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公开(公告)号：US07084990B2
公开(公告)日：2006-08-01
申请号：US10372270
申请日：2003-02-25
IPC分类号： G01B11/03
摘要： In size measurement of a semiconductor device, profiles of a pattern formed in a resist process are determined through an exposure/development simulation in respect of individual different combinations of exposure values and focus values to form a profile matrix and scattered light intensity distributions corresponding to the individual profiles are determined through calculation to form a scattered light library, thereby forming a profile library consisting of the profile matrix and scattered light library. A scattered light intensity distribution of an actually measured pattern is compared with the scattered light intensity distributions of the scattered light library and a profile of profile matrix corresponding to a scattered light intensity distribution of scattered light library having the highest coincidence is determined as a three-dimensional shape of the actually measured pattern.
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公开(公告)号：US07037735B2
公开(公告)日：2006-05-02
申请号：US10170378
申请日：2002-06-14
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.
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公开(公告)号：US06720117B2
公开(公告)日：2004-04-13
申请号：US10390670
申请日：2003-03-19
IPC分类号： G03F900
CPC分类号： G03F9/7019 , G03F9/7011 , G03F9/7084
摘要： An exposure mask includes an optically transparent substrate, a device area constituted with a pattern formed on the substrate, and alignment marks formed on the substrate. Further measurement data for relative positional displacement between the device area and the alignment marks on the substrate is appended together with information for identifying the substrate to the substrate.
摘要翻译： 曝光掩模包括光学透明基板，由形成在基板上的图案构成的器件区域和形成在基板上的对准标记。 将用于将衬底识别到衬底的信息附加在衬底上的器件区域和对准标记之间的相对位置位移的另外的测量数据。
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公开(公告)号：US06686107B2
公开(公告)日：2004-02-03
申请号：US09943140
申请日：2001-08-31
IPC分类号： G03F900
CPC分类号： G03F9/7019 , G03F9/7011 , G03F9/7084
摘要： A relative positional error is caused between an alignment mark and a device area on a mask due to an error inherent to the mask drawing apparatus, which causes an alignment error in the device area even when alignment upon exposure has no problem. Then, according to this invention, a relative positional error between the alignment mark and the device area on the mask is measured in an off line manner, the result of measurement is set upon exposure as a correction value to an exposure device thereby correcting the mask drawing error to reduce alignment errors in the device area.
摘要翻译： 由于掩模绘图装置固有的错误，在掩模上的对准标记和器件区域之间产生相对位置误差，即使在曝光时的对准没有问题的情况下也会导致器件区域中的对准误差。 然后，根据本发明，以离线方式测量对准标记和掩模上的器件面积之间的相对位置误差，将曝光结果作为校正值设置在曝光装置上，从而校正掩模 绘图错误，以减少设备区域中的对齐错误。
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65.发明授权Composition for electrodeposition of polyimides and method for producing patterned polyimide membranes using the same 有权用于聚酰亚胺电沉积的组合物和使用其制备图案化聚酰亚胺膜的方法公开(公告)号：US06630064B1
公开(公告)日：2003-10-07
申请号：US09806450
申请日：2001-03-30
IPC分类号： C25D1304
CPC分类号： C09D179/08 , G03F7/0045 , G03F7/0387 , G03F7/039 , G03F7/164
摘要： A composition for electro-depositing polyimide membranes which can be patterned by photolithography, which are excellent in heat resistance, insulation performance and in chemical resistance. The composition for electrodeposition of polyimides according to the present invention comprises a composition for electrodeposition of polyimides comprising a photoacid generator, a positive-type photosensitive polyimide having oxycarbonyl groups in side chains, a polar solvent which dissolves said polyimide, water, a dispersing agent, and an alkaline neutralizer.
