Vibration isolator
    62.
    发明授权
    Vibration isolator 有权
    隔振器

    公开(公告)号:US08006965B2

    公开(公告)日:2011-08-30

    申请号:US11997885

    申请日:2006-07-25

    申请人: Hiroshi Kojima

    发明人: Hiroshi Kojima

    IPC分类号: F16F5/00

    CPC分类号: F16F13/264 F16F13/268

    摘要: A vibration isolator having an inner passage of a communication tube that communicates the negative pressure chamber with the valve chamber. A pipe connection part and a supply/discharge pipe communicate the valve chamber with the supply/discharge port of a switching valve on the outside of the vibration isolator. The switching valve selectively communicates the supply/discharge port to either an intake manifold as the negative pressure supply source, or an atmosphere space. The negative pressure chamber communicates with the valve chamber through the communication tube on the inner peripheral side of the outer cylinder member. Thus, either of a negative pressure and an atmospheric pressure, which is same as a pressure in the valve chamber, can be supplied into the negative pressure chamber, by supplying either of the negative pressure and the atmospheric pressure into the valve chamber through the supply/discharge pipe and the pipe connection part.

    摘要翻译: 一种隔振器,具有将负压室与阀室连通的连通管的内部通道。 管连接部和供给排出管将隔室与隔振器外侧的切换阀的供给/排出口连通。 切换阀选择性地将供排气口与作为负压供应源的进气歧管或气氛空间连通。 负压室通过外筒部件的内周侧的连通管与阀室连通。 因此,通过将负压和大气压中的任一者通过供给供给到阀室中,能够向负压室供给与阀室中的压力相同的负压和大气压力 排气管和管道连接部分。

    Glass substrate for mask blank and method of polishing for producing the same
    63.
    发明授权
    Glass substrate for mask blank and method of polishing for producing the same 有权
    面罩坯料用玻璃基板及其制造方法

    公开(公告)号:US07923178B2

    公开(公告)日:2011-04-12

    申请号:US12143928

    申请日:2008-06-23

    摘要: The present invention aims at providing a glass substrate required to have a surface polished with extremely high accuracy as in glass substrates for reflective masks for use in EUVL; and a polishing method for producing the glass substrate. The present invention provides a glass substrate for mask blank, which is a glass substrate comprising SiO2 as a main component and having a polished main surface, wherein concave defects and convex defects on the main surface have a depth of 2 nm or smaller and a height of 2 nm or smaller, respectively, and have a half-value width of 60 nm or smaller, so that the concave defects and/or the convex defects do not cause phase defects when the glass substrate is used to produce a mask for exposure and the mask is used. Also disclosed are a polishing method for producing the glass substrate, and a mask blank and a mask for exposure using the glass substrate.

    摘要翻译: 本发明的目的在于提供一种玻璃基板,其具有以非常高的精度抛光的表面,如在用于EUVL的反射掩模的玻璃基板中; 以及用于制造玻璃基板的抛光方法。 本发明提供了一种用于掩模坯料的玻璃基板,其是以SiO 2为主要成分并具有抛光主表面的玻璃基板,其中主表面上的凹陷缺陷和凸起缺陷具有2nm或更小的深度, 分别为2nm以下,并且半值宽度为60nm以下,使得当使用玻璃基板制造用于曝光的掩模时,凹陷缺陷和/或凸起缺陷不会引起相位缺陷,并且 使用面具。 还公开了用于制造玻璃基板的抛光方法,以及掩模坯料和使用玻璃基板进行曝光的掩模。

