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96 条记录 (耗时 0.08 秒)

    Inspection method and apparatus, lithographic apparatus, lithographic processing cell, and device manufacturing method to measure a property of a substrate
    67.
    发明授权
    Inspection method and apparatus, lithographic apparatus, lithographic processing cell, and device manufacturing method to measure a property of a substrate 失效
    检测方法和装置，光刻设备，光刻处理单元和测量基板性质的器件制造方法

    公开(公告)号：US08115926B2

    公开(公告)日：2012-02-14

    申请号：US12256780

    申请日：2008-10-23

    申请人： Alexander Straaijer

    发明人： Alexander Straaijer

    IPC分类号： G01J4/00

    CPC分类号： G03F7/7085 ,  G03F7/70566 ,  G03F7/70616

    摘要： A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the two beams. The relative phases of the two radiation beams and other features of the beams are measured in a detector to provide information on the properties of the substrate surface.

    摘要翻译： 系统被配置为在从基板衍射时测量两个分离的偏振光束，以便确定衬底的性质。 圆形或椭圆偏振光源通过固定相位延迟器传递，以改变相对于两个光束的两个正交偏振辐射束之一的相位。 在检测器中测量两个辐射束的相对相位和光束的其它特征以提供关于衬底表面的性质的信息。

    Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
    68.
    发明授权
    Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
    检测方法和装置，光刻设备，光刻处理单元和器件制造方法

    公开(公告)号：US07701577B2

    公开(公告)日：2010-04-20

    申请号：US11708678

    申请日：2007-02-21

    申请人： Alexander Straaijer ,  Ronald Franciscus Herman Hugers

    发明人： Alexander Straaijer ,  Ronald Franciscus Herman Hugers

    IPC分类号： G01J4/00

    CPC分类号： G01B11/0641 ,  G01N2021/4711 ,  G01N2021/4792 ,  G03F7/70625 ,  G03F7/70633

    摘要： The present invention refers to the simultaneous measurement of four separately polarized beams upon diffraction from a substrate in order to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beamsplitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.

    摘要翻译： 本发明涉及从衬底衍射时同时测量四个分离的偏振光束，以便确定衬底的性质。 圆形或椭圆偏振光源最多通过三个偏振元件。 这使光源偏振0°，45°，90°和135°。 多个偏振分束器取代了相位调制器的使用，但是能够测量所有四个光束的强度，从而测量组合光束的相位调制和幅度，以给出基板的特征。

    Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
    69.
    发明授权
    Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems 有权
    用于高数值孔径系统的静态和动态径向横向电偏振器

    公开(公告)号：US07221501B2

    公开(公告)日：2007-05-22

    申请号：US11106480

    申请日：2005-04-15

    申请人： Donis Flagello ,  Kevin Cummings ,  Alexander Straaijer

    发明人： Donis Flagello ,  Kevin Cummings ,  Alexander Straaijer

    IPC分类号： G02B5/30 ,  G02B27/28 ,  G02B27/72

    CPC分类号： G03F7/70566 ,  G02B5/3058

    摘要： A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.

    摘要翻译： 提供径向横向电偏振器装置。 该器件包括具有第一折射率的第一材料层，具有第二折射率的第二材料层和位于方位角和周期上间隔开的多个细长元件，并且设置在第一层和第二层之间。 多个细长元件与辐射的电磁波相互作用以透射辐射的电磁波的横向电极化。 本发明的一个方面是例如在光刻投影设备中使用这种偏振器装置来增加成像分辨率。 另一方面是提供一种包括在横向电极化中偏振辐射束的装置制造方法。

    Scanning-slit exposure device
    70.
    发明授权
    Scanning-slit exposure device 失效
    扫描狭缝曝光装置

    公开(公告)号：US5889580A

    公开(公告)日：1999-03-30

    申请号：US824624

    申请日：1997-03-27

    申请人： Johannes C.M. Jasper ,  Alexander Straaijer

    发明人： Johannes C.M. Jasper ,  Alexander Straaijer

    IPC分类号： G02B5/02 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54

    CPC分类号： G03F7/70125 ,  G03F7/70358 ,  G03F7/70808

    摘要： A scanning-slit exposure device is provided with a radiation source (1) emitting radiation pulses through an exit window (2). An imaging system (3) images the exit window onto a surface (4) to be exposed by the radiation. The surface is scanned relative to the exit window image in a scan direction. To avoid the banding-type non-uniformities in the exposure, the device comprises a scattering element (12) which scattering element causes a blur of the exit window image only in the scan direction. The scattering element is arranged in the entrance pupil of the imaging system (3).

    摘要翻译： 扫描狭缝曝光装置设置有通过出射窗（2）发射辐射脉冲的辐射源（1）。 成像系统（3）将出射窗口成像到由辐射暴露的表面（4）上。 在扫描方向上相对于出口窗口图像扫描表面。 为了避免曝光中的带状不均匀性，该装置包括散射元件（12），散射元件仅在扫描方向上引起出射窗图像的模糊。 散射元件布置在成像系统（3）的入射光瞳上。