摘要:
A blade rubber having both of superior durability and wiping performance can be manufactured by using a non-diene-based rubber without environmental burden. A pair of blade-rubber molded bodies molded from the non-diene-based rubber is subjected to an irradiation treatment to generate radical active sites, and monomers are bound by graft polymerization as beginning at the radical active sites. Also, the monomers are adhered on a surface of the blade rubber either before or after the generation of the radical active sites. The irradiation treatment and the graft polymerization may be simultaneously performed or independently performed in this order. In this manner, a surface treatment for reducing friction of the non-diene-based rubber having superior durability can be performed without halogen, and therefore, a blade rubber having superior durability and wiping performance can be manufactured.
摘要:
A recoil starter includes a base plate that has a bearing portion formed therein and a rotary shaft that is supported by the bearing portion so as to pass through the base plate. A rope reel is rotatably supported at one side of the base plate, and a recoil rope is wound around the rope reel. A recoil spiral spring urges the rope reel to rewind the recoil rope. A damper spring has one end connected to the rotary shaft and the other end connected to the rope reel, and a clutch mechanism is disposed on an end of the rotary shaft at the other side of the base plate. The clutch mechanism transfers a rotational force to an engine.
摘要:
An interlayer dielectric film is completely buried in a trench, and failures caused by step coverage is prevented because a source electrode can be formed substantially uniformly on an upper portion of a gate electrode. Also, in the processes of forming a source region, a body region and an interlayer dielectric film, only one mask is necessary so that the device size is reduced to account for placement error of only one mask alignment.
摘要:
The present invention relates to a composition for external application, a humectant and a skin barrier function reinforcing agent, each containing a diamide derivative represented by the following formula (1): (wherein, R1a and R1b are the same or different and each represents a C1-23 hydrocarbon group, R2a and R2b are the same or different and each represents a divalent C1-6 hydrocarbon group, R3s are the same or different and each represents a divalent C2-6 hydrocarbon group and n stands for 1 to 100). The composition for external application, humectant and skin barrier function reinforcing agent basically improve the water retaining ability and barrier functions of the horny layer, are excellent in miscibility and mixing stability and can be prepared efficiently at a low cost.
摘要:
A power MOSFET comprises: a semiconductor substrate 21 of a first conduction type; a drain layer 22 of the first conduction type and formed on a surface layer of the substrate; a gate insulating film 25 formed in a partial region on the drain layer 22; a gate electrode 26 formed on the gate insulating film 25; an insulating film 27 formed on the gate electrode; a side wall insulator 28 formed on side walls of the gate insulating film 25, the gate electrode 26, and the insulating film 27; a recess formed on the drain layer 22 and in a region other than a region where the gate electrode 25 and the side wall insulator 28 are formed; a channel layer 23 of a second conduction type opposite to the first conduction type and formed in a range from the region where the recess is formed to a vicinity of the region where the gate electrode 26 is formed; a source region layer 24 of the one conduction type and formed on the channel layer 23 outside the recess; and a wiring layer 29 formed to cover the channel layer 23 which is exposed through the recess, the side wall insulator 28, and the insulating film.
摘要:
In a conventional semiconductor device, there was a problem that, in a guard ring region, a shape of a depletion layer is distorted and stable withstand voltage characteristics cannot be obtained. In a semiconductor device of the present invention, a thermal oxide film in an actual operation region and a thermal oxide film in a guard ring region are formed in the same process. Thereafter, the thermal oxide film is once removed and is formed again. Thus, a film thickness of the thermal oxide film on the upper surface of the guard ring region is set to, for example, about 8000 to 10000 Å. Accordingly, a CVD oxide film including moving ions is formed in a position distant from a surface of an epitaxial layer. Consequently, distortion of a depletion layer, which is influenced by the moving ions, is suppressed and desired withstand voltage characteristics can be maintained.
摘要:
A hydrodynamic bearing for a hard disk drive device is disclosed. An oil is filled in a clearance between an inner surface of the hub and an outer surface of the shaft, whereby a hydrodynamic radial bearing is formed between the inner periphery of the hub and the outer periphery of the shaft, and a hydrodynamic thrust bearing is formed between the top face of the shaft and the thrust plate. Between an outer peripheral part at the base end of the shaft and an inner peripheral part at the open end of the hub is formed a seal part in which a larger clearance is formed between the shaft and the hub than a clearance in the hydrodynamic radial bearing and in which the oil surface is positioned. An oil surface adjusting hole and a plug for sealing the hole are provided in the case opposite the seal part.
摘要:
A Schottky barrier diode in which a p+-type semiconductor layer is provided in an n−-type epitaxial layer can realize lowering the forward voltage VF without considering leak current IR. However, when compared with a normal Schottky barrier diode, the forward voltage VF is generally high. When a Schottky metal layer is suitably selected, although the forward voltage VF can be reduced, there is a limit in further reduction. On the other hand, when the resistivity of the n−-type semiconductor layer is reduced, although the forward voltage VF can be realized, there is a problem that breakdown voltage is deteriorated. In a semiconductor device of the invention, a second n−-type semiconductor layer having a low resistivity is laminated on a first n−-type semiconductor layer capable of securing a specified breakdown voltage. P+-type semiconductor regions are made to have depths equal to or slightly deeper than the second n−-type semiconductor layer. By this, in a Schottky barrier diode in which leak current IR can be suppressed by pinch off of a depletion layer, the forward voltage VF can be reduced and the specified breakdown voltage can be secured.
摘要:
In conventional semiconductor devices, there observed a problem that cells on the devices may not function uniformly because of voltage drop in a main wiring layer due to a uniform and narrow width of the main wiring layer through which a main current flows. In a semiconductor device of the present invention, a width of one end of a main wire for carrying the main current is formed wider than a width of another end of the main wire. An overall width of the main wire is formed so as to be gradually narrowed from the one end to the another end. In this way, it is possible to reduce a difference in drive voltages between a cell located in the vicinity of an electrode pad for carrying the main current and a cell located in a remote position. Resultantly, it is possible to suppress a voltage drop in the main wire and to achieve uniform operations of cells in an element.
摘要:
A channel layer is formed in a surface of a semiconductor substrate, and a plurality of trenches are formed in the surface of the semiconductor substrate, the trenches being deeper than the channel layer. Then, gate electrodes are formed in the trenches, respectively, after which body layers are formed between the trenches and source layers are formed adjacent to the trenches.