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公开(公告)号：US06437463B1
公开(公告)日：2002-08-20
申请号：US09556353
申请日：2000-04-24
IPC分类号： H02K4100
CPC分类号： H02K41/03 , G03F7/70716 , G03F7/70758 , H02K2201/18
摘要： A positioning stage assembly having a coarse stage which includes a planar motor driveable in at least two degrees of freedom, and a fine stage positioned on the coarse stage which is driveable in at least three degrees of freedom with respect to the coarse stage. More preferably, the fine stage is driveable in six degrees of freedom and includes variable reluctance actuators for positioning in three degrees of freedom.
摘要翻译： 一种具有粗糙台阶的定位台组件，其包括可以至少两个自由度驱动的平面电机，以及位于粗糙台上的精细台，所述精细平台可相对于粗略平台至少三个自由度驱动。 更优选地，精细级可以在六个自由度中驱动，并且包括用于以三个自由度定位的可变磁阻致动器。
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72.发明授权Platform positionable in at least three degrees of freedom by interaction with coils 有权平台可通过与线圈的相互作用至少三个自由度定位
公开(公告)号：US6147421A
公开(公告)日：2000-11-14
申请号：US192637
申请日：1998-11-16
CPC分类号： G03F7/70758 , H02K41/03 , H02K2201/18
摘要： The invention comprises a platform positionable in at least three degrees of freedom at least partly by interaction with coils. The platform includes a support member having a surface. Magnets are attached to the surface and part of a magnet bearing is attached to the support member. Inner and outer platforms are coupled to each other by magnet bearings and interact with coils to position the inner platform in six degrees of freedom. The invention may be particularly useful in precise positioning of semiconductor wafers and materials during photolithography and other processing.
摘要翻译： 本发明包括至少部分地通过与线圈相互作用而至少三个自由度定位的平台。 平台包括具有表面的支撑构件。 磁体连接到表面，并且磁体轴承的一部分附接到支撑构件。 内平台和外平台通过磁铁轴承彼此联接，并与线圈相互作用，以使内平台处于六自由度。 在光刻和其它处理期间，本发明可以特别适用于半导体晶片和材料的精确定位。
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公开(公告)号：US5760564A
公开(公告)日：1998-06-02
申请号：US495044
申请日：1995-06-27
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： B23Q1/00 , B23Q1/38 , B23Q1/62 , B23Q3/00 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68 , G05B11/00
CPC分类号： G03F7/70716 , B23Q3/00
摘要： A dual guide beam stage mechanism for accurate X-Y positioning for use e.g. in semiconductor processing equipment provides accurate planar motion and yaw control. Over-constraint between components in their relative motion is minimized by utilizing flexibly mounted air bearings at the connection between at least one of the moveable guide beams and its corresponding stationary guide, and between at least one of the guide beams and the adjacent stage itself. Thus stage yaw motion is provided by allowing yaw motion of one of the guide beams. Preloading provides enough constraint through the air bearings without over-constraining the moving components, thereby improving accuracy and also reducing the need for close manufacturing tolerances.
摘要翻译： 用于准确的X-Y定位的双引导波束级机构 在半导体加工设备中提供精确的平面运动和偏航控制。 通过在至少一个可移动导向梁及其对应的固定导轨之间的连接处以及至少一个导向梁和相邻的台本身之间的连接处利用柔性安装的空气轴承来最小化其相对运动中的部件之间的过度约束。 因此，通过允许一个引导梁的偏航运动来提供舞台偏转运动。 预加载通过空气轴承提供足够的约束，而不会过度约束运动部件，从而提高精度并减少对紧密制造公差的需求。
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公开(公告)号：US5623853A
公开(公告)日：1997-04-29
申请号：US325740
申请日：1994-10-19
IPC分类号： G12B5/00 , G02B21/26 , G03F7/20 , H01L21/027 , G05G11/00
CPC分类号： G03F7/707 , G03F7/70358 , G03F7/70716 , G03F7/70991 , Y10T74/20354 , Y10T74/20378
摘要： An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam. A cable follower stage moves in the Y direction on the follower stage and supports the cables connecting to the main stage, thereby reducing cable drag. An air circulation system is provided in the magnetic tracks on the follower stage to remove heat from operation of the electromagnetic motors. Air is removed from a central region of each track by a vacuum duct enhanced by air plugs fitting at the two ends of the motor coil assembly on the main stage to contain the air therein.
摘要翻译： 用于在微光刻系统中对准晶片的精确运动的XY平台。 支撑晶片的主平台跨越在XY平面中沿第一线性方向磁驱动的可移动光束。 机械独立于主舞台的跟随台阶也在第一线性（X）方向上移动，并且其运动由具有主方向运动的控制系统在X方向上电子同步。 电磁驱动电动机包括安装在从动台上的磁道，其与安装在主台的边缘上的电动机线圈配合，以沿着与X方向正交的第二线性（Y）方向移动主工作台。 因此，主平台与XY平面中的机械扰动隔离，因为没有机械连接并且通过从梁中去除磁道的重量而被减轻。 电缆跟随器级在从动台上沿Y方向移动，并支撑连接到主级的电缆，从而减少电缆阻力。 在跟随器台上的磁道中设置有一个空气循环系统，以消除电磁马达的运行中的热量。 空气由每个轨道的中心区域被一个真空管道除去，该真空管道通过安装在主台上的电动机线圈组件的两端上的空气塞来增强，以便在其中容纳空气。
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75.发明授权公开(公告)号：US08599488B2
公开(公告)日：2013-12-03
申请号：US13313399
申请日：2011-12-07
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G02B3/12
CPC分类号： G03F7/70258 , G03F7/2041 , G03F7/70341 , G03F7/70641 , G03F7/70958 , G03F9/7026 , G03F9/7034
摘要： A lithographic projection apparatus includes a projection system having a spherical lens element from which an exposure light is projected through liquid in a space under the spherical lens element, a member disposed adjacent to a surface of the spherical lens element through which the exposure light does not pass, and a gap formed between the member and the surface of the spherical lens element. The gap communicates with the space and includes lower and upper portions. A wafer is moved below and relative to the spherical lens element and the member, and the liquid is retained between the spherical lens element and the member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer to expose the wafer by projecting the exposure light onto the wafer through the liquid in the space.
