公开(公告)号：US07522259B2

公开(公告)日：2009-04-21

申请号：US11237651

申请日：2005-09-29

申请人： Andrew J Hazelton ,  Hidemi Kawai ,  Douglas C Watson ,  W Thomas Novak

发明人： Andrew J Hazelton ,  Hidemi Kawai ,  Douglas C Watson ,  W Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.

摘要翻译： 浸没式光刻设备具有分隔板台，其布置成保持掩模版，布置成保持工件的工作台，以及包括照明源和与工件相对的光学元件的光学系统，用于具有通过辐射投射的掩模版的图像图案 照明源。 在光学元件和工件之间限定间隙，并且流体供应装置用于将浸没液体供应到该间隙中，使得所提供的浸没液体在浸没式光刻工艺期间与光学元件和工件接触。 一种清洁装置，用于在净化过程中从光学元件中去除吸收的液体。 清洁装置可以利用对吸收的液体具有亲和性的清洁液体，热，真空条件，超声波振动或气泡以去除吸收的液体。 可以通过设置有诸如阀门的开关装置的相同的流体施加装置来供应清洁液体。

公开(公告)号：US07345742B2

公开(公告)日：2008-03-18

申请号：US11705001

申请日：2007-02-12

申请人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

发明人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC分类号： G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid removal system having a conduit having an open end adjacent a volume in which liquid will be present, a porous member between the end of the conduit and the volume, and a suction device arranged to create a pressure differential across the porous member.

摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该设备还包括一个液体去除系统，该系统具有一个导管，该导管具有一个与其中存在液体的容积相邻的开口端，一个位于导管端部和该体积之间的多孔构件，以及一个抽吸装置， 多孔构件。

公开(公告)号：US07251017B2

公开(公告)日：2007-07-31

申请号：US11236713

申请日：2005-09-28

申请人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

发明人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier, an immersion fluid system, and a transport region. The fluid barrier is positioned near the device and maintains the transport region near the gap. The immersion fluid system delivers an immersion fluid that fills the gap. The transport region transports at least a portion of the immersion fluid that is near the fluid barrier and the device away from the device. The immersion fluid system can include a fluid removal system that is in fluid communication with the transport region. The transport region can be made of a porous material.

摘要翻译： 环境系统控制光学组件和装置之间的间隙中的环境，并且包括流体屏障，浸没流体系统和输送区域。 流体屏障定位在设备附近并保持输送区域靠近间隙。 浸液系统提供填充间隙的浸液。 输送区域将至少一部分浸入液体输送到靠近流体屏障并且该装置远离装置。 浸没流体系统可以包括与输送区域流体连通的流体去除系统。 输送区域可以由多孔材料制成。

公开(公告)号：US07125128B2

公开(公告)日：2006-10-24

申请号：US10765703

申请日：2004-01-26

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： G02B5/08 ,  G02B7/182 ,  G03B27/54 ,  F15C1/00

CPC分类号： G02B26/0825 ,  G02B26/06 ,  G03F7/70266 ,  Y10T137/206

摘要： Actuator arrays for use in adaptive-optical elements and optical systems containing at least one such element are disclosed. The actuator arrays provide more precise control of the shape of the adaptive-optical surface while utilizing fewer actuators than conventional systems. An adaptive-optical system of an embodiment includes an array of force devices coupled to a deformable optical surface. The force devices of the array are arranged in braking groups and force-altering groups such that each force device belongs to a respective combination of braking group and force-altering group. A respective force controller is coupled to the force devices of each force-altering group, and a respective braking controller is coupled to the force devices of each braking group. The force-altering group adjusts as required the respective forces exerted on the optical surface by the force devices of the respective force-altering group, whereas the braking controller when actuated prevents changes in respective forces exerted by the force devices of the respective braking group.