    ANTI-VIBRATION DEVICE
    64.
    发明申请

    公开(公告)号:US20110042870A1

    公开(公告)日:2011-02-24

    申请号:US12990281

    申请日:2009-04-30

    申请人: Hiroshi Kojima

    发明人: Hiroshi Kojima

    IPC分类号: F16F9/14

    CPC分类号: F16F13/10

    摘要: An anti-vibration device including: a first mounting member that is coupled to either one of a vibration generating portion and a vibration receiving portion, and that is formed in an approximately cylindrical shape; a second mounting member that is coupled to the other of the vibration generating portion and a vibration receiving portion, and that is arranged on the inner circumference side of the first mounting member; a juxtaposed member that is arranged side by side with the second mounting member in the axial direction of the first mounting member; a first resilient body that resiliently supports the gap with the first mounting member and the juxtaposed member; a main liquid chamber that is arranged side by side with the juxtaposed member in the axial direction, with at least a portion of a partition wall being formed by the resilient body, and filled with a liquid; an auxiliary liquid chamber that is filled with a liquid, with at least a portion of a partition wall formed by a diaphragm, and the interior volume made capable of expanding or contracting in accordance with changes in the liquid pressure; a first restricting channel that brings the main liquid chamber and the auxiliary liquid chamber into communication with each other; a plurality of side liquid chambers that are arranged side by side with the juxtaposed member along a first axial right angle direction that is perpendicular to the axial direction and filled with a liquid; and a second restricting channel that brings the plurality of side liquid chambers into communication with each other or with the auxiliary liquid chamber, in which at least a portion of the partition wall of the side liquid chambers is formed by the first resilient body that extends in a second axial right angle direction that is perpendicular to the axial direction and that intersects with the first axial right angle direction; and the second mounting member and the juxtaposed member are coupled by a second resilient body.

    MICRO FLUIDIC DEVICE, SEPARATION METHOD AND SEPARATION APPARATUS
    65.
    发明申请
    MICRO FLUIDIC DEVICE, SEPARATION METHOD AND SEPARATION APPARATUS 审中-公开
    微流体装置,分离方法和分离装置

    公开(公告)号:US20100224551A1

    公开(公告)日:2010-09-09

    申请号:US12553459

    申请日:2009-09-03

    IPC分类号: B01D35/30

    摘要: A micro fluidic device includes a separation membrane that has an upper surface and a lower surface opposing to each other and a side surface; a plurality of base materials that sandwiches the separation membrane; a first channel and a second channel that are partitioned from each other by the separation membrane; a first feed port that is connected to the first channel; and a first discharge port that is connected to the second channel, wherein the first channel comes into contact with at least a part of the upper surface and the lower surface of the separation membrane, the second channel comes into contact with at least a part of the side surface of the separation membrane, and a fluid is movable in a surface direction within the separation membrane.

    摘要翻译: 微流体装置包括分离膜,其具有彼此相对的上表面和下表面以及侧表面; 夹持分离膜的多个基材; 通过分离膜彼此分隔的第一通道和第二通道; 连接到第一通道的第一进料口; 以及连接到第二通道的第一排出口,其中第一通道与分离膜的上表面和下表面的至少一部分接触,第二通道与至少一部分 分离膜的侧表面和流体可以在分离膜内沿表面方向移动。

    CLASSIFICATION METHOD AND CLASSIFICATION APPARATUS
    66.
    发明申请
    CLASSIFICATION METHOD AND CLASSIFICATION APPARATUS 审中-公开
    分类方法和分类装置

    公开(公告)号:US20090236269A1

    公开(公告)日:2009-09-24

    申请号:US12242012

    申请日:2008-09-30

    申请人: Hiroshi KOJIMA

    发明人: Hiroshi KOJIMA

    IPC分类号: B07C5/344

    摘要: A classification apparatus includes: a dispersion liquid inlet channel that introduces a dispersion liquid containing particles; a classification channel that classifies the particles; and at least one discharge channel that discharges the classified particles, wherein the classification channel is provided inclinedly to a direction of gravity.

    摘要翻译: 分级装置包括:引入含有颗粒的分散液的分散液入口通道; 用于分类颗粒的分类通道; 以及排出分级颗粒的至少一个排出通道,其中分级通道倾斜地设置在重力方向上。

    PROCESS FOR POLISHING GLASS SUBSTRATE
    67.
    发明申请
    PROCESS FOR POLISHING GLASS SUBSTRATE 有权
    抛光玻璃基板的工艺

    公开(公告)号:US20070259605A1

    公开(公告)日:2007-11-08

    申请号:US11779441

    申请日:2007-07-18

    IPC分类号: B24B49/00 B24B7/30

    摘要: A process for polishing a glass substrate, which enables to polish a glass substrate having a large waviness formed by mechanical polishing, to have a surface excellent in flatness, is provided. A process for polishing a glass substrate, comprising a step of measuring the surface profile of a mechanically polished glass substrate to identify the width of waviness present in the glass substrate, and a step of applying dry etching using a beam having a beam size in FWHM (full width of half maximum) value of at most the above size of waviness, to polish the surface of the glass substrate.

