公开(公告)号：US07279253B2

公开(公告)日：2007-10-09

申请号：US10936806

申请日：2004-09-09

申请人： Tomohiro Yamada ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Tomohiro Yamada ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03F1/00

CPC分类号： G03F1/54 ,  G03F1/50

摘要： A near-field exposure mask includes a mask base material and a light blocking layer formed on the base material, the light blocking layer includes a fine metal structure or fine opening formed in the light blocking layer. The size of the metal structure or the size of the opening is not more than a wavelength of light for exposure, and at least one of a cross section of the fine metal structure in a direction perpendicular to a surface of the mask, and a cross section of the fine opening in a direction perpendicular to the mask surface has an asymmetrical sectional shape with respect to an arbitrary axis perpendicular to the mask surface.

摘要翻译： 近场曝光掩模包括掩模基材和形成在基材上的遮光层，遮光层包括形成在遮光层中的细金属结构或细孔。 金属结构的尺寸或开口的尺寸不大于用于曝光的光的波长，并且细小金属结构的垂直于掩模的表面的方向的横截面中的至少一个和十字 在与掩模表面垂直的方向上的细孔的截面相对于垂直于掩模表面的任意轴具有不对称的截面形状。

公开(公告)号：US20070146680A1

公开(公告)日：2007-06-28

申请号：US10554993

申请日：2005-06-24

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03B27/62

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70433 ,  G03F7/70691 ,  G03F9/703 ,  G03F9/7053 ,  G03F9/7088

摘要： Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure apparatus is arranged to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern, wherein for exposure the exposure mask is flexed to be brought into contact with an object to be exposed. The exposure apparatus includes a distance detecting system for detecting a distance between the exposure mask before being flexed and the object to be exposed, and a distance controlling system for controlling the distance between the exposure mask before being flexed and the object to be exposed, on the basis of a signal from the distance detecting system.

摘要翻译： 公开了一种用于改进的光刻技术的曝光装置，曝光方法和曝光掩模。 具体地，根据本发明的一个优选形式，曝光装置被布置成与具有可弹性变形的保持构件和设置在保持构件上并形成有开口图案的遮光膜的曝光掩模一起使用，其中， 暴露曝光掩模被弯曲以与待曝光的物体接触。 曝光装置包括用于检测在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离检测系统，以及用于控制在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离控制系统， 来自距离检测系统的信号的基础。

公开(公告)号：US20070065734A1

公开(公告)日：2007-03-22

申请号：US11548756

申请日：2006-10-12

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03C5/00 ,  G03F1/00

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

摘要： An exposure method for exposing a workpiece on the basis of near-field light escaping from an opening of a mask. The method includes projecting non-polarized exposure light having a predetermined wavelength, emitted from a laser light source and passed through a depolarization device and a diffusion device, onto an exposure mask having a light blocking film formed with a plurality of rectangular openings therein, the openings having (i) a width in a widthwise direction not greater than one-third of the wavelength of the exposure light and (ii) two or more lengthwise directions extending along the mask surface, so that near-field light escaping from the openings performs exposure of a pattern on the basis of the openings.

摘要翻译： 一种用于基于从掩模的开口逸出的近场光暴露工件的曝光方法。 该方法包括将从激光源射出并通过去极化装置和扩散装置的具有预定波长的非偏振曝光光投射到具有形成有多个矩形开口的遮光膜的曝光掩模上， 具有（i）宽度方向的宽度不大于曝光光的波长的三分之一的开口和（ii）沿着掩模表面延伸的两个或更多个长度方向，使得从开口逸出的近场光执行 在开口的基础上曝光图案。

