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公开(公告)号：US06927403B2
公开(公告)日：2005-08-09
申请号：US10216547
申请日：2002-08-09
申请人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Wilhelm Egle , Vadim Yevgenyevich Banine , Erik Roelof Loopstra
发明人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Wilhelm Egle , Vadim Yevgenyevich Banine , Erik Roelof Loopstra
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70175 , G03F7/70275
摘要： There is provided an illumination system for wavelengths of ≦193 nm. The illumination system includes an object plane, a plane conjugated to the object plane, a first collector between the object plane and the conjugated plane, and a second collector after the conjugated plane. The first collector focuses a beam bundle of rays from the object plane in the conjugated plane. At least one of the first and second collectors includes a mirror shell. The rays strike the mirror shell at an angle of incidence of less than 20° relative to a surface tangent of the mirror shell.
摘要翻译： 提供了波长<= 193nm的照明系统。 照明系统包括物平面，与物平面共轭的平面，物平面和共轭平面之间的第一集电体，以及共轭平面之后的第二集电体。 第一个收集器将来自物平面的光束束聚焦在共轭平面中。 第一和第二收集器中的至少一个包括镜壳。 射线以相对于镜壳的表面切线小于20°的入射角撞击镜壳。
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公开(公告)号：US20050083503A1
公开(公告)日：2005-04-21
申请号：US10921447
申请日：2004-08-19
IPC分类号： G02B13/18 , G02B13/24 , G02B17/00 , G02B17/06 , G02B19/00 , G02B27/00 , G02B27/09 , G03F7/20 , G03F7/22 , H01L21/027 , G02B5/32
CPC分类号： G02B27/0983 , G02B17/0621 , G02B19/0023 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G02B27/0905 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70116 , G03F7/702 , G03F7/70233 , Y10S359/90
摘要： There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths ≦193 nm. The system includes light rays traveling along a light path from an object plane to an image plane, andan arc-shaped field in the image plane, whereby a radial direction in the middle of the arc-shaped field defines a scanning direction. The first mirror and the second mirror are arranged in the light path in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Furthermore, the light rays are impinging on the first mirror and the second mirror with incidence angles ≦30° or ≧60° relative to a surface normal of the first and second mirror.
摘要翻译： 提供了用于照明系统的多镜系统，特别是对于波长<= 193nm的光刻。 该系统包括沿着从物平面到像平面的光路行进的光线，以及图像平面中的弧形场，由此在弧形场的中间的径向方向限定了扫描方向。 第一反射镜和第二反射镜被布置在具有这样的位置的光路中，使得像面中的弧形场的边缘锐度在扫描方向上小于5mm。 此外，相对于第一和第二反射镜的表面法线，光线入射在第一反射镜和第二反射镜上，入射角<= 30°或> = 60°。
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公开(公告)号：US08134687B2
公开(公告)日：2012-03-13
申请号：US11660754
申请日：2005-08-23
CPC分类号： G03F7/70108 , G03F7/70183
摘要： An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.
摘要翻译： 微光刻曝光装置的照明系统具有光轴和光束变换装置。 该装置包括具有第一反射表面的第一反射镜，该第一反射表面具有围绕光轴旋转相对于光轴倾斜的直线所限定的形状。 该装置还包括具有第二反射表面的第二反射镜，其具有通过围绕光轴旋转曲线而限定的形状。 至少一个反射镜具有包含光轴的中心孔。 该装置可以形成EUV照明系统的变焦准直器，其将发散的光束变换成可变形状和/或直径的准直光束。
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64.发明授权Illumination system having a nested collector for annular illumination of an exit pupil 失效具有用于出射光瞳的环形照明的嵌套收集器的照明系统公开(公告)号：US07312462B2
公开(公告)日：2007-12-25
申请号：US10930302
申请日：2004-08-31
申请人： Wolfgang Singer , Johannes Wangler , Eric Sohmen
发明人： Wolfgang Singer , Johannes Wangler , Eric Sohmen
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70108 , G03F7/70166
摘要： There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a part of the light. The mirror shell is arranged so that a real image of the source is formed and comes to lie in a plane that is defocused relative to the field plane by more than 30 mm, so that the field plane is illuminated in a predetermined region, substantially homogeneously.
摘要翻译： 提供照明系统。 照明系统包括波长<= 193nm的光源，场平面和具有用于接收一部分光的镜壳的收集器。 镜壳布置成使得源的真实图像形成并且位于相对于场平面散焦大于30mm的平面中，使得场平面基本上均匀地被照射在预定区域中 。
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65.发明申请公开(公告)号：US20070216887A1
公开(公告)日：2007-09-20
申请号：US11568204
申请日：2004-04-23
申请人： Wolfgang Singer , Johannes Wangler
发明人： Wolfgang Singer , Johannes Wangler
IPC分类号： G03F7/20
CPC分类号： G03F7/70075
摘要： An illumination system for a microlithographic projection exposure apparatus comprises a light source, a first optical unit having an exit pupil, an optical raster element positioned in or in close proximity to the exit pupil of the first optical unit and a field plane that is conjugated to the exit pupil of the first optical unit by Fourier transformation. The illumination system further comprises a second optical unit imaging the field plane into an image plane and having at its object side a homocentric entrance pupil that at least substantially coincides with the exit pupil of the first optical unit. This allows to dispense with a condenser lens that is usually required for conjugating the exit pupil to the field plane.
