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公开(公告)号：US08735814B2
公开(公告)日：2014-05-27
申请号：US13879051
申请日：2011-10-05
CPC分类号： H01J37/023 , H01J37/153 , H01J37/28 , H01J2237/1534
摘要： The electron beam device includes a source of electrons and an objective deflector. The electron beam device obtains an image on the basis of signals of secondary electrons, etc. which are emitted from a material by an electron beam being projected. The electron beam device further includes a bias chromatic aberration correction element, further including an electromagnetic deflector which is positioned closer to the source of the electrons than the objective deflector, and an electrostatic deflector which has a narrower interior diameter than the electromagnetic deflector, is positioned within the electromagnetic deflector such that the height-wise position from the material overlaps with the electromagnetic deflector, and is capable of applying an offset voltage. It is thus possible to provide an electron beam device with which it is possible to alleviate geometric aberration (parasitic aberration) caused by deflection and implement deflection over a wide field of view with high resolution.
摘要翻译： 电子束装置包括电子源和物镜偏转器。 电子束装置基于通过投射的电子束从材料发射的二次电子等的信号获得图像。 电子束装置还包括偏置色差校正元件，该偏置色差校正元件还包括位于比物镜偏转器更靠近电子源的电磁偏转器和具有比电磁偏转器更窄的内径的静电偏转器， 在电磁偏转器内，使得材料的高度位置与电磁偏转器重叠，并且能够施加偏移电压。 因此，可以提供一种电子束装置，通过该电子束装置可以减轻由偏转引起的几何像差（寄生像差），并且在高分辨率的宽视角上实现偏转。
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公开(公告)号：US08704175B2
公开(公告)日：2014-04-22
申请号：US13812451
申请日：2011-08-26
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/153 , H01J2237/1506 , H01J2237/1532 , H01J2237/2826
摘要： Provided is a scanning electron microscope equipped with a high-speed and high-precision astigmatism measuring means to be used when both astigmatism generated by an electron-beam column and astigmatism generated from the surroundings of a measuring sample exist. This scanning electron microscope is characterized in controlling an astigmatism corrector (201) with high-speed and high-precision, to correct the astigmatism, by using both a method of obtaining the astigmatism from the qualities of two-dimensional images to be acquired upon changing the intensity of the astigmatism corrector (201), and a method of measuring the astigmatism from the change in the position displacement of an electron beam that occurs when the electron beam is tilted using a tilt deflector (202).
摘要翻译： 本发明提供一种扫描电子显微镜，其配备有当由电子束柱产生的散光和从测量样品的周围产生的散光存在时使用的高速和高精度散光测量装置。 该扫描电子显微镜的特征在于以高速和高精度控制像散校正器（201），以通过使用从改变后获得的二维图像的质量获得散光的方法来校正像散 散光校正器（201）的强度，以及根据使用倾斜偏转器（202）使电子束倾斜时发生的电子束的位置偏移的变化来测量像散的方法。
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公开(公告)号：US20120286160A1
公开(公告)日：2012-11-15
申请号：US13451596
申请日：2012-04-20
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/1532 , H01J2237/1536 , H01J2237/2811
摘要： A charged particle instrument including a controlling and operating unit for controlling a charged particle source, deflecting means, and focus changing means and making a data for an image by an electric signal detected by a detector, and a recording unit for preserving a correction coefficient registered at each image-acquisition, in which the controlling and operating unit acquires plural images while changing a focus, and controls an optical condition such that a landing angle of a charged particle beam becomes perpendicular when an image for measurement is acquired on the basis of a position shift amount of a mark in the image and a correction coefficient registered to the recording unit.
摘要翻译： 一种带电粒子仪器，包括用于控制带电粒子源的控制和操作单元，偏转装置和聚焦改变装置，以及通过由检测器检测的电信号为图像提供数据;以及记录单元，用于保持记录的校正系数 在每次图像获取期间，控制和操作单元在改变焦点的同时获取多个图像，并且控制光学条件，使得当基于以下步骤获得用于测量的图像时，带电粒子束的着陆角变为垂直 图像中的标记的位置偏移量和登记到记录单元的校正系数。
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公开(公告)号：US20120286158A1
公开(公告)日：2012-11-15
申请号：US13521254
申请日：2011-02-18
CPC分类号： H01J37/28 , H01J37/09 , H01J37/145 , H01J2237/1506 , H01J2237/1534 , H01J2237/2611
摘要： Provided is a high-resolution scanning electron microscope with minimal aberration, and equipped with an electro-optical configuration that can form a tilted beam having wide-angle polarization and a desired angle, without interfering with an electromagnetic lens. In the scanning electron microscope, an electromagnetic deflector (201) is disposed above a magnetic lens (207), and a control electrode (202) that accelerates or decelerates electrons is provided so at to overlap (in such a manner that the height positions overlap with respect to the vertical direction) with the electromagnetic deflector (201). In wide field polarization, electrodes are accelerated, and in tilted beam formation, electrons are decelerated.
