INTEGRATED FILLER CAPACITOR CELL DEVICE AND CORRESPONDING MANUFACTURING METHOD

    公开(公告)号:US20240186236A1

    公开(公告)日:2024-06-06

    申请号:US18437720

    申请日:2024-02-09

    CPC classification number: H01L23/5223 H01L21/76224 H01L27/0805 H01L29/66181

    Abstract: A semiconductor region includes an isolating region which delimits a working area of the semiconductor region. A trench is located in the working area and further extends into the isolating region. The trench is filled by an electrically conductive central portion that is insulated from the working area by an isolating enclosure. A cover region is positioned to cover at least a first part of the filled trench, wherein the first part is located in the working area. A dielectric layer is in contact with the filled trench. A metal silicide layer is located at least on the electrically conductive central portion of a second part of the filled trench, wherein the second part is not covered by the cover region.

    NFC charging
    628.
    发明授权

    公开(公告)号:US11943008B2

    公开(公告)日:2024-03-26

    申请号:US18153958

    申请日:2023-01-12

    Abstract: The present disclosure relates to a method for aligning a smartphone providing NFC wireless power for charging a battery of a device, the method comprising: emitting, with a first NFC antenna of the smartphone, an NFC field for wirelessly charging the battery of the device comprising a second NFC antenna; obtaining, with the smartphone, a measured value of a signal representative of the NFC field strength between the smartphone and the device; determining, by the smartphone, a range of values of a plurality of ranges of values the measured value belongs; and emitting, by the smartphone, at least one notification signal to a user with a frequency determined by the determined range of values.

    DEVICE OF THE EEPROM MEMORY TYPE WITH AN ARCHITECTURE OF THE SPLIT VOLTAGE TYPE

    公开(公告)号:US20240087652A1

    公开(公告)日:2024-03-14

    申请号:US18243193

    申请日:2023-09-07

    CPC classification number: G11C16/102 G11C16/0433 G11C16/08 G11C16/16

    Abstract: A nonvolatile memory device has a “split-voltage” architecture and includes columns of memory words formed on each row by groups of memory cells. All state transistors for memory cells of a memory word are gate controlled by a control element. All control elements of a same row are controlled by a first control signal generated by a first row control circuit in response to a set-reset (SR) latch output signal output for a selected row. In order to write a piece of data in a memory word, the first row control circuit confers onto the first control signal an erasing voltage corresponding to a first logic state of the first control signal and then a programming voltage corresponding to a second logic state of the first control signal without modifying, between erasing and programming the memory word, the state of the latch output signal for the selected row.

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