公开(公告)号：US20080316459A1

公开(公告)日：2008-12-25

申请号：US12201767

申请日：2008-08-29

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G03B27/72

CPC分类号： G03F7/70191 ,  G02B7/008 ,  G02B27/286 ,  G03B27/72 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70966

摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.

摘要翻译： 本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到感光基板上的投影物镜，其中所述投影系统包括光学系统 包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中 另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中 有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

公开(公告)号：US20080111983A1

公开(公告)日：2008-05-15

申请号：US11813529

申请日：2005-12-30

申请人： Wolfgang Singer ,  Dieter Bader ,  Johannes Wangler ,  Markus Deguenther

发明人： Wolfgang Singer ,  Dieter Bader ,  Johannes Wangler ,  Markus Deguenther

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70075 ,  G03F7/70083

摘要： An illumination system (12) of a microlithographic exposure system comprises a plurality of light emitting elements (24) that have light exit facets that are positioned in or in close proximity to a field plane (OP) or a pupil plane and are configured to be individually activated. Light collecting elements, for example microlenses of a fly-eye lens or arrays of cylinder lenses, may be used to collect the light bundles emitted by the light emitting elements (24). Homogenizing means, for example a rod integrator or an optical raster element (40), may be provided for improving the intensity uniformity in a reticle plane (RP).

摘要翻译： 微光刻曝光系统的照明系统（12）包括多个发光元件（24），该发光元件具有光出射面，其位于或靠近场平面（OP）或光瞳平面，并被配置为 单独激活。 可以使用光收集元件，例如蝇眼透镜的微透镜或圆柱透镜阵列来收集由发光元件（24）发射的光束。 可以提供均匀化装置，例如棒状积分器或光学光栅元件（40），以改善光罩平面（RP）中的强度均匀性。

公开(公告)号：US20070285644A1

公开(公告)日：2007-12-13

申请号：US11575042

申请日：2005-09-13

申请人： Markus Brotsack ,  Markus Deguenther ,  Wilhelm Ulrich ,  Joachim Wietzorrek ,  Johannes Wangler ,  Heiko Feldmann ,  Andreas Zeiler

发明人： Markus Brotsack ,  Markus Deguenther ,  Wilhelm Ulrich ,  Joachim Wietzorrek ,  Johannes Wangler ,  Heiko Feldmann ,  Andreas Zeiler

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70066

摘要： An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.

摘要翻译： 用于微光刻投影曝光装置的照明系统包括掩蔽装置和将掩模装置投影到图像平面上的掩蔽对象。 照明系统还包括光学校正元件，其具有非球面形状的表面或支撑具有至少基本上非球面的作用的衍射结构。 该表面至少大致布置在掩蔽对象的图像平面之前的场平面中。非球面作用表面被设计成使得由照明系统在图像平面中产生的主射线分布与投影所需的主射线分布相匹配 目的。

公开(公告)号：US20060268251A1

公开(公告)日：2006-11-30

申请号：US10564639

申请日：2004-07-15

申请人： Markus Deguenther ,  Manfred Maul ,  Damian Fiolka

发明人： Markus Deguenther ,  Manfred Maul ,  Damian Fiolka

IPC分类号： G03B27/54

CPC分类号： G03F7/70058 ,  G03F7/70066 ,  G03F7/70158 ,  G03F7/70191

摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (12) for generating a projection light beam, a first objective (20) and a masking system (38, 52) for masking a reticle (30). The masking system (38, 52) includes adjustable first blades (40) for masking in a first spatial direction (X) and adjustable second blades (54, 56) for masking in a second spatial direction (Y). The first blades (40) are arranged in the region of a first field plane (36) and the second blades (54, 56) are arranged in the region of a second field plane (44) which is different to the first field plane (36). The masking system can therefore be made spatially less concentrated, whereby constructional difficulties in the region of the field plane before the masking objective resulting from space requirement problems are reduced. A further contribution is made to solving the space requirement problem if an attenuation system for achieving the most uniform possible light intensity in the wafer plane (122) includes a transmission filter (162) which has locally varying transmissivity and can be moved synchronously with traversing movements of the reticle (30).

摘要翻译： 用于微光刻投影曝光装置的照明系统包括用于产生投影光束的光源（12），用于掩蔽掩模（30）的第一物镜（20）和掩蔽系统（38,52）。 掩蔽系统（38,52）包括可调节的第一叶片（40），用于在第一空间方向（X）和第二空间方向（Y）上遮蔽的可调节的第二叶片（54,56）进行掩蔽。 第一叶片（40）布置在第一场平面（36）的区域中，并且第二叶片（54,56）布置在与第一场平面不同的第二场平面（44）的区域中 36）。 因此，掩蔽系统可以在空间上较少地集中，由此减少了由空间需求问题导致的掩蔽目标之前的场平面区域中的构造困难。 如果用于在晶片平面（122）中实现最均匀可能的光强度的衰减系统包括具有局部变化的透射率的传输滤波器（162）并且可以与横移运动同步地移动，则进一步作出了解决空间需求问题的贡献 的标线（30）。

