摘要:
A substrate processing apparatus comprises roll chucks for holding and rotating a substrate, a closable chamber housing the roll chucks therein, and a gas introduction pipe for introducing a gas into the chamber. The substrate processing apparatus further comprises an etching unit for etching and cleaning a peripheral portion of the substrate while the substrate is being rotated by the roll chucks, and a first supply passage for supplying a first liquid to the etching unit.
摘要:
The object of the present invention is to provide a new kind of silicon compound having an ester-type organic functional group and a new method for providing a T8-silsesquioxane compound having a hydroxyl group by using said silicon compound as the starting material. A silicon compound represented by formula (1) is obtained through the production process characterized by using a silicon compound represented by formula (2). wherein: in formula (1), each of seven R1 group is independently selected from the group consisting of hydrogen, alkyl, substituted or unsubstituted aryl, and substituted or unsubstituted arylalkyl and A2 is a hydroxyl-terminal organic functional group, and in formula (2), each of R1 group is the same as R1 in formula (1), and A1 is an organic functional group containing an acyloxy group.
摘要:
A method for manufacturing a display apparatus includes a first step of arranging a display panel (110) inside a housing (130); a second step including a light guide lens formation step of forming a curved surface (151b) of a light guide lens (151) into a concave-convex surface having surface roughness of 40-250 μm, and a cover layer formation step of forming a light guide member (150) in such a manner that the curved surface (151b) of the light guide lens (151) is covered by a cover layer (152) to form an image-display-side surface of the cover layer (152) into a non-concave-convex surface; and a third step of bonding the light guide member (150) to a surface of an outer peripheral edge part of the display panel (110) and a surface of the window frame (130).
摘要:
A method for manufacturing a display apparatus includes a first step of arranging a display panel (110) inside a housing (130); a second step including a light guide lens formation step of forming a curved surface (151b) of a light guide lens (151) into a concave-convex surface having surface roughness of 40-250 μm, and a cover layer formation step of forming a light guide member (150) in such a manner that the curved surface (151b) of the light guide lens (151) is covered by a cover layer (152) to form an image-display-side surface of the cover layer (152) into a non-concave-convex surface; and a third step of bonding the light guide member (150) to a surface of an outer peripheral edge part of the display panel (110) and a surface of the window frame (130).
摘要:
A polymer and a treating agent (such as a surface-treating agent) are provided that have excellent characteristics in such properties as water repellency, oil repellency, antifouling property and charge controlling property. The polymer contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group, or contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group and a structural unit derived from organopolysiloxane having an addition polymerizable group. The treating agent contains the polymer. An article treated with the treating agent is also provided.
摘要:
A method for manufacturing a semiconductor device makes it possible to efficiently polish with a polishing tape a peripheral portion of a silicon substrate under polishing conditions particularly suited for a deposited film and for silicon underlying the deposited film. The method includes pressing a first polishing tape against a peripheral portion of a device substrate having a deposited film on a silicon surface while rotating the device substrate at a first rotational speed, thereby removing the deposited film lying in the peripheral portion of the device substrate and exposing the underlying silicon. A second polishing tape is pressed against the exposed silicon lying in the peripheral portion of the device substrate while rotating the device substrate at a second rotational speed, thereby polishing the silicon to a predetermined depth.
摘要:
A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable functional monomer containing a group having active hydrogen, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer containing a group having active hydrogen.
摘要:
According to one embodiment, a control method for a magnetic disk device includes writing data by varying a phase of the array period of the plurality of magnetic elements or a phase of the time period of the recording signal in one section of the track from a corresponding phase in another section of the track, reading a reproduction signal from the track, and determining a phase shift between the array period of the plurality of magnetic elements and the time period of the recording signal, based on a reproduction signal read from the one section and a reproduction signal read from the other section. In another embodiment, a magnetic disk includes a track in which magnetic elements are magnetically separated and arranged in an array period, and a phase of the array period in one section is different from a phase in another section of the track.
摘要:
A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable monomer and has a group having a polymerizable unsaturated bond on a side chain, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer having a functional group capable of introducing a group having a polymerizable unsaturated bond.
摘要:
A production process for a silicon compound represented by Formula (6), characterized by reacting a compound represented by Formula (4) with a compound represented by Formula (5): wherein all of the variables are defined in the specification.