公开(公告)号：US10976273B2

公开(公告)日：2021-04-13

申请号：US16226467

申请日：2018-12-19

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Srivatsan Seshadri ,  Janos Kirz ,  Sylvia Jia Yun Lewis

IPC: G01N23/207 ,  G01N23/087 ,  G01N23/223 ,  G21K1/06 ,  H01J35/08 ,  H01J35/14 ,  H01J35/18

Abstract: An x-ray spectrometer system includes an x-ray source, an x-ray optical system, a mount, and an x-ray spectrometer. The x-ray optical system is configured to receive, focus, and spectrally filter x-rays from the x-ray source to form an x-ray beam having a spectrum that is attenuated in an energy range above a predetermined energy and having a focus at a predetermined focal plane.

公开(公告)号：US10658145B2

公开(公告)日：2020-05-19

申请号：US16518713

申请日：2019-07-22

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  William Henry Hansen

IPC: H01J35/00 ,  H01J35/12 ,  H01J35/30 ,  H01J35/14

Abstract: An x-ray target, x-ray source, and x-ray system are provided. The x-ray target includes a thermally conductive substrate comprising a surface and at least one structure on or embedded in at least a portion of the surface. The at least one structure includes a thermally conductive first material in thermal communication with the substrate. The first material has a length along a first direction parallel to the portion of the surface in a range greater than 1 millimeter and a width along a second direction parallel to the portion of the surface and perpendicular to the first direction. The width is in a range of 0.2 millimeter to 3 millimeters. The at least one structure further includes at least one layer over the first material. The at least one layer includes at least one second material different from the first material. The at least one layer has a thickness in a range of 2 microns to 50 microns. The at least one second material is configured to generate x-rays upon irradiation by electrons having energies in an energy range of 0.5 keV to 160 keV.

公开(公告)号：US10656105B2

公开(公告)日：2020-05-19

申请号：US16525198

申请日：2019-07-29

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  David Vine

IPC: G01N23/20 ,  G01N23/02 ,  A61B6/00 ,  A61B6/03

Abstract: An x-ray source and an x-ray interferometry system utilizing the x-ray source are provided. The x-ray source includes a target that includes a substrate and a plurality of structures. The substrate includes a thermally conductive first material and a first surface. The plurality of structures is on or embedded in at least a portion of the first surface. The structures are separate from one another and are in thermal communication with the substrate. The structures include at least one second material different from the first material, the at least one second material configured to generate x-rays upon irradiation by electrons having energies in an energy range of 0.5 keV to 160 keV. The x-ray source further includes an electron source configured to generate the electrons and to direct the electrons to impinge the target and to irradiate at least some of the structures along a direction that is at a non-zero angle relative to a surface normal of the portion of the first surface. The x-ray source further includes at least one optical element positioned such that at least some of the x-rays are transmitted through the first material and to or through the at least one optical element.

公开(公告)号：US20200098537A1

公开(公告)日：2020-03-26

申请号：US16560287

申请日：2019-09-04

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Janos Kirz

IPC: H01J35/10 ,  H01J35/06 ,  H01J35/14 ,  G01N23/083 ,  H01J35/18 ,  G01N23/2273

Abstract: A system for x-ray analysis includes at least one x-ray source configured to emit x-rays. The at least one x-ray source includes at least one silicon carbide sub-source on or embedded in at least one thermally conductive substrate and configured to generate the x-rays in response to electron bombardment of the at least one silicon carbide sub-source. At least some of the x-rays emitted from the at least one x-ray source includes Si x-ray emission line x-rays. The system further includes at least one x-ray optical train configured to receive the Si x-ray emission line x-rays and to irradiate a sample with at least some of the Si x-ray emission line x-rays.

