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184 条记录 (耗时 0.042 秒)

    Device and method for compensating for phase distortion in base station of OFDMA-based cellular system
    61.
    再颁专利
    Device and method for compensating for phase distortion in base station of OFDMA-based cellular system 失效
    用于补偿基于OFDMA的蜂窝系统基站相位失真的装置和方法

    公开(公告)号：USRE43938E1

    公开(公告)日：2013-01-22

    申请号：US12779426

    申请日：2010-05-13

    申请人： Youn-Ok Park ,  Young-Hoon Kim

    发明人： Youn-Ok Park ,  Young-Hoon Kim

    IPC分类号： H04B1/00

    CPC分类号： H04L5/023 ,  H04L27/2647

    摘要： Disclosed is a device and method for compensating for phase distortions in a base station of an OFDMA-based cellular system. The method comprises receiving OFDM symbols from a plurality of mobile stations, canceling a symbol guard interval using a reference timing signal, and performing an FFT (fast Fourier transform) process on the OFDM symbols; dividing the OFDM symbols that have undergone FFT processing into subchannel groups of the mobile stations; restoring phases of the OFDM symbols divided into subchannel groups; and performing channel estimation and equalization on the restored OFDM symbols for each mobile station to thereby perform a demodulation process.

    摘要翻译： 公开了用于补偿基于OFDMA的蜂窝系统的基站中的相位失真的装置和方法。 该方法包括从多个移动站接收OFDM符号，使用参考定时信号消除符号保护间隔，并对OFDM符号执行FFT（快速傅里叶变换）处理; 将经过FFT处理的OFDM符号划分成移动站的子信道组; 恢复分成子信道组的OFDM符号的相位; 并且对每个移动台对恢复的OFDM符号执行信道估计和均衡，从而执行解调处理。

    Cell search method, forward link frame transmission method, apparatus using the same and forward link frame structure
    63.
    发明授权
    Cell search method, forward link frame transmission method, apparatus using the same and forward link frame structure 有权
    小区搜索方法，前向链路帧传输方法，使用相同和前向链路帧结构的装置

    公开(公告)号：US08248911B2

    公开(公告)日：2012-08-21

    申请号：US12093415

    申请日：2006-11-10

    申请人： Il-Gyu Kim ,  Hyeong-Geun Park ,  Nam-Il Kim ,  Kap-Seok Chang ,  Young-Hoon Kim ,  Seung-Chan Bang

    发明人： Il-Gyu Kim ,  Hyeong-Geun Park ,  Nam-Il Kim ,  Kap-Seok Chang ,  Young-Hoon Kim ,  Seung-Chan Bang

    IPC分类号： H04J11/00

    CPC分类号： H04L27/2656 ,  H04J11/0069 ,  H04L5/0016 ,  H04L5/005 ,  H04L27/2613 ,  H04L27/2675

    摘要： Provided are a cell search method, a forward link frame transmission method, an apparatus using the methods, and a forward link frame structure in an Orthogonal Frequency Division Multiplexing cellular system, wherein the time it takes to perform a cell search and the complexity of the cell search can be reduced. The cell search apparatus includes a sync acquirer which receives a signal according to a forward link frame comprising a plurality of sync channel symbols each having different intervals between the adjacent sync channel symbols and achieves synchronization of the sync channel symbols using a sync channel of the received signal, and a boundary detector which detects a frame boundary using an interval pattern between the sync channel symbols, based on the achieved synchronization.

    摘要翻译： 提供了正交频分复用蜂窝系统中的小区搜索方法，前向链路帧发送方法，使用该方法的装置和前向链路帧结构，其中执行小区搜索所需的时间和 可以减少小区搜索。 小区搜索装置包括：同步获取器，其根据包括多个同步信道符号的前向链路帧接收信号，每个同步信道符号在相邻同步信道符号之间具有不同的间隔，并且使用所接收的同步信道符号的同步信道实现同步信道符号的同步 信号，以及边界检测器，其基于所实现的同步，使用同步信道符号之间的间隔模式来检测帧边界。

    Method of forming a pattern using a photoresist composition for immersion lithography
    67.
    发明授权
    Method of forming a pattern using a photoresist composition for immersion lithography 有权
    使用用于浸渍光刻的光致抗蚀剂组合物形成图案的方法

