Method of processing a substrate, heating apparatus, and method of forming a pattern
    71.
    发明授权
    Method of processing a substrate, heating apparatus, and method of forming a pattern 失效
    处理基板的方法,加热装置以及形成图案的方法

    公开(公告)号:US07009148B2

    公开(公告)日:2006-03-07

    申请号:US10682419

    申请日:2003-10-10

    IPC分类号: F27B5/14

    摘要: A method of processing a substrate, comprising forming a chemically amplified resist film on a substrate, irradiating energy beams to the chemically amplified resist film to form a latent image therein, carrying out heat treatment with respect to the chemically amplified resist film, heating treatment being carried out in a manner of relatively moving a heating section for heating the chemically amplified resist film and the substrate forming a gas stream flowing reverse to the relatively moving direction of the heating section between the lower surface of the heating section and the chemically amplified resist film.

    摘要翻译: 一种处理衬底的方法,包括在衬底上形成化学放大的抗蚀剂膜,将能量束照射到化学放大的抗蚀剂膜上以在其中形成潜像,对化学放大的抗蚀剂膜进行热处理,加热处理为 以相对移动加热部分的方式进行加热,该加热部分用于加热化学放大的抗蚀剂膜和形成在加热部分的下表面和化学放大型抗蚀剂膜之间形成与加热部分的相对移动方向相反的方向流动的气流 。

    Substrate treatment method, substrate treatment apparatus, and method of manufacturing semiconductor device
    72.
    发明申请
    Substrate treatment method, substrate treatment apparatus, and method of manufacturing semiconductor device 审中-公开
    基板处理方法,基板处理装置以及半导体装置的制造方法

    公开(公告)号:US20050250056A1

    公开(公告)日:2005-11-10

    申请号:US11114043

    申请日:2005-04-26

    CPC分类号: G03F7/38 H01L21/312

    摘要: According to an aspect of the present invention, there is provided a substrate treatment method comprising forming a chemically amplified resist film on a substrate to be treated, and supplying heat to the chemically amplified resist film to perform a heat treatment, wherein the heat treatment includes creating a first temperature state satisfying TT TB in which TT is a temperature at a surface portion of the chemically amplified resist film, and TB is a temperature at an interface portion of the chemically amplified resist film with the substrate to be treated.

    摘要翻译: 根据本发明的一个方面,提供了一种基板处理方法,包括在待处理的基板上形成化学放大的抗蚀剂膜,并向化学放大的抗蚀剂膜供热以进行热处理,其中热处理包括 产生一个满足T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T B SUB>其中T T T是化学放大抗蚀剂膜的表面部分处的温度,T B B是化学放大抗蚀剂膜的界面部分处的温度 与待处理的基底。

    Optical modulation device having excellent electric characteristics by effectively restricting heat drift
    74.
    发明授权
    Optical modulation device having excellent electric characteristics by effectively restricting heat drift 失效
    通过有效地限制热漂移具有优异的电特性的光调制装置

    公开(公告)号:US06891982B2

    公开(公告)日:2005-05-10

    申请号:US10333546

    申请日:2002-05-23

    摘要: An optical waveguide for guided an incident light is formed on a substrate having an electro-optic effect. A first buffer layer is formed to cover an upper surface of the substrate. A conductive film is formed above the first buffer layer. A center electrode and a ground electrode are formed for applying a voltage in order to induce an electric field in the optical waveguide. A second buffer layer is formed between the conductive film and at least one of the center electrode and the ground electrode. The conductive film is formed to be present on at least a part below the ground electrode. A light guided through the optical waveguide is modulated by changing a phase by a voltage applied to the optical waveguide. Thereby, a thermal drift can be effectively restricted so that an optical modulation device having excellent electric characteristics can be realized.

