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198 条记录 (耗时 0.071 秒)

    Independently-addressable, self-correcting inking for cantilever arrays
    72.
    发明申请
    Independently-addressable, self-correcting inking for cantilever arrays 失效
    用于悬臂阵列的独立寻址，自校正上墨

    公开(公告)号：US20090133169A1

    公开(公告)日：2009-05-21

    申请号：US12222464

    申请日：2008-08-08

    申请人： Chad A. Mirkin ,  Yuhuang Wang ,  Louise R. Giam ,  Matthew Park

    发明人： Chad A. Mirkin ,  Yuhuang Wang ,  Louise R. Giam ,  Matthew Park

    IPC分类号： G12B21/08 ,  G12B21/02

    CPC分类号： G03F7/0002 ,  B01L3/0255 ,  B01L2200/12 ,  B01L2400/0484 ,  B41M5/00 ,  G01Q80/00

    摘要： An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.

    摘要翻译： 用于沉积的图案化组合物或油墨加载尖端和其它表面的改进方法。 描述了一种图案化方法，该方法包括：（i）提供至少一个尖端阵列; （ii）提供多个图案化组合物; （iii）将至少一些图案化组合物喷墨印刷到一些尖端上; 和（iv）将至少一些所述图案化组合物沉积到基底表面上; 其中喷墨印刷适于防止图案化组合物在尖端上的显着交叉污染。 可以实现良好的打印再现性和打印速度的控制。 可以处理进行喷墨印刷的表面以促进墨水在尖端处的定位。 该方法对于高密度阵列特别重要。

    Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
    75.
    发明授权
    Direct write nanolithographic deposition of nucleic acids from nanoscopic tips 失效
    从纳米尖端直接写入纳米光刻的核酸

    公开(公告)号：US07361310B1

    公开(公告)日：2008-04-22

    申请号：US10307515

    申请日：2002-12-02

    申请人： Chad A. Mirkin ,  Linette Demers ,  David S. Ginger

    发明人： Chad A. Mirkin ,  Linette Demers ,  David S. Ginger

    IPC分类号： B01L3/02

    CPC分类号： G03F7/0002 ,  G01Q80/00 ,  Y10T436/2575

    摘要： The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.

    摘要翻译： 描述了使用直写式纳米光刻技术在不同基底上产生锚定的纳米级核酸图案，包括导电和绝缘基底。 含有反应性基团如硫醇基团的核酸（包括寡核苷酸）的修饰使得在合适的条件下使用合适的扫描探针显微镜尖端进行图案化。 反应性基团提供化学吸附或共价结合到基底表面。 所得到的表现出良好稳定性的核酸特征可与互补核酸杂交，并使用例如用核酸官能化的纳米颗粒进行相应的探测。 可以通过选择尖端处理，相对湿度和核酸结构来控制图案化。