公开(公告)号：US20120164353A1

公开(公告)日：2012-06-28

申请号：US13394305

申请日：2010-09-07

申请人： John Madocks

发明人： John Madocks

IPC分类号： C23C16/50 ,  C23C16/511 ,  C23C16/06

CPC分类号： C23C16/448 ,  C23C16/45514 ,  C23C16/50 ,  H01J37/3408 ,  H01J37/3485

摘要： PECVD apparatus for depositing material onto a moving substrate is provided comprising a process chamber, a precursor gas inlet to the process chamber, a pumped outlet, and a plasma source disposed within the process chamber. The plasma source produces one or more negative glow regions and one or more positive columns. At least one positive column is disposed toward the substrate. The plasma source and precursor gas inlet are disposed relative to each other and the substrate such that the precursor gas is injected into the positive column adjacent the substrate. Apparatus is provided to channel the precursor gas into the positive column away from the negative glow region.

摘要翻译： 提供了用于将材料沉积到移动的基底上的PECVD装置，其包括处理室，处理室的前体气体入口，泵送出口和设置在处理室内的等离子体源。 等离子体源产生一个或多个负辉光区和一个或多个正列。 向衬底设置至少一个正极柱。 等离子体源和前体气体入口相对于彼此和基底设置，使得前体气体被注入邻近基底的正极柱中。 提供了将前体气体引导到远离负辉光区域的正柱中的装置。

公开(公告)号：US20090032393A1

公开(公告)日：2009-02-05

申请号：US12293159

申请日：2007-03-16

申请人： John Madocks

发明人： John Madocks

IPC分类号： C23C14/35

CPC分类号： H01J37/3266 ,  H01J37/3408

摘要： A new and useful plasma source is provided, comprising at least one electrode connected to an alternating current power supply and disposed adjacent to a portion of a grounded substrate. The electrode has a center magnet that produces a magnetron plasma at the electrode when the electrode is biased negative by the alternating power supply, and a mirror plasma on the substrate when the electrode is biased positive by the alternating power supply.

摘要翻译： 提供了一种新的有用的等离子体源，其包括连接到交流电源并且邻近接地衬底的一部分设置的至少一个电极。 电极具有中心磁体，当电极被交流电源偏置为负极时，在电极处产生磁控等离子体，并且当电极被交流电源偏置为正时，该等离子体在基板上。

公开(公告)号：US07038389B2

公开(公告)日：2006-05-02

申请号：US10835748

申请日：2004-04-30

申请人： John Madocks

发明人： John Madocks

IPC分类号： H01J7/24

CPC分类号： H01J37/3405

摘要： A point projection type flood plasma source implements a magnetron sputter cold cathode electron source in a discharge cavity separated from a process chamber by a narrow conduit and a solenoid magnetic field. The solenoid magnetic field impedes radial electron flow in the nozzle and the process chamber. Process gas flows into the discharge cavity and through the nozzle to the process chamber. This gas is ionized in the nozzle and the process chamber by electrons trapped in the solenoid magnetic field. The result is a dense plasma plume in the process chamber useful for a number of applications. The source has particular advantages for reactive gas processes such as those requiring oxygen.

摘要翻译： 点投影型洪水等离子体源在通过窄导管和螺线管磁场与处理室分离的放电腔中实现磁控溅射冷阴极电子源。 螺线管磁场阻止喷嘴和处理室中的径向电子流。 工艺气体流入排放腔并通过喷嘴流到处理室。 该气体通过被螺线管磁场中的电子俘获在喷嘴和处理室中。 结果是处理室中的致密等离子体羽毛可用于许多应用。 该源对于需要氧的那些反应气体方法具有特别的优点。

公开(公告)号：US20100155226A1

公开(公告)日：2010-06-24

申请号：US12602298

申请日：2008-06-06

申请人： John Madocks ,  Patrick Lawrence Morse

发明人： John Madocks ,  Patrick Lawrence Morse

IPC分类号： C23C14/35

CPC分类号： H01J37/342 ,  H01J37/3405 ,  H01J37/3435 ,  H01J37/3497

摘要： A new and useful rotatable sputter magnetron assembly is provided, that addresses the issue of uneven wear of the target electrode tube. According to the principles of the present invention, a rotatable sputter magnetron assembly for use in magnetron sputtering target material onto a substrate comprises a. a longitudinally extending tubular shaped target electrode tube having a longitudinal central axis, b. the target electrode tube extending about a magnet bar that is configured to generate a plasma confining magnetic field adjacent the target electrode tube, c. the magnet bar being held substantially stationary within the target electrode tube, and d. the target electrode tube supported for rotation about its longitudinal central axis and for axial movement along its longitudinal central axis, so that wear of the target electrode tube can be controlled by moving the target electrode tube axially during magnetron sputtering of the target material.