摘要翻译： 用于电沉积聚酰亚胺膜的组合物，其可通过光刻图案化，其耐热性，绝缘性能和耐化学性优异。 根据本发明的聚酰亚胺的电沉积用组合物包括用于电沉积聚酰亚胺的组合物，其包含光酸产生剂，在侧链中具有氧羰基的正型感光性聚酰亚胺，溶解所述聚酰亚胺的极性溶剂，水，分散剂， 和碱性中和剂。
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公开(公告)号：US06589662B1
公开(公告)日：2003-07-08
申请号：US09806452
申请日：2001-03-30
IPC分类号： B32B2700
CPC分类号： C08J7/047 , C08G73/10 , C08J2479/00 , H05K1/0346 , H05K3/022 , H05K2201/0154 , Y10T428/24917 , Y10T428/31504 , Y10T428/31511 , Y10T428/31522 , Y10T428/31529 , Y10T428/31721
摘要： A composite film having an excellent heat resistance is disclosed. The composite film according to the present invention comprises a substrate film and polyimide membrane(s) formed on at least one surface of the substrate film, which polyimide membrane(s) is(are) prepared by applying a solution of a solvent-soluble polyimide whose main chain is formed by polycondensation of one or more tetracarboxylic dianhydrides and one or more diamines and by drying the solution. The solvent-soluble polyimide comprises bicyclo(2,2,2)oct-7-ene-2,3,5,6-tetracarboxylic dianhydride as at least a part of the tetracarboxylic dianhydride(s) and/or at least one of 3,5-diaminobenzoic acid and a diaminosiloxane derivative as at least a part the diamine(s).
摘要翻译： 公开了具有优异耐热性的复合膜。 根据本发明的复合膜包括基材膜和形成在基材膜的至少一个表面上的聚酰亚胺膜，所述聚酰亚胺膜通过将溶剂可溶性聚酰亚胺 其主链通过一种或多种四羧酸二酐和一种或多种二胺的缩聚形成，并通过干燥该溶液。 溶剂可溶性聚酰亚胺包含二环（2,2,2）辛-7-烯-2,3,5,6-四羧酸二酐作为至少一部分四羧酸二酐和/或至少一种3 ，5-二氨基苯甲酸和作为二胺的至少一部分的二氨基硅氧烷衍生物。
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公开(公告)号：US06084664A
公开(公告)日：2000-07-04
申请号：US184003
申请日：1998-11-02
IPC分类号： G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , G03F1/32 , G03F1/84 , H01L21/027 , H01L21/30 , H01L21/66 , G01N21/00
CPC分类号： G01N21/94 , G01N21/956 , G01N21/95607 , G01N21/95623 , G03F1/84
摘要： A reticle inspecting apparatus for inspecting a reticle for defects has a transparent or translucent substrate, a circuit pattern formed on the front surface of the substrate, and a phase shifter formed of a light-transmissive film on the front surface of the substrate. In the apparatus, a detection optical system is disposed so as not to gather directly reflected light and directly transmitted light and so as to gather scattered light and diffracted light which has been scattered and diffracted, respectively, by the reticle. This detection optical system is capable of separating the gathered light by direction of illumination using detectors, and spatial filters disposed respectively on Fourier transform planes to intercept light diffracted by straight edges of the circuit pattern, so as to form images of gathered light on the detectors. A signal processing system having a signal processing unit calculates data concerning defects on the basis of the output signals of the detectors and displays the calculated data on a display.