公开(公告)号：US06980279B2

公开(公告)日：2005-12-27

申请号：US10764377

申请日：2004-01-22

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70775

摘要： An interferometer system for measuring the height of a wafer stage utilizes four beams emitted horizontally parallel to one another and in a same direction from an interferometer and obtained by splitting a single laser beam. Two of these four beams are reference beams and the other two are measurement beams. The reference beams are mutually on opposite sides of the center point of the stage, equally separated therefrom horizontally, and are reflected back from the front surface of the stage. The wafer stage is provided with two mirrors inclined at 45° extending horizontally so as to reflect the measurement beams vertically upward. These two inclined mirrors are disposed in lower front and upper back parts of the stage and the two measurement beams are aimed and reflected at target points on them, diametrically opposite with reference to the center point of the stage. The height of the wafer stage is calculated from measured path lengths of these four beams, independent of small displacements to first degree in other linear and rotational degrees of freedom of motion of the wafer stage.

公开(公告)号：USH2114H1

公开(公告)日：2005-02-01

申请号：US10298286

申请日：2002-11-14

申请人： W. Thomas Novak ,  John H. McCoy ,  Martin E. Lee

发明人： W. Thomas Novak ,  John H. McCoy ,  Martin E. Lee

摘要： An inspection system and method are disclosed. The inspection system is configured to inspect a projection unit having multiple optical subsystems. The optical subsystems are configured to project an image during a lithography step. The inspection system provides self calibration by measuring both a test mask and the aerial image of the test mask with the same detector assembly. The inspection system is also capable of measuring multiple fields simultaneously using multiple detectors and 6 axis interferometry to accurately determine the position of each detector. Additionally, the inspection system is capable of measuring the distance between the test mask and the detector assembly with an indirect path around the projection unit which normally blocks the direct path.

公开(公告)号：US06781138B2

公开(公告)日：2004-08-24

申请号：US09866838

申请日：2001-05-30

申请人： W. Thomas Novak ,  Michael Kovalerchik

发明人： W. Thomas Novak ,  Michael Kovalerchik

IPC分类号： G21K510

CPC分类号： G03F7/70716 ,  H01J37/20 ,  H01J2237/3175 ,  Y10T74/20354

摘要： A positioning stage system for precise and accurate movement of an article in an electron beam lithography system. The positioning stage system includes a support platform for supporting the article, an X-direction linear motor coupled to an X-member, a Y-direction linear motor coupled a Y-member, and a slide attached to the support platform and slidably engaged to the X-member and the Y-member. The X-member and Y-member, upon actuation of the X-direction and Y-direction linear motors, cause the support platform to move in an X-direction and a Y-direction, respectively.

摘要翻译： 一种用于电子束光刻系统中物品精确和精确移动的定位台系统。 定位台系统包括用于支撑物品的支撑平台，耦合到X构件的X方向线性电动机，连接Y形构件的Y方向线性电动机和附接到支撑平台的滑动件，可滑动地接合到 X会员和Y会员。 在X方向和Y方向线性电动机的驱动下，X形件和Y形件分别使支撑平台在X方向和Y方向上移动。

公开(公告)号：US06735867B2

公开(公告)日：2004-05-18

申请号：US10205200

申请日：2002-07-26

申请人： Takuma Tsuda ,  Shinji Shinohara ,  Shinobu Tokushima ,  Yukiharu Okubo ,  Toshimasa Shimoda ,  Douglas C. Watson ,  W. Thomas Novak

发明人： Takuma Tsuda ,  Shinji Shinohara ,  Shinobu Tokushima ,  Yukiharu Okubo ,  Toshimasa Shimoda ,  Douglas C. Watson ,  W. Thomas Novak

IPC分类号： B21D5310

CPC分类号： F16C32/06 ,  B23Q1/0027 ,  B23Q1/38 ,  B23Q1/621 ,  F16C29/025 ,  F16C32/0603 ,  F16C33/748 ,  F16C2300/62 ,  F16C2322/39 ,  G03F7/70816 ,  Y10T29/49639 ,  Y10T29/49641

摘要： In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

摘要翻译： 为了提供一种具有两个轴的静压空气轴承，该真空环在真空环境中可以使支撑排气管的连接不会对轴承机构的运动产生不利影响，排气管仅与固定部分 ）。 从上轴排出的排气通过形成在上下轴的固定部内的内部排气管（通路）进行排气，不需要将排气管与可动部连接。

