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    Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants
    68.
    发明申请
    Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants 审中-公开
    通过用多个顺序蚀刻剂去除牺牲层来制造微机械装置的方法

    公开(公告)号：US20050045276A1

    公开(公告)日：2005-03-03

    申请号：US10922565

    申请日：2004-08-19

    申请人： Satyadev Patel ,  Andrew Huibers ,  Gregory Schaadt ,  Peter Heureux

    发明人： Satyadev Patel ,  Andrew Huibers ,  Gregory Schaadt ,  Peter Heureux

    IPC分类号： B81B3/00 ,  C23F1/00 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306 ,  H01L21/461

    CPC分类号： B81C1/00476 ,  B81C1/00547 ,  B81C2201/0109 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/112 ,  B82Y30/00

    摘要： An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.

    摘要翻译： 公开了一种诸如用于形成微机械装置的蚀刻方法。 该方法的一个实施例是用于释放微机械结构，包括：提供衬底; 在衬底上直接或间接提供牺牲层; 在所述牺牲层上提供一个或多个微机械结构层; 执行第一蚀刻以去除牺牲层的一部分，所述第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体，以允许蚀刻剂气体在物理或化学和物理上移除牺牲层的该部分; 执行第二蚀刻以去除牺牲层中的附加牺牲材料，第二蚀刻包括提供化学上但不物理蚀刻附加牺牲材料的气体。 该方法的另一实施例是用于在衬底上或衬底内蚀刻硅材料，包括：执行第一蚀刻以去除硅的一部分，第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体以允许蚀刻剂 物理或化学和物理的气体去除硅的部分; 执行第二蚀刻以去除附加的硅，第二蚀刻包括提供蚀刻剂气体，其化学地但不物理地蚀刻附加的硅。

    Micromirror array device with a small pitch size
    69.
    发明申请
    Micromirror array device with a small pitch size 有权
    具有小间距尺寸的微镜阵列器件

    公开(公告)号：US20050018091A1

    公开(公告)日：2005-01-27

    申请号：US10627155

    申请日：2003-07-24

    申请人： Satyadev Patel ,  Andrew Huibers

    发明人： Satyadev Patel ,  Andrew Huibers

    IPC分类号： G02B26/08 ,  H04N5/74

    CPC分类号： B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

    摘要： A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

    摘要翻译： 公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。 根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。 微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。 镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。 在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。 通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

    Micromirror and post arrangements on substrates
    70.
    发明授权
    Micromirror and post arrangements on substrates 有权
    基板上的微镜和柱安排

    公开(公告)号：US07362493B2

    公开(公告)日：2008-04-22

    申请号：US11216930

    申请日：2005-08-30

    申请人： Andrew Huibers ,  Satyadev Patel

    发明人： Andrew Huibers ,  Satyadev Patel

    IPC分类号： G02B26/00

    CPC分类号： G02B26/0841

    摘要： A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

    摘要翻译： 在显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。