公开(公告)号：US07151250B2

公开(公告)日：2006-12-19

申请号：US11254638

申请日：2005-10-21

申请人： Yasuhiro Shimada ,  Ryo Kuroda

发明人： Yasuhiro Shimada ,  Ryo Kuroda

IPC分类号： G02B6/10

CPC分类号： G01Q60/22 ,  G02B6/10 ,  G02B6/122 ,  G02B6/241

摘要： A probe for detecting light or irradiating light comprises a cantilever supported at an end thereof by a substrate, a hollow tip formed at a free end of the cantilever, a microaperture formed at the end of the tip, and a hollow waveguide formed inside the cantilever.A method for producing a probe for light detection or light irradiation which comprises the steps of working a substrate to form a groove therein, forming a flat plate-shaped cover portion on the groove to form a hollow waveguide having an opening in a part thereof, forming a hollow tip having a microaperture on the opening, and removing a part of the substrate by etching, to form a cantilever.

公开(公告)号：US07136145B2

公开(公告)日：2006-11-14

申请号：US10630792

申请日：2003-07-31

申请人： Takako Yamaguchi ,  Ryo Kuroda

发明人： Takako Yamaguchi ,  Ryo Kuroda

IPC分类号： G03B27/42 ,  G03B27/02 ,  G03F1/00

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F7/16 ,  G03F7/2014 ,  G03F7/70325

摘要： An apparatus for forming a pattern by using a photomask including both a minute aperture where a main component of a transmitted light is an evanescent light and an aperture where a main component of a transmitted light is a propagating light. The apparatus includes a sample stand for placing a substrate to be processed on which a photoresist with a film thickness equal to or smaller than a width of the minute aperture is formed, a stage for placing the photomask, a light source for generating light for exposure, and a device for controlling a distance between the substrate to be processed and the photomask.

摘要翻译： 一种用于通过使用包括透射光的主要成分为ev逝光的微小孔和透射光的主要成分为传播光的孔的光掩模形成图案的装置。 该装置包括用于放置待处理基板的样品台，其上形成有薄膜厚度等于或小于微孔宽度的光致抗蚀剂，用于放置光掩模的台，用于产生曝光的光源 以及用于控制待处理基板与光掩模之间的距离的装置。

公开(公告)号：US07068353B2

公开(公告)日：2006-06-27

申请号：US10011974

申请日：2001-12-11

申请人： Koji Yano ,  Ryo Kuroda ,  Kohei Okamoto

发明人： Koji Yano ,  Ryo Kuroda ,  Kohei Okamoto

IPC分类号： G03B27/54

CPC分类号： G03F7/70058 ,  G03B27/42

摘要： An exposure apparatus includes a light-emitting portion arranged so as to be opposite to a photosensitive member at a position for exposure. A part of the light-emitting portion is smaller in width than a wavelength of light from the light-emitting portion.

摘要翻译： 曝光装置包括在曝光位置处与感光部件相对配置的发光部。 发光部的一部分的宽度比来自发光部的光的波长小。

公开(公告)号：US06982419B2

公开(公告)日：2006-01-03

申请号：US11102662

申请日：2005-04-11

申请人： Yasuhiro Shimada ,  Ryo Kuroda

发明人： Yasuhiro Shimada ,  Ryo Kuroda

IPC分类号： H01J40/14

CPC分类号： G01Q60/22 ,  G02B6/10 ,  G02B6/122 ,  G02B6/241

摘要： A probe for detecting light or irradiating light comprises a cantilever supported at an end thereof by a substrate, a hollow tip formed at a free end of the cantilever, a microaperture formed at the end of the tip, and a hollow waveguide formed inside the cantilever.A method for producing a probe for light detection or light irradiation which comprises the steps of working a substrate to form a groove therein, forming a flat plate-shaped cover portion on the groove to form a hollow waveguide having an opening in a part thereof, forming a hollow tip having a microaperture on the opeining, and removing a part of the substrate by etching, to form a cantilever.

