公开(公告)号：US20030127595A1

公开(公告)日：2003-07-10

申请号：US10346138

申请日：2003-01-17

Applicant: Hitachi, Ltd.

Inventor： Kuniyasu Nakamura ,  Hiroshi Kakibayashi ,  Mikio Ichihashi ,  Shigeto Isakozawa ,  Yuji Sato ,  Takahito Hashimoto

IPC: H01J037/28 ,  G01N023/00 ,  G21K007/00

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope (STEM) offering substantially the same ease of operation as that of a scanning electron microscope (SEM) and providing substantially the same degree of resolution as that of a transmission electron microscope (TEM). The STEM of the invention is constituted based on the constitution of the SEM. The STEM comprises: an electron source for generating a primary electron beam; an electron illuminating lens system for converging the primary electron beam from the electron source onto a specimen for illumination; an electron deflecting system for scanning the specimen with the primary electron beam emitted thereto; a scattered electron detector for detecting scattered electrons transmitted through the specimen; a projection lens system for projecting the scattered electrons onto a detection surface of the scattered electron detector; an image displaying device for displaying a scanning transmission electron microscope image of the specimen using a detection signal from the scattered electron detector; and a detection angle changing device for variably establishing a range of scattering angle of the scattered electrons detected by the scattered electron detector. This structure enhances a contrast of a desired portion of the specimen under observation for a scanning transmitted image by selective establishment of detection angle ranges for the scattered electron detector.

Abstract translation: 扫描透射电子显微镜（STEM）提供与扫描电子显微镜（SEM）基本上相同的操作容易性并且提供与透射电子显微镜（TEM）基本相同的分辨率。 本发明的STEM基于SEM的结构构成。 STEM包括：用于产生一次电子束的电子源; 电子照明透镜系统，用于将来自电子源的一次电子束会聚到用于照明的样本上; 电子偏转系统，用于用发射的一次电子束扫描样品; 用于检测通过样本传播的散射电子的散射电子检测器; 用于将散射电子投射到散射电子检测器的检测表面上的投影透镜系统; 图像显示装置，用于使用来自散射电子检测器的检测信号显示样本的扫描透射电子显微镜图像; 以及用于可变地建立由散射电子检测器检测的散射电子的散射角的范围的检测角度改变装置。 该结构通过选择性地建立散射电子检测器的检测角度范围来增强扫描透射图像的观察样本的期望部分的对比度。

公开(公告)号：US20030062479A1

公开(公告)日：2003-04-03

申请号：US10251749

申请日：2002-09-23

Inventor： Masatsugu Kametani ,  Kenjiro Yamamoto ,  Taku Ninomiya ,  Osamu Yamada ,  Katsuhisa Ike

IPC: H01J037/28 ,  G01N023/225

CPC classification number: H01J37/28 ,  H01J2237/2817

Abstract: In order that the deflection scanning position can be corrected at a time point within a period for fetching information from a subject to be inspected and improvements in accuracy of chip comparison inspection and an inspection near the wafer outer periphery where distortion is large can be assured by correcting the inspection position and biased distortion at a high speed with high accuracy, a digital deflection control scheme is employed in which the deflection scanning signal and correction are all calculated digitally in a deflection controller for deflecting and controlling a charged particle beam irradiated onto a subject to be inspected and the digital value is sequentially converted into an analog value by a time-series train of digital control signal to form a deflection scanning waveform.

公开(公告)号：US20030062478A1

公开(公告)日：2003-04-03

申请号：US10231686

申请日：2002-08-30

Inventor： Jurgen Frosien ,  Stefan Lanio

IPC: H01J037/28

CPC classification number: H01J37/244 ,  H01J2237/047 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/28

Abstract: A particle beam apparatus with a source for generating a primary particle beam, means for focussing the primary particle beam onto a specimen, a detection system for detecting particles released at the specimen, first means to accelerate the primary particle beam to a first energy, first means to decelerate the primary particle beam before the detection system from the first energy to a second lower energy, second means to accelerate the primary particle beam after the detection system from the second energy to a third higher energy and second means to decelerate the primary particle beam from the third energy to a final beam energy. The detection system further comprises a converter to convert particles released at the specimen into converted secondary particles which will be detected by the detector.

