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118 条记录 (耗时 0.037 秒)

    VERTICAL-OFFSET COATER AND METHODS OF USE
    62.
    发明申请
    VERTICAL-OFFSET COATER AND METHODS OF USE 有权
    垂直偏心涂层及其使用方法

    公开(公告)号：US20100221422A1

    公开(公告)日：2010-09-02

    申请号：US12713843

    申请日：2010-02-26

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： B05D1/00

    CPC分类号： C23C14/50 ,  B65G49/063 ,  B65G2249/02 ,  C03C17/002 ,  C03C2218/365 ,  C23C14/56 ,  C23C16/4587 ,  C23C16/54

    摘要： The invention provides a coater, and methods of using the coater, for depositing thin films onto generally-opposed major surfaces of a sheet-like substrate. The coater has a substrate transport system adapted for supporting the substrate in a vertical-offset configuration wherein the substrate is not in a perfectly vertical position but rather is offset from vertical by an acute angle. The transport system defines a path of substrate travel extending through the coater. The transport system is adapted for conveying the substrate along the path of substrate travel. Preferably, the transport system includes a side support for supporting a rear major surface of the substrate. The preferred side support bounds at least one passage through which coating material passes when such coating material is deposited onto the substrate's rear major surface. Preferably, the coater includes at least one coating apparatus (e.g., which is adapted for delivering coating material) on each of two sides of the path of substrate travel. The coating apparatuses preferably are adapted for depositing coatings onto both of the generally-opposed major surfaces of the substrate in a single pass of the substrate along the path of substrate travel.

    摘要翻译： 本发明提供一种涂布机，以及使用涂布机的方法，用于将薄膜沉积在片状基底的大致相对的主表面上。 该涂布机具有适于以垂直偏移配置来支撑基底的基底输送系统，其中基底不处于完全垂直的位置，而是以垂直方向偏斜锐角。 输送系统定义了延伸穿过涂布机的基板行程的路径。 传送系统适于沿着基板移动的路径输送基板。 优选地，输送系统包括用于支撑基底的后主表面的侧支撑件。 当这种涂层材料沉积到基底的后主表面上时，优选的侧支撑物限定涂层材料通过的至少一个通道。 优选地，涂布机包括至少一个涂布装置（例如适于输送涂料的涂布装置）在基板移动路径的两侧的每一侧上。 涂覆设备优选地适于在衬底行进路径的单次通过中将衬底沉积在衬底的两个大致相对的主表面上。

    Coater having substrate cleaning device and coating deposition methods employing such coater
    63.
    发明授权
    Coater having substrate cleaning device and coating deposition methods employing such coater 有权
    涂布机具有基板清洁装置和使用这种涂布机的涂布沉积方法

    公开(公告)号：US07264741B2

    公开(公告)日：2007-09-04

    申请号：US10750337

    申请日：2003-12-31

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： B44C1/22 ,  C23C14/00 ,  C23C14/32 ,  C23C16/00 ,  B05D1/00

    CPC分类号： C23C14/562 ,  C03C17/002 ,  C03C23/0075 ,  C03C2218/31 ,  C23C14/022 ,  C23C14/568

    摘要： A coater having a substrate cleaning device is disclosed. Also disclosed are methods of processing substrates in a coater equipped with a substrate cleaning device. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a path of substrate travel (e.g., beneath a substrate support) extending through the coater and that is adapted for treating a bottom major surface of a substrate. Certain embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device. In some embodiments of this nature, the upward coating apparatus is configured for depositing a photocatalytic coating upwardly onto the bottom major surface of the substrate. Certain embodiments of the invention involve a downward coating apparatus, wherein the substrate cleaning device is further along the path of substrate travel than the downward coating apparatus. Some embodiments of this nature also involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device.

    摘要翻译： 公开了一种具有基板清洁装置的涂布机。 还公开了在装有基板清洁装置的涂布机中处理基板的方法。 衬底清洁装置包括位于衬底行进路径（例如，衬底支撑件下方）下方的离子枪（即离子源），其延伸穿过涂布机，并适于处理衬底的底部主表面。 某些实施例涉及一种向上涂层装置，其进一步沿着衬底移动的路径而不是衬底清洗装置。 在这种性质的一些实施例中，向上涂覆装置被配置用于将光催化涂层向上沉积到基底的底部主表面上。 本发明的某些实施例涉及一种向下涂覆装置，其中基底清洗装置进一步沿着基底行程的路径而不是向下涂覆装置。 这种性质的一些实施方案还涉及向上涂布装置，其进一步沿衬底移动的路径比衬底清洗装置。

