公开(公告)号：US20080038732A1

公开(公告)日：2008-02-14

申请号：US11686506

申请日：2007-03-15

申请人： Jung-Hwan Hah ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim ,  Han-ku Cho ,  Sang-jun Choi ,  Man-hyoung Ryoo

发明人： Jung-Hwan Hah ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim ,  Han-ku Cho ,  Sang-jun Choi ,  Man-hyoung Ryoo

IPC分类号： C12Q1/68 ,  C07H21/00

CPC分类号： C12Q1/6834 ,  C12Q2563/155

摘要： An oligomer probe array having improved reaction yield is provided. The oligomer probe array includes a substrate, an immobilization layer on the substrate, a plurality of nano particles coupled with a surface of the immobilization layer, and a plurality of oligomer probes coupled with surfaces of the nano particles.

摘要翻译： 提供了具有改善的反应产率的低聚物探针阵列。 低聚物探针阵列包括基底，基底上的固定层，与固定层的表面耦合的多个纳米颗粒以及与纳米颗粒的表面耦合的多个低聚物探针。

公开(公告)号：US20050019693A1

公开(公告)日：2005-01-27

申请号：US10925983

申请日：2004-08-26

申请人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

发明人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

IPC分类号： G03F7/039 ,  G03C1/76

CPC分类号： G03F7/0395

摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

摘要翻译： 感光性高分子包含作为取代基具有C1〜C12脂肪族醇的降冰片酯的第一单体和作为马来酸酐的第二单体。 含有光敏聚合物的化学放大光致抗蚀剂组合物具有改进的抗蚀刻性和对下层材料的粘附性，并且显示出对显影液的润湿性。

公开(公告)号：US06800418B2

公开(公告)日：2004-10-05

申请号：US10264429

申请日：2002-10-04

申请人： Kwang-sub Yoon ,  Ki-yong Song ,  Sang-jun Choi ,  Sang-gyun Woo

发明人： Kwang-sub Yoon ,  Ki-yong Song ,  Sang-jun Choi ,  Sang-gyun Woo

IPC分类号： G03F7004

CPC分类号： C08F232/08 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/108

摘要： Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer. The photosensitive polymer has an average molecular weight of about 3,000-100,000 with a repeating unit including a group having one of structural formulae below:

摘要翻译： 提供具有水合物结构的含氟光敏聚合物和包含光敏聚合物的抗蚀剂组合物。 光敏聚合物的平均分子量约为3,000-100,000，重复单元包括具有以下结构式之一的基团：

公开(公告)号：US06753125B2

公开(公告)日：2004-06-22

申请号：US09888912

申请日：2001-06-25

申请人： Sang-jun Choi ,  Yool Kang

发明人： Sang-jun Choi ,  Yool Kang

IPC分类号： G03F7038

CPC分类号： G03F7/0392 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A photosensitive polymer having a protecting group including a fused aromatic ring, and a photoresist composition including the photosensitive polymer are provided. The photosensitive polymer has an acid-labile protecting group at its polymer backbone, the acid-labile protecting group including a fused aromatic ring having formula: where R1 is hydrogen atom or alkyl group having from 1 to 4 carbon atoms; X is hydrogen atom, halogen, alkyl, or alkoxy; and y is an integer from 1 to 3, wherein the fused aromatic ring is a liner ring or branched ring with y greater than or equal to 2. A photoresist composition is also provided which includes the photosensitive polymer and a photoacid generator (PAG).

摘要翻译： 提供了具有包含稠合芳环的保护基的光敏聚合物和包含该光敏聚合物的光致抗蚀剂组合物。 光敏聚合物在其聚合物主链上具有酸不稳定的保护基，酸不稳定保护基包括具有下式的稠合芳环：其中R 1是氢原子或具有1至4个碳原子的烷基; X是氢原子，卤素，烷基或烷氧基; y为1〜3的整数，其中稠合芳香环为y大于或等于2的衬垫环或分支环。还提供了包含光敏聚合物和光致酸产生剂（PAG）的光致抗蚀剂组合物。

公开(公告)号：US06713229B2

公开(公告)日：2004-03-30

申请号：US10153474

申请日：2002-05-21

申请人： Sang-jun Choi ,  Chun-geun Park ,  Young-bum Koh

发明人： Sang-jun Choi ,  Chun-geun Park ,  Young-bum Koh

IPC分类号： G03F7004

CPC分类号： C08F220/18 ,  C08F222/06 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/111 ,  Y10S430/115

摘要： Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.

摘要翻译： 共聚物和三聚体用于化学增强抗蚀剂。 三元共聚物具有下式：其中R 3选自氢和C 1至C 10脂族烃，其中脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基 ; R4选自氢和C1至C10脂族烃，其中脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基; R5选自氢和甲基; R6选自叔丁基和四氢吡喃基; m和n分别为整数; 并且其中n /（m + n）为约0.1至约0.5。

公开(公告)号：US06673513B2

公开(公告)日：2004-01-06

申请号：US09764150

申请日：2001-01-19

申请人： Sang-jun Choi ,  Hyun-woo Kim

发明人： Sang-jun Choi ,  Hyun-woo Kim

IPC分类号： G03F7004

CPC分类号： C08F222/06 ,  C08F216/165 ,  C08F220/18 ,  C08F232/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/115

摘要： There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures wherein y is one of the integer values 1 through 4, R1 is one of a hydrogen atom and a methyl group, R2 is a C1 to C20 hydrocarbon, and R3 is one of a hydrogen atom, a C1 to C3 alkyl group and an alkoxy group.