摘要翻译： 提供了一种新的和有用的可旋转溅射磁控管组件，其解决了目标电极管的不均匀磨损的问题。 根据本发明的原理，用于磁控溅射靶材的可旋转溅射磁控管组件包括a。 一个具有纵向中心轴的纵向延伸的管状目标电极管，b。 所述目标电极管围绕磁棒延伸，所述磁棒被配置为产生邻近所述目标电极管的等离子体约束磁场，c。 磁棒基本上固定在目标电极管内，d。 目标电极管被支撑用于围绕其纵向中心轴线旋转并且用于沿其纵向中心轴线轴向运动，使得可以通过在目标材料的磁控溅射期间轴向移动目标电极管来控制目标电极管的磨损。

公开(公告)号：US20050247885A1

公开(公告)日：2005-11-10

申请号：US11177984

申请日：2005-07-08

申请人： John Madocks

发明人： John Madocks

IPC分类号： F03H1/00 ,  H01J3/04 ,  H01J27/00 ,  H01J33/00 ,  H05H1/24

CPC分类号： F03H1/0075 ,  H01J27/143 ,  H05H1/54

摘要： A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and extends therefrom in a first direction. A second magnetic pole disposed on the open end of the channel and extends therefrom in a second direction, where the first direction is opposite to the second direction. The distal ends of the first magnetic pole and the second magnetic pole define a gap comprising the opening in the first end. An anode is disposed within the channel. A primary magnetic field line is disposed between the first magnetic pole and the second magnetic pole, where that primary magnetic field line has a mirror field greater than 2.

公开(公告)号：US06919672B2

公开(公告)日：2005-07-19

申请号：US10411024

申请日：2003-04-10

申请人： John Madocks

发明人： John Madocks

IPC分类号： F03H1/00 ,  H05H1/54 ,  F03H5/00 ,  H01J37/08 ,  H01J41/12 ,  H05H1/02

CPC分类号： H01J27/143 ,  F03H1/0075 ,  H05H1/54

摘要： A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and extends therefrom in a first direction. A second magnetic pole disposed on the open end of the channel and extends therefrom in a second direction, where the first direction is opposite to the second direction. The distal ends of the first magnetic pole and the second magnetic pole define a gap comprising the opening in the first end. An anode is disposed within the channel. A primary magnetic field line is disposed between the first magnetic pole and the second magnetic pole, where that primary magnetic field line has a mirror field greater than 2.

摘要翻译： 闭合漂移离子源，其包括具有开口端，闭合端和用于可电离气体的输入端口的通道。 第一磁极设置在通道的开口端上并沿第一方向从其延伸。 第二磁极，其设置在通道的开口端上，并沿第二方向从第二方向向第二方向延伸。 第一磁极和第二磁极的远端限定包括第一端中的开口的间隙。 阳极设置在通道内。 初级磁场线设置在第一磁极和第二磁极之间，其中初级磁场线具有大于2的反射镜场。

公开(公告)号：US06911779B2

公开(公告)日：2005-06-28

申请号：US10475546

申请日：2002-04-10

申请人： John Madocks

发明人： John Madocks

IPC分类号： H05H1/24 ,  C23C14/28 ,  C23C14/30 ,  C23C14/35 ,  C23C16/50 ,  C23C16/503 ,  C23C16/505 ,  C23C16/54 ,  C23F4/00 ,  H01J37/32 ,  H01J49/42 ,  H01L21/205 ,  H01L21/3065 ,  H05H1/14 ,  H05H1/46 ,  H01J7/24

CPC分类号： H01J27/14 ,  C23C16/50 ,  C23C16/505 ,  C23C16/545 ,  H01J37/32623 ,  H01J37/3266 ,  H01J37/3277 ,  H05H1/14

摘要： The preferred embodiments described herein provide a magnetic mirror plasma source. While the traditional magnetic/electrostatic confinement method is ideal for many applications, some processes are not best served with this arrangement. The preferred embodiments described herein present a new technique to confine electrons (3) to produce a low pressure, dense plasma directly on a substrate surface (75). With these preferred embodiments, a combination of electrostatic and mirror magnetic confinement is implemented. The result is a novel plasma source that has unique and important advantages enabling advancements in PECVD, etching, and plasma treatment processes.