    TRANSPORT ROLLERS
    64.
    发明申请
    TRANSPORT ROLLERS 审中-公开
    运输滚子

    公开(公告)号：US20070125304A1

    公开(公告)日：2007-06-07

    申请号：US11553083

    申请日：2006-10-26

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： C23C16/00 ,  C23C14/00

    CPC分类号： C23C14/56

    摘要： A nonstick transport roller is provided, the roller having an outer surface defined by a thickness of nonstick material. A rope can optionally be wound around the outer surface of the roller to define an elevated support for engaging a major substrate surface. A vacuum deposition chamber for applying thin films onto substrates is also provided, the chamber having a cavity in which a controlled vacuous environment can be established, the chamber including a series of transport rollers, at least one of the transport rollers comprising a cylindrical tube having an outer surface defined by a thickness of nonstick material, optionally with a rope wound around the tube to define an elevated support for engaging a bottom major surface of a substrate.

    摘要翻译： 提供不粘运输辊，该辊具有由不粘材料的厚度限定的外表面。 绳索可以可选地缠绕在辊的外表面上以限定用于接合主要基底表面的升高的支撑。 还提供了一种用于将薄膜施加到基底上的真空沉积室，所述腔室具有可以建立受控空泡环境的空腔，所述腔室包括一系列输送辊，至少一个输送辊包括圆柱形管， 由不粘材料的厚度限定的外表面，可选地具有围绕管缠绕的绳索，以限定用于接合基底的底部主表面的升高的支撑。

    Magnetron sputtering systems including anodic gas distribution systems
    67.
    发明授权
    Magnetron sputtering systems including anodic gas distribution systems 有权
    包括阳极气体分配系统的磁控溅射系统

    公开(公告)号：US07166199B2

    公开(公告)日：2007-01-23

    申请号：US10323703

    申请日：2002-12-18

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： C23C14/35

    CPC分类号： H01J37/3244 ,  C23C14/35 ,  C23C14/56 ,  H01J37/3408

    摘要： The present invention provides a magnetron sputtering system using a gas distribution system which also serves as a source of anodic charge to generate plasma field. The sputtering system is comprised of a vacuum chamber, a cathode target of sputterable material, a power source which supplies positive and negative charge, and a gas distribution system. The gas distribution system may comprise a simple perforated gas delivery member, or it may comprise a perforated gas delivery member with an attached conductive anodic surface. The gas delivery member may also contain an inner conduit with further perforations which serves to baffle flow of the sputtering gas. Gas flow may be regulated within discrete portions of the gas distribution system. The anodic surfaces of the gas distribution system are cleaned through the action of plasma and gas flow, creating a more stable plasma and reducing the need for maintenance.

    摘要翻译： 本发明提供一种使用也用作阳极电荷源以产生等离子体场的气体分配系统的磁控溅射系统。 溅射系统包括真空室，可溅射材料的阴极靶，供给正电荷和负电荷的电源以及气体分配系统。 气体分配系统可以包括简单的穿孔气体输送构件，或者其可以包括具有附接的导电阳极表面的穿孔气体输送构件。 气体输送构件还可以包含具有进一步穿孔的内部管道，其用于阻挡溅射气体的流动。 可以在气体分配系统的离散部分内调节气流。 气体分配系统的阳极表面通过等离子体和气体流动的作用被清除，产生更稳定的等离子体并减少维护的需要。

    Reduced maintenance sputtering chambers
    68.
    发明申请
    Reduced maintenance sputtering chambers 审中-公开
    减少维护溅射室

    公开(公告)号：US20060157347A1

    公开(公告)日：2006-07-20

    申请号：US11330787

    申请日：2006-01-12

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： C23C14/00

    CPC分类号： H01J37/32871 ,  C23C14/352 ,  C23C14/564 ,  H01J37/32477 ,  H01J37/3405 ,  H01J37/3455

    摘要： Improved sputtering chambers for sputtering thin coatings onto substrates. One sputtering chamber includes spall shields which are disposed inwardly and upwardly toward the chamber interior and toward the sputtering targets, and which can aid in the retention of overcoated sputtering material which may otherwise fall onto substrates to be coated. Another sputtering chamber includes targets having magnets which are turned inwardly relative to vertical and toward each other. The inward rotation of the magnets can serve to deposit more material toward the open bottom center of the chamber, and less toward the side walls of the chamber. Yet another sputtering chamber includes a third target disposed between and upward of the lower two targets so as to shield a portion of the sputtering chamber interior from material sputtered from the first and second targets. Some chambers have the three targets forming a triangle, for example, an isosceles or equilateral triangle. In one chamber having such a triangular configuration of sputtering targets, the first and second targets form the base of an isosceles triangle and have their magnets oriented inwardly relative to vertical and towards each other. The sputtering chambers provided can either reduce the amount of overcoat sputtering material deposited onto the interior of the chamber and/or aid in retention of overcoat sputtering material which would otherwise fall onto substrates to be coated.