摘要翻译： 提供了一种具有最小像差的高分辨率扫描电子显微镜，并且具有能够形成具有广角偏振和期望角度的倾斜光束而不干扰电磁透镜的电光结构。 在扫描电子显微镜中，电磁偏转器（201）设置在磁性透镜（207）的上方，并且设置使电子加速或减速的控制电极（202）重叠（以使得高度位置重叠 相对于垂直方向）与电磁偏转器（201）。 在宽场极化中，电极被加速，并且在倾斜的波束形成中，电子被减速。
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65.发明授权Standard member for correction, scanning electron microscope using same, and scanning electron microscope correction method 有权标准校正元件，扫描电子显微镜及其扫描电子显微镜校正方法公开(公告)号：US08263929B2
公开(公告)日：2012-09-11
申请号：US13057235
申请日：2009-07-31
IPC分类号： G01J1/10
CPC分类号： H01J37/28 , B82Y15/00 , H01J2237/2826
摘要： Disclosed is a standard specimen, used with an electron microscope to correct the magnification with high precision. A standard member used for correction corrects a scanning electron microscope that measures a pattern within an observation region based on information about the secondary electrons generated by scanning incident electron lines on the observation region on a measurement specimen, or information about the reflected electron intensity. The standard member has a first pattern region that corrects the magnification and that comprises a concavo-convex pattern (line/space pattern) in the cross section of a multilayer film that has been laminated, and a second pattern region near the first pattern at almost the same height that does not contain a pattern with the same periodicity as the pattern pitch size of the first region and that is used for beam adjustment.
摘要翻译： 公开了一种标准样品，与电子显微镜一起使用以高精度校正放大率。 用于校正的标准构件基于通过扫描测量样本上的观察区域上的入射电子线扫描产生的二次电子信息或关于反射电子强度的信息来校正观察区域内的图案的扫描电子显微镜。 标准构件具有第一图案区域，该第一图案区域校正放大率，并且在层压的多层膜的横截面中包括凹凸图案（线/空间图案），以及在第一图案附近的第二图案区域 相同的高度不包含与第一区域的图案间距尺寸相同的周期性的图案，并且用于光束调节。
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66.发明申请Standard Member for Correction, Scanning Electron Microscope Using Same, and Scanning Electron Microscope Correction Method 有权标准校正成员，使用扫描电子显微镜和扫描电子显微镜校正方法公开(公告)号：US20110133065A1
公开(公告)日：2011-06-09
申请号：US13057235
申请日：2009-07-31
IPC分类号： G01D18/00 , G01N23/00 , G01N23/225
CPC分类号： H01J37/28 , B82Y15/00 , H01J2237/2826
摘要： Disclosed is a standard specimen, used with an electron microscope to correct the magnification with high precision. A standard member used for correction corrects a scanning electron microscope that measures a pattern within an observation region based on information about the secondary electrons generated by scanning incident electron lines on the observation region on a measurement specimen, or information about the reflected electron intensity. The standard member has a first pattern region that corrects the magnification and that comprises a concavo-convex pattern (line/space pattern) in the cross section of a multilayer film that has been laminated, and a second pattern region near the first pattern at almost the same height that does not contain a pattern with the same periodicity as the pattern pitch size of the first region and that is used for beam adjustment.