摘要翻译： 光刻投影装置包括具有球面透镜元件的投影系统，曝光光从该球面透镜元件的球面透镜元件下方的空间中通过液体投射;与透镜元件的与透镜元件不同的透镜元件的表面附近设置的元件 在球面透镜元件的表面之间形成间隙。 该间隙与空间连通并且包括下部和上部。 晶片在球面透镜元件和构件之下移动并且相对于球形透镜元件和构件移动，并且液体保持在球面透镜元件与另一侧的晶片的一侧的构件和晶片的上表面之间。 液体局部地覆盖晶片的上表面的一部分，以通过空间中的液体将曝光光投影到晶片上而露出晶片。
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76.发明授权Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port 有权清洁方法，用于浸没光刻中的清洁液体，将清洁液体提供到光学元件，液体供应口和液体回收口下面的物体表面上公开(公告)号：US08493545B2
公开(公告)日：2013-07-23
申请号：US12382078
申请日：2009-03-09
申请人： Hidemi Kawai , W. Thomas Novak
发明人： Hidemi Kawai , W. Thomas Novak
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , B08B3/04 , B08B3/12 , G03F7/70891 , G03F7/70916 , G03F7/70925
摘要： An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.
摘要翻译： 浸渍光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 与工件不同的物体的表面设置在光学元件的下方，供给口和回收口。 在净化过程中，清洁液体被供应到物体上，使得清洁液仅覆盖物体表面的一部分。
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77.发明申请公开(公告)号：US20120075609A1
公开(公告)日：2012-03-29
申请号：US13313399
申请日：2011-12-07
申请人： W. Thomas NOVAK
发明人： W. Thomas NOVAK
IPC分类号： G03B27/54
CPC分类号： G03F7/70258 , G03F7/2041 , G03F7/70341 , G03F7/70641 , G03F7/70958 , G03F9/7026 , G03F9/7034
摘要： A lithographic projection apparatus includes a projection system having a spherical lens element from which an exposure light is projected through liquid in a space under the spherical lens element, a member disposed adjacent to a surface of the spherical lens element through which the exposure light does not pass, and a gap formed between the member and the surface of the spherical lens element. The gap communicates with the space and includes lower and upper portions. A wafer is moved below and relative to the spherical lens element and the member, and the liquid is retained between the spherical lens element and the member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer to expose the wafer by projecting the exposure light onto the wafer through the liquid in the space.
摘要翻译： 光刻投影装置包括具有球面透镜元件的投影系统，曝光光从该球面透镜元件的球面透镜元件下方的空间中通过液体投射;与透镜元件的与透镜元件不同的透镜元件的表面附近设置的元件 在球面透镜元件的表面之间形成间隙。 该间隙与空间连通并且包括下部和上部。 晶片在球面透镜元件和构件之下移动并且相对于球形透镜元件和构件移动，并且液体保持在球面透镜元件与另一侧的晶片的一侧的构件和晶片的上表面之间。 液体局部地覆盖晶片的上表面的一部分，以通过空间中的液体将曝光光投影到晶片上而露出晶片。
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公开(公告)号：US08059258B2
公开(公告)日：2011-11-15
申请号：US12232513
申请日：2008-09-18
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid.
摘要翻译： 液浸光刻设备包括具有最后元件的投影系统。 投影系统将图像投影到工件上，以通过填充在最后一个元件和工件之间的空间中的液体来暴露工件。 液体供应装置包括在曝光期间将液体从供应入口供应到工件和最后元件之间的空间的供应入口。 最后一个元件包括光学元件和板。 该板防止可能受液体接触影响的光学元件的劣化。
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79.发明申请Environmental system including a transport region for an immersion lithography apparatus 有权环境系统包括浸没式光刻设备的传送区域公开(公告)号：US20110235007A1
公开(公告)日：2011-09-29
申请号：US13067464
申请日：2011-06-02
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.
摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括液体收集系统，其包括具有可渗透构件的液体收集构件，通过该液体收集构件从与液体收集构件相对的物体的表面收集液体，其中可渗透构件具有多个通道，其产生毛细管 力。
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80.发明授权Environmental system including a transport region for an immersion lithography apparatus 有权环境系统包括浸没式光刻设备的传送区域公开(公告)号：US07969552B2
公开(公告)日：2011-06-28
申请号：US11819689
申请日：2007-06-28
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a wick structure member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
摘要翻译： 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括一种液体收集系统，该液体收集系统包括具有芯结构构件的液体收集构件，从与液体收集构件相对的物体的表面收集液体。
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