Polymeric compounds, and liquid crystal element using the same
    52.
    发明授权
    Polymeric compounds, and liquid crystal element using the same 失效
    聚合物和使用其的液晶元件

    公开(公告)号:US5702642A

    公开(公告)日:1997-12-30

    申请号:US797348

    申请日:1997-02-11

    摘要: The polymeric compound of this invention is represented by the following general formula (I): ##STR1## wherein A represents a hydrogen atom or ##STR2## B represents a hydrogen atom or ##STR3## each of X.sub.1 and X.sub.2 represents independently a hydrogen atom or a methyl group, each of m and n represents independently an integer of 0 to 14, each of p and q represents independently 0 or 1, and each of Y1 , Y.sub.2, Y.sub.3, and Y.sub.4 represents independently a hydrogen atom or a fluorine atom, with the proviso that both A and B are not hydrogen atoms, p is 0 when m is 0, and q is 0 when n is 0. The liquid crystal display element of this invention includes a pair of substrates oppositely disposed with a gap therebetween, and a liquid crystal layer placed in said gap, at least one of said substrates being transparent, and said liquid crystal layer having a liquid crystal region, and a polymer wall surrounded by said liquid crystal region, wherein said liquid crystal layer includes a liquid crystal material, a polymeric polymer material, and the above-described polymeric compound. The liquid crystal display element prepared from the polymeric compound of this invention does not cause disclination lines, and has bright characteristics in the absence of an electric voltage.

    摘要翻译: 本发明的高分子化合物由下列通式(I)表示:其中A表示氢原子或者A表示氢原子,或者X 1和X 2各自独立地表示 氢原子或甲基,m和n各自独立地表示0〜14的整数,p和q各自独立地为0或1,Y1,Y2,Y3和Y4各自独立地表示氢原子或 氟原子,条件是A和B都不是氢原子,当m为0时p为0,当n为0时q为0。本发明的液晶显示元件包括一对相对设置的基板 间隙,以及设置在所述间隙中的液晶层,至少一个所述基板是透明的,并且所述液晶层具有液晶区域和由所述液晶区域包围的聚合物壁,其中所述液晶层包括 液晶材料, 聚合物聚合物材料和上述聚合物。 由本发明的高分子化合物制备的液晶显示元件不会产生旋错线,并且在没有电压的情况下具有明亮的特性。

    Reagent for the determination of chlorine ion
    55.
    发明授权
    Reagent for the determination of chlorine ion 失效
    用于测定氯离子的试剂

    公开(公告)号:US5229270A

    公开(公告)日:1993-07-20

    申请号:US713007

    申请日:1991-06-10

    IPC分类号: C12Q1/40 G01N33/84

    摘要: Quantitative assay and reagent for the determination of chlorine ion in body fluid. Body fluid is contacted with a reagent which includes deactivated .alpha.-amylase, a compound capable of chelating calcium ion, a calcium chelate compound, and an .alpha.-amylase activity-measuring substance; the amount of .alpha.-amylase activity is proportional to the amount of chlorine ion present in the body fluid. The assay is suitable for automation.

    摘要翻译: 用于测定体液中氯离子的定量测定和试剂。 体液与包括失活的α-淀粉酶,能够螯合钙离子的化合物,钙螯合物和α-淀粉酶活性测量物质的试剂接触; α-淀粉酶活性的量与体液中存在的氯离子的量成比例。 该测定适用于自动化。

    Cleaning solution composition
    56.
    发明授权

    公开(公告)号:US11046910B2

    公开(公告)日:2021-06-29

    申请号:US16497508

    申请日:2018-03-05

    摘要: Provided is a cleaning solution composition which, when cleaning the surface of a semiconductor substrate or glass substrate, does not damage SiO2, Si3N4, Si, and the like forming a layer on the substrate surface, can be used under processing conditions applicable to a brush scrub cleaning chamber equipped with a CMP apparatus, and can efficiently remove compounds derived from abrasive particles in a slurry. This cleaning solution composition for cleaning the surface of a semiconductor substrate or glass substrate contains: one or two or more fluorine atom-containing inorganic acids or salts thereof; water; one or two or more reducing agents; and one or two or more anionic surfactants, and has a hydrogen ion concentration (pH) of less than 7.

    Etchant composition for multilayered metal film of copper and molybdenum, method of etching using said composition, and method for prolonging life of said composition

    公开(公告)号:US10655231B2

    公开(公告)日:2020-05-19

    申请号:US15525817

    申请日:2015-11-17

    IPC分类号: C23F1/18 C23F1/26 C23F1/46

    摘要: Provided is an etchant composition for a multilayered metal film comprising both a layer comprising copper and a layer comprising molybdenum, the etchant composition: being capable of etching en bloc a multilayered metal film comprising a layer constituted of copper or an alloy including copper as the main component and a layer constituted of molybdenum or an alloy including molybdenum as the main component; being effective in preventing the molybdenum layer from being undercut; making it easy to regulate the component concentrations so as to accommodate the cross-sectional shape control and cross-section; and being stable. Also provided are a method of etching using the etchant composition and a method for prolonging the life of the etchant composition. The etchant composition according to the present invention is an etchant composition for use in etching en bloc a multilayered metal film comprising a layer constituted of copper or an alloy including copper as the main component and a layer constituted of molybdenum or an alloy including molybdenum as the main component, and comprises hydrogen peroxide, an organic acid, an amine compound, an azole, and a hydrogen peroxide stabilizer (no inorganic acid is contained therein).

    ETCHANT COMPOSITION FOR MULTILAYERED METAL FILM OF COPPER AND MOLYBDENUM, METHOD OF ETCHING USING SAID COMPOSITION, AND METHOD FOR PROLONGING LIFE OF SAID COMPOSITION

    公开(公告)号:US20180298500A1

    公开(公告)日:2018-10-18

    申请号:US15525817

    申请日:2015-11-17

    IPC分类号: C23F1/18 C23F1/26 C23F1/46

    摘要: Provided is an etchant composition for a multilayered metal film comprising both a layer comprising copper and a layer comprising molybdenum, the etchant composition: being capable of etching en bloc a multilayered metal film comprising a layer constituted of copper or an alloy including copper as the main component and a layer constituted of molybdenum or an alloy including molybdenum as the main component; being effective in preventing the molybdenum layer from being undercut; making it easy to regulate the component concentrations so as to accommodate the cross-sectional shape control and cross-section; and being stable. Also provided are a method of etching using the etchant composition and a method for prolonging the life of the etchant composition. The etchant composition according to the present invention is an etchant composition for use in etching en bloc a multilayered metal film comprising a layer constituted of copper or an alloy including copper as the main component and a layer constituted of molybdenum or an alloy including molybdenum as the main component, and comprises hydrogen peroxide, an organic acid, an amine compound, an azole, and a hydrogen peroxide stabilizer (no inorganic acid is contained therein).