公开(公告)号：US20060108474A1

公开(公告)日：2006-05-25

申请号：US11026086

申请日：2005-01-03

申请人： Yutaka Tanaka ,  Haruhiko Kakimoto

发明人： Yutaka Tanaka ,  Haruhiko Kakimoto

IPC分类号： B64C1/12

CPC分类号： B64C3/26 ,  B23K20/122 ,  B23K20/1265 ,  B64C1/12 ,  B64C27/473

摘要： A movable trailing edge is composed of a main body including a structural frame member in which a spar and a rib intersect with each other, and a first outer plate that covers the main body. The first outer plate is placed on and cover the structural frame member, a rotating probe is pressed against the first outer plate from the obverse side thereof to friction stir weld the first outer plate and the side end face of the structural frame member. Joint parts are arranged in a dotted pattern.

公开(公告)号：US06984362B2

公开(公告)日：2006-01-10

申请号：US10619506

申请日：2003-07-16

申请人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

发明人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

IPC分类号： G05B1/00 ,  G05B23/00

CPC分类号： G05D16/2013

摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

摘要翻译： 一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

公开(公告)号：US20050271558A1

公开(公告)日：2005-12-08

申请号：US11201142

申请日：2005-08-11

申请人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

发明人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

IPC分类号： H01L21/027 ,  G03F7/20 ,  G05D16/00 ,  G05D16/20

CPC分类号： G05D16/2013

摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

摘要翻译： 一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

公开(公告)号：US06616898B2

公开(公告)日：2003-09-09

申请号：US09257258

申请日：1999-02-25

申请人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

发明人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

IPC分类号： G05D1600

CPC分类号： G05D16/2013

摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient gas recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

摘要翻译： 一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境气体被吹送到密封真空室中，使得沿着处理部分沿预定方向产生气流。

公开(公告)号：US06559927B1

公开(公告)日：2003-05-06

申请号：US09455248

申请日：1999-12-06

申请人： Toshinobu Tokita ,  Yutaka Tanaka

发明人： Toshinobu Tokita ,  Yutaka Tanaka

IPC分类号： G03B2758

CPC分类号： G03F9/703 ,  G03F7/70425 ,  G03F9/7046

摘要： An exposure apparatus includes a gap measuring device for measuring a gap between a mask, having a mask membrane, and a substrate, a gap adjuster for adjusting the gap between the mask and the substrate and a driver for relatively moving the mask and the substrate relative to each other. The gap adjusting device adjusts the gap when the mask and the substrate are placed at a position at which they are opposed to each other in an area smaller than a predetermined area.

摘要翻译： 曝光装置包括用于测量具有掩模膜的掩模与基板之间的间隙的间隙测量装置，用于调节掩模和基板之间的间隙的间隙调节器和用于使掩模和基板相对移动的驱动器 对彼此。 间隙调整装置在将掩模和基板置于小于预定区域的区域彼此相对的位置时调整间隙。

公开(公告)号：US06435264B1

公开(公告)日：2002-08-20

申请号：US09377062

申请日：1999-08-19

申请人： Osahiro Konno ,  Kazuyuki Sagara ,  Yutaka Tanaka

发明人： Osahiro Konno ,  Kazuyuki Sagara ,  Yutaka Tanaka

IPC分类号： B60K1100

CPC分类号： F28D1/0426 ,  B60K11/04 ,  F01P3/18 ,  F01P2003/182 ,  F01P2060/04

摘要： A cooling system that is capable of cooling a working vehicle, such as a wheeled loader, at a good efficiency and at a reduced level of noise. Plural radiators are arranged in a V-shaped form within a plane behind an engine mounted in the rear of the engine compartment of the vehicle. The radiators are spread a part rearwardly to form a space between them. A cooling fan is mounted in this space. The side surfaces of the radiators are provided with intake ports that are covered by openable side covers. The top of each intake ports is covered by a hood whose top surface can be tilted rearwardly and downwardly.