    摘要翻译: 在具有电光效应的基板上形成用于引导入射光的光波导。 形成第一缓冲层以覆盖基板的上表面。 导电膜形成在第一缓冲层上方。 形成中心电极和接地电极以施加电压以便在光波导中引起电场。 在导电膜和至少一个中心电极和接地电极之间形成第二缓冲层。 导电膜形成为存在于接地电极下方的至少一部分上。 通过光波导引导的光被施加到光波导的电压改变相位来调制。 因此,可以有效地限制热漂移,从而可以实现具有优异电特性的光调制装置。

    Semiconductor light receiving element provided with acceleration spacer layers between plurality of light absorbing layers and method for fabricating the same
    76.
    发明授权
    Semiconductor light receiving element provided with acceleration spacer layers between plurality of light absorbing layers and method for fabricating the same 失效
    在多个光吸收层之间设置有加速间隔层的半导体光接收元件及其制造方法

    公开(公告)号:US06756609B2

    公开(公告)日:2004-06-29

    申请号:US10312470

    申请日:2002-12-23

    IPC分类号: H01L3300

    CPC分类号: H01L31/101

    摘要: A semiconductor light receiving element has an n electrode, an n-type semiconductor doped layer or a non-doped layer provided above the n electrode, a semiconductor light absorbing layer provided above the n-type semiconductor doped layer or the non-doped layer, a p-type semiconductor doped layer provided above the semiconductor light absorbing layer, and a p electrode provided above the p-type semiconductor doped layer. The semiconductor light absorbing layer has at least two layer portions doped to p-type, and a spacer layer for acceleration which is formed from a semiconductor material sandwiched by the two layer portions and which makes electrons and positive holes generated by incident light being absorbed at the semiconductor light absorbing layer accelerate and run.

    摘要翻译: 半导体光接收元件具有设置在n电极上方的n电极,n型半导体掺杂层或非掺杂层,设置在n型半导体掺杂层或非掺杂层上方的半导体光吸收层, 设置在半导体光吸收层上方的p型半导体掺杂层,以及设置在p型半导体掺杂层上方的p型电极。 半导体光吸收层具有掺杂到p型的至少两个层部分和由夹在两层部分之间的半导体材料形成的用于加速的间隔层,并且使由入射光产生的电子和正空穴被吸收在 半导体光吸收层加速运行。

    Optical element, holding structure for optical element, and image pickup apparatus
    78.
    发明授权
    Optical element, holding structure for optical element, and image pickup apparatus 有权
    光学元件,用于光学元件的保持结构和图像拾取装置

    公开(公告)号:US06362921B1

    公开(公告)日:2002-03-26

    申请号:US09414139

    申请日:1999-10-07

    IPC分类号: G02B2710

    摘要: In an optical element composed of an entrance refractive surface, an exit refractive surface and a plurality of internal reflective surfaces provided between the entrance refractive surface and the exit refractive surface, a structure is provided for enabling the optical element to turn around a reference axis of the entrance refractive surface. Further, in such an optical element, an diaphragm member is disposed adjacent to the entrance refractive surface and is arranged to vary an aperture diameter thereof according to a movement thereof.

    摘要翻译: 在由入射折射表面,出射折射表面和设置在入射折射表面和出射折射表面之间的多个内部反射表面组成的光学元件中,提供了一种结构,用于使光学元件能够绕着 入口折射面。 此外,在这种光学元件中,隔膜构件设置成与入射折射面相邻,并且被布置成根据其移动来改变其孔径直径。

    Optical element, jig for holding optical element, and apparatus including optical element
    79.
    发明授权
    Optical element, jig for holding optical element, and apparatus including optical element 失效
    光学元件,用于保持光学元件的夹具,以及包括光学元件的装置

    公开(公告)号:US06337773B1

    公开(公告)日:2002-01-08

    申请号:US09099146

    申请日:1998-06-18

    IPC分类号: G02B300

    CPC分类号: G02B17/086 G02B17/0848

    摘要: An optical element is provided that allows accurate measurement of the shapes of the element and its surfaces which light is bound to strike, a jig is provided for holding the optical element, and an apparatus such as an image pickup apparatus or display apparatus is provided which includes the optical element. This optical element is characterized in that it includes surfaces which light is bound to strike and reference portions indicating the reference positions of the shapes of the surfaces, and the reference portions have curved surfaces defining points corresponding to the reference positions.

    摘要翻译: 提供一种光学元件,其允许精确测量光束被撞击的元件及其表面的形状,提供用于保持光学元件的夹具,并且提供诸如图像拾取装置或显示装置的装置,其中 包括光学元件。 该光学元件的特征在于,其包括光被束缚的表面和指示表面的形状的参考位置的参考部分,并且参考部分具有限定对应于参考位置的点的弯曲表面。