公开(公告)号：US20120020759A1

公开(公告)日：2012-01-26

申请号：US13248386

申请日：2011-09-29

申请人： Peter van der Meulen

发明人： Peter van der Meulen

IPC分类号： H01L21/677 ,  B65G49/07

CPC分类号： H01L21/67742 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  Y10S414/139

摘要： Linear semiconductor handling systems provide more balanced processing capacity using various techniques to provide increased processing capacity to relatively slow processes. This may include use of hexagonal vacuum chambers to provide additional facets for slow process modules, use of circulating process modules to provide more processing capacity at a single facet of a vacuum chamber, or the use of wide process modules having multiple processing sites. This approach may be used, for example, to balance processing capacity in a typical process that includes plasma enhanced chemical vapor deposition steps and bevel etch steps.

摘要翻译： 线性半导体处理系统使用各种技术提供更平衡的处理能力，以提供相对较慢工艺的增加的处理能力。 这可能包括使用六边形真空室来为慢速过程模块提供附加面，使用循环过程模块在真空室的单个面提供更多的处理能力，或使用具有多个处理位置的宽工艺模块。 该方法可以用于例如在包括等离子体增强化学气相沉积步骤和斜面蚀刻步骤的典型工艺中平衡处理能力。

公开(公告)号：US07899562B2

公开(公告)日：2011-03-01

申请号：US11877242

申请日：2007-10-23

申请人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

发明人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

IPC分类号： G06F19/00 ,  G05D19/00

CPC分类号： G05B99/00 ,  G05B15/02 ,  G05B19/41865 ,  G05B19/41885 ,  G05B23/0267 ,  G05B2219/30 ,  G05B2219/31 ,  G05B2219/31467 ,  G05B2219/31472 ,  G05B2219/32128 ,  G05B2219/32267 ,  G05B2219/32329 ,  G05B2219/32335 ,  G05B2219/32342 ,  G05B2219/32351 ,  G05B2219/35494 ,  G05B2219/40411 ,  G05B2219/40412 ,  G05B2219/40413 ,  G05B2219/40419 ,  G05B2219/40424 ,  G05B2219/45031 ,  G06T7/0004 ,  H01L21/67161 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/67742 ,  H01L21/67745 ,  Y02P90/18 ,  Y02P90/20 ,  Y02P90/26 ,  Y02P90/86

摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

摘要翻译： 用于控制异构半导体制造环境中的处理的软件可以包括以晶圆为中心的数据库，使用神经网络的实时调度器和显示系统的模拟操作的图形用户界面。 这些特征可以单独使用或组合使用以提供用于半导体制造过程的实时控制和监视的改进的可用性和计算效率。 更一般来说，这些技术可以有用地用于各种实时控制系统中，特别是需要复杂调度决策的系统或由许多独立供应商的硬件构成的异构系统。

公开(公告)号：US20080155446A1

公开(公告)日：2008-06-26

申请号：US11877203

申请日：2007-10-23

申请人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

发明人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

IPC分类号： G06F3/048

CPC分类号： G05B99/00 ,  G05B15/02 ,  G05B19/41865 ,  G05B19/41885 ,  G05B23/0267 ,  G05B2219/30 ,  G05B2219/31 ,  G05B2219/31467 ,  G05B2219/31472 ,  G05B2219/32128 ,  G05B2219/32267 ,  G05B2219/32329 ,  G05B2219/32335 ,  G05B2219/32342 ,  G05B2219/32351 ,  G05B2219/35494 ,  G05B2219/40411 ,  G05B2219/40412 ,  G05B2219/40413 ,  G05B2219/40419 ,  G05B2219/40424 ,  G05B2219/45031 ,  G06T7/0004 ,  H01L21/67161 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/67742 ,  H01L21/67745 ,  Y02P90/18 ,  Y02P90/20 ,  Y02P90/26 ,  Y02P90/86

摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

公开(公告)号：US20080155444A1

公开(公告)日：2008-06-26

申请号：US11877170

申请日：2007-10-23

申请人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

发明人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

IPC分类号： G06F3/048

CPC分类号： G05B99/00 ,  G05B15/02 ,  G05B19/41865 ,  G05B19/41885 ,  G05B23/0267 ,  G05B2219/30 ,  G05B2219/31 ,  G05B2219/31467 ,  G05B2219/31472 ,  G05B2219/32128 ,  G05B2219/32267 ,  G05B2219/32329 ,  G05B2219/32335 ,  G05B2219/32342 ,  G05B2219/32351 ,  G05B2219/35494 ,  G05B2219/40411 ,  G05B2219/40412 ,  G05B2219/40413 ,  G05B2219/40419 ,  G05B2219/40424 ,  G05B2219/45031 ,  G06F15/00 ,  G06T7/0004 ,  H01L21/67161 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/67742 ,  H01L21/67745 ,  Y02P90/18 ,  Y02P90/20 ,  Y02P90/26 ,  Y02P90/86

摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

公开(公告)号：US20080014055A1

公开(公告)日：2008-01-17

申请号：US11681822

申请日：2007-03-05

申请人： Peter van der Meulen

发明人： Peter van der Meulen

IPC分类号： B65G25/00

CPC分类号： B65G25/02 ,  B65G37/00 ,  H01L21/67161 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/68792

摘要： A bypass thermal adjuster, which may be placed between two robots, provides a chamber for isolation and thermal control of wafers while permitting other wafers to be passed through the adjuster by the robots.

