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71.
公开(公告)号:US11362070B2
公开(公告)日:2022-06-14
申请号:US16939650
申请日:2020-07-27
Applicant: Micron Technology, Inc.
Inventor: Aparna U. Limaye , Dong Soon Lim , Randon K. Richards , Owen R. Fay
IPC: H01L23/552 , H01L25/065 , H01L25/18 , H01L23/00 , H01L23/64 , H01L21/78 , H01L21/66 , H01L25/00 , H01L23/66 , H01Q1/22 , H01Q1/48
Abstract: Disclosed is a microelectronic device assembly comprising a substrate having conductors exposed on a surface thereof. Two or more stacks of microelectronic devices are located on the substrate, and microelectronic devices of the stacks are connected to vertical conductive paths external to the stacks and extending to the substrate and to lateral conductive paths extending between the stacks. Methods of fabrication are also disclosed.
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72.
公开(公告)号:US20220059508A1
公开(公告)日:2022-02-24
申请号:US17520568
申请日:2021-11-05
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Owen R. Fay , Eiichi Nakano
IPC: H01L25/065 , H01L23/373 , H01L23/498 , H01L23/00 , H05K1/02
Abstract: Semiconductor assemblies including thermal layers and associated systems and methods are disclosed herein. In some embodiments, the semiconductor assemblies comprise one or more semiconductor devices over a substrate. The substrate includes a thermal layer configured to transfer thermal energy across the substrate. The thermal energy is transferred from the semiconductor device to the graphene layer using one or more thermal connectors.
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公开(公告)号:US20220028771A1
公开(公告)日:2022-01-27
申请号:US17493352
申请日:2021-10-04
Applicant: Micron Technology, Inc.
Inventor: Owen R. Fay , Jack E. Murray
IPC: H01L23/498 , H01L21/48 , H01L23/13 , H01L25/10 , H01L25/00 , H01L23/00 , H01L25/065 , H01L25/18
Abstract: Package-on-package systems for packaging semiconductor devices. In one embodiment, a package-on-package system comprises a first semiconductor package device and a second semiconductor package device. The first package device includes a base substrate including a first side having a die-attach region and a peripheral region, a first semiconductor die attached to the base substrate at the die-attach region, wherein the first semiconductor die has a front side facing the first side of the base substrate and a backside spaced apart from the first side of the base substrate by a first distance, and a high density interconnect array in the perimeter region of the base substrate outside of the die-attach region. The interconnect array has a plurality of interconnects that extend from the first side of the base substrate by a second distance greater than the first distance. The second semiconductor device package is electrically coupled corresponding individual interconnects.
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公开(公告)号:US20210384043A1
公开(公告)日:2021-12-09
申请号:US16896043
申请日:2020-06-08
Applicant: Micron Technology, Inc.
Inventor: Owen R. Fay , Chan H. Yoo
Abstract: Methods for manufacturing semiconductor devices having a flexible reinforcement structure, and associated systems and devices, are disclosed herein. In one embodiment, a method of manufacturing a semiconductor device includes electrically coupling at least one semiconductor die to a redistribution structure on a first carrier. The semiconductor die can include a first surface connected to the redistribution structure and a second surface spaced apart from the redistribution structure. The method also includes reducing a thickness of the semiconductor die to no more than 10 μm. The method further includes coupling a flexible reinforcement structure to the second surface of the at least one semiconductor die.
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公开(公告)号:US11081460B2
公开(公告)日:2021-08-03
申请号:US16236237
申请日:2018-12-28
Applicant: Micron Technology, Inc.
Inventor: Suresh Yeruva , Owen R. Fay , Sameer S. Vadhavkar , Adriel Jebin Jacob Jebaraj , Wayne H. Huang
IPC: H01L23/00
Abstract: A method of manufacturing a semiconductor device having a conductive substrate having a first surface, a second surface opposite the first surface, and a passivation material covering a portion of the first surface can include applying a seed layer of conductive material to the first surface of the conductive substrate and to the passivation material, the seed layer having a first face opposite the conductive substrate. The method can include forming a plurality of pillars comprising layers of first and second materials. The method can include etching the seed layer to undercut the seed layer between the conductive substrate and the first material of at least one of the pillars. In some embodiments, a cross-sectional area of the seed layer in contact with the passivation material between the first material and the conductive substrate is less than the cross-sectional area of the second material.
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公开(公告)号:US20210183662A1
公开(公告)日:2021-06-17
申请号:US17189006
申请日:2021-03-01
Applicant: Micron Technology, Inc.
