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71.发明授权Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method 有权图案形成方法，图案形成方法中使用的多次显影用抗蚀剂组合物，图案形成方法中使用的负显影用显影剂和图案形成方法中使用的负显影用冲洗液公开(公告)号：US08637229B2
公开(公告)日：2014-01-28
申请号：US12871969
申请日：2010-08-31
申请人： Hideaki Tsubaki , Shinichi Kanna
发明人： Hideaki Tsubaki , Shinichi Kanna
CPC分类号： G03F7/0035 , G03F7/0392 , G03F7/0397 , G03F7/0758 , G03F7/2024 , G03F7/325
摘要： A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
摘要翻译： 一种图案形成方法，包括：（A）用正性显影剂中的溶解度增加的正性抗蚀剂组合物涂覆基材，并且在用光化学辐射或辐射照射时，在负极显影剂中的溶解度降低，以形成抗蚀剂膜; （B）曝光抗蚀膜; 和（D）用负极显影剂显影抗蚀膜; 该方法中使用的用于多重显影的正性抗蚀剂组合物; 用于该方法的开发人员; 以及用于该方法的负显影用冲洗液。
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72.发明授权Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same 有权使用其组合物和图案形成方法的面漆组合物，碱显影剂可溶性面漆公开(公告)号：US08618217B2
公开(公告)日：2013-12-31
申请号：US12271510
申请日：2008-11-14
申请人： Shinichi Kanna
发明人： Shinichi Kanna
IPC分类号： C08L25/14 , C08L27/12 , C08L33/10 , C08L33/16 , C08L33/20 , C08L33/26 , C08L35/06 , C08L43/04 , C08L83/06 , G03F7/004 , G03F7/09
CPC分类号： C08L25/14 , C08L27/12 , C08L33/10 , C08L33/16 , C08L33/20 , C08L33/26 , C08L35/06 , C08L43/04 , C08L83/06 , C08L101/04 , C09D7/65 , C09D133/16 , G03F7/0046 , G03F7/0752 , G03F7/092 , G03F7/11 , G03F7/2041
摘要： A topcoat composition to be applied on a resist film is provided, the topcoat composition including: (A) an alkali-soluble resin; (B) a compound containing at least one of an Si atom and an F atom, and increasing a contact angle on a surface of the topcoat film; and (C) a solvent.
摘要翻译： 提供涂覆在抗蚀剂膜上的面漆组合物，所述面漆组合物包括：（A）碱溶性树脂; （B）含有Si原子和F原子中的至少一种的化合物，并且增加面涂层表面的接触角; 和（C）溶剂。
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73.发明授权Curable coloring composition, color filter and method for producing same, and quinophthalone dye 有权可溶性着色组合物，滤色器及其制备方法，以及喹酞酮染料公开(公告)号：US08529803B2
公开(公告)日：2013-09-10
申请号：US13260118
申请日：2010-03-19
申请人： Yoshihiko Fujie , Yuuki Mizukawa , Shinichi Kanna , Kazuya Oota
发明人： Yoshihiko Fujie , Yuuki Mizukawa , Shinichi Kanna , Kazuya Oota
CPC分类号： C07D215/20 , C09B23/105 , C09B23/145 , C09B57/00 , G02B5/201 , G02B5/223 , G03F7/0007 , G03F7/105
摘要： A curable coloring composition includes a quinophthalone dye of Formula (1). A color filter employing the composition, a method for producing the color filter, and a quinophthalone dye of Formula (2) are also described. The curable coloring composition and color filter have good color hue, high transmittance properties, high light fastness and heat fastness, and excellent stability over time and solvent resistance.
摘要翻译： 可固化着色组合物包括式（1）的喹酞酮染料。 还描述了使用该组合物的滤色器，滤色器的制造方法和式（2）的喹酞酮染料。 可固化着色组合物和滤色器具有良好的色调，高透光率，耐光牢度和耐热牢度，并且具有优异的时间稳定性和耐溶剂性。
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74.发明授权Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof 失效着色固化性组合物，滤色器及其制造方法，以及二吡咯亚甲基金属络合物及其互变异构体公开(公告)号：US08334085B2
公开(公告)日：2012-12-18
申请号：US12550427
申请日：2009-08-31
申请人： Yuki Mizukawa , Ryoji Goto , Junichi Ito , Hideki Takakuwa , Shinichi Kanna
发明人： Yuki Mizukawa , Ryoji Goto , Junichi Ito , Hideki Takakuwa , Shinichi Kanna
CPC分类号： C07D207/46 , C09B23/04 , C09B57/007 , G02B5/223 , G03F7/0043 , G03F7/022 , G03F7/027 , G03F7/105
摘要： A colored curable composition is provided which has good developability, has excellent color purity, can be formed into a thin film, and has a high absorption coefficient. The colored curable composition includes at least one of specific dipyrromethene metal complex compounds and tautomers thereof. Also, a colored curable composition suitable for forming a color filter which is used in a liquid crystal display device or a solid-state imaging device, and a color filter using the colored curable composition and a method of producing the same are provided.