    摘要翻译: 提供了一种用于抛光玻璃基板的方法,该玻璃基板能够研磨通过机械抛光形成的具有大波纹度的玻璃基板以具有优异的平面度的表面。 一种用于抛光玻璃基板的方法,包括测量机械抛光的玻璃基板的表面轮廓以识别玻璃基板中存在的波纹宽度的步骤,以及使用在FWHM中具有光束尺寸的光束进行干蚀刻的步骤 (全宽半高)值至多为上述大小的波纹,以研磨玻璃基板的表面。

    Amplifying device
    68.
    发明授权
    Amplifying device 有权
    放大装置

    公开(公告)号:US07224226B2

    公开(公告)日:2007-05-29

    申请号:US11212310

    申请日:2005-08-26

    IPC分类号: H03F3/45

    摘要: An amplifying device comprising a first terminal to which an alternating signal is inputted; a second terminal connected via an external first resistor to a power supply line; a third terminal to be grounded; a second resistor provided on a signal line in between the second terminal and the third terminal; a differential amplifier, the alternating signal of which being inputted through the first terminal to one input terminal and an output according to the alternating signal being fed back to the other input terminal via a signal line in between the second terminal and the second resistor, and between the one input terminal and the other input terminal, a positive offset voltage higher than a maximum level of the alternating signal being produced in advance; and a third resistor provided between a signal line joining the first terminal and the one input terminal, and a signal line leading to the third terminal. A voltage waveform of the alternating signal that has been amplified on the basis of the resistances of the first and second resistors is produced at the second terminal.

    摘要翻译: 一种放大装置,包括:输入交流信号的第一端子; 经由外部第一电阻器连接到电源线的第二端子; 要接地的第三个终端; 设置在第二端子和第三端子之间的信号线上的第二电阻器; 差分放大器,其交流信号通过第一端子输入到一个输入端子,并且根据交流信号的输出端经由第二端子和第二电阻器之间的信号线反馈到另一输入端子,以及 在一个输入端子和另一个输入端子之间,预先产生高于交变信号的最大电平的正偏移电压; 以及设置在连接第一端子和一个输入端子的信号线之间的第三电阻器,以及通向第三端子的信号线。 在第二端子处产生基于第一和第二电阻器的电阻放大的交变信号的电压波形。

    Photomask, photomask manufacturing method, and photomask processing device
    69.
    发明申请
    Photomask, photomask manufacturing method, and photomask processing device 失效
    光掩模,光掩模制造方法和光掩模处理装置

    公开(公告)号:US20070059608A1

    公开(公告)日:2007-03-15

    申请号:US11222979

    申请日:2005-09-12

    IPC分类号: G03B27/62 G06F17/50 G03F1/00

    摘要: A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.

    摘要翻译: 通过包括提供具有要在其上形成预定图案的表面的基板的方法制造光掩模,将基板定位在曝光工具中,以便获得由于施加在其上的外力而导致的表面的变形量 基板,基于所述表面的变形量和目标平面度来计算所述表面的目标轮廓,以及当所述基板位于所述曝光工具中时,对所述基板的表面进行处理,以使所述表面基本上平坦。

    Electromagnetic shielding sheet and method for manufacturing same
    70.
    发明申请
    Electromagnetic shielding sheet and method for manufacturing same 失效
    电磁屏蔽片及其制造方法

    公开(公告)号:US20050233132A1

    公开(公告)日:2005-10-20

    申请号:US10519796

    申请日:2003-08-06

    申请人: Hiroshi Kojima

    发明人: Hiroshi Kojima

    IPC分类号: H05K9/00 B32B5/16

    摘要: Blackened layers 23A and 23B are formed by depositing Cu—Co alloy particles on the surfaces of a metal layer 21. The metal layer 21 coated with the blackened layers 23A and 23B of the Cu—Co alloy particles is subjected to a chromating process to form density-intensifying layers 25A and 25B on the blackened layers 23A and 23B. A base 11 is laminated to the density-intensifying layer 25A or 25B. A conductive structure 109 consisting of the meal layer 21, the blackened layers 23A and 23B, and the density-intensifying layers 25A and 25B is processed by a photolithographic process to complete an electromagnetic shielding sheet 1 having a mesh conductive structure.

    摘要翻译: 通过在金属层21的表面上沉积Cu-Co合金颗粒而形成钝化层23A和23B。 对涂覆有Cu-Co合金颗粒的黑化层23A和23B的金属层21进行铬酸盐化处理,以在黑化层23A和23B上形成增强强化层25A和25B。 11层压到增密层25A或25B。由餐层21,黑化层23A和23B以及增强密度层25A和25B组成的导电结构109由 光刻工艺完成具有网状导电结构的电磁屏蔽片1。