公开(公告)号：US20060126049A1

公开(公告)日：2006-06-15

申请号：US11271844

申请日：2005-11-14

申请人： Markus Deguenther ,  Johannes Wangler ,  Markus Brotsack ,  Ella Mizkewitsch

发明人： Markus Deguenther ,  Johannes Wangler ,  Markus Brotsack ,  Ella Mizkewitsch

IPC分类号： G03B27/72

CPC分类号： G03F7/70075 ,  G03F7/70091

摘要： An illumination system for a microlithography projection exposure apparatus is designed for illuminating an illumination field with an illumination radiation with a predeterminable degree of coherence σ, it being possible to adjust the degree of coherence within a degree of coherence range extending into the range of very small degrees of coherence of significantly less than σ=0.2. The illumination system may have a first optical system for generating a predeterminable light distribution in an entrance plane of a light mixing device, and also a light mixing device for homogenizing the impinging radiation. The first optical system and the light mixing device can in each case be changed over between a plurality of configurations corresponding to different degree of coherence ranges. The degree of coherence ranges overlap and are dimensioned such that the resulting total degree of coherence range is larger than the individual degree of coherence ranges.

摘要翻译： 用于微光刻投影曝光装置的照明系统设计成用具有可预定程度的一致性sigma的照明辐射照射照明场，可以在相干范围内的相干程度范围内调整相干度 相干度显着小于σ= 0.2。 照明系统可以具有用于在光混合装置的入射面中产生可预定的光分布的第一光学系统，以及用于均匀化入射辐射的光混合装置。 在每种情况下，可以在对应于不同程度的相干范围的多个配置之间改变第一光学系统和光混合装置。 相干度的重叠程度重叠，其尺寸使得所产生的总相干度范围大于相干范围的个体程度。

公开(公告)号：US08873023B2

公开(公告)日：2014-10-28

申请号：US13186068

申请日：2011-07-19

申请人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

发明人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

摘要翻译： 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。 在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。 例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III） 这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。 结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

公开(公告)号：US08854604B2

公开(公告)日：2014-10-07

申请号：US13215616

申请日：2011-08-23

申请人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

发明人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20 ,  G02B26/08

CPC分类号： G03F7/7085 ,  G02B26/0833 ,  G03F7/70116 ,  G03F7/70266 ,  G03F7/70591 ,  G03F7/706

摘要： A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.

摘要翻译： 微光刻投影曝光装置包括可以由多个微镜形成的光学表面，以及被配置为测量与多个位置处的光学表面相关的参数的测量装置。 测量装置包括具有多个照明构件的照明单元，每个具有光出射面。 光学成像系统在其中布置至少两个光出射面的物平面与至少基本上与光学表面重合的像平面之间建立成像关系。 检测器单元在与光学表面相互作用后测量光的性质，并且评估单元基于由检测器单元确定的特性来确定每个位置的表面相关参数。

公开(公告)号：US08730455B2

公开(公告)日：2014-05-20

申请号：US13181033

申请日：2011-07-12

申请人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

发明人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03F7/20 ,  G03B27/68 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。

公开(公告)号：US08289623B2

公开(公告)日：2012-10-16

申请号：US12729948

申请日：2010-03-23

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B5/30 ,  G02B27/28 ,  F21V9/14 ,  G03B27/72

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G02B5/3025 ,  G02B5/3075 ,  G02B27/286 ,  G02F1/0136 ,  G02F1/0147 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70566

摘要： A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

摘要翻译： 由光学活性晶体材料组成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果 具有第一旋转角度和第二旋转角度彼此不同。

公开(公告)号：US08270077B2

公开(公告)日：2012-09-18

申请号：US11440479

申请日：2006-05-25

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B5/30 ,  G02B27/28

CPC分类号： G02B27/286 ,  G02B7/008

摘要： An optical arrangement includes a polarization-modulating optical element and a compensation plate is disclosed. The polarization-modulating optical element includes a first optically active material having a first specific rotation with a sign, the polarization-modulating optical element having a first optical axis. The polarization-modulating element has a first thickness profile that, as measured in the direction of the first optical axis, that is variable. The compensation plate includes a second optically active material having a second specific rotation with a sign opposite the sign of the first specific rotation. The compensation plate has a second thickness profile configured so that, when radiation passes through the optical arrangement, the compensation plate substantially compensates for angle deviations of the radiation that are caused by the polarization-modulating optical element.

摘要翻译： 光学装置包括偏振调制光学元件和补偿板。 偏振调制光学元件包括具有第一比旋转符号的第一光学活性材料，该偏振调制光学元件具有第一光轴。 偏振调制元件具有第一厚度分布，其在第一光轴的方向上测量为可变的。 补偿板包括具有与第一比旋转的符号相反的符号的第二比旋的第二光学活性材料。 补偿板具有第二厚度轮廓，其被构造成使得当辐射通过光学装置时，补偿板基本上补偿由偏振调制光学元件引起的辐射的角度偏差。