摘要翻译： 能够以良好的效率和降低的噪声水平对作业车辆（例如轮式装载机）进行冷却的冷却系统。 多个散热器在安装在车辆发动机舱后部的发动机后面的平面内以V形的形式布置。 散热器向后扩展一部分，在它们之间形成一个空间。 一个冷却风扇安装在这个空间。 散热器的侧表面设置有被可打开的侧盖覆盖的进气口。 每个进气口的顶部被顶盖覆盖，顶盖可以向后和向下倾斜。

公开(公告)号：US06328619B1

公开(公告)日：2001-12-11

申请号：US09260085

申请日：1999-03-02

申请人： Kenji Shimizu ,  Yutaka Tanaka

发明人： Kenji Shimizu ,  Yutaka Tanaka

IPC分类号： H01T2102

CPC分类号： H01T21/02 ,  H01T13/34

摘要： A spark plug assembly is produced in the following manner. Namely, an insulator having an axial through-hole with a metallic terminal fixed at an end thereof and a center electrode fixed at the other end and with packing layers of bulk powders of a conductive glass seal layer, a resistor and the like being formed in the through-hole between the metallic terminal and the center electrode. Subsequently, the spark plug assembly is heated so that the temperature of the side closer to the center electrode is higher than that of the side closer to the metallic terminal along the longitudinal axis of the insulator. Then, the packing layers of the bulk powders within the through-hole are pressed between the center electrode and the metallic terminal by applying pressure to the heated spark plug assembly so that the metallic terminal comes closer to the center electrode along the axis of the through-hole with the position of the center electrode being fixed relative to the through-hole.

摘要翻译： 以下列方式制造火花塞组件。 即，具有固定在其端部的具有金属端子的轴向通孔和固定在另一端的中心电极和导电玻璃密封层，电阻器等的本体粉末的填充层的绝缘体形成在 金属端子和中心电极之间的通孔。 随后，加热火花塞组件，使得靠近中心电极的一侧的温度高于沿着绝缘体的纵向轴线更靠近金属端子的一侧的温度。 然后，通过向加热的火花塞组件施加压力，将通孔内的散装粉末的填充层压在中心电极和金属端子之间，使得金属端子沿着贯穿孔的轴线更靠近中心电极 - 中心电极相对于通孔固定的位置。

公开(公告)号：US06223097B1

公开(公告)日：2001-04-24

申请号：US09265876

申请日：1999-03-11

申请人： Takehiro Hashimoto ,  Yutaka Tanaka ,  Tetsuya Asami ,  Youichi Satou ,  Noriaki Okumiya

发明人： Takehiro Hashimoto ,  Yutaka Tanaka ,  Tetsuya Asami ,  Youichi Satou ,  Noriaki Okumiya

IPC分类号： B07C1700

CPC分类号： H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a method for setting appropriate initial-failure screening conditions when mass-producing semiconductor devices of multiple types, devices of each type being manufactured in a small number, the step of subjecting products of every type to an acceleration test is excluded, and instead, the failure ratio on the market of semiconductor devices of each type is estimated using a testing semiconductor device. Specifically, {circle around (1)} first, all types of semiconductor devices to be developed and mass-produced are classified into several groups. {circle around (2)} A test semiconductor device is developed which has the same number of elements, the same gate area, the same multi-layer wiring length and the same number of contact holes as the average number of elements, the average gate area, the average wiring length and the average number of contact holes of the semiconductor devices included in one of the type groups, respectively. The testing semiconductor device has main features (design rules, MOSFET structure, wiring structure, etc.) common to the types included in its corresponding type group, and a failed portion thereof, if any, can be easily detected by an analysis using a tester.