Abstract translation: 具有用于产生一次粒子束的源的粒子束装置，用于将一次粒子束聚焦到样本上的装置，用于检测在样本上释放的粒子的检测系统，第一装置，用于将第一粒子束加速至第一能量，第一 用于将检测系统之前的一次粒子束从第一能量减速到第二较低能量的装置;第二装置，用于将检测系统之后的第一粒子束从第二能量加速到第三较高能量;以及第二装置， 从第三能量到最终光束能量的光束。 检测系统还包括转换器，用于将样品中释放的颗粒转换成将被检测器检测到的转换次级颗粒。

公开(公告)号：US20020158199A1

公开(公告)日：2002-10-31

申请号：US10082286

申请日：2002-02-26

Inventor： Atsushi Takane ,  Haruo Yoda ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Yasuhiko Ozawa

IPC: H01J037/28

CPC classification number: H01J37/28

Abstract: An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.

Abstract translation: 实现了高吞吐量的无操作员和全自动半导体检测系统。 捕获和检查所需的所有条件都是从CAD数据等设计信息生成的。 为了在条件下进行实际检查，半导体检查系统由用于从设计信息产生捕获和检查所需的所有条件的导航系统和用于实际执行捕获和检查的扫描电子显微镜系统组成。 此外，在进行设计数据和SEM图像之间的匹配处理的情况下，通过使用根据多个方向的边缘信息和平滑来校正变形部分。 此外，将与检测位置对应的SEM图像重新登记为模板，由此进行匹配处理。

公开(公告)号：US20020017606A1

公开(公告)日：2002-02-14

申请号：US09910109

申请日：2001-07-20

Inventor： Masayuki Maruo

IPC: H01J037/28

CPC classification number: H01J37/28

Abstract: To correct delay time of an electronic circuit of a scanning type charged particle beam microscope, in a scanning type charged particle beam microscope using electron beam, when a scanned image is sampled to a storing apparatus in synchronism with a scanning signal, the scanned image is sampled after correcting delay of an electronic circuit by a shift register having a variable stage number.

Abstract translation: 为了校正扫描型带电粒子束显微镜的电子电路的延迟时间，在使用电子束的扫描型带电粒子束显微镜中，当将扫描图像与扫描信号同步地采样到存储装置时，扫描图像为 在具有可变级数的移位寄存器校正电子电路的延迟之后进行采样。

公开(公告)号：US20020008201A1

公开(公告)日：2002-01-24

申请号：US09876853

申请日：2001-06-07

Applicant: JEOL Ltd.

Inventor： Yukihiro Tanaka ,  Sadao Matsumoto ,  Toru Ishimoto ,  Hirofumi Miyao

IPC: H01J037/28 ,  H01J037/244

CPC classification number: H01J37/28 ,  G01R31/2653 ,  G01R31/305 ,  H01J37/244 ,  H01J2237/24495 ,  H01J2237/24564

Abstract: A specimen inspection instrument has a specimen-moving mechanism mounted within a specimen chamber. An electrical current, induced across the specimen by the mechanism, is detected with a detector. The specimen is examined based on the obtained detector output signal. An amplifier for amplifying the detector output signal is placed outside the specimen chamber. A first lead wire passes the detector output signal to the outside amplifier through the wall of the specimen chamber. A second lead wire connects a conductive partition member with a conducting member and with a reference input terminal of the amplifier that determines a reference potential for the output from the amplifier.