    公开(公告)号：US07968275B2

    公开(公告)日：2011-06-28

    申请号：US12329189

    申请日：2008-12-05

    申请人： Seok Han ,  Young-Hoon Kim ,  Hyo-Sun Kim

    发明人： Seok Han ,  Young-Hoon Kim ,  Hyo-Sun Kim

    IPC分类号： G03F7/20 ,  G03F7/30 ,  G03F7/38 ,  G03F7/039

    CPC分类号： G03F7/0397 ,  G03F7/0392 ,  G03F7/2041 ,  Y10S430/111

    摘要： A photoresist composition for immersion lithography and a method of forming a photoresist pattern using the photoresist composition are disclosed. The photoresist composition includes a photosensitive polymer including a cycloaliphatic group blocked with at least two cyclic acetal groups as a side chain, a photoacid generator and an organic solvent. The hydrophobic photoresist composition may be changed into the hydrophilic photoresist composition by an exposure process. Thus, before the exposure process, the photoresist composition may be insoluble in a liquid for the immersion lithography. After the exposure process, an exposure portion of a photoresist film formed using the photoresist composition may be effectively dissolved in a developing solution to form a uniform photoresist pattern.

    摘要翻译： 公开了一种用于浸没式光刻的光致抗蚀剂组合物和使用光致抗蚀剂组合物形成光致抗蚀剂图案的方法。 光致抗蚀剂组合物包括光敏聚合物，其包含用作为侧链的至少两个环状缩醛基封端的脂环族基团，光酸产生剂和有机溶剂。 疏水性光致抗蚀剂组合物可通过曝光方法改变为亲水性光致抗蚀剂组合物。 因此，在曝光处理之前，光致抗蚀剂组合物可能不溶于用于浸渍光刻的液体。 在曝光处理之后，使用光致抗蚀剂组合物形成的光致抗蚀剂膜的曝光部分可以有效地溶解在显影液中以形成均匀的光致抗蚀剂图案。

    Liquid crystal display device
    69.
    发明申请
    Liquid crystal display device 有权
    液晶显示装置

    公开(公告)号：US20100134728A1

    公开(公告)日：2010-06-03

    申请号：US12591221

    申请日：2009-11-12

    申请人： Young-Hoon Kim ,  Joong-Min Yoon

    发明人： Young-Hoon Kim ,  Joong-Min Yoon

    IPC分类号： G02F1/1335 ,  G02F1/1343

    CPC分类号： G02F1/134363 ,  G02F1/133514 ,  G02F2001/134345 ,  G02F2201/52

    摘要： A liquid crystal display device includes a first substrate; first to fourth pixels arranged in a matrix pattern on the first substrate, the fourth pixel having an area smaller than each of the first and second pixels and larger than the third pixel; a second substrate facing the first substrate; first to fourth color filter patterns formed on the second substrate and respectively corresponding to the first to fourth pixels, wherein the first to fourth color filter patterns have green, blue, white and red colors, respectively; and a liquid crystal layer interposed between the first and second substrates.

    摘要翻译： 液晶显示装置包括：第一基板; 第一至第四像素以矩阵图案排列在第一基板上，第四像素的面积小于第一和第二像素中的每一个并且大于第三像素; 面对所述第一基板的第二基板; 第一至第四滤色器图案分别形成在第二基板上并分别对应于第一至第四像素，其中第一至第四滤色器图案分别具有绿色，蓝色，白色和红色; 以及插入在第一和第二基板之间的液晶层。

    Method and apparatus for analyzing a photoresist film
    70.
    发明授权
    Method and apparatus for analyzing a photoresist film 有权
    用于分析光致抗蚀剂膜的方法和装置

    公开(公告)号：US07629583B2

    公开(公告)日：2009-12-08

    申请号：US11938402

    申请日：2007-11-12

    申请人： Young-Hoon Kim ,  Hong Lee ,  Youn-Kyung Wang

    发明人： Young-Hoon Kim ,  Hong Lee ,  Youn-Kyung Wang

    IPC分类号： G01J5/02

    CPC分类号： G01N21/3563 ,  G01N21/8422

    摘要： In a method for analyzing photoresist, light having a wavelength which responds to a photoresist film is selected. The photoresist film is exposed to the selected light. Changes of components and properties of the photoresist film are analyzed while the photoresist film is being exposed to the selected light.

    摘要翻译： 在分析光致抗蚀剂的方法中，选择具有响应于光致抗蚀剂膜的波长的光。 光致抗蚀剂膜暴露于选定的光。 当光致抗蚀剂膜暴露于所选择的光时，分析光致抗蚀剂膜的组分和性质的变化。