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    RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION
    61.
    发明申请
    RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION 审中-公开
    电阻加工方法和正极型电阻组合物的使用

    公开(公告)号：US20110183264A1

    公开(公告)日：2011-07-28

    申请号：US13063670

    申请日：2009-09-08

    申请人： Kazuhiko Hashimoto ,  Mitsuhiro Hata ,  Satoshi Yamamoto

    发明人： Kazuhiko Hashimoto ,  Mitsuhiro Hata ,  Satoshi Yamamoto

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0035 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/40

    摘要： A resist processing method has the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) including a structural unit represented by the formula (XX), and having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, and a photo acid generator (B) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and then drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern. wherein, Ra1 represents a hydrogen atom, a halogen atom or a C1 to C3 saturated hydrocarbon group which may be substituted with a halogen atom; Ra2 represents a single bond or a divalent organic group; Ra3 represents a hydrogen atom, a C1 to C12 saturated hydrocarbon group which may be substituted with a hydroxy group etc., and Ra4 represent a C1 to C12 saturated hydrocarbon group.

    摘要翻译： 抗蚀剂处理方法具有以下步骤：（1）通过施加第一抗蚀剂组合物形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含：包含由式（XX）表示的结构单元并具有酸不稳定基团的树脂（A） 在碱性水溶液中不溶或难溶，并且通过酸的作用使碱溶液和光酸产生剂（B）溶解在基材上并干燥; （2）预烘第一抗蚀膜; （3）曝光第一抗蚀膜; （4）第一抗蚀剂膜的曝光后烘烤; （5）用第一碱性显影剂显影以获得第一抗蚀剂图案; （6）对第一抗蚀剂图案进行硬烘烤，（7）通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上，然后干燥获得第二抗蚀剂膜; （8）预烘烤第二抗蚀剂膜; （9）使第二抗蚀剂膜曝光; （10）曝光后烘烤第二抗蚀膜; 和（11）用第二碱性显影剂显影以获得第二抗蚀剂图案。 其中，Ra1表示氢原子，卤素原子或可被卤素原子取代的C1〜C3饱和烃基; Ra2表示单键或二价有机基团; Ra3表示氢原子，可被羟基取代的C1〜C12饱和烃基等，Ra4表示C1〜C12饱和烃基。

    PROCESS FOR PRODUCING PHOTORESIST PATTERN
    63.
    发明申请
    PROCESS FOR PRODUCING PHOTORESIST PATTERN 审中-公开
    生产光电子图案的工艺

    公开(公告)号：US20110091818A1

    公开(公告)日：2011-04-21

    申请号：US12906522

    申请日：2010-10-18

    申请人： Mitsuhiro HATA ,  Kazuhiko Hashimoto

    发明人： Mitsuhiro HATA ,  Kazuhiko Hashimoto

    IPC分类号： G03F7/20

    CPC分类号： G03F7/0035 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/40

    摘要： The present invention provides a process for producing a photoresist pattern comprising the following steps (1) to (11): (1) a step of applying the first photoresist composition comprising a resin comprising a structural unit having an acid-labile group in its side chain and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, and an acid generator, on a substrate followed by conducting drying, thereby forming the first photoresist film, (2) a step of prebaking the first photoresist film, (3) a step of exposing the prebaked first photoresist film to radiation, (4) a step of baking the exposed first photoresist film, (5) a step of developing the baked first photoresist film with the first alkaline developer, thereby forming the first photoresist pattern, (6) a step of forming a coating layer on the first photoresist pattern, (7) a step of applying the second photoresist composition on the coating layer followed by conducting drying, thereby forming the second photoresist film, (8) a step of prebaking the second photoresist film, (9) a step of exposing the prebaked second photoresist film to radiation, (10) a step of baking the exposed second photoresist film, and (11) a step of developing the baked second photoresist film with the second alkaline developer, thereby forming the second photoresist pattern.