摘要翻译： 在批量生产多种类型的半导体器件的情况下设置适当的初始故障筛选条件的方法中，每种类型的器件被少量制造，不考虑每种类型的产品进行加速度测试的步骤， 使用测试半导体器件来估计每种类型的半导体器件市场的故障率。 具体来说，首先，围绕（1）圆）将要开发和批量生产的所有类型的半导体器件分为几组。 {circle around（2）}开发了一种测试半导体器件，其具有与元件的平均数目相同数量的元件，相同的栅极面积，相同的多层布线长度和相同数量的接触孔，平均栅极 面积，平均布线长度和包括在一个类型组中的半导体器件的接触孔的平均数量。 测试半导体器件具有与其对应类型组中包括的类型相同的主要特征（设计规则，MOSFET结构，布线结构等），并且其故障部分（如果有的话）可以通过使用测试仪的分析容易地检测 。

公开(公告)号：US6160342A

公开(公告)日：2000-12-12

申请号：US64002

申请日：1998-04-21

申请人： Kenichi Nishikawa ,  Yutaka Tanaka ,  Toshitaka Honda ,  Makoto Sugimoto

发明人： Kenichi Nishikawa ,  Yutaka Tanaka ,  Toshitaka Honda ,  Makoto Sugimoto

IPC分类号： H01C7/00 ,  H01T13/20 ,  H01T13/41 ,  H01T21/02 ,  H01J13/20

CPC分类号： H01T13/41 ,  H01T21/02

摘要： In a spark plug (100), the resistor composition constituting a resistor (15) contains semiconductive ceramic particles, offering a superior load life characteristic. Also, the value of (.alpha.2-.alpha.1)/.alpha.1 >=-0.30, where a value of electric resistance between a terminal (13) and a center electrode (3) is .alpha.1 at 20.degree. C. and .alpha.2 at 150.degree. C., so that deterioration of the radio frequency noise prevention performance at high temperatures can be effectively suppressed. The resistor composition contains semiconductive ceramic particles whose temperature coefficient of electric resistance shows a positive value, or a negative value of relatively small absolute value, (e.g., TiO.sub.2 particles having a rutile type crystalline structure, titanate or zirconate of alkali earth metal elements, titanium suboxide, etc.), or titanium metal. Thus, the invention provides a resistor-incorporated spark plug which is enabled to offer a stable load life characteristic even when a high load acts thereon, and which is unlikely to deteriorate in the radio frequency noise prevention performance even under high temperatures.

摘要翻译： 在火花塞（100）中，构成电阻器（15）的电阻器组合物包含半导体陶瓷颗粒，具有优异的负载寿命特性。 此外，（α2-α1）/α1 = 0.30的值，其中端子（13）和中心电极（3）之间的电阻值在20℃为α1，α2 在150℃下，可以有效地抑制高温下的射频噪声防止性能的恶化。 电阻体组合物含有电阻温度系数为正值或绝对值相对较小的负值的半导体陶瓷粒子（例如，具有金红石型结晶结构的TiO 2粒子，碱土类金属元素的钛酸酯或锆酸酯，钛 低氧化物等）或钛金属。 因此，本发明提供了一种结合电阻器的火花塞，其即使在高负载时也能够提供稳定的负载寿命特性，即使在高温下也不太可能降低射频噪声防止性能。

公开(公告)号：US6144719A

公开(公告)日：2000-11-07

申请号：US786217

申请日：1997-01-21

申请人： Takayuki Hasegawa ,  Yutaka Tanaka

发明人： Takayuki Hasegawa ,  Yutaka Tanaka

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/30

CPC分类号： G03F9/7038 ,  G03F7/70691 ,  G03F9/7003 ,  G03F9/703 ,  G03F9/7034

摘要： An exposure method including the steps of providing a wafer and a mask having a membrane and a pattern formed thereon, arranging the mask and the wafer opposite to each other, obtaining information corresponding to deformation of the membrane of the mask, reducing the influence of the deformation of the membrane, and transferring the pattern of the mask to the wafer by exposing the mask to radiant energy. Also disclosed is an exposure device for performing this exposure method.

摘要翻译： 一种曝光方法，包括以下步骤：提供具有膜和形成在其上的图案的晶片和掩模，将掩模和晶片彼此相对布置，获得与掩模的膜的变形相对应的信息，减少了 膜的变形，以及通过将掩模暴露于辐射能量将掩模的图案转移到晶片。 还公开了用于执行该曝光方法的曝光装置。