Light-sensitive recording materials for producing mar-resistant intaglio
printing plates
    63.
    发明授权
    Light-sensitive recording materials for producing mar-resistant intaglio printing plates 失效
    用于生产防水凹版印刷版的感光记录材料

    公开(公告)号:US4994348A

    公开(公告)日:1991-02-19

    申请号:US315119

    申请日:1989-02-24

    CPC分类号: G03F7/027 Y10S430/162

    摘要: A light-sensitive recording material for the production of intaglio printing plates comprises a photopolymerizable and/or photocrosslinkable material which is soluble or dispersible in a developer liquid and on exposure to actinic light is rendered insoluble or no longer dispersible in this developer liquid and which, at least in a surface zone of the surface of the layer which forms the later surface of the printing plate, contains finely divided abrasive particles whose average particle size is within the range from 0.1 to 6 .mu.m, which have a hardness of >4.0 on the Mohs hardness scale, the surface of the layer which forms the later surface of the printing plate has a peak-to-valley height of

    摘要翻译: 用于生产凹版印刷版的感光记录材料包括可溶于或可分散于显影液中的光可聚合和/或可光交联的材料,并且暴露于光化性光下,使其变得不溶或不再分散在该显影液中, 至少在形成印版的较后表面的层的表面的表面区域中,包含细碎的磨粒,其平均粒度在0.1至6μm的范围内,其硬度> 4.0以上 莫氏硬度刻度,形成印版后期表面的层的表面的峰 - 谷高度<2μm,光可交联和/或光聚合材料含有脂环族环氧基与 丙烯酸或甲基丙烯酸。

    Photosensitive element for producing printing plates or resist images
    64.
    发明授权
    Photosensitive element for producing printing plates or resist images 失效
    用于生产印版或抗蚀剂图像的感光元件

    公开(公告)号:US4842987A

    公开(公告)日:1989-06-27

    申请号:US62162

    申请日:1987-06-15

    IPC分类号: C08F2/48 G03F7/033

    CPC分类号: G03F7/033 Y10S430/117

    摘要: A photosensitive recording element which is suitable for the production of printing plates or resist images possesses a photopolymerizable recording layer which is applied to a dimensionally stable base, can be developed in an aqueous alkaline medium and contains, as a polymeric binder, one or more film-forming copolymers which are insoluble in water but soluble or dispersible in aqueous alkaline solutions and consist of from 10 to 50% by weight of one or more N-vinylamides, preferably N-vinylcaprolactam and/or N-vinylpyrrolidone, from 5 to 30% by weight of acrylic acid and/or methacrylic acid, from 30 to 80% by weight of one or more comonomers from the group consisting of the vinyl aromatics and (meth)acrylates of monoalkanols and from 0.2 to 5% by weight of an olefinically unsaturated compound which contains basic nitrogen atoms and has a pK.sub.a >4.

    摘要翻译: 适用于制造印版或抗蚀剂图像的光敏记录元件具有应用于尺寸稳定的基底的可光聚合记录层,可以在碱性介质水溶液中显影,并且作为聚合物粘合剂含有一个或多个膜 不溶于水但可溶于或分散于碱性水溶液中的共混物,其组成为10至50重量%的一种或多种N-乙烯基酰胺,优选N-乙烯基己内酰胺和/或N-乙烯基吡咯烷酮,5-30% 的丙烯酸和/或甲基丙烯酸,30至80重量%的一种或多种共聚单体,其由乙烯基芳族化合物和单链烷醇的(甲基)丙烯酸酯和0.2-5重量%的烯属不饱和 含有碱性氮原子并具有pKa> 4的化合物。

    (Meth)acrylic esters containing urethane groups, their preparation, radiation-curable coating compositions and a process for preparing these coating compositions
    66.
    发明授权
    (Meth)acrylic esters containing urethane groups, their preparation, radiation-curable coating compositions and a process for preparing these coating compositions 失效
    (甲基)丙烯酸酯,其制备方法,可辐射固化涂料组合物和制备这些涂料组合物的方法

    公开(公告)号:US06319983B1

    公开(公告)日:2001-11-20

    申请号:US09539321

    申请日:2000-03-30

    IPC分类号: C09D17514

    摘要: The present invention relates to a process for preparing nondispersing (meth)acrylic esters containing urethane groups, comprising a) reacting at least one hydroxyl-containing compound with (meth)acrylic acid in a solvent, to form an ester; b) removing the solvent and optionally a part of unreacted (meth) acrylic acid; c) reacting the mixture resulting from stage a) or b) with at least one epoxy-functional compound in an amount corresponding to the acid number of the mixture; and d) reacting the mixture resulting from stage c) with at least one compound containing isocyanate groups, and such esters obtainable in this way, and radiation-curable coating compositions comprising said esters, and a process for preparing these coating compositions.

