Abstract:
The crawler-type travel device includes a plurality of shoe plates, a first link section, a rotational wheel, and a shaft. The rotational wheel includes a first roller and a second roller. The first roller makes contact with first end portions corresponding to axial outer ends of the first link members forming the first link section. The second roller is aligned with and disposed on the axial inner side of the first roller. The second roller is rotatable independently from the first roller. The second roller makes contact with second end portions corresponding to axial inner ends of the first link members.
Abstract:
There is provided an air-conditioning system in which at least one or some of a plurality of air-conditioning apparatuses are each controllable such that the indoor temperature is maintained between two set temperatures. All the plurality of air-conditioning apparatuses are switched to either one of heating operation and cooling operation on the basis of a temperature difference between the indoor temperature related to an air-conditioning apparatus that is in the first operation mode and a set target temperature and a temperature difference between the indoor temperature related to an air-conditioning apparatuses that is in the second operation mode and an upper temperature limit or a lower temperature limit.
Abstract:
A track shoe connecting link 25 has shaft holes 31, 32 at both end portions. In the track shoe connecting link 25, a plurality of insertion holes 39 are formed between the shaft holes 31, 32, and window holes 40, 41 are formed so as to correspond to each insertion hole 39. A bolt 43 is inserted through each of the insertion holes 39 and a nut 44 is screwed onto a distal end of the bolt 43 in each of the window holes 40, 41. Accordingly, the track shoe connecting link 25 is fixed to a track shoe 26. The area of the window hole 41 that is adjacent to the second shaft hole 32 is greater than the area of the window hole 40. Accordingly, the rigidity of the track shoe connecting link 25 becomes smaller toward the second shaft hole 32.
Abstract:
In a track with a rotatable bushing which is brought into engagement with a sprocket of a track-type vehicle, it is intended that strength is enhanced rationally by link functionality sharing and by combination of such assigned functional tasks for achieving further improvements in rotatable bushing function. To this end, a first bolt insertion hole provided in a track shoe mount surface of an external link and a second bolt insertion hole provided in a track shoe mount surface of an internal link are arranged on the same straight line, and a straight line connecting the first bolt insertion hole and the second bolt insertion hole is situated at a position more interior than a contact plane of the external link and internal link.
Abstract:
A first assembly 22A has two first links 25 that are parallel to each other and a second assembly 22B has two second links 28 that are parallel to each other. Sleeves 30 that are provided at both end portions of the second assembly 22B are externally fitted to support shafts 27 that are provided at both end portions of the first assembly 22A, respectively. When the total number of the assemblies is odd, a third assembly 22C is arranged between the first assembly 22A and the second assembly 22B. The sleeve 30 of the second assembly 22B is externally fitted to the support shaft 27 of the third assembly 22C and the sleeve 30 of the third assembly 22C is externally fitted to the support shaft 27 of the first assembly 22A. Therefore, even if the total number of the assemblies for the crawler belt is odd, the crawler belt of a parallel-link type can be applied.
Abstract:
A throw-away insert includes: an upper and bottom surface; two side surfaces; two end surfaces; a main cutting section formed from a ridge line positioned at the intersection between the side surfaces and the upper surface; a secondary cutting section formed from a ridge line positioned at the intersection between the end surfaces and the upper surface; an axial support surface supported by an insert pocket of a cutter body; and noses formed at the corners of the upper surface. The corner angles of the noses when seen from above are essentially right angles. The axial support surface is formed as a section of the end surface. The secondary cutting section is parallel to the ridge line at the upper end of the axial support surface and the bottom surface. The upper end of the axial support surface is positioned so that it is projected more in the direction of the longitudinal axis of the main cutting section than the ridge line of the upper end.
Abstract:
A semiconductor device having a barrier insulating film covering a copper wiring is formed by a plasma enhanced CVD method. The method includes supplying high frequency power of a frequency of 1 MHz or more to a first electrode, and holding a substrate on which copper wiring is formed on a second electrode facing the first electrode; supplying a film forming gas containing an alkyl compound and an oxygen-containing gas between the first and second electrodes while regulating gas pressure of the film forming gas to 1 Torr or less; and supplying high frequency power to either of the first and second electrodes to convert the film forming gas into a plasma, and allowing the alkyl compound and the oxygen-containing gas of the film forming gas to react to form a barrier insulating film covering the surface of the substrate.
Abstract:
A surface of a copper (Cu) wiring layer formed over a semiconductor substrate is exposed to a plasma gas selected from the group consisting of an ammonia gas, a mixed gas of nitrogen and hydrogen, a CF4 gas, a C2F6 gas and a NF3 gas. The surface of the copper (Cu) wiring layer is then exposed to an atmosphere or a plasma of a gas selected from the group consisting of an ammonia gas, an ethylenediamine gas, a fÀ-diketone gas, a mixed gas consisting of the ammonia gas and a hydrocarbon gas (CxHy), and a mixed gas consisting of a nitrogen gas and the hydrocarbon gas (CxHy), and a Cu diffusion preventing insulating film is formed on the copper (Cu) wiring layer.
Abstract:
The present invention relates to a semiconductor device manufacturing method for forming an interlayer insulating film having a low dielectric constant by coating a copper wiring. The low dielectric constant insulating film is formed by reaction of a plasma of a film-forming gas containing an oxygen-containing gas of N2O, H2O, or CO2, ammonia (NH3), and at least one of an alkyl compound having a siloxane bond and methylsilane (SiHn(CH3)4−n: n=0, 1, 2, 3).
Abstract:
The present invention discloses a film forming method for forming an insulating film having a low dielectric constant. This method comprises the steps of adding at least one diluting gas of an inert gas and a nitrogen gas (N2) to a major deposition gas component consisting of siloxane and N2O, converting the resultant deposition gas into plasma, causing reaction in the plasma, and forming an insulating film 25,27, or 28 on a substrate targeted for film formation.