公开(公告)号：US20030012333A1

公开(公告)日：2003-01-16

申请号：US10090470

申请日：2002-03-04

Applicant: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS

Inventor： Jorg Schultz ,  Johannes Wangler

IPC: G21K005/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K5/00

Abstract: There is provided an illumination system for light having wavelengths null193 nm. The system includes (a) a first raster element for receiving a first diverging portion of the light and directing a first beam of the light, (b) a second raster element for receiving a second diverging portion of the light and directing a second beam of the light, where the first raster element is oriented at an angle with respect to the second raster element to cause a center ray of the first beam to intersect with a center ray of the second beam at an image plane, and (c) an optical element for imaging secondary sources of the light in an exit pupil, where the optical element is situated in a path of the light after the first and second raster elements and before the image plane.

Abstract translation: 为波长<= 193nm的光提供照明系统。 该系统包括（a）用于接收光的第一发散部分并引导第一光束的第一光栅元件，（b）第二光栅元件，用于接收光的第二发散部分并引导第二光束 所述光，其中所述第一光栅元件相对于所述第二光栅元件以一定角度定向，以使所述第一光束的中心光线在图像平面处与所述第二光束的中心光线相交，以及（c）光学 用于在出射光瞳中成像二次光源的元件，其中光学元件位于第一和第二光栅元件之后的光的路径中以及在图像平面之前。

公开(公告)号：US20020136351A1

公开(公告)日：2002-09-26

申请号：US10042122

申请日：2001-10-25

Inventor： Wolfgang Singer

IPC: G21K005/00

CPC classification number: G03F7/70075 ,  B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70891 ,  G03F7/70983 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04

Abstract: An illumination system comprises (a) a first optical element upon which a light beam impinges, where the first optical element has first raster elements that partition said light beam into light channels; (b) a second optical element that receives said light channels, where the second optical element has a second raster elements; (c) an object plane that receives said light channels via said second optical element; and (d) an exit pupil that is provided with an illumination via said object plane. The system is characterized by an assignment of a member of said first raster elements and a member of said second raster elements to each of said light channels to provide a continuous beam path from said first optical element to said object plane for each of said plurality of light channels. The assignment is changeable to provide an adjustment of said illumination in said exit pupil.

Abstract translation: 照明系统包括：（a）第一光学元件，光束入射到该第一光学元件上，其中第一光学元件具有将所述光束分割成光通道的第一光栅元件; （b）第二光学元件，其接收所述光通道，其中所述第二光学元件具有第二光栅元件; （c）通过所述第二光学元件接收所述光通道的物平面; 和（d）通过所述物平面设置照明的出射光瞳。 该系统的特征在于将所述第一光栅元件的成员和所述第二光栅元件的成员分配给每个所述光通道，以提供从所述第一光学元件到所述物平面的连续光束路径，用于所述多个 光通道。 所述分配是可变的以提供所述出射光瞳中的所述照明的调整。

公开(公告)号：US06246066B1

公开(公告)日：2001-06-12

申请号：US09154752

申请日：1998-09-17

Applicant: Pu Yuehu

Inventor： Pu Yuehu

IPC: B01D5944

CPC classification number: H05H7/04 ,  G21K5/00

Abstract: A magnetic field generator includes a movable magnetic pole pair within a stationary return yoke, modifying a magnetic field at a high speed with high precision. The magnetic field generator includes a first return yoke having a first internal volume, a magnetic pole pair with magnetic poles disposed opposite each other, disposed in the first internal volume, and movable relative to the first return yoke, and a driver for moving the magnetic pole pair within the first internal volume.

