公开(公告)号：US4247554A

公开(公告)日：1981-01-27

申请号：US795887

申请日：1977-05-11

申请人： Hisao Yamamoto ,  Toshiaki Komatsu ,  Hiroshi Awata

发明人： Hisao Yamamoto ,  Toshiaki Komatsu ,  Hiroshi Awata

IPC分类号： A61K31/505

CPC分类号： A61K31/505 ,  Y10S514/926 ,  Y10S514/927

摘要： A method for preventing gastro-intestinal ulcer caused by a non-steroidal anti-inflammatory agent, which comprises administering an effective amount of a quinazolinone of the formula, ##STR1## wherein R.sub.1 is C.sub.1-3 alkyl, cyclopropylmethyl or 2,2,2-trifluoroethyl, R.sub.2 is halogen, C.sub.1-3 alkyl or C.sub.1-3 alkoxy, and R.sub.3 is phenyl or thienyl, or a non-toxic pharmaceutically acceptable salt thereof in combination with a pharmaceutically effective amount of the non-steroidal anti-inflammatory agent.

摘要翻译： 一种用于预防由非甾体抗炎药引起的胃肠溃疡的方法，其包括给予有效量的下式的喹唑啉酮，其中R 1为C 1-3烷基，环丙基甲基或2,2,2 三氟乙基，R 2是卤素，C 1-3烷基或C 1-3烷氧基，R 3是苯基或噻吩基，或其无毒的药学上可接受的盐与药学上有效量的非甾体抗炎剂的组合。

公开(公告)号：US4241070A

公开(公告)日：1980-12-23

申请号：US736072

申请日：1976-10-27

申请人： Junki Katsube ,  Hiroyuki Mizote ,  Shuichi Harada ,  Hisao Yamamoto

发明人： Junki Katsube ,  Hiroyuki Mizote ,  Shuichi Harada ,  Hisao Yamamoto

IPC分类号： A61K31/435 ,  A61P25/04 ,  C07D221/26 ,  A61K31/445

CPC分类号： C07D221/26 ,  Y02P20/55

摘要： 2-Substituted-2'-methyl-6,7-benzomorphan derivatives of the formula: ##STR1## wherein R.sub.1 and R.sub.2 are each hydrogen or C.sub.1 -C.sub.3 alkyl; and R.sub.3 is hydrogen, halogen or C.sub.1 -C.sub.3 alkyl, and pharmaceutically acceptable salts thereof, which are useful as non-addicting analgesics with sedative effects, are prepared by the reaction of a 6,7-benzomorphan derivative of the formula: ##STR2## wherein R.sub.1 and R.sub.2 are as defined above, with a reactive derivative of an alcohol compound of the formula: ##STR3## wherein X is an optionally protected carbonyl group; and R.sub.3 is as defined above, optionally followed by the elimination of the protective group of the carbonyl group, or by the oxidation of a 6,7-benzomorphan derivative of the formula: ##STR4## wherein R.sub.1, R.sub.2 and R.sub.3 are as defined above.

摘要翻译： 具有下式的2-取代的-2'-甲基-6,7-苯并吗啉衍生物：其中R 1和R 2各自为氢或C 1 -C 3烷基; 并且R3是氢，卤素或C1-C3烷基及其药学上可接受的盐，其可用作具有镇静作用的非上瘾止痛剂，通过下式的6,7-苯并吗啉衍生物的反应制备： [II]其中R1和R2如上所定义，与下式的醇化合物的反应性衍生物：其中X是任选被保护的羰基; 并且R 3如上所定义，任选地随后消除羰基的保护基，或通过下式的6,7-苯并吗啉衍生物的氧化：其中R 1，R 2和R 3是 如上所述。

公开(公告)号：US4202974A

公开(公告)日：1980-05-13

申请号：US731574

申请日：1976-10-12

申请人： Michihiro Yamamoto ,  Shigenari Katayama ,  Masao Koshiba ,  Hisao Yamamoto

发明人： Michihiro Yamamoto ,  Shigenari Katayama ,  Masao Koshiba ,  Hisao Yamamoto

IPC分类号： C07D239/78 ,  C07D239/82 ,  C07D409/06 ,  C07D491/056 ,  A61K31/505 ,  C07D491/04

CPC分类号： C07D239/82 ,  C07D239/78

摘要： 3,4-Dihydro-2(1H)-quinazolinones and quniazolinethiones such as 1-cyclopropylmethyl-4-phenyl-6-methoxy-3,4-dihydro-2(1H)-quinazolinone and its thione derivative, are prepared in high yield with high purity by heating the corresponding arylurea or thiourea such as N-cyclopropylmethyl-N-(p-methoxyphenyl) urea or its thiourea derivative, with the corresponding aldehyde such as benzaldehyde in the presence of hydrobromic acid in an inert solvent.