公开(公告)号：US06628392B2

公开(公告)日：2003-09-30

申请号：US09931720

申请日：2001-08-20

申请人： Ryo Kuroda ,  Yasuhiro Shimada ,  Junichi Seki ,  Takako Yamaguchi ,  Yasuhisa Inao

发明人： Ryo Kuroda ,  Yasuhiro Shimada ,  Junichi Seki ,  Takako Yamaguchi ,  Yasuhisa Inao

IPC分类号： G01B1100

CPC分类号： G03F9/703 ,  G03F9/7038 ,  G03F9/7049 ,  G03F9/7088

摘要： Disclosed herein is a light modulating apparatus comprising first and second two periodic structures each having a period smaller than the wavelength of light emitted from a light source, and a moving means for relatively moving the two periodic structures, wherein the surface of the first periodic structure is brought near to the surface of the second periodic structure to a space not longer than the wavelength to arrange them in a state opposed to each other, the light incident on the first periodic structure is converted into near-field light by the first periodic structure, the converted near-field light is transmitted through the second periodic structure and converted into propagation light by scattering the near-field light on the back surface of the second periodic structure, and the intensity of the propagation light is modulated by relatively moving the two periodic structures by the moving means.

摘要翻译： 这里公开了一种光调制装置，其包括第一和第二两个周期性结构，每个周期结构的周期小于从光源发射的光的波长;以及移动装置，用于相对移动两个周期性结构，其中第一周期性结构的表面 被带到第二周期性结构的表面附近到不长于波长的空间以将它们布置成彼此相对的状态，入射到第一周期性结构的光被第一周期性结构转换成近场光 转换的近场光透过第二周期结构传播，并通过散射第二周期结构的背面上的近场光而转换为传播光，并且传播光的强度通过相对移动两个 通过移动装置的周期性结构。

公开(公告)号：US06337477B1

公开(公告)日：2002-01-08

申请号：US09353153

申请日：1999-07-14

申请人： Yasuhiro Shimada ,  Takayuki Yagi ,  Ryo Kuroda

发明人： Yasuhiro Shimada ,  Takayuki Yagi ,  Ryo Kuroda

IPC分类号： G12B2100

CPC分类号： G01Q60/22 ,  Y10S977/875 ,  Y10S977/879

摘要： A probe with a micro-projection for a near-field scanning optical microscope (NSOM) which comprises a substrate, first and second junction layers which are arranged on the substrate and electrically isolated from each other and which are made of an electroconductive material, and a micro-projection bonded to the substrate by way of the first and second junction layers and having a cavity in the inside. The micro-projection has first and second material layer made of different respective materials and laid one on the other to form a junction interlayer therebetween. The first and second material layers are electrically connected to the first and second junction layers respectively and independently.

摘要翻译： 一种具有用于近场扫描光学显微镜（NSOM）的微投影的探针，其包括衬底，布置在衬底上并彼此电隔离并且由导电材料制成的第一和第二接合层，以及 微突起通过第一和第二接合层接合到衬底并且在内部具有空腔。 微型突起具有由不同的材料制成的第一和第二材料层，并在另一个之间铺设，以在它们之间形成连接中间层。 第一和第二材料层分别和独立地电连接到第一和第二结层。

公开(公告)号：US6040848A

公开(公告)日：2000-03-21

申请号：US944895

申请日：1997-10-06

申请人： Shunichi Shido ,  Ryo Kuroda

发明人： Shunichi Shido ,  Ryo Kuroda

IPC分类号： G11B9/14 ,  G11B9/00 ,  B41J2/385

CPC分类号： B82Y10/00 ,  G11B9/14 ,  Y10S977/947

摘要： In recording of information, a voltage is applied to between a probe and a recording medium. A capacitor stores charges from a DC power supply. A switch is provided so as to disconnect the capacitor and the DC power supply. When information is to be recorded, the capacitor and the DC power supply are disconnected from each other by the switch and the charges stored in the capacitor are output to the probe or recording medium.

摘要翻译： 在记录信息时，在探头和记录介质之间施加电压。 电容器存储来自直流电源的电荷。 提供开关以便断开电容器和直流电源。 当要记录信息时，电容器和直流电源通过开关彼此断开，并且存储在电容器中的电荷被输出到探针或记录介质。