摘要翻译： 可以放置在两个机器人之间的旁路热调节器提供用于隔离和热控制晶片的室，同时允许其他晶片通过机器人通过调节器。

公开(公告)号：US20050111938A1

公开(公告)日：2005-05-26

申请号：US10985834

申请日：2004-11-10

申请人： Peter van der Meulen

发明人： Peter van der Meulen

IPC分类号： B65G65/00

CPC分类号： H01L21/67161 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S414/139

摘要： Methods and systems are provided for handling materials, including materials used in semiconductor manufacturing systems. The methods and systems include mid-entry load lock facilities for linear, vacuum-based handling systems.

摘要翻译： 提供了用于处理材料的方法和系统，包括在半导体制造系统中使用的材料。 该方法和系统包括用于线性，基于真空的处理系统的中间入口加载锁定设施。

公开(公告)号：US08972029B2

公开(公告)日：2015-03-03

申请号：US11877203

申请日：2007-10-23

申请人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

发明人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

IPC分类号： G06F15/18 ,  G06F19/00 ,  G05B99/00 ,  G05B15/02 ,  G05B19/418 ,  G05B23/02 ,  G06T7/00 ,  H01L21/67 ,  H01L21/677

CPC分类号： G05B99/00 ,  G05B15/02 ,  G05B19/41865 ,  G05B19/41885 ,  G05B23/0267 ,  G05B2219/30 ,  G05B2219/31 ,  G05B2219/31467 ,  G05B2219/31472 ,  G05B2219/32128 ,  G05B2219/32267 ,  G05B2219/32329 ,  G05B2219/32335 ,  G05B2219/32342 ,  G05B2219/32351 ,  G05B2219/35494 ,  G05B2219/40411 ,  G05B2219/40412 ,  G05B2219/40413 ,  G05B2219/40419 ,  G05B2219/40424 ,  G05B2219/45031 ,  G06T7/0004 ,  H01L21/67161 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/67742 ,  H01L21/67745 ,  Y02P90/18 ,  Y02P90/20 ,  Y02P90/26 ,  Y02P90/86

摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

摘要翻译： 用于控制异构半导体制造环境中的处理的软件可以包括以晶圆为中心的数据库，使用神经网络的实时调度器和显示系统的模拟操作的图形用户界面。 这些特征可以单独使用或组合使用以提供用于半导体制造过程的实时控制和监视的改进的可用性和计算效率。 更一般来说，这些技术可以有用地用于各种实时控制系统中，特别是需要复杂调度决策的系统或由许多独立供应商的硬件构成的异构系统。

公开(公告)号：US08807905B2

公开(公告)日：2014-08-19

申请号：US13158883

申请日：2011-06-13

申请人： Peter van der Meulen

发明人： Peter van der Meulen

IPC分类号： H01L21/677 ,  H01L21/67 ,  B25J9/04

CPC分类号： H01L21/67167 ,  B25J9/042 ,  H01L21/67126 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/67253 ,  H01L21/67259 ,  H01L21/67706 ,  H01L21/67727 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/67757 ,  H01L21/67781 ,  H01L21/68 ,  H01L21/68707 ,  H01L21/68735 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/139 ,  Y10T74/20305

摘要： Methods and systems are provided for handling materials, including materials used in semiconductor manufacturing systems. The methods and systems include linear semiconductor processing facilities for vacuum-based semiconductor processing and handling, as well as linkable or extensible semiconductor processing facilities that can be flexibly configured to meet a variety of constraints.

摘要翻译： 提供了用于处理材料的方法和系统，包括在半导体制造系统中使用的材料。 该方法和系统包括用于基于真空的半导体处理和处理的线性半导体处理设备，以及可以灵活地配置以满足各种限制的可连接或可扩展的半导体处理设备。

公开(公告)号：US08639489B2

公开(公告)日：2014-01-28

申请号：US11877096

申请日：2007-10-23

申请人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

发明人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

IPC分类号： G06G7/62

CPC分类号： G05B19/41885 ,  G05B2219/31467 ,  G05B2219/31472 ,  G05B2219/32335 ,  G05B2219/32342 ,  G05B2219/35494 ,  Y02P90/18 ,  Y02P90/20 ,  Y02P90/26 ,  Y02P90/86

摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.

公开(公告)号：US08639365B2

公开(公告)日：2014-01-28

申请号：US11877071

申请日：2007-10-23

申请人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

发明人： Patrick D. Pannese ,  Vinaya Kavathekar ,  Peter van der Meulen

IPC分类号： G05B13/02 ,  G06F15/18 ,  G06F3/048 ,  G05B13/04 ,  G06N99/00 ,  G06F3/0481

CPC分类号： G05B13/042 ,  G03F7/70525 ,  G06F3/0481 ,  G06F17/30554 ,  G06F17/5009 ,  G06N99/005

摘要： Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.