摘要翻译： 以高产率制备3,4-二氢-2（1H） - 喹唑啉酮和quniazolinethiones如1-环丙基甲基-4-苯基-6-甲氧基-3,4-二氢-2（1H） - 喹唑啉酮及其硫酮衍生物 通过在惰性溶剂中，在氢溴酸存在下，将相应的芳基脲或硫脲如N-环丙基甲基-N-（对甲氧基苯基）脲或其硫脲衍生物与相应的醛如苯甲醛加热而得到高纯度。

公开(公告)号：US4039670A

公开(公告)日：1977-08-02

申请号：US568819

申请日：1975-04-17

申请人： Kikuo Sasajima ,  Keiichi Ono ,  Masaru Nakao ,  Hisao Yamamoto

发明人： Kikuo Sasajima ,  Keiichi Ono ,  Masaru Nakao ,  Hisao Yamamoto

IPC分类号： C07D295/10 ,  A61K31/435 ,  A61K31/443 ,  A61K31/445 ,  A61K31/451 ,  A61P9/12 ,  A61P25/00 ,  A61P25/02 ,  A61P25/04 ,  A61P25/20 ,  A61P29/00 ,  C07D211/14 ,  C07D211/52 ,  C07D405/06 ,  C07D471/10 ,  C07D487/10 ,  A01N9/22

CPC分类号： C07D211/52

摘要： Butyrophenone compounds having excellent psychotropic activities represented by the formula: ##STR1## wherein R.sup.1 is a halogen atom, R.sup.2 is a lower alkyl group, and Z is a group of either one of the formulae: ##STR2## (wherein the dotted line indicates the optional presence of an additional single bond linkage, R.sup.3 is a hydrogen atom or a hydroxyl group but only when said additional single bond linkage is not present and R.sup.4 is a hydrogen atom or a phenyl or benzyl group optionally substituted with one or two substituents selected from the group consisting of halogen, lower alkyl, lower alkyoxy and trifluoromethyl on the benzene ring (except monohalophenyl)), ##STR3## (wherein the dotted line indicates the optional presence of an additional single bond linkage, R.sup.5 is a hydrogen atom or a lower alkyl group and R.sup.6 and R.sup.7 are each a hydrogen atom, a halogen atom or a lower alkyl group), ##STR4## (wherein R.sup.8 is a hydrogen atom or a lower alkyl group and R.sup.9 is a hydrogen atom, a halogen atom, a lower alkyl group or a lower alkoxy group), ##STR5## (wherein R.sup.10 is a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxy group or a trifluoromethyl group), or ##STR6##

摘要翻译： 其中R1为卤原子，R2为低级烷基，Z为下列任何一个基团的基团：其中虚线表示的具有极好的精神活性的丁基苯酚化合物由下式表示： 线表示任选地存在另外的单键键，R3是氢原子或羟基，但仅在所述另外的单键键不存在且R4是氢原子或任选被一个或两个取代基取代的苯基或苄基时 取代基选自苯环上的卤素，低级烷基，低级烷氧基和三氟甲基（单卤代苯基除外）），其中虚线表示任选地存在另外的单键键，R5是 氢原子或低级烷基，R6和R7各自为氢原子，卤素原子或低级烷基），其中R8为氢原子或低级烷基，R9为 氢原子，卤素 原子，低级烷基或低级烷氧基），其中R 10为氢原子，卤素原子，低级烷基，低级烷氧基或三氟甲基。 （5）

公开(公告)号：US4001312A

公开(公告)日：1977-01-04

申请号：US497389

申请日：1974-08-14

申请人： Masaru Nakao ,  Kikuo Sasajima ,  Isamu Maruyama ,  Shigenari Katayama ,  Hisao Yamamoto

发明人： Masaru Nakao ,  Kikuo Sasajima ,  Isamu Maruyama ,  Shigenari Katayama ,  Hisao Yamamoto

IPC分类号： A61K31/135 ,  C07C215/30 ,  C07C91/28

CPC分类号： A61K31/135 ,  C07C215/30

摘要： Novel 4-amino-1-butanol derivatives having excellent depressant activity on central nervous system. A preferred compound of the disclosure is 4-[2-(2-alkoxyphenoxy)ethylamino]-1-(4-fluorophenyl)-1-butanol and its pharmaceutically acceptable salts.

