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公开(公告)号:US10964698B2
公开(公告)日:2021-03-30
申请号:US16879586
申请日:2020-05-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Mark S. Rodder , Borna J. Obradovic
IPC: H01L29/00 , H01L27/092 , H01L29/06 , H01L29/78 , H01L21/8238 , H01L29/04 , H01L21/84 , H01L29/10 , H01L27/12 , H01L29/66
Abstract: A field effect transistor (FET) for an nFET and/or a pFET device including a substrate and a fin including at least one channel region decoupled from the substrate. The FET also includes a source electrode and a drain electrode on opposite sides of the fin, and a gate stack extending along a pair of sidewalls of the channel region of the fin. The gate stack includes a gate dielectric layer and a metal layer on the gate dielectric layer. The FET also includes an oxide separation region separating the channel region of the fin from the substrate. The oxide separation region includes a dielectric material that includes a portion of the gate dielectric layer of the gate stack. The oxide separation region extends completely from a surface of the channel region facing the substrate to a surface of the substrate facing the channel region.
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公开(公告)号:US20210056401A1
公开(公告)日:2021-02-25
申请号:US17094356
申请日:2020-11-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Borna J. Obradovic , Titash Rakshit , Mark S. Rodder
IPC: G06N3/063 , H01L29/808 , H01L27/11521 , H01L29/66 , H01L29/788 , H01L29/423 , H01L21/28
Abstract: A neuromorphic device for the analog computation of a linear combination of input signals, for use, for example, in an artificial neuron. The neuromorphic device provides non-volatile programming of the weights, and fast evaluation and programming, and is suitable for fabrication at high density as part of a plurality of neuromorphic devices. The neuromorphic device is implemented as a vertical stack of flash-like cells with a common control gate contact and individually contacted source-drain (SD) regions. The vertical stacking of the cells enables efficient use of layout resources.
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公开(公告)号:US10909449B2
公开(公告)日:2021-02-02
申请号:US15678050
申请日:2017-08-15
Applicant: Samsung Electronics Co., Ltd.
Inventor: Borna J. Obradovic , Titash Rakshit , Jorge A. Kittl , Ryan Hatcher
IPC: G06N3/063 , G06N3/04 , H01L27/112 , H01L27/11556 , G06N3/08 , G11C13/00
Abstract: A neuromorphic weight cell (NWC) including a resistor ladder including a plurality of resistors connected in series, and a plurality of shunting nonvolatile memory (NVM) elements, each of the shunting NVM elements being coupled in parallel to a corresponding one of the resistors.
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公开(公告)号:US20200279849A1
公开(公告)日:2020-09-03
申请号:US16879586
申请日:2020-05-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Mark S. Rodder , Borna J. Obradovic
IPC: H01L27/092 , H01L29/06 , H01L29/78 , H01L21/8238 , H01L29/04 , H01L21/84 , H01L29/10 , H01L27/12 , H01L29/66
Abstract: A field effect transistor (FET) for an nFET and/or a pFET device including a substrate and a fin including at least one channel region decoupled from the substrate. The FET also includes a source electrode and a drain electrode on opposite sides of the fin, and a gate stack extending along a pair of sidewalls of the channel region of the fin. The gate stack includes a gate dielectric layer and a metal layer on the gate dielectric layer. The FET also includes an oxide separation region separating the channel region of the fin from the substrate. The oxide separation region includes a dielectric material that includes a portion of the gate dielectric layer of the gate stack. The oxide separation region extends completely from a surface of the channel region facing the substrate to a surface of the substrate facing the channel region.
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公开(公告)号:US10679688B2
公开(公告)日:2020-06-09
申请号:US16142954
申请日:2018-09-26
Applicant: Samsung Electronics Co., LTD.
Inventor: Titash Rakshit , Borna J. Obradovic , Ryan M. Hatcher , Jorge A. Kittl
IPC: G11C11/22 , H01L27/11585 , H01L27/11502
Abstract: A memory cell and method for utilizing the memory cell are described. The memory cell includes at least one ferroelectric transistor (FE-transistor) and at least one selection transistor coupled with the FE-transistor. An FE-transistor includes a transistor and a ferroelectric capacitor for storing data. The ferroelectric capacitor includes ferroelectric material(s). In some aspects, the memory cell consists of a FE-transistor and a selection transistor. In some aspects, the transistor of the FE-transistor includes a source, a drain and a gate coupled with the ferroelectric capacitor. In this aspect, the selection transistor includes a selection transistor source, a selection transistor drain and a selection transistor gate. In this aspect, a write port of the memory cell is the selection transistor source or the selection transistor drain. The other of the selection transistor source and drain is coupled to the ferroelectric capacitor.