摘要翻译： 提供了具有烷基乙烯基醚的共聚物和含有该共聚物的抗蚀剂组合物的感光性聚合物。 感光性高分子包括烷基乙烯基醚和马来酸酐的共聚物，由以下结构表示：其中X是直链烷基乙烯基醚和环状烷基乙烯基醚之一，其分别由y是整数之一的结构 值1至4，R 1是氢原子和甲基之一，R 2是C 1至C 20烃，R 3是氢原子，C 1至C 3烷基和烷氧基之一。

公开(公告)号：US06642336B1

公开(公告)日：2003-11-04

申请号：US09644101

申请日：2000-08-23

申请人： Sook Lee ,  Ki-young Kwon ,  Si-hyeung Lee ,  Kwang-sub Yoon ,  Hyun-woo Kim ,  Dong-won Jung ,  Sang-jun Choi ,  Sang-gyun Woo

发明人： Sook Lee ,  Ki-young Kwon ,  Si-hyeung Lee ,  Kwang-sub Yoon ,  Hyun-woo Kim ,  Dong-won Jung ,  Sang-jun Choi ,  Sang-gyun Woo

IPC分类号： C08F1000

CPC分类号： G03F7/039 ,  C08G61/08 ,  G03F7/0045

摘要： A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C6 to C20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.

摘要翻译： 即使暴露于193nm以下的短波长光源也能够保持透明性的光敏性聚合物表现出改善的对基材的粘合性，改善的对比度和改善的耐干蚀刻性。 感光性高分子包括具有酸不稳定性C6〜C20叔脂环族烃基作为取代基的脂环式羧酸酯的第一单体和能够进行自由基聚合的第二单体。

公开(公告)号：US06537727B2

公开(公告)日：2003-03-25

申请号：US09901569

申请日：2001-07-11

申请人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

发明人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

IPC分类号： G03F7038

CPC分类号： G03F7/0395 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106

摘要： A resist composition includes a photosensitive polymer having a lactone in its backbone. The photosensitive polymer of the resist composition includes at least one of the monomers having the formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x, y, v and w are independently integers from 1 to 6.

摘要翻译： 抗蚀剂组合物包括在其主链中具有内酯的光敏聚合物。 抗蚀剂组合物的光敏聚合物包含至少一种具有下式的单体：其中R 1和R 2独立地为氢原子，烷基，羟烷基，烷氧基，羰基或酯，x，y，v和w独立地为 1〜6。

公开(公告)号：US06517990B1

公开(公告)日：2003-02-11

申请号：US09576053

申请日：2000-05-23

申请人： Sang-jun Choi ,  Hyun-woo Kim

发明人： Sang-jun Choi ,  Hyun-woo Kim

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  G03F7/004 ,  G03F7/039 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/111

摘要： There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures wherein y is one of the integer values 1 through 4, R1 is one of a hydrogen atom and a methyl group, R2 is a C1 to C20 hydrocarbon, and R3 is one of a hydrogen atom, a C1 to C3 alkyl group and an alkoxy group.

摘要翻译： 提供了具有烷基乙烯基醚的共聚物和含有该共聚物的抗蚀剂组合物的感光性聚合物。 感光性高分子包括烷基乙烯基醚和马来酸酐的共聚物，由以下结构表示：其中X是直链烷基乙烯基醚和环状烷基乙烯基醚之一，其分别由y是整数之一的结构 值1至4，R 1是氢原子和甲基之一，R 2是C 1至C 20烃，R 3是氢原子，C 1至C 3烷基和烷氧基之一。

公开(公告)号：US06515038B2

公开(公告)日：2003-02-04

申请号：US09915670

申请日：2001-07-26

申请人： Sang-jun Choi

发明人： Sang-jun Choi

IPC分类号： C08L3300

CPC分类号： C08F212/14 ,  C08F8/32 ,  C08F220/28 ,  G03F7/0392 ,  C08F2220/283 ,  C08F2220/1825

摘要： A polymer used in a chemically amplified resist is represented by the following formula: wherein R1, R3 and R5 are each independently selected from the group consisting of —H, and —CH3; R2 is selected from the group consisting of t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; R4 is selected from the group consisting of —H, —CH3, t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; x is an integer ranging from 1 to 4; and wherein l, m, and n are selected such that l/(l+m+n) ranges from 0.1 to 0.5, m/(l+m+n) ranges from 0.01 to 0.5, and (l+m)/(l+m+n) ranges from 0.1 to 0.7.

摘要翻译： 用于化学放大抗蚀剂的聚合物由下式表示：其中R1，R3和R5各自独立地选自-H和-CH3; R2选自叔丁基，四氢吡喃基和1-烷氧基乙基; R 4选自-H，-CH 3，叔丁基，四氢吡喃基和1-烷氧基乙基; x是1〜4的整数; 并且其中l，m和n被选择为使得l /（1 + m + n）为0.1至0.5，m /（1 + m + n）为0.01至0.5，和（1 + m）/（ 1 + m + n）为0.1〜0.7。