公开(公告)号：US20140145368A1

公开(公告)日：2014-05-29

申请号：US13825169

申请日：2011-09-28

申请人： Chikao Ohashi ,  Michihiko Ichikawa ,  Hisao Yamamoto

发明人： Chikao Ohashi ,  Michihiko Ichikawa ,  Hisao Yamamoto

IPC分类号： B41C1/05

CPC分类号： B41C1/05 ,  B41N1/12

摘要： A method is provided for production of a flexographic printing plate precursor for laser engraving including at least the following steps to be carried out in this order: (1) a step for separately preparing a plurality of fluids that are reactive with each other, (2) a step for carrying out in-line mixing of the plurality of fluids to form a reactive resin composition, (3) a step for casting the reactive resin composition onto a release material to form a cast film, (4) a step for heating the cast film, and (5) a step for removing the cast film from the release material to form an independent sheet made of the reactive resin composition.

摘要翻译： 提供了一种用于生产用于激光雕刻的柔性版印刷版前体的方法，包括至少按以下顺序执行的以下步骤：（1）分别制备彼此反应的多种流体的步骤，（2 ）用于进行多个流体的在线混合以形成反应性树脂组合物的步骤，（3）将反应性树脂组合物浇铸到脱模材料上以形成流延膜的步骤，（4）加热步骤 流延膜，（5）从剥离材料除去流延膜以形成由反应性树脂组合物制成的独立片材的步骤。

公开(公告)号：US20070212644A1

公开(公告)日：2007-09-13

申请号：US11715995

申请日：2007-03-09

申请人： Hisao Yamamoto ,  Hiromitsu Yanaka ,  Takahiro Goto ,  Shigeo Koizumi

发明人： Hisao Yamamoto ,  Hiromitsu Yanaka ,  Takahiro Goto ,  Shigeo Koizumi

IPC分类号： G03C1/00

CPC分类号： G03F7/092 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/04 ,  B41C2201/10 ,  B41C2201/12 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  G03F7/11

摘要： The present invention provides a photosensitive recording material having a support, and a photosensitive layer and a protective layer formed in this order on or above the support. The photosensitive layer contains a polymerization initiator, a sensitizing agent, and a polymerizable compound. Further, the protective layer contains a water-insoluble and alkali-soluble dye that has an absorption wavelength region different from the absorption wavelength region of the sensitizing agent, and the dye is dispersed in a solid state in the protective layer. The present invention also provides a planographic printing plate precursor including the photosensitive recording material, a stack of the photosensitive recording materials, and a stack of the planographic printing plate precursors.

摘要翻译： 本发明提供一种具有支持体的光敏记录材料，以及在该载体上或上方依次形成的感光层和保护层。 感光层含有聚合引发剂，增感剂和聚合性化合物。 此外，保护层含有具有与敏化剂的吸收波长区域不同的吸收波长区域的水不溶性碱溶性染料，染料在保护层中以固体状态分散。 本发明还提供了包括感光记录材料的平版印刷版原版，感光记录材料的叠层和平版印刷版前体的叠层。

公开(公告)号：US5882807A

公开(公告)日：1999-03-16

申请号：US770239

申请日：1996-12-20

申请人： Yoshio Funato ,  Koji Furukawa ,  Hisao Yamamoto ,  Nobuo Kageyama

发明人： Yoshio Funato ,  Koji Furukawa ,  Hisao Yamamoto ,  Nobuo Kageyama

IPC分类号： C04B41/52 ,  C04B41/89 ,  C23C16/32 ,  H01L21/00 ,  C04B35/56

CPC分类号： H01L21/67115 ,  C04B41/009 ,  C04B41/52 ,  C04B41/89 ,  C23C16/325 ,  C04B2111/0025 ,  Y10T428/265

摘要： A jig used for heat treatment made from an SiC-coated silicon carbide material, wherein the SiC film is coated by the CVD method on a silicon carbide matrix in which silicon has been impregnated and wherein there are no pores with a diameter of 2 .mu.m or larger in the outer layer of the matrix within 200 .mu.m from the interface of the SiC film and the silicon carbide matrix when observed by a scanning electron microscope at a magnification of 400 times. The jig is manufactured by producing an SiC film on the surface of a silicon carbide matrix in which silicon has been impregnated by introducing a raw material compound for producing the SiC film and forming the SiC film at a temperature from 1000.degree. C. to 1290.degree. C. under a pressure from 500 to 760 Torr in a non-oxidative atmosphere. The jig exhibits superior resistance to high temperature heating cycles and excellent high thermal shock resistance required for heat treatment in semiconductor manufacturing.