摘要翻译： 用于检查用于缺陷的掩模版的掩模版检查装置具有透明或半透明的基板，形成在基板的前表面上的电路图案，以及在基板的前表面上由透光膜形成的移相器。 在该装置中，检测光学系统被设置成不会直接聚集反射光并直接透射光，以分散散射光和被散射和衍射的衍射光。 该检测光学系统能够通过使用检测器的照明方向分离收集的光，并且分别设置在傅里叶变换平面上的空间滤波器，以截取由电路图案的直边衍射的光，以便在检测器上形成聚光的图像 。 具有信号处理单元的信号处理系统基于检测器的输出信号来计算关于缺陷的数据，并将计算出的数据显示在显示器上。
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68.发明申请公开(公告)号：US20210293475A1
公开(公告)日：2021-09-23
申请号：US17208210
申请日：2021-03-22
申请人： Shunichi MATSUMOTO , Kunio KAZAMI , Jun KONDO , Hiroshi KUBOTA , Takahiro UMENO , Shoji TAKAMI , Kenji IWAMOTO , Yujiro HOTEI
发明人： Shunichi MATSUMOTO , Kunio KAZAMI , Jun KONDO , Hiroshi KUBOTA , Takahiro UMENO , Shoji TAKAMI , Kenji IWAMOTO , Yujiro HOTEI
摘要： A helium circulation system includes a refrigerator configured to cool a gas refrigerant into a liquid refrigerant; a first path configured to feed the liquid refrigerant from the refrigerator to a Dewar; a second path configured to feed the gas refrigerant from the Dewar to a vaporized gas collector via the refrigerator; a third path configured to feed the gas refrigerant from the vaporized gas collector to the refrigerator; a fourth path configured to feed the gas refrigerant from the Dewar to the vaporized gas collector without via the refrigerator; and a control unit configured to feed the liquid refrigerant through the first path while feeding the gas refrigerant through the third path when the refrigerator is driven, and feed the gas refrigerant through the second path while feeding the gas refrigerant the fourth path, when the refrigerator is stopped.
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公开(公告)号：US09291574B2
公开(公告)日：2016-03-22
申请号：US14232929
申请日：2012-06-28
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/956 , G01N2201/126 , G01N2201/127 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a table, with illumination light from an inclined direction to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through oval shaped lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light.
摘要翻译： 一种缺陷检查方法和装置，用于将安装在台上的表面图案样品上的线性区域照射到具有来自倾斜方向的样品的照明光，并在多个方向上检测从所述多个方向散射的光的图像 用照射光照射的样品，然后处理通过检测散射光的图像获得的信号，从而检测样品上存在的缺陷; 其特征在于，通过椭圆形透镜，其光轴的仰角彼此不同，在垂直于由所述平面形成的法线形成的平面的一个平面内，通过椭圆形透镜来检测多个方向上的散射光图像的步骤 用于安装样品的台面和用照射光照射的线性区域的纵向方向。
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公开(公告)号：US08830465B2
公开(公告)日：2014-09-09
申请号：US13700150
申请日：2011-06-17
IPC分类号： G01J4/00 , G01N21/956 , G01N21/95 , G01N21/94
CPC分类号： G01N21/956 , G01N21/94 , G01N21/9501
摘要： A defect inspecting apparatus includes an irradiation optical system having a light source that emits illumination light and a polarization generation part that adjusts polarization state of the illumination light emitted from the light source, a detection optical system having a polarization analysis part that adjusts polarization state of scattered light from a sample irradiated by the irradiation optical system and a detection part that detects the scattered light adjusted by the polarization analysis part, and a signal processing system that processes the scattered light detected by the detection optical system to detect a defect presenting in the sample. The polarization generation part adjusts the polarization state of the illumination light emitted from the light source on the basis of predetermined illumination conditions and the polarization analysis part adjusts the polarization state of the illumination light emitted from the light source on the basis of predetermined detection conditions.
摘要翻译： 缺陷检查装置包括具有发出照明光的光源的照射光学系统和调整从光源发出的照明光的偏振状态的偏振光产生部，具有调整偏振状态的偏振光分析部的检测光学系统 由照射光学系统照射的样本的散射光和检测由偏振分析部调节的散射光的检测部，以及处理由检测光学系统检测出的散射光的信号处理系统， 样品。 偏光产生部根据规定的照明条件来调整从光源发出的照明光的偏光状态，偏光分析部基于规定的检测条件来调整从光源发出的照明光的偏振状态。
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