摘要翻译： 用于微光刻投影曝光装置的照明系统包括光源，具有出射光瞳的第一光学单元，位于第一光学单元的出射光瞳处或紧邻第一光学单元的出射光瞳的光栅元件和与 通过傅里叶变换使第一光学单元的出射光瞳。 照明系统还包括第二光学单元，其将场平面成像为图像平面，并且在其物体侧具有至少基本上与第一光学单元的出射光瞳重合的同心入射光瞳。 这允许省略通常用于将出射光瞳共轭到场平面所需的聚光透镜。
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66.发明申请Illumination system having a light mixer for the homogenization of radiation distributions 审中-公开具有用于辐射分布均匀化的光混合器的照明系统公开(公告)号：US20050280821A1
公开(公告)日：2005-12-22
申请号：US11147931
申请日：2005-06-08
申请人： Damian Fiolka , Wolfgang Singer , Johannes Wangler
发明人： Damian Fiolka , Wolfgang Singer , Johannes Wangler
CPC分类号： G03F7/70583 , G02B27/283 , G03F7/70075
摘要： An illumination system of a microlithographic projection exposure apparatus contains a light mixer for the homogenization of radiation distributions. The latter may, in one embodiment, comprise at least one plane beam-splitter layer which is arranged between two transparent sub-elements, parallel to an optical axis of the illumination system. An alternative embodiment of a light mixer contains at least one row of beam splitters, wherein the beam splitters in at least one row are arranged mutually parallel, at an inclination angle with respect to an entry-side optical axis of the illumination system, and offset behind one another in a direction perpendicular to the entry-side optical axis.
摘要翻译： 微光刻投影曝光装置的照明系统包含用于辐射分布均匀化的光混合器。 在一个实施例中，后者可以包括布置在平行于照明系统的光轴的两个透明子元件之间的至少一个平面分束器层。 光混合器的替代实施例包含至少一排分束器，其中至少一排中的分束器相对于照明系统的入射侧光轴以倾斜角相互平行地布置，并且偏移 在与入射侧光轴垂直的方向上彼此相邻。
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67.发明申请Illumination system having a nested collector for annular illumination of an exit pupil 失效具有用于出射光瞳的环形照明的嵌套收集器的照明系统公开(公告)号：US20050093041A1
公开(公告)日：2005-05-05
申请号：US10930302
申请日：2004-08-31
申请人： Wolfgang Singer , Johannes Wangler , Eric Sohmen
发明人： Wolfgang Singer , Johannes Wangler , Eric Sohmen
CPC分类号： B82Y10/00 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70108 , G03F7/70166
摘要： There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a part of the light. The mirror shell is arranged so that a real image of the source is formed and comes to lie in a plane that is defocused relative to the field plane by more than 30 mm, so that the field plane is illuminated in a predetermined region, substantially homogeneously.
摘要翻译： 提供照明系统。 照明系统包括波长<= 193nm的光源，场平面和具有用于接收一部分光的镜壳的收集器。 镜壳布置成使得源的真实图像形成并且位于相对于场平面散焦大于30mm的平面中，使得场平面基本上均匀地被照射在预定区域中 。
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公开(公告)号：US06840640B2
公开(公告)日：2005-01-11
申请号：US10060909
申请日：2002-01-30
IPC分类号： G02B13/18 , G02B13/24 , G02B17/00 , G02B17/06 , G02B19/00 , G02B27/00 , G02B27/09 , G03F7/20 , G03F7/22 , H01L21/027 , G02B5/10 , G21K5/00
CPC分类号： G02B27/0983 , G02B17/0621 , G02B19/0023 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G02B27/0905 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70116 , G03F7/702 , G03F7/70233 , Y10S359/90
摘要： There is provided a multi-mirror system for an illumination system with wavelengths ≦193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors ≦30° or ≧60°.
摘要翻译： 为波长<= 193nm的照明系统提供了多镜系统。 多镜系统包括（a）具有第一反射镜和第二反射镜的成像系统，（b）物体平面，（c）成像系统形成物体的图像的图像平面，（d） 在图像平面中的弧形场，其中弧形场的中间的径向方向限定扫描方向。 第一和第二反射镜被布置成使得弧形场的边缘锐度在扫描方向上小于5mm。 从物体行进到图像平面的光线相对于反射镜的表面法线<= 30°或> = 60°的入射角撞击第一和第二反射镜的使用区域。
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公开(公告)号：US20050002090A1
公开(公告)日：2005-01-06
申请号：US10876898
申请日：2004-06-25
申请人： Wolfgang Singer , Martin Antoni , Johannes Wangler
发明人： Wolfgang Singer , Martin Antoni , Johannes Wangler
CPC分类号： B82Y10/00 , G03B27/54 , G03F7/70083 , G03F7/70166 , G03F7/702 , G03F7/70233 , G21K2201/061
摘要： There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.
摘要翻译： 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。
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公开(公告)号：US08891057B2
公开(公告)日：2014-11-18
申请号：US12818501
申请日：2010-06-18
申请人： Michael Layh , Markus Deguenther , Michael Patra , Johannes Wangler , Manfred Maul , Damian Fiolka , Gundula Weiss
发明人： Michael Layh , Markus Deguenther , Michael Patra , Johannes Wangler , Manfred Maul , Damian Fiolka , Gundula Weiss
CPC分类号： G03F7/702 , G02B5/09 , G02B26/105 , G03F7/70116 , G03F7/7055 , G03F7/70583
摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.
摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。
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