    摘要翻译： 本发明提供了一种制备光致抗蚀剂图案的方法，包括以下步骤（1）至（11）：（1）将包含具有酸不稳定基团的结构单元的树脂在其侧面上施加的第一光致抗蚀剂组合物的步骤 并且本身不溶于或难溶于碱性水溶液，但是通过酸和酸产生剂在碱性水溶液中溶解，然后进行干燥，从而形成第一光致抗蚀剂膜（2 ）预烘烤第一光致抗蚀剂膜的步骤，（3）将预焙蚀的第一光致抗蚀剂膜暴露于辐射的步骤，（4）烘烤曝光的第一光致抗蚀剂膜的步骤，（5） 与第一碱性显影剂，由此形成第一光致抗蚀剂图案，（6）在第一光致抗蚀剂图案上形成涂层的步骤，（7）将第二光致抗蚀剂组合物涂布在涂层上 然后进行干燥，从而形成第二光致抗蚀剂膜，（8）预烘烤第二光致抗蚀剂膜的步骤，（9）将预焙烧的第二光致抗蚀剂膜暴露于辐射的步骤，（10） 第二光致抗蚀剂膜，和（11）用第二碱性显影剂显影所焙烧的第二光致抗蚀剂膜的步骤，从而形成第二光致抗蚀剂图案。

    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
    66.
    发明申请
    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
    化学放大正电阻组合物

    公开(公告)号：US20090004600A1

    公开(公告)日：2009-01-01

    申请号：US12143268

    申请日：2008-06-20

    申请人： Makoto Akita ,  Isao Yoshida ,  Kazuhiko Hashimoto

    发明人： Makoto Akita ,  Isao Yoshida ,  Kazuhiko Hashimoto

    IPC分类号： G03C1/053

    CPC分类号： G03F7/0397 ,  C07C69/00 ,  C07C2603/24 ,  C08F212/14 ,  C08F212/34 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/106

    摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.

    摘要翻译： 一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：其中R7表示氢原子等，R8表示C1-C4烷基，p表示整数 为1〜3，q为0〜2的整数，（ii）至少一种选自由式（II）表示的聚合单元的聚合单元：其中，R1表示氢原子等，R2 代表C1-C8烷基，X代表脂环族烃基，和由式（Ⅳ）表示的聚合单元：其中R3表示氢原子等，R4和R5独立地表示氢原子等，R10表示 C 1 -C 6烷基等，和（iii）由式（III）表示的聚合单元：其中R3，R4和R5与上述定义相同，E表示二价烃基，G表示单键等 Z表示羰基等，L r 表示蒽基等，和（B）至少一种酸发生剂。

    Monitoring system
    67.
    发明申请
    Monitoring system 失效
    监视系统

    公开(公告)号：US20050160325A1

    公开(公告)日：2005-07-21

    申请号：US10510986

    申请日：2003-02-21

    申请人： Hiroyuki Ogino ,  Hideki Omori ,  Hidekazu Yamashita ,  Naofumi Nakatani ,  Osamu Eguchi ,  Makoto Imai ,  Wataru Uchiyama ,  Kazuhiko Hashimoto ,  Tadashi Miki ,  Haruo Terai ,  Kenji Kida

    发明人： Hiroyuki Ogino ,  Hideki Omori ,  Hidekazu Yamashita ,  Naofumi Nakatani ,  Osamu Eguchi ,  Makoto Imai ,  Wataru Uchiyama ,  Kazuhiko Hashimoto ,  Tadashi Miki ,  Haruo Terai ,  Kenji Kida

    IPC分类号： G08B13/196 ,  G08B25/08 ,  G06F11/00

    CPC分类号： G08B13/19656 ,  G08B13/19645 ,  G08B13/19658 ,  G08B13/19691 ,  G08B13/19697 ,  G08B25/08

    摘要： A monitoring system which is suitable for, for example, preventing crime for a residence, includes a plurality of terminals (31, 32, . . . ) for monitoring whether predetermined monitoring points are in a stationary state or a nonstationary state, and a central processing device (10) for controlling a setting/canceling operation of alarm operations of the terminals (31, 32, . . . ). The central processing device (10) has a communication unit that receives information related to the stationary/nonstationary states from the terminals and transmits predetermined information including commands to the terminals. Each terminal has a communication unit that transmits information related to stationary/nonstationary states to the central processing device and receives the predetermined information from the central processing device. Thus bidirectional communication can be achieved between the central processing device and the terminals. The plurality of terminals (31, 32, . . . ) may include a terminal with an emergency call unit which operates in an emergency to call or notify, and a terminal having a notification unit which indicates that notification of occurrence of nonstationay state has been accepted by a predetermined point of contact.

