公开(公告)号：US20080180645A1

公开(公告)日：2008-07-31

申请号：US12060514

申请日：2008-04-01

申请人： Herman Vogel ,  Klaus Simon ,  Antonius Theodorus Anna Maria Derksen

发明人： Herman Vogel ,  Klaus Simon ,  Antonius Theodorus Anna Maria Derksen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/20 ,  G03F7/70358 ,  G03F7/709 ,  H01L21/027

摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

摘要翻译： 液浸式光刻系统包括：用电磁辐射曝光基板的曝光系统，包括将电磁辐射聚焦在基板上的投影光学系统。 液体供应系统在投影光学系统和基板之间提供液体流动。 可选的多个微喷嘴布置在投影光学系统的一侧的周边周围，以便在衬底被暴露的区域中提供基本均匀的液流速度分布。

公开(公告)号：US20070258080A1

公开(公告)日：2007-11-08

申请号：US11418453

申请日：2006-05-05

申请人： Enno Brink ,  Henricus Wilhelmus Van Buel ,  Joseph Consolini ,  Gerardus Johannes Keijsers ,  Klaus Simon ,  Johannes De Smit ,  Richard Travers ,  Maurice Anton Teuwen ,  Arnout Meester ,  Frederick Hafner ,  Vinyu Greenlee ,  Hubertus Antonius Baijens

发明人： Enno Brink ,  Henricus Wilhelmus Van Buel ,  Joseph Consolini ,  Gerardus Johannes Keijsers ,  Klaus Simon ,  Johannes De Smit ,  Richard Travers ,  Maurice Anton Teuwen ,  Arnout Meester ,  Frederick Hafner ,  Vinyu Greenlee ,  Hubertus Antonius Baijens

IPC分类号： G03B27/58

CPC分类号： G03F7/70691

摘要： According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.

摘要翻译： 根据本发明的一个方面，提供了一种衬底载体，其布置成使用真空将衬底保持在适当位置，真空建立在衬底载体和衬底之间形成的密封空间中。

公开(公告)号：US06295332B1

公开(公告)日：2001-09-25

申请号：US09332206

申请日：1999-06-12

申请人： Robert Allen Selzer ,  William Rudolf Friml ,  Joe Baker Gagnon ,  Robert Harrison Macklin ,  Franz Ludwig Rauch ,  Heinz Siegert ,  Klaus Simon

发明人： Robert Allen Selzer ,  William Rudolf Friml ,  Joe Baker Gagnon ,  Robert Harrison Macklin ,  Franz Ludwig Rauch ,  Heinz Siegert ,  Klaus Simon

IPC分类号： G21K500

CPC分类号： G03F7/70216 ,  G03F7/708 ,  G21K5/00 ,  Y10S430/168

摘要： The present invention is directed to the production of high quality semi-conductor devices created at speeds and in sizes that far exceed current x-ray lithography capabilities. The steps involved in the method include the use and development of horizontal beams from a synchrotron or point source of x-ray beams; preparation of submicrometer, transverse horizontal and vertical stepper stages and frames; providing a stepper base frame for the proper housing and mating of the x-ray beam; minimizing the effects of temperature and airflow control by means of a environmental chamber; transporting, handling and prealigning wafers and other similar items for tight process control; improving the control and sensing of positional accuracy through the use of differential variable reluctance transducers; controlling the continuous gap and all six degrees of freedom of the wafer being treated with a multiple variable stage control; incorporating alignment systems using unambiguous targets to provide data to align one level to the next level; beam transport, shaping or shaping devices, to include x-ray point sources; using an inline collimator or concentrator for collimating or concentrating the x-ray beams; and, imaging the mask pattern at the precise moment for optimum effectiveness.

公开(公告)号：US08011915B2

公开(公告)日：2011-09-06

申请号：US11364497

申请日：2006-03-01

申请人： Klaus Simon

发明人： Klaus Simon

IPC分类号： B29C59/02

CPC分类号： G03F9/7042 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.

公开(公告)号：US07570342B2

公开(公告)日：2009-08-04

申请号：US11294348

申请日：2005-12-06

申请人： Klaus Simon ,  Enno Van Den Brink ,  Gerardus Johannes Joseph Keijsers ,  Adrianus Hubertus Henricus Van Dijk ,  Hubertus Antonius Marinus Baijens

发明人： Klaus Simon ,  Enno Van Den Brink ,  Gerardus Johannes Joseph Keijsers ,  Adrianus Hubertus Henricus Van Dijk ,  Hubertus Antonius Marinus Baijens

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933

摘要： An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.

摘要翻译： 曝光装置设置有用于从投影系统和基板之间的区域去除气体的辐射源，图案形成结构，投影系统，基板和气体冲洗系统。

公开(公告)号：US07408624B2

公开(公告)日：2008-08-05

申请号：US11170735

申请日：2005-06-30

申请人： Michael Josephus Evert Van De Moosdijk ,  Klaus Simon ,  Wilhelmus Johannes Maria De Laat

发明人： Michael Josephus Evert Van De Moosdijk ,  Klaus Simon ,  Wilhelmus Johannes Maria De Laat

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70691

摘要： A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The polished surface supports a second substrate of a second type and the projection system is configured to project the patterned radiation beam onto the second substrate.

摘要翻译： 光刻设备包括：衬底台，其构造成保持第一类型的第一衬底，所述第一衬底具有抛光表面; 以及投影系统，被配置为将图案化的辐射束投影到基板的目标部分上。 抛光表面支撑第二类型的第二衬底，并且投影系统被配置为将图案化的辐射束投影到第二衬底上。

公开(公告)号：US20060119811A1

公开(公告)日：2006-06-08

申请号：US11036186

申请日：2005-01-18

申请人： Klaus Simon

发明人： Klaus Simon

IPC分类号： G03B27/52

CPC分类号： G03F7/70933

摘要： An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for introducing flushing gas in an area between the projection system and the substrate.

摘要翻译： 曝光装置设置有辐射源，图案形成结构，投影系统，基板以及用于在投影系统和基板之间的区域中引入冲洗气体的气体冲洗系统。

公开(公告)号：US08571318B2

公开(公告)日：2013-10-29

申请号：US13369026

申请日：2012-02-08

申请人： Klaus Simon

发明人： Klaus Simon

IPC分类号： G06K9/00 ,  G06K9/34

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.

公开(公告)号：US07676088B2

公开(公告)日：2010-03-09

申请号：US11019521

申请日：2004-12-23

申请人： Klaus Simon

发明人： Klaus Simon

IPC分类号： G06K9/00 ,  B41F33/00 ,  G03B27/58

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.

摘要翻译： 公开了一种压印方法，在实施例中，包括分别将基板上的可压印介质的第一和第二间隔的目标区域与第一和第二模板接触，以在介质中形成相应的第一和第二印记，并将第一和第二模板与 印记介质

公开(公告)号：US20090212462A1

公开(公告)日：2009-08-27

申请号：US12391954

申请日：2009-02-24

申请人： Yvonne Wendela KRUIJT-STEGEMAN ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karal Diederick Van Der Mast ,  Klaus Simon

发明人： Yvonne Wendela KRUIJT-STEGEMAN ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karal Diederick Van Der Mast ,  Klaus Simon

IPC分类号： B28B3/00 ,  B29C59/02

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。