公开(公告)号：US20140340663A1

公开(公告)日：2014-11-20

申请号：US14345118

申请日：2012-08-21

申请人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Bernardus Antonius Johannes Luttikhuis ,  Roelof Koole ,  Hendrikus Jan Wondergem ,  Petrus Carolus Johannes Graat

发明人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Bernardus Antonius Johannes Luttikhuis ,  Roelof Koole ,  Hendrikus Jan Wondergem ,  Petrus Carolus Johannes Graat

IPC分类号： G03F7/20

CPC分类号： G03F7/70783 ,  G01B11/16 ,  G03F1/84 ,  G03F7/70141 ,  G03F7/7085 ,  G03F7/70916

摘要： A lithographic patterning device deformation monitoring apparatus (38) comprising a radiation source (40), an imaging device (42), and a processor (50). The radiation source being configured to direct a plurality of beams of radiation (41) with a predetermined diameter towards a lithographic patterning device (MA) such that they are reflected by the patterning device. The imaging detector configured to detect spatial positions of the radiation beams (41′) after they have been reflected by the patterning device. The processor configured to monitor the spatial positions of the radiation beams and thereby determine the presence of a patterning device deformation. The imaging detector has an collection angle which is smaller than a minimum angle of diffraction of the radiation beams.

摘要翻译： 一种包括辐射源（40），成像装置（42）和处理器（50）的平版印刷图案形成装置变形监测装置（38）。 辐射源被配置为将多个具有预定直径的辐射光束引向平版印刷图案形成装置（MA），使得它们被图案形成装置反射。 该成像检测器被配置为在被图案形成装置反射之后检测辐射束（41'）的空间位置。 处理器被配置为监视辐射束的空间位置，从而确定图案形成装置变形的存在。 成像检测器的收集角度小于辐射束的最小衍射角。

公开(公告)号：US20110149276A1

公开(公告)日：2011-06-23

申请号：US12904610

申请日：2010-10-14

申请人： Luigi SCACCABAROZZI ,  Vadim Yevgenyevich Banine ,  Christian Wagner

发明人： Luigi SCACCABAROZZI ,  Vadim Yevgenyevich Banine ,  Christian Wagner

IPC分类号： G01N21/01 ,  G03B27/42

CPC分类号： G01N21/94 ,  G01N2021/95676 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field.

摘要翻译： 检测器检测来自掩模的辐射以形成图像，但是图像的焦平面位于掩模的前面。 布置在面罩上的任何颗粒将被聚焦。 然而，面具上的图案将会失焦。 因此可以检测具有任意图案的掩模上的颗粒的存在和位置。 检测器的景深较小，焦平面不比图案形成装置的表面高两倍的景深。

公开(公告)号：US08405825B2

公开(公告)日：2013-03-26

申请号：US12904610

申请日：2010-10-14

申请人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Christian Wagner

发明人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Christian Wagner

IPC分类号： G01N21/00

CPC分类号： G01N21/94 ,  G01N2021/95676 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field.

摘要翻译： 检测器检测来自掩模的辐射以形成图像，但是图像的焦平面位于掩模的前面。 布置在面罩上的任何颗粒将被聚焦。 然而，面具上的图案将会失焦。 因此可以检测具有任意图案的掩模上的颗粒的存在和位置。 检测器的景深较小，焦平面不比图案形成装置的表面高两倍的景深。

公开(公告)号：US20120182538A1

公开(公告)日：2012-07-19

申请号：US13186034

申请日：2011-07-19

申请人： Roelof Koole ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Oktay Yildirim

发明人： Roelof Koole ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Oktay Yildirim

IPC分类号： G03B27/62 ,  G01N21/956

CPC分类号： G01N21/6428 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84

摘要： An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with radiation at wavelengths suitable for exciting the fluorescent dye, monitoring the article for emission of second radiation by the fluorescent dye at a wavelength different from the first radiation, and generating a signal representing contamination in the event of detecting the second radiation. In one example, measures such as low-affinity coatings may be applied to the reticle to reduce affinity for the dye molecules, while the dye molecules will bind by physical or chemical adsorption to the contaminant particles. Dyes may be selected to have fluorescence behavior enhanced by hydrophobicity or hydrophilicity, and contaminant surfaces treated by buffer coatings accordingly.

摘要翻译： 检查诸如EUV光刻掩模版的物品以检测污染物颗粒。 该方法包括将荧光染料材料施加到制品上，用适于激发荧光染料的波长的辐射照射物品，监测该物品用荧光染料发射不同于第一辐射的波长的第二辐射， 在检测到第二辐射的情况下表示污染的信号。 在一个实例中，诸如低亲和性涂层的措施可以应用于掩模版以降低对染料分子的亲和性，而染料分子将通过物理或化学吸附结合到污染物颗粒。 可以选择染料以通过疏水性或亲水性增强荧光性能，并且相应地通过缓冲涂层处理污染物表面。

公开(公告)号：US09488922B2

公开(公告)日：2016-11-08

申请号：US13883083

申请日：2011-10-06

申请人： Yuri Vainer ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Arie Jeffrey Den Boef

发明人： Yuri Vainer ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Arie Jeffrey Den Boef

IPC分类号： G01J1/42 ,  G03F7/20 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F1/24

CPC分类号： G03F7/7085 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95623 ,  G01N2021/95676 ,  G03F1/24 ,  G03F1/84 ,  G03F7/70916

摘要： An EUV lithography reticle is inspected to detect contaminant particles. The inspection apparatus comprises illumination optics with primary radiation. An imaging optical system with plural branches is arranged to form and detect a plurality of images, each branch having an image sensor and forming its image with a different portion of radiation received from the illuminated article. A processor combines information from the detected images to report on the presence and location of contaminant particles. In one or more branches the primary radiation is filtered out, so that the detected image is formed using only secondary radiation emitted by contaminant material in response to the primary radiation. In a dark field imaging branch using the scattered primary radiation, a spatial filter blocks spatial frequency components associated with periodic features of the article under inspection, to allow detection of particles which cannot be detected by secondary radiation.