摘要翻译： 本文所述的优选实施例提供了磁镜等离子体源。 虽然传统的磁/静电约束方法对于许多应用来说是理想的，但是一些方法并不是最适合这种安排。 本文所述的优选实施例提出了限制电子（3）直接在衬底表面（75）上产生低压致密等离子体的新技术。 利用这些优选实施例，实现了静电和镜面磁约束的组合。 结果是一种新颖的等离子体源，其具有独特且重要的优点，可实现PECVD，蚀刻和等离子体处理工艺的进步。

公开(公告)号：US20110005919A1

公开(公告)日：2011-01-13

申请号：US12776706

申请日：2010-05-10

申请人： John Madocks ,  Mark A. George

发明人： John Madocks ,  Mark A. George

IPC分类号： C23C14/35 ,  C23C14/06

CPC分类号： C23C14/085 ,  C23C14/3407 ,  H01J37/3408 ,  H01J37/3426 ,  H01J37/3435 ,  H01J37/3497

摘要： A sputter coating apparatus for sputter coating a substrate in a processing chamber includes a target of sputter coating material supported within the processing chamber. The target has a sputtering surface and a back surface. The target is affixed to a backing plate such that the back surface of the target is disposed adjacent to a first surface of the backing plate. The backing plate is in fluid communication with a source of cooling fluid. The target back surface has a first layer selected to have a high thermal emissivity coefficient. The backing plate first surface carries a second layer having a high emissivity coefficient. The target back surface first layer and the backing plate first surface second layer provide enhanced heat transfer between the target and the backing plate via thermal radiation.

摘要翻译： 用于在处理室中溅射涂覆基板的溅射涂覆设备包括支撑在处理室内的溅射涂层材料的靶。 靶具有溅射表面和背面。 靶材固定到背板上，使得靶材的后表面邻近背板的第一表面设置。 背板与冷却流体源流体连通。 目标后表面具有被选择为具有高热辐射率系数的第一层。 背板第一表面承载具有高发射率系数的第二层。 目标背面第一层和背板第一表面第二层通过热辐射提供靶和背板之间的增强的热传递。

公开(公告)号：US07025833B2

公开(公告)日：2006-04-11

申请号：US10471107

申请日：2002-02-27

申请人： John Madocks

发明人： John Madocks

IPC分类号： C23C16/00 ,  C23C16/458 ,  C23C14/24 ,  C23C16/54

CPC分类号： C23C14/562

摘要： A chill drum (14) is modified to improve heat transfert between the drum and a flexible web substrate (20) disposed around the drum. The drum surface (22) contains a series of passages (44) and distribution holes (46). A working gas is injected into these passages and flows out of the distribution holes into the space between the web and drum. A cover (32) prevents working gas from escaping from frum passages in the area not covered by the web, and supplies the working gas to the passages at the drum cover. Once gas is in the passages, leakage only occurs from the edges of the web. The pressure in the passages remains essentially constant around the drum, producing uniform elevated pressures under the entire web. Elevated pressure behind the web significantly improves overall heat transfert, thereby allowing higher deposition rates and other process advantages.

摘要翻译： 改变冷却鼓（14）以改善滚筒与布置在滚筒周围的柔性幅材基片（20）之间的热传递。 鼓表面（22）包含一系列通道（44）和分配孔（46）。 工作气体注入这些通道并从分配孔流出到卷筒和滚筒之间的空间中。 盖（32）防止工作气体从未被卷筒纸覆盖的区域中的通道中逸出，并将工作气体供应到鼓罩上的通道。 一旦气体在通道中，泄漏只从网的边缘发生。 通道中的压力在鼓周围保持基本恒定，在整个幅材下产生均匀的升高的压力。 幅材后面的高压显着地改善了总体传热，从而允许更高的沉积速率和其它工艺优点。

公开(公告)号：US07023128B2

公开(公告)日：2006-04-04

申请号：US10475547

申请日：2002-04-10

申请人： John Madocks

发明人： John Madocks

IPC分类号： H05H1/46 ,  H05H1/54

CPC分类号： H01J27/14 ,  H01J37/08 ,  H01J37/32431

摘要： A dipole ion source (FIG. 1) includes two cathode surfaces, a substrate (1) and a pole (3); wherein a gap is defined between the substrate and the pole; an unsymmetrical mirror magnetic field including a compressed end, wherein the substrate is positioned in the less compressed end of the magnetic field; and an anode (4) creating an electric field penetrating the magnetic field and confining electrons in a continuous Hall current loop, wherein the unsymmetrical magnetic field serves an ion beam on the substrate.

摘要翻译： 偶极离子源（图1）包括两个阴极表面，一个衬底（1）和一个极（3）; 其中在所述基板和所述极之间限定间隙; 包括压缩端的不对称镜面磁场，其中所述衬底位于所述磁场的较小压缩端中; 以及阳极（4），产生穿过磁场的电场并将电子限制在连续的霍尔电流回路中，其中非对称磁场用于衬底上的离子束。