公开(公告)号：US08148663B2

公开(公告)日：2012-04-03

申请号：US11888433

申请日：2007-07-31

申请人： Bruce E. Adams ,  Samuel C. Howells ,  Dean Jennings ,  Jiping Li ,  Timothy N. Thomas ,  Stephen Moffatt

发明人： Bruce E. Adams ,  Samuel C. Howells ,  Dean Jennings ,  Jiping Li ,  Timothy N. Thomas ,  Stephen Moffatt

IPC分类号： B23K26/06

CPC分类号： B23K26/073 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  B23K26/0732 ,  B23K2103/56 ,  G02B27/0961

摘要： The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

摘要翻译： 本发明一般涉及一种光学系统，其能够在包含在基板的表面上的退火区域上可靠地传递均匀的能量。 光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。 通常，退火区域可以是正方形或矩形形状。 通常，本发明的光学系统和方法用于通过递送足够的能量以使一个或多个区域再熔化和固化来优先退火在退火区域内发现的一个或多个区域。

公开(公告)号：US07717617B2

公开(公告)日：2010-05-18

申请号：US12283615

申请日：2008-09-12

申请人： Bruce E. Adams ,  Dean Jennings ,  Aaron M. Hunter ,  Abhilash J. Mayur ,  Vijay Parihar ,  Timothy N. Thomas

发明人： Bruce E. Adams ,  Dean Jennings ,  Aaron M. Hunter ,  Abhilash J. Mayur ,  Vijay Parihar ,  Timothy N. Thomas

IPC分类号： G01N3/28 ,  G01J5/08 ,  H01L21/477

CPC分类号： G02B5/281 ,  G01J5/06 ,  H01S5/005 ,  H01S5/4012

摘要： A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.

摘要翻译： 热处理系统包括以激光波长发射的激光辐射源，设置在反射表面和能够保持要处理的衬底的基板支撑件之间的光束投影光学器件，响应于高温计波长的高温计和波长响应光学 元件，其具有用于包括激光波长的第一波长范围内的光的第一光路，所述第一光路位于激光辐射源和光束投影光学器件之间，以及用于在包括高温计的第二波长范围内的光的第二光路 波长，第二光路位于光束投影光学器件和高温计之间。 该系统还可以包括在激光辐射源和波长响应光学元件之间的高温计波长阻挡滤波器。

公开(公告)号：US07422775B2

公开(公告)日：2008-09-09

申请号：US11131899

申请日：2005-05-17

申请人： Kartik Ramaswamy ,  Hiroji Hanawa ,  Biagio Gallo ,  Kenneth S. Collins ,  Kai Ma ,  Vijay Parihar ,  Dean Jennings ,  Abhilash J. Mayur ,  Amir Al-Bayati ,  Andrew Nguyen

发明人： Kartik Ramaswamy ,  Hiroji Hanawa ,  Biagio Gallo ,  Kenneth S. Collins ,  Kai Ma ,  Vijay Parihar ,  Dean Jennings ,  Abhilash J. Mayur ,  Amir Al-Bayati ,  Andrew Nguyen

IPC分类号： H05H1/24

CPC分类号： H05H1/46

摘要： A method of processing a workpiece includes introducing an optical absorber material precursor gas into a chamber containing the workpiece, generating an RF oscillating toroidal plasma current in a reentrant path that includes a process zone overlying the workpiece by applying RF source power, so as to deposit a layer of an optical absorber material on the workpiece, and exposing the workpiece to optical radiation that is at least partially absorbed in the optical absorber layer.

摘要翻译： 一种处理工件的方法包括将光吸收材料前体气体引入到包含工件的室中，在折入路径中产生RF振荡环形等离子体电流，其包括通过施加RF源功率覆盖工件的工艺区域，以便沉积 在工件上的光吸收材料层，以及将工件暴露于至少部分地吸收在光吸收层中的光辐射。

公开(公告)号：US07398693B2

公开(公告)日：2008-07-15

申请号：US11393423

申请日：2006-03-30

申请人： Joseph Michael Ranish ,  Tarpan Dixit ,  Dean Jennings ,  Balasubramanian Ramachandran ,  Aaron Hunter ,  Wolfgang Aderhold ,  Bruce Adams ,  Wen Teh Chang

发明人： Joseph Michael Ranish ,  Tarpan Dixit ,  Dean Jennings ,  Balasubramanian Ramachandran ,  Aaron Hunter ,  Wolfgang Aderhold ,  Bruce Adams ,  Wen Teh Chang

IPC分类号： G01L9/06

CPC分类号： H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention generally relates to methods for the rapid thermal processing (RTP) of a substrate. Embodiments of the invention include controlling a thermal process using either a real-time adaptive control algorithm or by using a control algorithm that is selected from a suite of fixed control algorithms designed for a variety of substrate types. Selection of the control algorithm is based on optical properties of the substrate measured during the thermal process. In one embodiment, a combination of control algorithms are used, wherein the majority of lamp groupings are controlled with a fixed control algorithm and a substantially smaller number of lamp zones are controlled by an adaptive control algorithm.