    摘要翻译： 适用于例如防止住宅犯罪的监视系统包括用于监视预定监视点是处于静止状态还是处于非稳态状态的多个终端（31,32 ...）和中央 处理装置（10），用于控制终端（31,32 ...）的报警操作的设置/取消操作。 中央处理装置（10）具有通信单元，其从终端接收与静止/非平稳状态有关的信息，并向终端发送包括命令的预定信息。 每个终端具有通信单元，其向中央处理设备发送与静止/非静止状态相关的信息，并从中央处理设备接收预定信息。 因此，可以在中央处理装置和终端之间实现双向通信。 多个终端（31,32 ...）可以包括具有在紧急情况下操作以进行呼叫或通知的紧急呼叫单元的终端，以及具有指示非易失性状态的发生通知已经被通知的通知单元的终端 接受预定的接触点。

    Positive resist composition
    68.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US06893792B2

    公开(公告)日：2005-05-17

    申请号：US10366673

    申请日：2003-02-14

    申请人： Yoshiko Miya ,  Kouji Toishi ,  Kazuhiko Hashimoto

    发明人： Yoshiko Miya ,  Kouji Toishi ,  Kazuhiko Hashimoto

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0395 ,  Y10S430/108

    摘要： The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.

    摘要翻译： 本发明提供一种正型抗蚀剂组合物，其包含本身在碱性水溶液中不溶或难溶于但通过酸作用而在碱性水溶液中溶解的树脂，和酸产生剂，其中卤素原子的含量 树脂为40重量％以上，构成树脂的结构单元中的至少一个为具有脂环烃骨架的结构单元，具有脂环烃骨架的结构单元含有至少一个使树脂溶于 碱水溶液，通过酸的作用和至少一个卤素原子。

    Thermal type infrared sensing device, fabrication method for thermal type infrared sensing device, and infrared imaging system and infrared imaging apparatus
    70.
    发明授权
    Thermal type infrared sensing device, fabrication method for thermal type infrared sensing device, and infrared imaging system and infrared imaging apparatus 有权
    热式红外感测装置，热式红外感测装置的制造方法，红外成像系统和红外成像装置

    公开(公告)号：US06262418B1

    公开(公告)日：2001-07-17

    申请号：US09177148

    申请日：1998-10-22

    申请人： Kazuhiko Hashimoto ,  Masanori Okuyama ,  Ryuichi Kubo ,  Tomonori Mukaigawa

    发明人： Kazuhiko Hashimoto ,  Masanori Okuyama ,  Ryuichi Kubo ,  Tomonori Mukaigawa

    IPC分类号： G01J510

    CPC分类号： G01J5/34

    摘要： A thermal type infrared sensing device has; a plurality of light-receiving electrodes for outputting a change of surface charge associated with a polarization that occurs in a dielectric when subjected to infrared radiation; and a plurality of compensation electrodes, corresponding one for one to plurality of light-receiving electrodes, for compensating the outputs of corresponding light-receiving electrodes, and wherein plurality of compensation electrodes are formed on a different substrate from a substrate on which plurality of light-receiving electrodes are formed.

    摘要翻译： 一种热式红外传感器具有： 多个光接收电极，用于输出当经受红外辐射时在电介质中发生的与偏振有关的表面电荷的变化; 以及多个补偿电极，对应一个用于一个到多个光接收电极，用于补偿相应的光接收电极的输出，并且其中多个补偿电极形成在不同的衬底上，所述衬底上具有多个光 形成接收电极。