    摘要翻译： 改进的溅射室，用于将薄涂层溅射到基板上。 一个溅射室包括防护罩，其被设置成向内并向上朝向室内部并且朝向溅射靶，并且其可以有助于保留外涂的溅射材料，否则其可能落在待涂覆的基板上。 另一个溅射室包括具有相对于垂直和彼此向内转动的磁体的靶。 磁体的向内旋转可用于将更多的材料沉积到腔室的敞开的底部中心，并且朝向腔室的侧壁较少。 又一个溅射室包括设置在下两个靶之间和之上的第三靶，以便将溅射室内的一部分与第一和第二靶溅射的材料进行屏蔽。 一些室具有形成三角形的三个目标，例如等腰或等边三角形。 在具有溅射靶的这种三角形构造的一个室中，第一和第二靶形成等腰三角形的基部，并使其磁体相对于垂直方向和彼此朝向内侧。 所提供的溅射室可以减少沉积在室内部的外涂层溅射材料的量和/或有助于保留外涂层溅射材料，否则这些溅射材料会落在待涂覆的基板上。

    Cylindrical target with oscillating magnet for magnetron sputtering
    69.
    发明申请
    Cylindrical target with oscillating magnet for magnetron sputtering 有权
    圆柱靶用磁控溅射的振荡磁体

    公开(公告)号：US20060000705A1

    公开(公告)日：2006-01-05

    申请号：US11171054

    申请日：2005-06-30

    申请人： Klaus Hartig ,  Steve Smith ,  John Madocks

    发明人： Klaus Hartig ,  Steve Smith ,  John Madocks

    IPC分类号： C23C14/32

    CPC分类号： H01J37/3455 ,  H01J37/3405 ,  H01J37/3423 ,  H01J37/3497

    摘要： In some embodiments, the invention includes a cylindrical cathode target assembly for use in sputtering target material onto a substrate that comprises a generally cylindrical target, means for rotating the target about its axis during a sputtering operation, an elongated magnet carried within the target for generation of a plasma-containing magnetic field exterior to but adjacent the target, a framework for supporting the magnet against rotation within the target, and a power train for causing the magnet to oscillate within and axially of the target in a substantially asynchronous manner to promote generally uniform target utilization along its length, as well as its method of use. In some embodiments, the magnet is oscillated in response to rotation of the target.

    摘要翻译： 在一些实施例中，本发明包括用于将目标材料溅射到基板上的圆柱形阴极靶组件，该基板包括大致圆柱形的靶，用于在溅射操作期间使靶围绕其轴旋转的装置，用于产生的靶内的细长磁体 位于目标外部但邻近目标的等离子体磁场，用于支撑磁体以防止目标内的旋转的框架和用于使磁体以基本上异步的方式在目标内部和轴向振荡的传动系，以促进一般 沿其长度的均匀目标利用率及其使用方法。 在一些实施例中，磁体响应于目标的旋转而振荡。

    Multichamber coating apparatus
    70.
    发明授权
    Multichamber coating apparatus 失效
    多室涂装置

    公开(公告)号：US5382126A

    公开(公告)日：1995-01-17

    申请号：US39865

    申请日：1993-03-30

    申请人： Klaus Hartig ,  Joachim Szczyrbowski

    发明人： Klaus Hartig ,  Joachim Szczyrbowski

    IPC分类号： C23C14/56 ,  C23C16/54 ,  B65G49/06 ,  C23C17/00

    CPC分类号： C23C14/568

    摘要： A transport car open at the top and supported on rollers moves a substrate from a first coating chamber to a second coating chamber separated by a gate 7 running transversely of the direction of movement of the transport car 5. The gate 7 is formed of an upper gate part 8 and a lower gate part 9 forming a slot 10 which is adaptable to the cross section of the car. A cover associated with the top gate part and parallel to the direction of movement has an area greater than the car in order to minimize gas transfer between chambers.

    摘要翻译： 在顶部打开并支撑在辊上的运输车将基材从第一涂料室移动到第二涂料室，该第二涂料室由与输送汽车5的运动方向横向延伸的闸门7分开。闸门7由上部 闸门部分8和下门部分9，形成适于轿厢横截面的槽10。 与顶部门部分相关联并且平行于运动方向的盖具有大于轿厢的面积，以便最小化室之间的气体传递。