公开(公告)号：US20190254616A1

公开(公告)日：2019-08-22

申请号：US16402887

申请日：2019-05-03

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

IPC: A61B6/00 ,  A61B6/03 ,  H01J35/12 ,  H01J35/08

Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The structures may be microstructures with lateral dimensions measured on the order of microns, and in some embodiments, the structures are arranged in a regular array.The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π or π/2 phase-shifting grating, an x-ray detector to convert two-dimensional x-ray intensities into electronic signals, and in some embodiments, also comprises an additional analyzer grating G2 that may be placed in front of the detector to form additional interference fringes. Systems may also include a means to translate and/or rotate the relative positions of the x-ray source and the object under investigation relative to the beam splitting grating and/or the analyzer grating for tomography applications.

公开(公告)号：US10352880B2

公开(公告)日：2019-07-16

申请号：US15605957

申请日：2017-05-26

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Srivatsan Seshadri ,  Alan Francis Lyon ,  David Vine

IPC: G21K7/00 ,  G01N23/04 ,  G01N23/20 ,  A61B6/00 ,  G21K1/02 ,  H01J35/08

Abstract: This disclosure presents systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro- or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using an arrayed x-ray source or a set of Talbot interference fringes.

公开(公告)号：US10349908B2

公开(公告)日：2019-07-16

申请号：US14943445

申请日：2015-11-17

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

IPC: A61B6/00 ,  A61B6/03 ,  H01J35/08 ,  H01J35/12

Abstract: An x-ray interferometric imaging system includes an x-ray source with a target having a plurality of discrete structures arranged in a periodic pattern. The system further includes a beam-splitting x-ray grating, a stage configured to hold an object to be imaged, and an x-ray detector having a two-dimensional array of x-ray detecting elements. The object is positioned between the beam-splitting x-ray grating and the x-ray detector, the x-ray detector is positioned to detect the x-rays diffracted by the beam-splitting x-ray grating and perturbed by the object to be imaged.

公开(公告)号：US10295485B2

公开(公告)日：2019-05-21

申请号：US15663831

申请日：2017-07-31

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Srivatsan Seshadri ,  Janos Kirz ,  Sylvia Jia Yun Lewis

IPC: G01N23/223 ,  G01N23/207 ,  G01N23/087 ,  G21K1/06 ,  H01J35/08 ,  H01J35/14 ,  H01J35/18

Abstract: An x-ray transmission spectrometer system to be used with a compact x-ray source to measure x-ray absorption with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness x-ray source, an optical system with a low pass spectral filter property to focus the x-rays through an object to be examined, and a spectrometer comprising a crystal analyzer (and, in some embodiments, a mosaic crystal) to disperse the transmitted beam, and in some instances an array detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 15 degrees, and be coupled to an optical system that collects and focuses the high flux x-rays to micron-scale spots, leading to high flux density. The x-ray optical system may also act as a “low-pass” filter, allowing a predetermined bandwidth of x-rays to be observed at one time while excluding the higher harmonics.

公开(公告)号：US20180144901A1

公开(公告)日：2018-05-24

申请号：US15783855

申请日：2017-10-13

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  David Charles Reynolds ,  Alan Francis Lyon

IPC: H01J35/10 ,  H01J35/14 ,  H01J35/26 ,  H01J35/30 ,  G21K1/06

CPC classification number: G21K1/067 ,  G21K2201/064 ,  H01J35/105 ,  H01J35/108 ,  H01J35/14 ,  H01J35/26 ,  H01J35/30 ,  H01J2235/086 ,  H01J2235/088 ,  H01J2235/1204

Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

公开(公告)号：US20170162288A1

公开(公告)日：2017-06-08

申请号：US15431786

申请日：2017-02-14

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G21K1/06 ,  H01J35/08 ,  H01J35/18 ,  H01J35/14

CPC classification number: G01N23/223 ,  G21K1/06 ,  G21K2201/064 ,  H01J35/08 ,  H01J2235/081 ,  H01J2235/086

Abstract: Systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may have a take-off angle from 0 to 105 mrad. and be coupled to an x-ray optical system that collects and focuses the high flux x-rays to spots that can be as small as one micron, leading to high flux density.