Abstract translation: 磁场发生器包括在固定返回轭内的可移动磁极对，以高精度高精度地改变磁场。 磁场发生器包括：具有第一内部容积的第一回转轭，具有彼此相对设置的磁极的磁极对，设置在第一内部容积中，并且可相对于第一回转轭移动;以及驱动器，用于使磁性 第一个内部卷内的极对。

公开(公告)号：US5572563A

公开(公告)日：1996-11-05

申请号：US357650

申请日：1994-12-16

Applicant: Kazuyuki Kasumi ,  Yutaka Watanabe

Inventor： Kazuyuki Kasumi ,  Yutaka Watanabe

IPC: G02B5/08 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC classification number: G03F7/70891 ,  G21K1/06 ,  G21K5/00

Abstract: A mirror unit includes a mirror having a reflecting surface, a holding member for supporting the mirror and an airtight chamber incorporating the mirror, supported by the holding member, in an airtight state. Either the mirror or the holding member constitutes a portion of a side wall of the airtight chamber. The mirror unit can be suitably used in an exposure apparatus which uses a synchrotron radiation light source or the like as a light source.

Abstract translation: 反射镜单元包括具有反射表面的反射镜，用于支撑反射镜的保持构件和由保持构件支撑的并入反射镜的气密室，处于气密状态。 镜子或保持构件都构成气密室的侧壁的一部分。 反射镜单元可以适用于使用同步辐射光源等作为光源的曝光装置。

公开(公告)号：US5485496A

公开(公告)日：1996-01-16

申请号：US310489

申请日：1994-09-22

Applicant: Keun-Ho Lee ,  Chih-Chang Chu

Inventor： Keun-Ho Lee ,  Chih-Chang Chu

IPC: A61L2/08 ,  A61L17/12 ,  G21K5/00

CPC classification number: A61L17/12 ,  A61L2/08 ,  G21K5/00

Abstract: Biomaterial medical devices or products, e.g., absorbable sutures or joint prostheses components, are gamma irradiation sterilized in the substantial absence of oxygen (e.g., vacuum treatment to 5.times.10.sup.-6 torr) while being maintained at a temperature about that of liquid nitrogen, with improved strength loss resistance compared to gamma irradiation sterilization under ambient conditions.

Abstract translation: 生物材料医疗装置或产品，例如可吸收缝合线或关节假体组件，在相当于没有氧气（例如，5×10 -6乇的真空处理）的同时被γ辐射灭菌，同时保持在液氮附近的温度， 与环境条件下的γ辐射灭菌相比，抗强度损失阻力。

公开(公告)号：US5318045A

公开(公告)日：1994-06-07

申请号：US821028

申请日：1992-01-15

Applicant: Walter C. Rawls, Jr. ,  Gregory J. Provell

Inventor： Walter C. Rawls, Jr. ,  Gregory J. Provell

IPC: A61N2/04 ,  B09C1/10 ,  C02F3/34 ,  C12N13/00 ,  G21K1/093 ,  G21K5/00 ,  A61B19/00

CPC classification number: G21K1/093 ,  B09C1/10 ,  C02F3/34 ,  C12N13/00 ,  G21K5/00

Abstract: A method is provided for the modification of microbial metabolism using a unipolar magnetic field. By applying a unipolar magnetic field to microbes under controlled conditions, changes in the rate and/or efficiency of metabolism are produced.

Abstract translation: 提供了使用单极磁场修饰微生物代谢的方法。 通过在受控条件下对微生物施加单极磁场，产生代谢速率和/或效率的变化。

公开(公告)号：US5120972A

公开(公告)日：1992-06-09

申请号：US625833

申请日：1990-12-11

Applicant: Im J. Rangwalla ,  Sam Nablo

Inventor： Im J. Rangwalla ,  Sam Nablo

IPC: B05C9/12 ,  B05D3/04 ,  B05D3/06 ,  G21K5/00

CPC classification number: G21K5/00 ,  B05D3/0486 ,  B05D3/068

Abstract: Through the use of a hybrid or the combination of inexpensive relatively impure, and expensive pure, nitrogen purging at various locations of electron-beam processing of polymer and other coatings, high speed efficient processing can be obtained at reduced cost.