    摘要翻译: 本发明涉及一种制备含有氨基甲酸酯基团的不分散(甲基)丙烯酸酯的方法,包括:a)使至少一种含羟基化合物与(甲基)丙烯酸在溶剂中反应形成酯; b)除去溶剂和 使任选的一部分未反应的(甲基)丙烯酸; c)使由步骤a)或b)得到的混合物与至少一种与混合物的酸值相当的量的环氧官能化合物反应; 和d)将由步骤c)得到的混合物与至少一种含有异氰酸酯基团的化合物反应,以及以这种方式获得的这些酯,以及包含所述酯的可辐射固化涂料组合物,以及制备这些涂料组合物的方法。

    Photoinitiator blends
    68.
    发明授权

    公开(公告)号:US6103453A

    公开(公告)日:2000-08-15

    申请号:US268725

    申请日:1999-03-17

    摘要: A photoinitiator blend, containinga) at least one monoacylphosphine oxide of formula I ##STR1## in which R.sup.1 denotes C.sub.1 -C.sub.18 alkyl; C.sub.1 -C.sub.4 alkyl, C.sub.5 -C.sub.8 cycloalkyl, C.sub.7 -C.sub.9 phenylalkyl, phenyl, naphthyl, biphenyl, all substituted by halogen or C.sub.1 -C.sub.6 alkoxy; phenyl, naphthyl or biphenylyl, all mono- or poly-substituted by halogen, C.sub.1 -C.sub.12 alkyl and/or C.sub.1 -C.sub.12 alkoxy; or a monovalent N--, O--, or S--containing 5-membered or 6-membered heterocyclic radical,R.sup.2 denotes phenyl, naphthyl, biphenylyl; phenyl, naphthyl or biphenylyl, all mono- or poly-substituted by halogen, C.sub.1 -C.sub.12 alkyl and/or C.sub.1 -C.sub.12 alkoxy; a monovalent N--, O--, or S--containing 5-membered or 6-membered heterocyclic radical, C.sub.1 -C.sub.18 alkoxy, phenoxy; phenoxy substituted by halogen, C.sub.1 -C.sub.4 alkyl or C.sub.1 -C.sub.4 alkoxy; benzyloxy, cyclohexyloxy or R.sup.2 and R.sup.1 form a ring together with the phosphorus atom,R.sup.3 denotes C.sub.1 -C.sub.18 alkyl; C.sub.1 -C.sub.4 alkyl, C.sub.5 -C.sub.8 cycloalkyl, C.sub.7 -C.sub.9 phenylalkyl, phenyl, naphthyl, biphenylyl, all substituted by halogen or C.sub.1 -C.sub.6 alkoxy; phenyl, naphthyl or biphenylyl, all mono- or poly-substituted by halogen, C.sub.1 -C.sub.12 alkyl and/or C.sub.1 -C.sub.12 alkoxy; a monovalent N--, O--, or S--containing 5-membered or 6-membered heterocyclic radical or a group ##STR2## in which X C.sub.2 -C.sub.8 alkene, cyclohexylene or unsubstituted or; phenylene, or biphenylene, both substituted by halogen, C.sub.1 -C.sub.4 alkyl or C.sub.1 -C.sub.4 alkoxy;b) at least one diacylphosphine oxide of formula II ##STR3## in which R.sup.4 denotes C.sub.1 -C.sub.18 alkyl; C.sub.1 -C.sub.4 alkyl, C.sub.5 -C.sub.8 cycloalkyl, C.sub.7 -C.sub.9 phenylalkyl, phenyl, naphthyl, biphenylyl, all substituted by halogen or C.sub.1 -C.sub.6 alkoxy; phenyl, naphthyl or biphenylyl, all mono- or poly-substituted by halogen, C.sub.1 -C.sub.12 alkyl and/or C.sub.1 -C.sub.12 alkoxy; a monovalent N--, O--, or S--containing 5-membered or 6-membered heterocyclic radical, C.sub.1 -C.sub.18 alkoxy, phenoxy; phenoxy substituted by halogen, C.sub.1 -C.sub.4 alkyl or C.sub.1 -C.sub.4 alkoxy; benzyloxy, cyclohexyloxy andR.sup.5 and R.sup.6 independently denote C.sub.1 -C.sub.18 alkyl; C.sub.1 -C.sub.4 alkyl, C.sub.5 -C.sub.8 cycloalkyl, C.sub.7 -C.sub.9 phenylalkyl, phenyl, naphthyl, biphenylyl, all substituted by halogen or C.sub.1 -C.sub.6 alkoxy; phenyl, naphthyl or biphenylyl, all mono- or poly-substituted by halogen, C.sub.1 -C.sub.12 alkyl and/or C.sub.1 -C.sub.12 alkoxy; a monovalent N--, O--, or S--containing 5-membered or 6-membered heterocyclic radical.