摘要翻译： 本发明提供一种着色固化性组合物，它具有良好的显影性，具有优异的色纯度，可以形成为薄膜，且具有高的吸收系数。 着色固化性组合物包括特定的二吡咯亚甲基金属络合物及其互变异构体中的至少一种。 此外，提供了适用于形成用于液晶显示装置或固态成像装置的滤色器的着色固化性组合物和使用该着色固化性组合物的滤色器及其制造方法。
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公开(公告)号：US20100112477A1
公开(公告)日：2010-05-06
申请号：US12593353
申请日：2008-03-27
申请人： Toshiaki Fukuhara , Hiromi Kanda , Shinichi Kanna
发明人： Toshiaki Fukuhara , Hiromi Kanda , Shinichi Kanna
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/0757 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound that generates an acid in irradiation with actinic light or radiation; (C) a resin that has: at least one of a fluorine atom and a silicon atom; and a group selected from the group consisting of groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility of the resin (C) in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two of Ry1 to Ry3 may be coupled to form a ring structure, and Z represents a divalent linking group.
摘要翻译： 正型光敏组合物包含：（A）具有由式（I）表示的可酸分解重复单元并通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）在光化或辐射照射下产生酸的化合物; （C）具有氟原子和硅原子中的至少一个的树脂; 和选自基团（x）〜（z））的基团。 和（D）溶剂：（x）碱溶性基团，（y）通过碱显影剂的作用分解并增加树脂（C）在碱性显影剂中的溶解度的基团，和（z） 通过酸的作用分解，其中，Xa1表示氢原子，烷基，氰基或卤素原子，Ry1〜Ry3各自独立地表示烷基或环烷基，Ry1〜Ry3中的至少两个可以 偶联形成环结构，Z表示二价连接基团。
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76.发明授权公开(公告)号：US07674567B2
公开(公告)日：2010-03-09
申请号：US11523551
申请日：2006-09-20
申请人： Kei Yamamoto , Shinichi Kanna
发明人： Kei Yamamoto , Shinichi Kanna
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/121 , Y10S430/122 , Y10S430/123
摘要： A positive resist composition comprising: at least one compound selected from a compound capable of generating an acid represented by the formula (I) as defined herein upon irradiation with actinic rays or radiation and a compound capable of generating an acid represented by the following formula (II) upon irradiation with actinic rays or radiation; and a compound capable of generating an acid represented by the formula (III) as defined herein upon irradiation with actinic rays or radiation.
摘要翻译： 一种正型抗蚀剂组合物，其包含：在用光化学射线或辐射照射时，选自能够产生如本文所定义的式（I）表示的酸的化合物的化合物和能够产生由下式表示的酸的化合物 II）用光化射线或辐射照射时; 以及当用光化射线或辐射照射时能够产生如本文所定义的式（III）表示的酸的化合物。
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公开(公告)号：US20090136870A1
公开(公告)日：2009-05-28
申请号：US12363303
申请日：2009-01-30
申请人： Toshiaki FUKUHARA , Shinichi Kanna , Hiromi Kanda
发明人： Toshiaki FUKUHARA , Shinichi Kanna , Hiromi Kanda
CPC分类号： G03F7/0758 , G03F7/0392 , G03F7/2041 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/146
摘要： A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用显示在碱性显影剂中的溶解度增加的树脂; （B）当用光化射线或辐射照射时能够产生酸的化合物; （C）具有特定结构的含硅重复单元并且对酸稳定但不溶于碱显影剂的树脂; 和（D）溶剂; 和使用该图案的图案制作方法。
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公开(公告)号：US07504194B2
公开(公告)日：2009-03-17
申请号：US11636633
申请日：2006-12-11
申请人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
发明人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
CPC分类号： G03F7/0758 , G03F7/0392 , G03F7/2041 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/146
摘要： A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用显示在碱性显影剂中的溶解度增加的树脂; （B）当用光化射线或辐射照射时能够产生酸的化合物; （C）具有特定结构的含硅重复单元并且对酸稳定但不溶于碱显影剂的树脂; 和（D）溶剂; 和使用该图案的图案制作方法。
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79.发明申请公开(公告)号：US20080305433A1
公开(公告)日：2008-12-11
申请号：US12193302
申请日：2008-08-18
申请人： Hiromi KANDA , Shinichi Kanna , Haruki Inabe
发明人： Hiromi KANDA , Shinichi Kanna , Haruki Inabe
IPC分类号： G03C1/053
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/091 , G03F7/16 , G03F7/168 , G03F7/2041 , G03F7/30 , G03F7/322 , G03F7/38 , G03F7/40
摘要： A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用在碱性显影液中具有增强的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; （C）含有选自（x）〜（z）中的至少一种基团的含氟化合物; 和（F）溶剂，以及组合物的图案形成方法：（x）碱溶性基团; （y）通过碱性显影液的作用分解以提高在碱性显影液中的溶解度的基团; 和（z）通过酸的作用分解的基团。
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公开(公告)号：US20080171287A1
公开(公告)日：2008-07-17
申请号：US12046204
申请日：2008-03-11
申请人： Hiromi Kanda , Shinichi Kanna
发明人： Hiromi Kanda , Shinichi Kanna
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0048 , G03F7/0397 , G03F7/0758 , G03F7/2041 , Y10S430/108
摘要： A positive resist composition, which comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) contains at least one of: (C1) a resin having at least one of a fluorine atom and a silicon atom and having an alicyclic structure; and (C2) a resin containing a repeating unit having at least one of a fluorine atom and a silicon atom in a side chain and a repeating unit having an unsubstituted alkyl group in a side chain; and a pattern forming method.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）在酸性作用下在碱性显影剂中的溶解度增加的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）具有氟原子和硅原子中的至少一个的树脂; 和（D）溶剂，其中树脂（C）含有以下中的至少一种：（C1）具有氟原子和硅原子中的至少一个并具有脂环结构的树脂; 和（C2）含有侧链中具有氟原子和硅原子中的至少一个的重复单元的树脂和在侧链具有未取代的烷基的重复单元; 和图案形成方法。
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