公开(公告)号：US20080037905A1

公开(公告)日：2008-02-14

申请号：US11874493

申请日：2007-10-18

申请人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

发明人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

IPC分类号： G06K9/03

CPC分类号： G03F7/70566 ,  G01J4/04 ,  G01M11/0271 ,  G01M11/0285 ,  G02B27/0025 ,  G03F7/70591

摘要： A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.

摘要翻译： 一种用于通过被测光学系统确定光辐射的偏振状态的影响的方法和装置，其中具有限定的入射极化状态的辐射被引导到光学系统上，测量出射侧的偏振态， 并且通过参考偏振的入射状态来评估偏振的退出状态，由光学系统确定极化状态的影响。 还公开了可用于此目的的分析装置。 使用该方法和装置，例如通过具有规定孔径的光学成像系统来确定光学辐射的偏振状态的影响，该确定以瞳孔分辨的方式执行。

公开(公告)号：US07321465B2

公开(公告)日：2008-01-22

申请号：US11071699

申请日：2005-03-02

申请人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

发明人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02B27/28

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/705 ,  G03F7/70966 ,  Y10S359/90

摘要： A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimizing method, an optimizing function which takes at least one birefringence-related image aberration into account is minimized. The birefringence-related image aberration is determined from a calculation for a light ray passing through the fluoride crystal lenses. To the extent that the birefringence-related image aberration is a function of parameters of the light ray, it depends only on geometric parameters of the light ray. The numerical optimizing method is used to produce objectives in which an optical retardation as well as an asymmetry of the optical retardation are corrected. The lenses are arranged in homogeneous groups, where each homogeneous group is corrected for the optical retardation asymmetry.

摘要翻译： 数值优化方法用于减少物镜中的立方晶体结构的氟化物晶体材料的透镜中的固有双折射引起的有害影响，特别是微光刻系统的投影物镜。 在优化方法下，考虑到至少一个双折射相关图像像差的优化函数被最小化。 从通过氟化物晶体透镜的光线的计算确定双折射相关图像像差。 在双折射相关图像像差是光线参数的函数的程度上，其仅取决于光线的几何参数。 使用数值优化方法来产生其中光学延迟以及光学延迟的不对称性被校正的目标。 透镜被排列成均匀的组，其中每个均匀组被校正用于光学延迟不对称。

公开(公告)号：US20050152046A1

公开(公告)日：2005-07-14

申请号：US11014199

申请日：2004-12-16

申请人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

发明人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

IPC分类号： G02B27/00 ,  G02B27/28 ,  G03F7/20 ,  G02B17/00

CPC分类号： G03F7/70191 ,  G02B5/04 ,  G02B5/3066 ,  G02B27/286 ,  G03F7/70566

摘要： An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.

摘要翻译： 微光刻投影曝光装置的光学系统，特别是照明系统包含用于折叠光束路径的至少一个平面反射表面。 所述至少一个反射表面相对于所述光学系统的光轴布置，使得对于由所述至少一个反射表面偏离的轴向平行的光线，至少基本上保留了两个相互垂直的偏振方向之间的强度比。 根据第二方面，至少一个反射表面被布置成使得能够实现对投射光的极化的最大影响，以便能够补偿在照明系统的其它部件中发生的偏振依赖性。

公开(公告)号：US20050123840A1

公开(公告)日：2005-06-09

申请号：US10984868

申请日：2004-11-10

申请人： Michael Totzeck ,  Toralf Gruner ,  Jochen Hetzler

发明人： Michael Totzeck ,  Toralf Gruner ,  Jochen Hetzler

IPC分类号： G02F1/13 ,  G03B27/42 ,  G03C5/00 ,  G03F1/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70566 ,  G03F1/38 ,  G03F1/50

摘要： A mask (20) for use in a microlithographic projection exposure apparatus (10) has a support (28) on which a pattern of opaque structures (32) is applied. The intermediate spaces (36, 36′) remaining between the structures (32c) are filled with a liquid or solid dielectric material (38, 38′). This increases the polarisation dependency of the diffraction efficiency, so that the mask can be used as a polarizer.

摘要翻译： 在微光刻投影曝光装置（10）中使用的掩模（20）具有支撑体（28），在其上施加不透明结构（32）的图案。 残留在结构（32c）之间的中间空间（36,36'）填充有液体或固体电介质材料（38,38'）。 这增加了衍射效率的极化依赖性，使得掩模可以用作偏振器。

公开(公告)号：US08736849B2

公开(公告)日：2014-05-27

申请号：US13062566

申请日：2009-09-18

申请人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

发明人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

IPC分类号： G01N21/00 ,  G01B11/14 ,  G03B27/42

CPC分类号： G03F1/84 ,  G03F7/70141

摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.