摘要翻译： 本发明一般涉及用于衬底的快速热处理（RTP）的方法。 本发明的实施例包括使用实时自适应控制算法或通过使用从针对各种基板类型设计的一套固定控制算法中选择的控制算法来控制热处理。 控制算法的选择基于在热处理期间测量的衬底的光学性质。 在一个实施例中，使用控制算法的组合，其中大多数灯分组由固定控制算法控制，并且通过自适应控制算法来控制基本上较少数量的灯区。

公开(公告)号：US07323401B2

公开(公告)日：2008-01-29

申请号：US11199593

申请日：2005-08-08

申请人： Kartik Ramaswamy ,  Hiroji Hanawa ,  Biagio Gallo ,  Kenneth S. Collins ,  Kai Ma ,  Vijay Parihar ,  Dean Jennings ,  Abhilash J. Mayur ,  Amir Al-Bayati ,  Andrew Nguyen

发明人： Kartik Ramaswamy ,  Hiroji Hanawa ,  Biagio Gallo ,  Kenneth S. Collins ,  Kai Ma ,  Vijay Parihar ,  Dean Jennings ,  Abhilash J. Mayur ,  Amir Al-Bayati ,  Andrew Nguyen

IPC分类号： H01L21/22 ,  H01L21/38

CPC分类号： H01L21/0276 ,  C23C16/26 ,  C23C16/507 ,  H01J37/321 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/268 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/32139 ,  Y10S430/151

摘要： A method of processing a thin film structure on a semiconductor substrate using an optically writable mask includes placing the substrate in a reactor chamber, the substrate having on its surface a target layer to be etched in accordance with a predetermined pattern, and depositing a carbon-containing hard mask layer on the substrate by (a) introducing a carbon-containing process gas into the chamber, (b) generating a reentrant toroidal RF plasma current in a reentrant path that includes a process zone overlying the workpiece by coupling plasma RF source power to an external portion of the reentrant path, and (c) coupling RF plasma bias power or bias voltage to the workpiece. The method further includes photolithographically defining the predetermined pattern in the carbon-containing hard mask layer, and etching the target layer in the presence of the hard mask layer.

摘要翻译： 使用光学可写掩模在半导体衬底上处理薄膜结构的方法包括将衬底放置在反应室中，所述衬底在其表面上根据预定图案在其表面上具有待蚀刻的靶层，并且沉积碳 - （a）将含碳工艺气体引入所述腔室中，（b）在折入路径中产生可重入环形的RF等离子体电流，所述凹入的RF等离子体电流包括通过耦合等离子体RF源功率的工件区域 到（c）将RF等离子体偏置功率或偏置电压耦合到工件的外部部分。 该方法还包括光刻地限定含碳硬掩模层中的预定图案，并且在存在硬掩模层的情况下蚀刻目标层。

公开(公告)号：US20080013911A1

公开(公告)日：2008-01-17

申请号：US11480135

申请日：2006-06-30

申请人： Dean Jennings

发明人： Dean Jennings

IPC分类号： G02B6/10

CPC分类号： G02B6/00 ,  G02B27/0927 ,  G02B27/0994

摘要： A beam shaper has a light pipe fabricated of a material having a refractive index that provides total internal reflection within the light pipe. A first face accepts light and a second face releases light from the light pipe. The faces are orthogonal to an axis about which the light pipe is twisted and have different shapes. The area of the second face differs from an area of the first face by less than 25%.

摘要翻译： 光束整形器具有由具有在光管内提供全内反射的折射率的材料制成的光管。 第一面接受光，第二面从光管中释放光。 这些面正交于光管扭曲的轴线，具有不同的形状。 第二面的面积不同于第一面的面积小于25％。

公开(公告)号：US20070238202A1

公开(公告)日：2007-10-11

申请号：US11393423

申请日：2006-03-30

申请人： Joseph Ranish ,  Tarpan Dixit ,  Dean Jennings ,  Balasubramanian Ramachandran ,  Aaron Hunter ,  Wolfgang Aderhold ,  Bruce Adams ,  Wen Chang

发明人： Joseph Ranish ,  Tarpan Dixit ,  Dean Jennings ,  Balasubramanian Ramachandran ,  Aaron Hunter ,  Wolfgang Aderhold ,  Bruce Adams ,  Wen Chang

IPC分类号： H01L21/66 ,  G01R31/26

CPC分类号： H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention generally relates to methods for the rapid thermal processing (RTP) of a substrate. Embodiments of the invention include controlling a thermal process using either a real-time adaptive control algorithm or by using a control algorithm that is selected from a suite of fixed control algorithms designed for a variety of substrate types. Selection of the control algorithm is based on optical properties of the substrate measured during the thermal process. In one embodiment, a combination of control algorithms are used, wherein the majority of lamp groupings are controlled with a fixed control algorithm and a substantially smaller number of lamp zones are controlled by an adaptive control algorithm.

