公开(公告)号：US20090009753A1

公开(公告)日：2009-01-08

申请号：US12167570

申请日：2008-07-03

Applicant: Izuo Horai ,  Hirokazu Koyabu ,  Yuta Urano ,  Takahiro Jingu

Inventor： Izuo Horai ,  Hirokazu Koyabu ,  Yuta Urano ,  Takahiro Jingu

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/65 ,  G01N21/9505 ,  G01N2021/4711 ,  G01N2021/473 ,  G01N2021/8861 ,  G01N2021/8864

Abstract: An inspection method and an inspection device, or apparatus each capable of conducting composition analysis of a defect detected by elastic or stokes scattered light, an inspection surface or defect on the surface of the inspection surface, or a defect on the surface of the inspection object and its internal composition. A surface inspection method for optically detecting elastic or stokes scattering or inelastic or anti-stokes scattered light from inside the surface of the inspection object, for detecting existence of defects of the inspection object and features of the defects, for detecting positions of the detected defects on the surface of the inspection object, classifying and analyzing the detected defects in accordance with their features on the basis of the positions of the defects and the features of the defects or the classification result of the defects.

Abstract translation: 检查方法和检查装置或装置，其能够对由检查表面的弹性或sto kes散射光，检查面或缺陷检测到的缺陷或检​​查对象的表面上的缺陷进行组成分析 及其内在组成。 一种表面检查方法，用于光学检测来自检查对象的表面内的弹性或斯托克斯散射或非弹性或反射散射光，用于检测检查对象的缺陷的存在和缺陷的特征，用于检测检测到的缺陷的位置 在检查对象的表面上，根据缺陷的位置和缺陷的特征或缺陷的分类结果，根据其特征对检测到的缺陷进行分类和分析。

公开(公告)号：US20080015802A1

公开(公告)日：2008-01-17

申请号：US11776572

申请日：2007-07-12

Applicant: Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

Inventor： Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

IPC: G06F19/00 ,  G01J4/00 ,  G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N21/956

Abstract: A pattern inspection apparatus which compares images of regions, corresponding to each other, of patterns that are formed so as to be identical and judges that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.

Abstract translation: 一种模式检查装置，其将彼此对应的区域的图像进行比较，形成为相同的图案，并判断图像中的非重合部分是缺陷。 图案检查装置配备有图像比较部，其在特征空间中绘制检查对象图像的各个像素，并且将特征空间中的过度偏离的点作为缺陷进行检测。 即使图像中的相同图案由于晶片上形成的膜的厚度差而具有亮度差，因此也可以正确地检测缺陷。

公开(公告)号：US20060290923A1

公开(公告)日：2006-12-28

申请号：US11472426

申请日：2006-06-22

Applicant: Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

Inventor： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC: G01N21/88

CPC classification number: G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

Abstract: A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

公开(公告)号：US09588054B2

公开(公告)日：2017-03-07

申请号：US13882542

申请日：2011-10-14

Applicant: Yuta Urano ,  Toshifumi Honda ,  Takahiro Jingu

Inventor： Yuta Urano ,  Toshifumi Honda ,  Takahiro Jingu

IPC: G01N21/86 ,  H01J3/14 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/4795 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8835

Abstract: A defect inspection method includes an illumination light adjustment step of adjusting light emitted from a light source, an illumination intensity distribution control step of forming light flux obtained in the illumination light adjustment step into desired illumination intensity distribution, a sample scanning step of displacing a sample in a direction substantially perpendicular to a longitudinal direction of the illumination intensity distribution, a scattered light detection step of counting the number of photons of scattered light emitted from plural small areas in an area irradiated with illumination light to produce plural scattered light detection signals corresponding to the plural small areas, a defect judgment step of processing the plural scattered light detection signals to judge presence of a defect, a defect dimension judgment step of judging dimensions of the defect in each place in which the defect is judged to be present and a display step of displaying a position on sample surface and the dimensions of the defect in each place in which the defect is judged to be present.