摘要翻译： 本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。 在这种情况下，控制平台（2）的位置。 掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。 来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。 在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。 本发明还涉及一种可以进行这些方法步骤的装置。 在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。 为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。

公开(公告)号：US08593618B2

公开(公告)日：2013-11-26

申请号：US12971798

申请日：2010-12-17

申请人： Michael Totzeck

发明人： Michael Totzeck

IPC分类号： G03B27/54 ,  G02B5/30 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G02B27/642 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70341 ,  G03F7/70566

摘要： The disclosure relates to an optical system of a microlithographic projection exposure apparatus and to a microlithographic exposure method. An optical system of a microlithographic projection exposure apparatus includes an image rotator, which is arranged in the optical system such that light impinging on the image rotator is at least partially polarized. The image rotator rotates, for light impinging on the image rotator, both the intensity distribution and the polarization distribution of through a given angle of rotation.

摘要翻译： 本公开涉及微光刻投影曝光装置的光学系统和微光刻曝光方法。 微光刻投影曝光装置的光学系统包括图像旋转器，其被布置在光学系统中，使得入射到图像旋转器上的光至少部分地偏振。 图像旋转器旋转，用于光照射在图像旋转器上，通过给定的旋转角度的强度分布和偏振分布。

公开(公告)号：US08305558B2

公开(公告)日：2012-11-06

申请号：US12390676

申请日：2009-02-23

申请人： Toralf Gruner ,  Michael Totzeck

发明人： Toralf Gruner ,  Michael Totzeck

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70566 ,  B82Y10/00 ,  G03F7/70008 ,  G21K2201/061 ,  H05G2/00

摘要： An illumination system for a microlithographic projection exposure apparatus includes an EUV light source which generates an emission beam of linearly polarized EUV illumination light. An illumination optics guides the emission beam along an optical axis which causes an illumination field in a reticle plane to be illuminated by the emission beam. The illumination system also includes an illumination subunit of the illumination system. The illumination subunit includes at least the EUV light source and a polarization setting device for setting a defined polarization of the EUV emission beam of the illumination subunit.

摘要翻译： 用于微光刻投影曝光装置的照明系统包括产生线偏极化EUV照明光的发射光束的EUV光源。 照明光学器件沿着光轴引导发射光束，其使得光栅平面中的照明场被发射光束照射。 照明系统还包括照明系统的照明子单元。 照明子单元至少包括EUV光源和用于设定照明子单元的EUV发射光束的限定极化的偏振设置装置。

公开(公告)号：US08237918B2

公开(公告)日：2012-08-07

申请号：US12498475

申请日：2009-07-07

申请人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

发明人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

IPC分类号： G03B27/72

CPC分类号： G03F7/70566

摘要： An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.

摘要翻译： 公开了一种光学系统，例如微光刻投影曝光装置的照明装置或投影物镜。 光学系统可以包括具有至少一个偏振修正部分元件的偏振补偿器。 光学系统还可以包括操纵器，通过该操纵器可以改变至少一个部分元件的位置。 可以设置光学系统的至少一种操作模式，其中在属于垂直于光轴并且可以用来自光源的光照射的平面的区域上的强度不超过最大值的20％ 平面内的强度，机械手配置在该区域。

公开(公告)号：US08169595B2

公开(公告)日：2012-05-01

申请号：US12357126

申请日：2009-01-21

申请人： Martin Schriever ,  Ulrich Wegmann ,  Stefan Hembacher ,  Bernhard Geuppert ,  Juergen Huber ,  Norbert Kerwien ,  Michael Totzeck ,  Markus Hauf

发明人： Martin Schriever ,  Ulrich Wegmann ,  Stefan Hembacher ,  Bernhard Geuppert ,  Juergen Huber ,  Norbert Kerwien ,  Michael Totzeck ,  Markus Hauf

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70825 ,  G03F7/70041 ,  G03F7/70266

摘要： The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.

摘要翻译： 本发明涉及一种光学装置，其包括以具有脉冲频率的光脉冲形式发光的光源，并且包括至少一个光学元件。 本公开还涉及包括脉冲光源和投影物镜的投影曝光机，以及用于修改诸如投影曝光机中的这种装置的成像行为的方法。

公开(公告)号：US20100201959A1

公开(公告)日：2010-08-12

申请号：US12723496

申请日：2010-03-12

申请人： Helmut Beierl ,  Heiko Feldmann ,  Jochen Hetzler ,  Michael Totzeck

发明人： Helmut Beierl ,  Heiko Feldmann ,  Jochen Hetzler ,  Michael Totzeck

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G02B1/02 ,  G02B21/33 ,  G03F7/70941

摘要： A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.

摘要翻译： 用于微光刻的投影物镜包括至少一个具有设置在物平面和像平面之间的光学元件的光学组件。 光学组件包括靠近图像平面设置的至少一个光学终端元件。 第一浸没液体设置在光学终端元件的图像取向表面上。 第二浸没液体设置在光学终端元件的物体取向表面上。 面向对象的表面包括用于成像光进入端子元件的第一表面部分，并且图像取向表面包括用于成像光从终端元件退出的第二表面部分。