摘要翻译： 用于由SiC涂覆的碳化硅材料制成的热处理的夹具，其中通过CVD方法将SiC膜涂覆在已经浸渍了硅的碳化硅基体上，并且其中没有直径为2μm的孔 或者当通过扫描电子显微镜以400倍的倍数观察时，从SiC膜和碳化硅基体的界面在200μm以内的基体的外层中，或者更大。 通过在碳化硅基体的表面上制造SiC膜来制造夹具，其中通过引入用于制造SiC膜的原料化合物并在1000℃至1290℃的温度下形成SiC膜来浸渍硅。 在非氧化性气氛下，在500至760托的压力下。 夹具具有优异的耐高温加热循环性能以及半导体制造中热处理所需的优异的耐热冲击性。

公开(公告)号：US5755984A

公开(公告)日：1998-05-26

申请号：US911286

申请日：1997-08-14

申请人： Hisao Yamamoto

发明人： Hisao Yamamoto

IPC分类号： D06M13/513 ,  D06M13/517 ,  D06M15/53 ,  D06M15/643 ,  D06M15/647 ,  D06M15/657 ,  D06M101/00 ,  D06M101/16 ,  D06M101/30 ,  D06M101/32 ,  D06M101/34

CPC分类号： D06M15/657 ,  D06M13/513 ,  D06M13/517 ,  D06M15/53 ,  D06M15/643 ,  D06M7/00 ,  D06M2200/40

摘要： A lubricating agent obtained by mixing a polyether compound and cyclic polyorganosiloxane of a specified type at a specified ratio is applied at a specified ratio to synthetic yarns which are to be subjected to a heat treatment process such that heater deposits can be eliminated.

摘要翻译： 以规定的比率将特定类型的聚醚化合物和环状聚有机硅氧烷以规定的比例混合而得到的润滑剂与要进行热处理工艺的合成纱线相加，使得能够消除加热器沉积物。

公开(公告)号：US5428108A

公开(公告)日：1995-06-27

申请号：US192133

申请日：1994-02-03

申请人： Yoshihiro Oshibe ,  Michihisa Yamada ,  Hisao Yamamoto ,  Hiroshi Ohmura

发明人： Yoshihiro Oshibe ,  Michihisa Yamada ,  Hisao Yamamoto ,  Hiroshi Ohmura

IPC分类号： C08F8/26 ,  C08F299/00 ,  C08F259/08

CPC分类号： C08F299/00 ,  C08F8/26

摘要： The present block copolymer contains a structural unit (A) derived from a compound represented by the general formula (I): CH.sub.2 .dbd.CR.sub.1 COOR.sub.2 R.sub.f, and also contains a structural unit (B) consisting of a polymer moiety represented by at least one of the structural formulae (III) and (IV) and another polymer moiety derived from a compound represented by the general formula (II): CH.sub.2 .dbd.CR.sub.3 R.sub.4. For preparing the above block copolymer, a block copolymer consisting of the structural unit (A) derived from a compound represented by the general formula (I): CH.sub.2 .dbd.CR.sub.1 COOR.sub.2 R.sub.f and the structural unit (B1) derived from a compound represented by the general formula (II): CH.sub.2 .dbd.CR.sub.3 R.sub.4 and a compound represented by the general formula (V): CH.dbd.CR.sub.6 COO(R.sub.9).sub.t H are reacted with a compound represented by the general formula (VI): R.sub.10 COCl to allow a dehydrochlorination reaction to take place. Thus, an unsaturated group and fluorine containing block copolymer having excellent water and oil repellent properties and excellent sensitivity to activation energy rays can be prepared. The block copolymer is utilized as a surface modifier for activation energy-curing resins.

摘要翻译： 本发明的嵌段共聚物含有由通式（I）表示的化合物衍生的结构单元（A）：CH2 = CR1COOR2Rf，并且还含有由结构单元（B）构成的结构单元， 式（III）和（IV）表示的另一聚合物部分和由通式（II）表示的化合物衍生的另一聚合物部分：CH 2 = CR 3 R 4。 为了制备上述嵌段共聚物，由由通式（I）表示的化合物衍生的结构单元（A）：CH 2 = CR 1 COOR 2 R f和由通式（I）表示的化合物衍生的结构单元（B1） （II）：CH 2 = CR 3 R 4和由通式（V）表示的化合物：CH = CR 6 COO（R 9）t H与通式（VI）表示的化合物：R 10 COCl反应，以进行脱氯化氢反应。 因此，可以制备具有优异的防斥油性和对激活能量射线具有优异敏感性的不饱和基团和含氟嵌段共聚物。 嵌段共聚物用作活化能量固化树脂的表面改性剂。