Abstract translation: 缺陷检查方法包括调整从光源发出的光的照明光调节步骤，将在所述照明光调节步骤中获得的光束形成为期望的照度分布的照度分布控制步骤，将样品置换的样本扫描步骤 在与照明强度分布的长度方向大致正交的方向上，对从照明光照射的区域的多个小区域发射的散射光的光数进行计数，生成与多个散射光检测信号对应的散射光检测信号的散射光检测步骤 多个小区域，处理多个散射光检测信号以判断缺陷的存在的缺陷判断步骤，判断存在缺陷的每个位置的缺陷的尺寸的缺陷维度判断步骤和显示 显示位置的步骤o n样品表面和缺陷的每个位置的缺陷的尺寸。

公开(公告)号：US09041921B2

公开(公告)日：2015-05-26

申请号：US13519138

申请日：2011-01-17

Applicant: Toshiyuki Nakao ,  Shigenobu Maruyama ,  Yuta Urano ,  Toshifumi Honda

Inventor： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Yuta Urano ,  Toshifumi Honda

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/47

CPC classification number: G01N21/9501 ,  G01N21/47

Abstract: A defect inspection device has: an illumination optical system which irradiates a predetermined region of an inspection target with illumination light; a detection optical system which has a detector provided with a plurality of pixels by which scattered light from the predetermined region of the inspection target due to illumination light from the illumination optical system can be detected; and a signal processing portion which is provided with a correction portion which corrects pixel displacement caused by change in a direction perpendicular to a surface of the inspection target with respect to a detection signal based on the scattered light detected by the detector of the detection optical system, and a defect determination portion which determines a defect on the surface of the inspection target based on the detection signal corrected by the correction portion.

Abstract translation: 缺陷检查装置具有：利用照明光照射检查对象物的规定区域的照明光学系统; 检测光学系统，其具有检测器，该检测器设置有多个像素，通过该检测器能够检测来自照明光学系统的照明光来自检查对象物的预定区域的散射光; 以及信号处理部，其具有校正部，该校正部基于由检测光学系统的检测器检测到的散射光，相对于检测信号校正与垂直于检查对象的表面的方向的变化引起的像素位移 以及缺陷确定部分，其基于由校正部分校正的检测信号来确定检查对象的表面上的缺陷。

公开(公告)号：US08705026B2

公开(公告)日：2014-04-22

申请号：US13597553

申请日：2012-08-29

Applicant: Yoshimasa Oshima ,  Yuta Urano ,  Toshiyuki Nakao

Inventor： Yoshimasa Oshima ,  Yuta Urano ,  Toshiyuki Nakao

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N2021/4707 ,  G01N2021/4709 ,  G01N2021/8864

Abstract: An inspection method and apparatus for detecting defects or haze of a sample, includes illuminating light to the sample from an oblique direction relative to a surface of the sample with an illuminator, detecting first scattered light at a forward position relative to an illuminating direction from the sample with a first detector, detecting sec and scattered light at a sideward or backward position relative to the illuminating direction from the sample with a second detection, and processing a first signal of the first scattered light and a second signal of the second scattered light with different weighting for the first signal and for the second signal with a processor.

Abstract translation: 一种用于检测样品的缺陷或雾度的检查方法和装置，包括使用照明器从相对于样品表面的倾斜方向向样品照射光，从相对于照射方向的前方位置检测第一散射光， 采用第一检测器，利用第二检测从样品检测相对于照明方向的向后或向后位置处的秒和散射光，并且处理第一散射光的第一信号和第二散射光的第二信号， 对于第一信号和与处理器的第二信号的加权不同。

公开(公告)号：US08654350B2

公开(公告)日：2014-02-18

申请号：US13672742

申请日：2012-11-09

Applicant: Akira Hamamatsu ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiyuki Nakao ,  Shigenobu Maruyama

Inventor： Akira Hamamatsu ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiyuki Nakao ,  Shigenobu Maruyama

IPC: G01B11/30

CPC classification number: G01B11/303 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501

Abstract: An inspecting method and apparatus for inspecting a substrate surface includes illuminating a light to the substrate surface having a film, detection of a scattered light or reflected light from a plurality of positions of the substrate surface to obtain a plurality of electrical signals, comparison of the plurality of electrical signals and a database which indicates a relationship between the electrical signals and surface roughness, and calculation of a surface roughness value based on the result of comparison.