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公开(公告)号:US20190318775A1
公开(公告)日:2019-10-17
申请号:US16142954
申请日:2018-09-26
Applicant: Samsung Electronics Co., LTD.
Inventor: Titash Rakshit , Borna J. Obradovic , Ryan M. Hatcher , Jorge A. Kittl
IPC: G11C11/22
Abstract: A memory cell and method for utilizing the memory cell are described. The memory cell includes at least one ferroelectric transistor (FE-transistor) and at least one selection transistor coupled with the FE-transistor. An FE-transistor includes a transistor and a ferroelectric capacitor for storing data. The ferroelectric capacitor includes ferroelectric material(s). In some aspects, the memory cell consists of a FE-transistor and a selection transistor. In some aspects, the transistor of the FE-transistor includes a source, a drain and a gate coupled with the ferroelectric capacitor. In this aspect, the selection transistor includes a selection transistor source, a selection transistor drain and a selection transistor gate. In this aspect, a write port of the memory cell is the selection transistor source or the selection transistor drain. The other of the selection transistor source and drain is coupled to the ferroelectric capacitor.
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公开(公告)号:US20190280694A1
公开(公告)日:2019-09-12
申请号:US16137227
申请日:2018-09-20
Applicant: Samsung Electronics Co., LTD.
Inventor: Borna J. Obradovic , Ryan M. Hatcher , Jorge A. Kittl , Titash Rakshit
IPC: H03K19/0944 , H01L29/51 , H01L27/118 , H03K19/20 , G06N3/063
Abstract: A computing cell and method for performing a digital XNOR of an input signal and weights are described. The computing cell includes at least one pair of FE-FETs and a plurality of selection transistors. The pair(s) of FE-FETs are coupled with a plurality of input lines and store the weight. Each pair of FE-FETs includes a first FE-FET that receives the input signal and stores a first weight and a second FE-FET that receives the input signal complement and stores a second weight. The selection transistors are coupled with the pair of FE-FETs.
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公开(公告)号:US20190148410A1
公开(公告)日:2019-05-16
申请号:US15880156
申请日:2018-01-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Joon Goo Hong , Kang Ill Seo , Borna J. Obradovic
IPC: H01L27/12 , H01L21/027 , H01L21/02 , H01L21/477 , H01L27/088
Abstract: A method for providing a semiconductor device is described. The method provides a plurality of fins. A first portion of each of the plurality of fins is covered by a mask. A second portion of each of the plurality of fins is exposed by the mask. The method also performs an anneal in a volume-increasing ambient, such as hydrogen, at anneal temperature(s) above one hundred degrees Celsius and not more than six hundred degrees Celsius. The second portion of each of the fins is exposed during the anneal such that the second portion of each of the fins undergoes a volume expansion.
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公开(公告)号:US20190080230A1
公开(公告)日:2019-03-14
申请号:US15849106
申请日:2017-12-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Ryan M. Hatcher , Jorge A. Kittl , Borna J. Obradovic , Titash Rakshit
Abstract: A hardware device and method for performing a multiply-accumulate operation are described. The device includes inputs lines, weight cells and output lines. The input lines receive input signals, each of which is has a magnitude and a phase and can represent a complex value. The weight cells couple the input lines with the output lines. Each of the weight cells has an electrical admittance corresponding to a weight. The electrical admittance is programmable and capable of being complex valued. The input lines, the weight cells and the output lines form a crossbar array. Each of the output lines provides an output signal. The output signal for an output line is a sum of an input signal for each of the input lines connected to the output line multiplied by the electrical admittance of each of the weight cells connecting the input lines to the output line.
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公开(公告)号:US20190079701A1
公开(公告)日:2019-03-14
申请号:US15845985
申请日:2017-12-18
Applicant: Samsung Electronics Co., Ltd.
Inventor: Titash Rakshit , Borna J. Obradovic , Ryan M. Hatcher , Vladimir Nikitin , Dmytro Apalkov
IPC: G06F3/06 , H01L21/3105 , H01L21/822 , H01L27/11578
Abstract: A memory device and method for providing the memory device are described. The memory device includes word lines, a first plurality of bit lines, a second plurality of bit lines and selectorless memory cells. Each selectorless memory cell is coupled with a word line, a first bit line of the first plurality of bit lines and a second bit line of the second plurality of bit lines. The selectorless memory cell includes first and second magnetic junctions. The first and second magnetic junctions are each programmable using a spin-orbit interaction torque. The word line is coupled between the first and second magnetic junctions. The first and second bit lines are coupled with the first and second magnetic junctions, respectively. The selectorless memory cell is selected for a write operation based on voltages in the word line, the first bit line and the second bit line.
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