X-ray sources using linear accumulation
    61.
    发明授权
    X-ray sources using linear accumulation 有权
    X射线源使用线性积分

    公开(公告)号:US09390881B2

    公开(公告)日:2016-07-12

    申请号:US14490672

    申请日:2014-09-19

    Applicant: Sigray, Inc.

    CPC classification number: H01J35/08 G21K1/06 H01J2235/081 H01J2235/086

    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness.Some embodiments of the invention comprise x-ray optical elements placed between sub-sources of x-rays. These x-ray optical elements may form images of one or more x-ray sub-sources in alignment with other x-ray sub-sources, and may enhance the linear accumulation that can be achieved.

    Abstract translation: 公开了用于高亮度x射线产生的紧凑源。 通过彼此对准的多个区域的电子束轰击实现较高的亮度,以实现x射线的线性积累。 这可以通过对齐离散x射线子源或通过使用包含与具有高导热性的基底紧密热接触制造的x射线产生材料的微结构的x射线靶来实现。 这样可以更有效地将热量从X射线产生材料中拉出,并且进而允许以更高的电子密度和/或更高能量的电子轰击x射线产生材料,导致更大的x射线亮度。 本发明的一些实施例包括放置在x射线的子源之间的x射线光学元件。 这些X射线光学元件可以形成与其他x射线子源对准的一个或多个x射线子源的图像,并且可以增强可以实现的线性累积。

    Microfocus x-ray source for generating high flux low energy x-rays

    公开(公告)号:US12278080B2

    公开(公告)日:2025-04-15

    申请号:US18152973

    申请日:2023-01-11

    Applicant: Sigray, Inc.

    Abstract: An x-ray source includes an x-ray transmissive window having an x-ray transmittance greater than or equal to 20% for at least some x-rays having an x-ray energy less than 1 keV. The x-ray source further includes an electron source configured to generate at least one electron beam and an anode assembly configured to generate x-rays in response to electron bombardment by at least some of the electrons of the at least one electron beam from the electron source. The x-ray source further includes at least one x-ray optic is configured to receive at least some of the x-rays from the anode assembly and to direct at least some of the received x-rays to the window to form an x-ray beam.

    High throughput 3D x-ray imaging system using a transmission x-ray source

    公开(公告)号:US12153001B2

    公开(公告)日:2024-11-26

    申请号:US18311558

    申请日:2023-05-03

    Applicant: Sigray, Inc.

    Abstract: A three-dimensional x-ray imaging system includes at least one detector and an x-ray source including an x-ray transmissive vacuum window. The x-ray source is configured to produce diverging x-rays emerging from the vacuum window and propagating along an x-ray propagation axis extending through a region of interest of an object to the at least one detector. The diverging x-rays have propagation paths within an angular divergence angle greater than 1 degree centered on the x-ray propagation axis. The system further includes at least one sample motion stage configured to rotate the object about a rotation axis. The system further includes a sample mount configured to hold the object and comprises a first portion in the propagation paths of at least some of the diverging x-rays and having an x-ray transmission greater than 30% for x-rays having energies greater than 50% of a maximum x-ray energy of an x-ray spectrum of the diverging x-rays.

    System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector

    公开(公告)号:US11992350B2

    公开(公告)日:2024-05-28

    申请号:US18176760

    申请日:2023-03-01

    Applicant: Sigray, Inc.

    CPC classification number: A61B6/4266 A61B6/4241

    Abstract: An x-ray computed laminography imaging system includes a transmission x-ray source configured to generate x-rays, at least some of the x-rays propagate along an x-ray propagation axis through a region of interest of an object. The system further includes a stage assembly configured to rotate the object about a rotation axis extending through the region of interest. The system further includes at least one x-ray detector configured to intercept at least some of the x-rays propagating along the x-ray propagation axis. The at least one x-ray detector includes a scintillator, at least one optical lens, and two-dimensional pixelated imaging circuitry. The scintillator has a thickness that is substantially parallel to the x-ray propagation axis and the at least one optical lens is configured to receive visible light from the scintillator and to focus the visible light into a two-dimensional image. The at least one optical lens has a depth of focus, and the thickness of the scintillator is in a range of 1 to 20 times the depth of focus.

    System and method for x-ray absorption spectroscopy using a crystal analyzer and a plurality of detector elements

    公开(公告)号:US11215572B2

    公开(公告)日:2022-01-04

    申请号:US17320852

    申请日:2021-05-14

    Applicant: Sigray, Inc.

    Abstract: An apparatus includes a crystal analyzer positioned relative to an x-ray source on a Rowland circle. The crystal analyzer includes crystal planes curved along at least one direction and configured to receive x-rays from the x-ray source and to disperse the received x-rays according to Bragg's law. The apparatus further includes a spatially resolving detector that includes a plurality of x-ray detection elements having a tunable first x-ray energy and/or a tunable second x-ray energy. The plurality of x-ray detection elements are configured to measure received dispersed x-rays having x-ray energies below the first x-ray energy while suppressing measurements above the first x-ray energy and/or to measure the received dispersed x-rays having x-ray energies above the second x-ray energy while suppressing measurements below the second x-ray energy.

    X-ray dark-field in-line inspection for semiconductor samples

    公开(公告)号:US11175243B1

    公开(公告)日:2021-11-16

    申请号:US17167870

    申请日:2021-02-04

    Applicant: Sigray, Inc.

    Abstract: An x-ray imaging/inspection system includes an x-ray source having a plurality of sub-sources in thermal communication with a substrate. The system further includes a first grating positioned to receive at least some of the x-rays from the x-ray source, a stage configured to hold a sample positioned to receive at least some of the x-rays from the x-ray source, at least one x-ray detector, and a second grating having periodic structures. The x-ray source, the first grating, and the second grating are configured such that a ratio of a pitch p0 of the plurality of sub-sources to a pitch p2 of the periodic structures of the second grating is substantially equal to a ratio of a distance dS-G1 between the plurality of sub-sources and the first grating and a distance dG1-G2 between the first grating and the second grating: (p0/p2)=(dS-G1/dG1-G2).

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