Abstract translation: 样品检查仪器具有安装在样品室内的样品移动机构。 用检测器检测通过该机构在试样上感应的电流。 根据获得的检测器输出信号检查样本。 用于放大检测器输出信号的放大器放置在样品室外部。 第一引线将检测器输出信号通过样品室的壁传递到外部放大器。 第二导线将导电分隔构件与导电构件和放大器的参考输入端连接，该放大器的参考输入端确定放大器的输出的参考电位。

公开(公告)号：US20040227079A1

公开(公告)日：2004-11-18

申请号：US10843642

申请日：2004-05-12

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yasuhiko Nara ,  Masaaki Nojiri ,  Kouichi Hayakawa ,  Hiroyuki Shinada ,  Yukio Hagita

IPC: H01J037/28

CPC classification number: H01J37/28 ,  H01J2237/004 ,  H01J2237/2817

Abstract: In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.

Abstract translation: 在电路图案检查装置中，当电子束照射到已经形成电路图案的具有多个芯片的基板的表面上时，检测从照射的基板产生的信号以形成图像， 将形成的图像与另一图像进行比较，以便检测电路图案上的缺陷。 在将电子束照射到芯片或多个芯片上以获取用于检查目的的图像之前，将电子束预先照射到要照射的区域上，使得要检查的基板的充电条件为 任意控制

公开(公告)号：US20040227077A1

公开(公告)日：2004-11-18

申请号：US10779323

申请日：2004-02-13

Applicant: Nikon Corporation

Inventor： Toru Takagi ,  Naoto Kihara

IPC: H01J037/28

CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/265 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/2817

Abstract: Electron microscopes (e.g., scanning electron microscopes, mapping SEMs) are disclosed in which the amount of charging of the specimen is controlled to between a minimum amount needed to view an image and a maximum amount beyond which a viewable image cannot be obtained, and such that the image has low distortion and the specimen is not damaged. Multiple irradiation-electron beams, or multiple segments of a single irradiation-electron beam, are directed to a specimen surface. The irradiation beams (or segments) are decelerated by a retarding voltage applied by a cathode lens and are incident on the specimen surface. The respective current and incident energy of each irradiation beam (or segment thereof) are controlled independently to a predetermined relationship so as to impart predetermined amounts of charging to different insulator regions of the specimen.

Abstract translation: 公开了电子显微镜（例如，扫描电子显微镜，映射SEM），其中将样品的充电量控制在观看图像所需的最小量与不能获得可视图像的最大量之间， 图像的变形小，样品没有损坏。 单个照射电子束的多个照射电子束或多个片段被引导到样品表面。 照射光束（或片段）由阴极透镜施加的延迟电压减速，并入射在样本表面上。 每个照射束（或其片段）的相应的电流和入射能量被独立​​地控制到预定的关系，以便对样本的不同绝缘体区域赋予预定量的电荷。

公开(公告)号：US20040222385A1

公开(公告)日：2004-11-11

申请号：US10828360

申请日：2004-04-20

Applicant: SHIMADZU CORPORATION

Inventor： Hiroki Hatajima

IPC: H01J037/28

CPC classification number: H01J37/28 ,  G01R31/2808 ,  G09G3/006 ,  G09G3/3208 ,  G09G3/3648 ,  G09G2300/08 ,  G09G2330/10 ,  H01J2237/2811 ,  H01J2237/2817

Abstract: In a substrate testing device, a testing unit acquires a tested result of a substrate by scanning of an electron beam. An alignment mark detecting unit optically detects an alignment mark on the substrate. A substrate position calculating unit calculates a substrate position within the substrate testing device from a position of the alignment mark. A position aligning unit aligns a position of the tested result with the calculated substrate position.

Abstract translation: 在基板测试装置中，测试单元通过扫描电子束来获取基板的测试结果。 对准标记检测单元光学检测基板上的对准标记。 衬底位置计算单元从对准标记的位置计算衬底测试装置内的衬底位置。 位置对齐单元将测试结果的位置与计算出的基板位置对齐。

公开(公告)号：US20040135082A1

公开(公告)日：2004-07-15

申请号：US10742901

申请日：2003-12-23

Inventor： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

IPC: H01J037/28

CPC classification number: H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

Abstract translation: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。