Abstract translation: 用于检查基板表面的检查方法和装置包括将光照射到具有膜的基板表面，从基板表面的多个位置检测散射光或反射光以获得多个电信号， 多个电信号和指示电信号和表面粗糙度之间的关系的数据库，以及基于比较结果的表面粗糙度值的计算。

公开(公告)号：US20140009755A1

公开(公告)日：2014-01-09

申请号：US13701834

申请日：2011-07-01

Applicant: Yukihiro Shibata ,  Toshiyuki Nakao ,  Yuta Urano ,  Toshifumi Honda

Inventor： Yukihiro Shibata ,  Toshiyuki Nakao ,  Yuta Urano ,  Toshifumi Honda

IPC: G01N21/956

CPC classification number: G01N21/956 ,  G01N21/8806 ,  G01N21/9501

Abstract: In order to enable inspections to be conducted at a sampling rate higher than the pulse oscillation frequency of a pulsed laser beam emitted from a laser light source, without damaging samples, a defect inspection method is disclosed, wherein: a single pulse of a pulsed laser beam emitted from the laser light source is split into a plurality of pulses; a sample is irradiated with this pulse-split pulsed laser beam; scattered light produced by the sample due to the irradiation is focused and detected; and defects on the sample are detected by using information obtained by focusing and detecting the scattered light from the sample. Said defect inspection method is configured such that the splitting a single pulse of the pulsed laser beam into a plurality of pulses is controlled in such a manner that the peak values of the split pulses are substantially uniform.

Abstract translation: 为了使得能够以高于从激光光源发射的脉冲激光束的脉冲振荡频率的采样率进行检查，而不损害样品，公开了一种缺陷检查方法，其中：脉冲激光的单个脉冲 从激光光源发射的光束被分成多个脉冲; 用脉冲分割脉冲激光束照射样品; 聚焦和检测由于照射产生的样品产生的散射光; 通过使用通过聚焦和检测来自样品的散射光获得的信息来检测样品上的缺陷。 所述缺陷检查方法被配置为使得将脉冲激光束的单个脉冲分裂成多个脉冲以使得分离脉冲的峰值基本上均匀的方式被控制。

公开(公告)号：US08482727B2

公开(公告)日：2013-07-09

申请号：US13366704

申请日：2012-02-06

Applicant: Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

Inventor： Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N2021/887

Abstract: A method and apparatus of inspecting a defect of a surface of a sample in which a laser beam is irradiated on a sample surface so that at least a part of an illumination field of the laser beam illuminates a first area of the sample surface, a plurality of scattered light rays from the first area caused by the irradiation is detected with a plurality of detectors, detection errors of inclination of an illumination apparatus and a sensor for the plurality of scattered light rays detected by the plurality of detectors are corrected, at least one of adding and averaging the corrected plurality of scattered light rays, and a defect on the sample surface is determined based on the plurality of scattered light rays in accordance with the correction of errors of inclination of the illumination apparatus and the sensor.

Abstract translation: 一种检查样品表面的缺陷的方法和装置，其中激光束照射在样品表面上，使得激光束的照明场的至少一部分照射样品表面的第一区域，多个 利用多个检测器检测来自由照射引起的第一区域的散射光线，校正由多个检测器检测的用于多个散射光线的照明装置和传感器的倾斜检测误差，至少一个 根据照明装置和传感器的倾斜误差的校正，基于多个散射光线来确定样本表面上的缺陷。

公开(公告)号：US20130003052A1

公开(公告)日：2013-01-03

申请号：US13519138

申请日：2011-01-17

Applicant: Toshiyuki Nakao ,  Shigenobu Maruyama ,  Yuta Urano ,  Toshifumi Honda

Inventor： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Yuta Urano ,  Toshifumi Honda

IPC: G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/47

Abstract: A defect inspection device has: an illumination optical system which irradiates a predetermined region of an inspection target with illumination light; a detection optical system which has a detector provided with a plurality of pixels by which scattered light from the predetermined region of the inspection target due to illumination light from the illumination optical system can be detected; and a signal processing portion which is provided with a correction portion which corrects pixel displacement caused by change in a direction perpendicular to a surface of the inspection target with respect to a detection signal based on the scattered light detected by the detector of the detection optical system, and a defect determination portion which determines a defect on the surface of the inspection target based on the detection signal corrected by the correction portion.

Abstract translation: 缺陷检查装置具有：利用照明光照射检查对象物的规定区域的照明光学系统; 检测光学系统，其具有检测器，该检测器设置有多个像素，通过该检测器能够检测来自照明光学系统的照明光来自检查对象物的预定区域的散射光; 以及信号处理部，其具有校正部，该校正部基于由检测光学系统的检测器检测到的散射光，相对于检测信号校正与垂直于检查对象的表面的方向的变化引起的像素位移 以及缺陷确定部分，其基于由校正部分校正的检测信号来确定检查对象的表面上的缺陷。