Inventor: Owen R. Fay , Akshay N. Singh , Kyle K. Kirby
IPC: H01L21/48 , H01L21/66 , H01L23/498 , H01L25/065 , H01L23/48
Abstract: A semiconductor device assembly and method of forming a semiconductor device assembly that includes a first substrate, a second substrate disposed over the first substrate, at least one interconnect between the substrates, and at least one pillar extending from the bottom surface of the first substrate. The pillar is electrically connected to the interconnect and is located adjacent to a side of the first substrate. The pillar is formed by filling a via through the substrate with a conductive material. The first substrate may include an array of pillars extending from the bottom surface adjacent to a side of the substrate that are formed from a plurality of filled vias. The substrate may include a test pad located on the bottom surface or located on the top surface. The pillars may include a removable coating enabling the pillars to be probed without damaging the inner conductive portion of the pillar.
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公开(公告)号:US11018056B1
公开(公告)日:2021-05-25
申请号:US16671577
申请日:2019-11-01
Applicant: Micron Technology, Inc.
Inventor: Kyle K. Kirby , Owen R. Fay
IPC: H01L21/76 , H01L21/768 , H01L21/56 , H01L23/00 , H01L21/463 , H01L21/60
Abstract: A method of coupling a first semiconductor device to a second semiconductor device can include encapsulating solder balls on a first surface of a first substrate of the first semiconductor device with an encapsulant material. In some embodiments, the method includes removing a portion of the encapsulant material and a portion the solder balls to form a mating surface. The method can include reflowing the solder balls. In some embodiments, the method includes inserting exposed conductive pillars of the second semiconductor device into the reflowed solder balls.
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公开(公告)号:US20210134725A1
公开(公告)日:2021-05-06
申请号:US16671558
申请日:2019-11-01
Applicant: Micron Technology, Inc.
Inventor: Owen R. Fay , Kyle K. Kirby , Akshay N. Singh
IPC: H01L23/538 , H01L25/065 , H01L23/498 , H01L23/00 , H01L21/48
Abstract: A semiconductor device assembly can include a semiconductor device having a substrate and vias electrically connected to circuitry of the semiconductor device. Individual vias can have an embedded portion extending from the first side to the second side of the substrate and an exposed portion projecting from the second side of the substrate. The assembly can include a density-conversion connector comprising a connector substrate and a first array of contacts formed at the first side thereof, the first array of contacts occupying a first footprint area on the first side thereof, and wherein individual contacts of the first array are electrically connected to the exposed portion of a corresponding via of the semiconductor device. The assembly can include a second array of contacts electrically connected to the first array, formed at the second side of the connector substrate, and occupying a second footprint area larger than the first footprint area.
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公开(公告)号:US20210118852A1
公开(公告)日:2021-04-22
申请号:US16939756
申请日:2020-07-27
Applicant: Micron Technology, Inc.
Inventor: Owen R. Fay , Randon K. Richards , Aparna U. Limaye , Dong Soon Lim , Chan H. Yoo , Bret K. Street , Eiichi Nakano , Shijian Luo
IPC: H01L25/065 , H01L25/18 , H01L23/00 , H01L23/552 , H01L23/66 , H01L21/78 , H01L21/66 , H01L25/00 , H01Q1/48 , H01Q1/22
Abstract: Disclosed is a microelectronic device assembly comprising a substrate having conductors exposed on a surface thereof. Two or more microelectronic devices are stacked on the substrate, each microelectronic device comprising an active surface having bond pads operably coupled to conductive traces extending over a dielectric material to via locations beyond at least one side of the stack, and vias extending through the dielectric materials at the via locations and comprising conductive material in contact with at least some of the conductive traces of each of the two or more electronic devices and extending to exposed conductors of the substrate. Methods of fabrication and related electronic systems are also disclosed.
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公开(公告)号:US20210118850A1
公开(公告)日:2021-04-22
申请号:US16939678
申请日:2020-07-27
Applicant: Micron Technology, Inc.
Inventor: Randon K. Richards , Aparna U. Limaye , Owen R. Fay , Dong Soon Lim
IPC: H01L25/065 , H01L25/18 , H01L23/00 , H01L23/552 , H01L23/64 , H01L21/78 , H01L21/66 , H01L25/00
Abstract: Disclosed is a microelectronic device assembly comprising a substrate having conductors exposed on a surface thereof. Two or more microelectronic devices are stacked on the substrate and the components are connected with conductive material in preformed holes in dielectric material in the bond lines aligned with TSVs of the devices and the exposed conductors of the substrate. Methods of fabrication are also disclosed.
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