公开(公告)号：US06562528B2

公开(公告)日：2003-05-13

申请号：US09884140

申请日：2001-06-20

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： G03F900

CPC分类号： G03F9/7019 ,  G03F7/70641 ,  G03F9/7011 ,  G03F9/7034

摘要： A method for determining and calibrating substrate plane tilt and image plane tilt in a photolithography system, which includes subjecting a test substrate to multiple exposure series to form image from which image plane tilt and substrate plane tilt about the first axis can be separately determined. For a first exposure series, two test areas aligned along a second axis are subject to the same exposures at the same position along a third axis orthogonal to the horizontal reference plane. The image from this exposure series would indicate the presence of substrate plane tilt if the relative locations of the best focus images in the test areas were substantially different. For a second exposure series, the substrate plane is stepped along the third axis direction and at least one of the test areas is subjected to the same exposure at different positions in the third axis direction. The image from this second exposure series provides information on the change in position of best focus across the substrate plane, corresponding to changes in substrate position along the third axis direction. Such information is used for determining the image plane tilt and substrate plane tilt with respect to the substrate plane. The image plane tilt and substrate plane tilt information may be used to calibrate the photolithography system for processing production substrates.

摘要翻译： 一种用于在光刻系统中确定和校准衬底平面倾斜和图像平面倾斜的方法，其包括使测试衬底经受多次曝光序列以形成图像，从而可以分别确定图像平面倾斜和衬底平面围绕第一轴线倾斜的图像。 对于第一曝光系列，沿着第二轴对准的两个测试区域沿着与水平参考平面正交的第三轴线在相同位置处受到相同的曝光。 如果测试区域中最佳对焦图像的相对位置基本不同，则来自该曝光系列的图像将指示存在基板平面倾斜。 对于第二曝光系列，基板平面沿着第三轴线方向阶梯，并且至少一个测试区域在第三轴线方向上的不同位置处受到相同的曝光。 来自该第二曝光系列的图像提供关于沿着第三轴线方向的基板位置的变化的关于跨越基板平面的最佳焦点的位置变化的信息。 这样的信息用于确定相对于基板平面的图像平面倾斜和基板平面倾斜。 图像平面倾斜和基板平面倾斜信息可以用于校准用于处理生产基板的光刻系统。

公开(公告)号：US06515381B1

公开(公告)日：2003-02-04

申请号：US09661321

申请日：2000-09-13

申请人： W. Thomas Novak ,  Michael Kovalerchik

发明人： W. Thomas Novak ,  Michael Kovalerchik

IPC分类号： G03B2742

CPC分类号： B23Q1/26 ,  B23Q11/0021 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70766 ,  H01J37/20 ,  H01J37/3174 ,  H02K16/00 ,  H02K41/02 ,  H02K2201/18

摘要： A cantilever stage for precision movement and positioning an article such as a reticle in an electron beam photolithography system is disclosed. The cantilever stage comprises a cantilevered support platform for supporting the article extending from a movable member. The cantilever stage is supported by at least one elongate guide extending through a channel defined by the movable member. The cantilever stage may be driven by one or more actuators mechanically coupled to the movable member to move and position the cantilever stage in a first direction along the elongate guide. The actuator may be any suitable actuator such as an electromagnetic drive motors. The movable portion defines an open region which includes the center of gravity of the cantilever stage and is configured to receive a counterbalance or reaction force balancing device. The cantilever stage may also be driven in a second direction, generally perpendicular to the first direction, by an actuator mechanically coupled to the elongate guide.

摘要翻译： 公开了一种用于在电子束光刻系统中精确移动和定位诸如掩模版的物品的悬臂台。 悬臂台包括用于支撑从可移动构件延伸的制品的悬臂支撑平台。 悬臂台由延伸穿过由可移动构件限定的通道的至少一个细长引导件支撑。 悬臂台可以由一个或多个致动器驱动，该致动器机械联接到可移动构件，以沿着细长引导件沿第一方向移动和定位悬臂台。 致动器可以是任何合适的致动器，例如电磁驱动马达。 可移动部分限定了包括悬臂台的重心的开放区域，并且构造成容纳平衡或反作用平衡装置。 悬臂台还可以通过机械联接到细长引导件的致动器在大致垂直于第一方向的第二方向上被驱动。