Method of making a dielectric for an integrated circuit
    51.
    发明授权
    Method of making a dielectric for an integrated circuit 失效
    制造集成电路电介质的方法

    公开(公告)号:US5960302A

    公开(公告)日:1999-09-28

    申请号:US775790

    申请日:1996-12-31

    摘要: A composite 3-layer gate dielectric is disclosed. The upper and lower layers have a concentration of nitrogen atoms, while the middle layer has very few nitrogen atoms. The presence of the nitrogen atoms in the top sublayers provides resistance to boron diffusion from the top conductive layer and plasma damage during polysilicon gate stack formation and the presence of nitrogen in the bottom sublayer near the silicon-dielectric interface improves wearout, endurance, resistance to current stress and electron traps.

    摘要翻译: 公开了复合三层栅极电介质。 上层和下层具有氮原子的浓度,而中间层具有非常少的氮原子。 顶层子层中氮原子的存在提供了对顶部导电层的硼扩散的阻力和在多晶硅栅叠层形成期间的等离子体损伤,并且在硅 - 介电界面附近的底层子层中存在氮,从而改善了耐磨性,耐久性 电流应力和电子阱。

    SOURCE DETECTION BY SPECTRUM SENSING
    54.
    发明申请
    SOURCE DETECTION BY SPECTRUM SENSING 审中-公开
    通过光谱感测的源检测

    公开(公告)号:US20150072625A1

    公开(公告)日:2015-03-12

    申请号:US14110447

    申请日:2012-04-04

    IPC分类号: H04B17/00

    摘要: A source detection system for detecting wireless communication signals, the system comprising: receiving means for receiving a signal; and processing means arranged to filter the signal to separate it into a plurality of frequency components, determine an energy content for each of the frequency components, calculate a measure of the difference between the energy contents of respective frequency components, and make a determination, from said measure, whether the signal has been transmitted from a source.

    摘要翻译: 一种用于检测无线通信信号的源检测系统,所述系统包括:接收装置,用于接收信号; 以及处理装置,被布置为对信号进行滤波以将其分离成多个频率分量,确定每个频率分量的能量含量,计算各个频率分量的能量内容之间的差的度量,并且从 所述测量,信号是否已经从源传输。

    Rectification of characters and text as transform invariant low-rank textures
    56.
    发明授权
    Rectification of characters and text as transform invariant low-rank textures 有权
    将字符和文本整理为变形不变的低阶纹理

    公开(公告)号:US08774558B2

    公开(公告)日:2014-07-08

    申请号:US13310730

    申请日:2011-12-03

    IPC分类号: G06K9/36 G06K9/32

    摘要: A “Text Rectifier” provides various techniques for processing selected regions of an image containing text or characters by treating those images as matrices of low-rank textures and using a rank minimization technique that recovers and removes image deformations (e.g., affine and projective transforms as well as general classes of nonlinear transforms) while rectifying the text or characters in the image region. Once distortions have been removed and the text or characters rectified, the resulting text is made available for a variety of uses or further processing such as optical character recognition (OCR). In various embodiments, binarization and/or inversion techniques are applied to the selected image regions during the rank minimization process to both improve text rectification and to present the resulting images of text to an OCR engine in a form that enhances the accuracy of the OCR results.

    摘要翻译: “文本整流器”提供了通过将这些图像作为低阶纹理矩阵来处理包含文本或字符的图像的所选区域的各种技术,并且使用恢复和去除图像变形的秩最小化技术(例如,仿射和投影变换为 以及非线性变换的一般类),同时整理图像区域中的文本或字符。 一旦失真被消除并且文本或者字符被纠正,所得到的文本可用于各种用途或进一步的处理,例如光学字符识别(OCR)。 在各种实施例中,在秩最小化处理期间将二值化和/或反转技术应用于所选择的图像区域,以改善文本校正,并以提高OCR结果的准确性的形式向OCR引擎呈现文本的所得图像 。

    Methods for fabricating memory cells having fin structures with smooth sidewalls and rounded top corners and edges
    57.
    发明授权
    Methods for fabricating memory cells having fin structures with smooth sidewalls and rounded top corners and edges 有权
    用于制造具有平滑侧壁和圆形顶角和边缘的翅片结构的存储单元的方法