摘要翻译： 公开了一种标准样品，与电子显微镜一起使用以高精度校正放大率。 用于校正的标准构件基于通过扫描测量样本上的观察区域上的入射电子线扫描产生的二次电子信息或关于反射电子强度的信息来校正观察区域内的图案的扫描电子显微镜。 标准构件具有第一图案区域，该第一图案区域校正放大率，并且在层压的多层膜的横截面中包括凹凸图案（线/空间图案），以及在第一图案附近的第二图案区域 相同的高度不包含与第一区域的图案间距尺寸相同的周期性的图案，并且用于光束调节。
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67.发明授权公开(公告)号：US07875850B2
公开(公告)日：2011-01-25
申请号：US12078516
申请日：2008-04-01
CPC分类号： G01N23/225 , H01J37/28 , H01J2237/20 , H01J2237/2826 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： The invention provides a standard component for calibration that enables a calibration position to be easily specified in order to calibrate accurately a scale factor in the electron-beam system, and provides an electron-beam system using it. The standard component for calibration is one that calibrates a scale factor of an electron-beam system based on a signal of secondary charged particles detected by irradiation of a primary electron beam on a substrate having a cross section of a superlattice of a multi-layer structure in which different materials are deposited alternately. The substrate has linear patterns on the substrate surface parallel to the multi-layers and are arranged at a fixed interval in a direction crossing the cross section of the superlattice pattern, and the cross sections of the linear patterns are on substantially the same plane of the superlattice cross section, so that the linear patterns enable a position of the superlattice pattern to be identified.
摘要翻译： 本发明提供了一种用于校准的标准组件，其使得能够容易地指定校准位置，以便准确地校准电子束系统中的比例因子，并提供使用该电子束系统的电子束系统。 用于校准的标准组件是基于通过在具有多层结构的超晶格的横截面的基板上照射一次电子束而检测的二次带电粒子的信号来校准电子束系统的比例因子的标准组件 其中不同的材料交替沉积。 衬底在平行于多层的衬底表面上具有线性图案，并且在与超晶格图案的横截面交叉的方向上以固定的间隔布置，并且线状图案的横截面在 超晶格截面，使得线性图案能够识别超晶格图案的位置。
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公开(公告)号：US20070172967A1
公开(公告)日：2007-07-26
申请号：US11626402
申请日：2007-01-24
申请人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
发明人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
IPC分类号： H01L21/66
CPC分类号： G03F9/7049 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/703 , G03F9/7084 , G03F9/7088
摘要： Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
摘要翻译： 通过纳米压印技术形成图案的方法开始于在其表面上制备具有纳米结构的模具。 将模具压在涂有树脂膜的基板或板上。 检测在涂覆有树脂膜的板的后表面上形成的对准标记的位置。 因此，执行模具和涂覆有树脂膜的板之间的相对对准。
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公开(公告)号：US6121625A
公开(公告)日：2000-09-19
申请号：US87296
申请日：1998-05-29
申请人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
发明人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
IPC分类号： G03F7/20 , C08F10/02 , G03F1/20 , H01J37/147 , H01J37/317 , H01L21/027 , H01J37/304
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for a mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.
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公开(公告)号：US5759423A
公开(公告)日：1998-06-02
申请号：US563329
申请日：1995-11-28
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027 , B44C1/22 , H01L21/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： An electron beam writing apparatus comprises: an electron beam source for projecting an electron beam; a first mask provided with a first rectangular aperture for passing the electron beam projected by the electron beam source to shape the electron beam in a primary shaped beam having a rectangular cross section; a second mask provided with a second rectangular aperture for passing the primary shaped beam to shape the primary shaped beam in a secondary shaped beam having a rectangular cross section, and triangular apertures for passing the primary shaped beam to form a secondary shaped beam having a triangular cross section; a first electron beam deflecting system for moving the primary shaped beam on the surface of the second mask; and a second electron beam deflecting system for moving the secondary shaped beam on the surface of a workpiece on which a pattern is to be written. Each of the triangular apertures is formed in a size such that the triangular aperture can be entirely covered with a rectangular image formed by the first shaped beam on the surface of the second mask.
摘要翻译： 电子束写入装置包括：用于投射电子束的电子束源; 第一掩模，设置有第一矩形孔，用于使由电子束源投影的电子束通过，以将电子束形成为具有矩形横截面的主要形状的梁; 第二掩模，其设置有第二矩形孔，用于使主要成形梁通过，以形成具有矩形截面的次级成形梁的主要成形梁，以及三角形孔，用于使初级成形梁通过以形成具有三角形的二次成形梁 横截面; 第一电子束偏转系统，用于将第一形状光束移动到第二掩模的表面上; 以及用于在待写入图案的工件的表面上移动二次成形光束的第二电子束偏转系统。 每个三角形孔形成为使得三角形孔可以被由第二掩模的表面上的第一成形束形成的矩形图像完全覆盖的尺寸。
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