摘要翻译： 检查EUV光刻掩模版以检测污染物颗粒。 检查装置包括具有初级辐射的照明光学器件。 布置具有多个分支的成像光学系统以形成和检测多个图像，每个分支具有图像传感器并且形成具有从照明物品接收的辐射的不同部分的图像。 处理器结合来自检测图像的信息，报告污染物颗粒的存在和位置。 在一个或多个分支中，主辐射被滤出，使得仅使用由污染物材料响应于初级辐射发射的二次辐射形成检测到的图像。 在使用散射的初级辐射的暗场成像分支中，空间滤波器阻挡与被检查物品的周期特征相关联的空间频率分量，以允许检测不能被二次辐射检测的颗粒。

公开(公告)号：US20110043795A1

公开(公告)日：2011-02-24

申请号：US12805808

申请日：2010-08-19

申请人： Arie Jeffrey Den Boef ,  Vadim Yevgenyevich Banine ,  Sander Frederik Wuister ,  Luigi Scaccabarozzi

发明人： Arie Jeffrey Den Boef ,  Vadim Yevgenyevich Banine ,  Sander Frederik Wuister ,  Luigi Scaccabarozzi

IPC分类号： G01N21/01

CPC分类号： G01N21/95623

摘要： In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.

摘要翻译： 在一方面，公开了一种用于检测物体上缺陷的存在或不存在的检查方法，该物体包括具有物理深度的凹部。 该方法包括在物体上引导辐射，辐射具有基本上等于凹部的光学深度的两倍的波长，检测由对象重新引导的辐射或物体上的缺陷，以及确定存在或不存在 来自重新导向的辐射的缺陷。

公开(公告)号：US20100151394A1

公开(公告)日：2010-06-17

申请号：US12567383

申请日：2009-09-25

申请人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Norbertus Benedictus Koster ,  Johannes Hubertus Josephina Moors ,  Maarten Van Kampen ,  Ramasamy Raju ,  Wayne Mathew Lytle ,  David Neil Ruzic ,  Martin John Neumann

发明人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Norbertus Benedictus Koster ,  Johannes Hubertus Josephina Moors ,  Maarten Van Kampen ,  Ramasamy Raju ,  Wayne Mathew Lytle ,  David Neil Ruzic ,  Martin John Neumann

IPC分类号： G03F7/20 ,  G03B27/52 ,  B08B13/00

CPC分类号： G03F7/70925

摘要： Embodiments of the invention relate to a system for contactless cleaning of an object surface, a lithographic apparatus including the system, and a method of manufacturing a device. The system may include a He plasma source contained in a chamber and a control unit constructed to modify plasma parameters in use, such as the electron energy distribution of the plasma for causing an increase in formation of He metastables without modifying operational parameters of the plasma source. The control unit may include an electrical biasing unit constructed to apply a positive bias voltage to the object, for attracting free electrons from the plasma. The system may include a supplementary gas source, which may be either pre-mixed with He or be supplied from a further gas source. The supplementary gas may be selected based on a pre-knowledge on a type of particles to be expected on the surface of the object.

摘要翻译： 本发明的实施例涉及一种用于物体表面的非接触式清洁的系统，包括该系统的光刻设备以及一种制造设备的方法。 该系统可以包括包含在腔室中的He等离子体源和构造为修改使用中的等离子体参数的控制单元，例如等离子体的电子能量分布，以引起He亚稳态的形成增加而不改变等离子体源的操作参数 。 控制单元可以包括电偏置单元，其构造成向对象施加正偏置电压，用于从等离子体吸引自由电子。 该系统可以包括辅助气体源，其可以与He预先混合或者从另外的气体源供应。 可以基于对物体表面上预期的颗粒类型的预先知识来选择补充气体。

公开(公告)号：US09372399B2

公开(公告)日：2016-06-21

申请号：US13812459

申请日：2011-07-21

申请人： Martinus Bernardus Van Der Mark ,  Vadim Yevgenyevich Banine ,  Andre Bernardus Jeunink ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Emiel Andreas Godefridus Peeters ,  Johan Hendrik Klootwijk ,  Roelof Koole ,  Christianus Martinus Van Heesch ,  Ruediger Guenter Mauczok ,  Jacobus Bernardus Giesbers

发明人： Martinus Bernardus Van Der Mark ,  Vadim Yevgenyevich Banine ,  Andre Bernardus Jeunink ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Emiel Andreas Godefridus Peeters ,  Johan Hendrik Klootwijk ,  Roelof Koole ,  Christianus Martinus Van Heesch ,  Ruediger Guenter Mauczok ,  Jacobus Bernardus Giesbers

IPC分类号： G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.

摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。

公开(公告)号：US09110389B2

公开(公告)日：2015-08-18

申请号：US13241837

申请日：2011-09-23

申请人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

发明人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。

公开(公告)号：US08493548B2

公开(公告)日：2013-07-23

申请号：US11882853

申请日：2007-08-06

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/32 ,  G03B27/42

CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/003

摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.