    公开(公告)号:US08563441B2

    公开(公告)日:2013-10-22

    申请号:US12111122

    申请日:2008-04-28

    摘要: Methods for fabricating a semiconductor FIN structure with smooth sidewalls and rounded top corners and edges is disclosed. A method includes forming a plurality of semiconductor FIN structures. A sacrificial oxide layer is formed on the top surface and the sidewall surfaces of the plurality of semiconductor FIN structures for rounding the corners and edges between the top surfaces and the sidewall surfaces of the plurality of semiconductor FIN structures. The sacrificial oxide layer is removed with a high selectivity oxide etchant. The plurality of semiconductor FIN structures are annealed in a hydrogen environment. A tunnel oxide is formed over the plurality of semiconductor FIN structures.

    摘要翻译: 公开了制造具有平滑侧壁和圆角顶角和边缘的半导体FIN结构的方法。 一种方法包括形成多个半导体FIN结构。 在多个半导体FIN结构的顶表面和侧壁表面上形成牺牲氧化物层,用于使多个半导体FIN结构的顶表面和侧壁表面之间的角和边缘倒圆。 用高选择性氧化物蚀刻剂除去牺牲氧化物层。 多个半导体FIN结构在氢环境中退火。 在多个半导体FIN结构上形成隧道氧化物。

    RECTIFICATION OF CHARACTERS AND TEXT AS TRANSFORM INVARIANT LOW-RANK TEXTURES
    58.
    发明申请
    RECTIFICATION OF CHARACTERS AND TEXT AS TRANSFORM INVARIANT LOW-RANK TEXTURES 有权
    字符和文本的修正作为变换不变的低排序纹理

    公开(公告)号:US20120134588A1

    公开(公告)日:2012-05-31

    申请号:US13310730

    申请日:2011-12-03

    IPC分类号: G06K9/34

    摘要: A “Text Rectifier” provides various techniques for processing selected regions of an image containing text or characters by treating those images as matrices of low-rank textures and using a rank minimization technique that recovers and removes image deformations (e.g., affine and projective transforms as well as general classes of nonlinear transforms) while rectifying the text or characters in the image region. Once distortions have been removed and the text or characters rectified, the resulting text is made available for a variety of uses or further processing such as optical character recognition (OCR). In various embodiments, binarization and/or inversion techniques are applied to the selected image regions during the rank minimization process to both improve text rectification and to present the resulting images of text to an OCR engine in a form that enhances the accuracy of the OCR results.

    摘要翻译: “文本整流器”提供了通过将这些图像作为低阶纹理矩阵来处理包含文本或字符的图像的选定区域的各种技术,并且使用恢复和去除图像变形的秩最小化技术(例如,仿射和投影变换为 以及非线性变换的一般类),同时整理图像区域中的文本或字符。 一旦失真被消除并且文本或者字符被纠正,则所得到的文本可用于各种用途或进一步的处理,例如光学字符识别(OCR)。 在各种实施例中,在秩最小化处理期间将二值化和/或反转技术应用于所选择的图像区域,以改善文本校正,并以提高OCR结果的准确性的形式向OCR引擎呈现文本的所得图像 。

    Method of forming a high quality gate oxide layer having a uniform thickness
    60.
    发明授权
    Method of forming a high quality gate oxide layer having a uniform thickness 有权
    形成厚度均匀的高品质栅氧化层的方法

    公开(公告)号:US06544907B1

    公开(公告)日:2003-04-08

    申请号:US09689030

    申请日:2000-10-12

    申请人: Yi Ma Edith Yang

    发明人: Yi Ma Edith Yang

    IPC分类号: H01L2131

    CPC分类号: H01L21/28211

    摘要: The present invention provides a method for manufacturing a high quality oxide layer having a uniform thickness. The method includes providing a semiconductor substrate, and forming an oxide layer having a substantially uniform thickness on the semiconductor substrate, and in a zone of pressure of less than about 4 Torr or greater than about 25 Torr.

    摘要翻译: 本发明提供一种具有均匀厚度的高品质氧化物层的制造方法。 该方法包括提供半导体衬底,以及在半导体衬底上形成具有基本上均匀厚度的氧化物层,以及小于约4Torr或大于约25Torr的压力区。