摘要翻译： 本发明一般涉及用于衬底的快速热处理（RTP）的方法。 本发明的实施例包括使用实时自适应控制算法或通过使用从针对各种基板类型设计的一套固定控制算法中选择的控制算法来控制热处理。 控制算法的选择基于在热处理期间测量的衬底的光学性质。 在一个实施例中，使用控制算法的组合，其中大多数灯分组由固定控制算法控制，并且通过自适应控制算法来控制基本上较少数量的灯区。

公开(公告)号：US06174080B1

公开(公告)日：2001-01-16

申请号：US09130304

申请日：1998-08-06

申请人： Dean Jennings

发明人： Dean Jennings

IPC分类号： G01J558

CPC分类号： G01J5/0003 ,  G01J5/58

摘要： An apparatus for measuring the temperature of a substrate in a thermal processing chamber is disclosed. The chamber includes a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber. The apparatus includes a first polarizer positioned to polarize radiation reflected by the reflector, a probe having an input end positioned to receive reflected and non-reflected radiation from the reflecting cavity, a polarizing system optically coupled to an output end of the probe, and a detector apparatus optically coupled to the polarizing system. The polarizing system is configured to generate a first beam and a second beam, and it includes a second polarizer oriented such that a ratio of reflected radiation to non-reflected radiation is higher in the first beam than the second beam. The detector apparatus generates a first intensity signal from the first beam and a second intensity signal from the second beam. The two intensity signals are processed to determine an emissivity-corrected substrate temperature.

摘要翻译： 公开了一种用于测量热处理室中的衬底的温度的装置。 该腔室包括一反射镜，当该基片定位在腔室中时，该反射器形成具有基底的反射腔。 该装置包括：第一偏振器，其被定位成使由反射器反射的辐射偏振;具有输入端的探针，该输入端定位成接收来自反射腔的反射和未反射的辐射;光学耦合到探针的输出端的偏振光学系统，以及 检测器装置，其光耦合到偏振系统。 偏振系统被配置为产生第一光束和第二光束，并且其包括第二偏振器，其被定向成使得第一光束中的反射辐射与非反射辐射的比率高于第二光束。 检测器装置产生来自第一光束的第一强度信号和来自第二光束的第二强度信号。 处理两个强度信号以确定发射率校正的衬底温度。

公开(公告)号：US6096621A

公开(公告)日：2000-08-01

申请号：US841493

申请日：1997-04-23

申请人： Dean Jennings

发明人： Dean Jennings

IPC分类号： H01L21/762 ,  H01L21/763 ,  H01L21/76

CPC分类号： H01L21/763 ,  H01L21/76264 ,  H01L21/76275 ,  H01L21/76286

摘要： A method for dissipating accumulated charge in a trench isolation structure, comprising the steps of: etching the trench region into a silicon substrate; forming an insulating region on the sidewalls of the trench and the base of the trench; removing the insulator at the bottom of the trench; and filling the trench with polysilicon, the polysilicon engaging the second layer of silicon below the insulator layer.

摘要翻译： 一种用于消散沟槽隔离结构中的累积电荷的方法，包括以下步骤：将沟槽区域蚀刻成硅衬底; 在沟槽的侧壁和沟槽的基底上形成绝缘区域; 去除沟槽底部的绝缘体; 并且用多晶硅填充沟槽，多晶硅与绝缘体层下面的第二层硅接合。

公开(公告)号：US5681216A

公开(公告)日：1997-10-28

申请号：US597680

申请日：1996-02-06

申请人： Dean Jennings

发明人： Dean Jennings

IPC分类号： B24B1/00 ,  B24B7/22 ,  B24B13/00 ,  B24D7/10 ,  H01L21/304 ,  B24B57/00

CPC分类号： H01L21/02024 ,  B24B1/00 ,  B24B13/00 ,  B24B7/228 ,  B24D7/10

摘要： A polishing tool having a polishing wheel that forms a set of pockets wherein the pockets receive a stream of water and are formed such that a high hydrostatic pressure builds in the pockets as the polishing tool rotates in a high precision grinding machine and addresses a surface of a substrate. The high hydrostatic pressure removes material from the surface of the substrate while preserving the precise thickness variation control of the high precision grinding machine.

摘要翻译： 一种抛光工具，其具有形成一组凹穴的抛光轮，其中凹穴接收水流并且形成为使得当抛光工具在高精度研磨机中旋转时，在袋中形成高静压力，并且处理 底物。 高静态压力从基材表面除去材料，同时保持高精度磨床的精确厚度变化控制。