector receives the light beam and creates a semi-annular scanning beam. A first flared parabolic surface receives the semi-annular scanning beam and directs the semi-annular scanning beam onto the edge of the substrate, thereby creating specularly reflected light from the edge of the substrate. A second flared parabolic surface receives and directs the specularly reflected light to a detector. The detector receives the directed specularly reflected light and produces signals. An analyzer analyzes the signals and detects defects at the edge of the substrate.

摘要翻译： 一种用于检查基板边缘的装置。 光源产生光束，二维光束偏转器接收光束并产生半环形扫描光束。 第一扩张抛物面接收半环形扫描光束并将半环形扫描光束引导到衬底的边缘上，从而从衬底的边缘产生镜面反射的光。 第二个扩张的抛物线表面接收并将镜面反射光引导到检测器。 检测器接收定向镜面反射光并产生信号。 分析仪分析信号并检测基板边缘的缺陷。

公开(公告)号：US20110058174A1

公开(公告)日：2011-03-10

申请号：US12858669

申请日：2010-08-18

申请人： Mahendra P. Ramachandran ,  Steven W. Meeks ,  Alireza S. Moghadam ,  Hung P. Nguyen

发明人： Mahendra P. Ramachandran ,  Steven W. Meeks ,  Alireza S. Moghadam ,  Hung P. Nguyen

IPC分类号： G01N21/55

CPC分类号： G01N21/9503

摘要： An apparatus for inspecting an edge of a substrate. A light source produces a light beam, and a two-dimensional beam deflector receives the light beam and creates a semi-annular scanning beam. A first flared parabolic surface receives the semi-annular scanning beam and directs the semi-annular scanning beam onto the edge of the substrate, thereby creating specularly reflected light from the edge of the substrate. A second flared parabolic surface receives and directs the specularly reflected light to a detector. The detector receives the directed specularly reflected light and produces signals. An analyzer analyzes the signals and detects defects at the edge of the substrate.

摘要翻译： 一种用于检查基板边缘的装置。 光源产生光束，二维光束偏转器接收光束并产生半环形扫描光束。 第一扩张抛物面接收半环形扫描光束并将半环形扫描光束引导到衬底的边缘上，从而从衬底的边缘产生镜面反射的光。 第二个扩张的抛物线表面接收并将镜面反射光引导到检测器。 检测器接收定向镜面反射光并产生信号。 分析仪分析信号并检测基板边缘的缺陷。

公开(公告)号：US20080180656A1

公开(公告)日：2008-07-31

申请号：US11627677

申请日：2007-01-26

申请人： Steven W. Meeks ,  ROMAIN SAPPEY ,  TOM CARR

发明人： Steven W. Meeks ,  ROMAIN SAPPEY ,  TOM CARR

IPC分类号： G01B11/30

CPC分类号： G01B11/306 ,  G01N21/9501 ,  G01N21/9503

摘要： In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a scatterometer to identify at least one defect region on the surface and a surface profile height measuring tool to measure one or more characteristics of the surface in the defect region with a surface profile height measuring tool.

摘要翻译： 在一个实施例中，使用单个工具测量晶片表面和晶片边缘上的缺陷的系统包括用于识别表面上的至少一个缺陷区域的散射仪和用于测量一个或多个 具有表面轮廓高度测量工具的缺陷区域中的表面特征。

公开(公告)号：US07362425B2

公开(公告)日：2008-04-22

申请号：US11387952

申请日：2006-03-23

申请人： Steven W. Meeks ,  Mahendra Prabhu Ramachandran ,  Alireza Shahdoost Moghadam

发明人： Steven W. Meeks ,  Mahendra Prabhu Ramachandran ,  Alireza Shahdoost Moghadam

IPC分类号： G01N21/00

CPC分类号： G01B11/303 ,  G01N21/9501

摘要： In one embodiment, a system to inspect a surface comprises an assembly to direct a first radiation beam onto a surface in a first plane of incidence, a first detector to generate a first signal from a portion of the radiation reflected from the first radiation beam, a first spatial filter interposed between the surface and the first detector, a first ellipsoidal mirror to collect scattered light, a second detector to generate a second signal from the scattered portion of the beam, and a processor to generate, from the first and second signals, a data set representing one or more characteristics of the surface using the first and second signals.

摘要翻译： 在一个实施例中，用于检查表面的系统包括将第一辐射束引导到第一入射入射面中的表面的组件，第一检测器，用于从第一辐射束反射的辐射的一部分产生第一信号， 介于所述表面和所述第一检测器之间的第一空间滤光器，用于收集散射光的第一椭圆面镜，从所述光束的散射部分产生第二信号的第二检测器，以及处理器，用于从所述第一和第二信号 使用第一和第二信号表示表面的一个或多个特征的数据集。

公开(公告)号：US07295300B1

公开(公告)日：2007-11-13

申请号：US11237257

申请日：2005-09-28

申请人： Laurie Bechtler ,  Vamsi Velidandla ,  Steven W. Meeks

发明人： Laurie Bechtler ,  Vamsi Velidandla ,  Steven W. Meeks

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/9503 ,  G01N2021/218

摘要： A system to detect pits in a surface comprises first and second radiation targeting assemblies to target a second radiation beam onto a surface, a first radiation collecting assembly that collects radiation scattered from the surface, a processor coupled to the first radiation collecting assembly, a memory module coupled to the processor and comprising logic instructions which, when executed by the processor, configure the processor to generate a first signal from radiation scattered from the first radiation beam, generate a second signal from radiation scattered from the second radiation beam, record the first signal and the second signal at an array of different positions on the surface, calculate a median value for the first signal and the second signal over the array of different positions on the surface, and use the first signal, the second signal, and the median value to detect pits in the surface.

摘要翻译： 用于检测表面中的凹坑的系统包括将第二辐射束瞄准到表面上的第一和第二辐射瞄准组件，收集从表面散射的辐射的第一辐射收集组件，耦合到第一辐射收集组件的处理器，存储器 模块，其耦合到所述处理器并且包括逻辑指令，所述逻辑指令在被所述处理器执行时配置所述处理器以从所述第一辐射束散射的辐射生成第一信号，从所述第二辐射束散射的辐射产生第二信号， 信号和表面上不同位置的阵列上的第二信号，计算表面上不同位置阵列上的第一信号和第二信号的中值，并使用第一信号，第二信号和中值 值以检测表面中的凹坑。

公开(公告)号：US07218391B2

公开(公告)日：2007-05-15

申请号：US11269336

申请日：2005-11-07

申请人： Steven W. Meeks

发明人： Steven W. Meeks

IPC分类号： G01N21/00

CPC分类号： G01B11/0616 ,  G01N21/9501

摘要： A material independent optical profilometer system and method for measuring at least one of either a height or a slope of an object such as a thin film disk, a silicon wafer, or a glass substrate is disclosed.

摘要翻译： 公开了一种用于测量诸如薄膜盘，硅晶片或玻璃基板的物体的高度或斜率中的至少一个的材料无关的光学轮廓仪系统和方法。