公开(公告)号：US4916311A

公开(公告)日：1990-04-10

申请号：US166074

申请日：1988-03-09

Applicant: Naomitsu Fuzishita ,  Shigeo Sasaki ,  Yasushi Matsumura ,  Akira Shuhara ,  Kazuhiro Shono

Inventor： Naomitsu Fuzishita ,  Shigeo Sasaki ,  Yasushi Matsumura ,  Akira Shuhara ,  Kazuhiro Shono

IPC: G21K1/14 ,  G21K5/00 ,  H01J27/02 ,  H05H3/00

CPC classification number: G21K5/00 ,  G21K1/14 ,  H01J27/02 ,  H05H3/00 ,  H01J2237/0041

Abstract: In an ion beam irradiating apparatus for providing a neutralized ion beam to a sample, there are provided an ion source, an accelerating device and an ion beam selecting device to which the accelerated and selection ion beam is irradiated. This irradiating apparatus further includes an ion neutralizer positioned between the selecting device and the sample, and includes: an electron beam emitting source for emitting an electron beam; a first electron scatter preventing electrode for preventing the electron beam emitted from the electron beam emitting source from being scattered outside the ion neutralizer; a second electron scatter preventing electrode for preventing the electron beam induced into the specified ion beam from being scattered in a direction opposite to an ion irradiating direction; and a control electrode for controlling a traveling velocity of the electron beam emitted from the electron emitting source so as to drift the emitted electron beam toward the sample, thereby neutralizing the selected ion beam at a location adjacent to a surface of the sample that is being irradiated.

Abstract translation: 在用于向样品提供中和的离子束的离子束照射装置中，设置有照射加速选择离子束的离子源，加速装置和离子束选择装置。 该照射装置还包括位于选择装置和样品之间的离子中和器，包括：用于发射电子束的电子束发射源; 用于防止从电子束发射源发射的电子束被散射到离子中和器外的第一电子散射防止电极; 第二电子散射防止电极，用于防止被引导到指定的离子束中的电子束沿与离子照射方向相反的方向散射; 以及控制电极，用于控制从电子发射源发射的电子束的行进速度，以使所发射的电子束朝向样品漂移，从而在邻近样品表面的位置处中和选定的离子束 照射。

公开(公告)号：US4446374A

公开(公告)日：1984-05-01

申请号：US336353

申请日：1982-01-04

Applicant: Andrei S. Ivanov ,  Leonid V. Komorin ,  Vladimir I. Nikishkin ,  Mikhail P. Sviniin ,  Mikhail T. Fedotov

Inventor： Andrei S. Ivanov ,  Leonid V. Komorin ,  Vladimir I. Nikishkin ,  Mikhail P. Sviniin ,  Mikhail T. Fedotov

IPC: G21K5/00 ,  G21K5/10 ,  C08J7/10 ,  G21K1/00

CPC classification number: G21K5/00 ,  G21K5/10

Abstract: An electron beam accelerator comprises a radiation protection chamber 10 accommodating a partition 12 which in combination with a vacuum chamber 1 hermetically divides the radiation protection chamber 10 into two compartments 14, 15. One compartment 14 accommodates an exit window 2 of the vacuum chamber 1, while the other compartment 15 accommodates an electron beam scanning system 8, vacuum pumps 3 and a vacuum monitoring device 5.

Abstract translation: PCT No.PCT / SU80 / 00068 Sec。 371日期1982年1月4日 102（e）日期1982年1月4日PCT申请日1980年5月5日PCT公布。 公开号WO81 / 03253 日期：1981年11月12日。电子束加速器包括辐射保护室10，其容纳隔板12，隔板12与真空室1组合，将辐射防护室10气密地分隔成两个隔间14,15。一个隔室14容纳出口窗 2，而另一个隔室15容纳电子束扫描系统8，真空泵3和真空监测装置5。

公开(公告)号：US4295048A

公开(公告)日：1981-10-13

申请号：US145061

申请日：1980-04-28

Applicant: Marshall R. Cleland ,  Howard F. Malone, Sr.

Inventor： Marshall R. Cleland ,  Howard F. Malone, Sr.

IPC: G21K5/00 ,  G01K1/08 ,  G01N23/00

CPC classification number: G21K5/00

Abstract: A method and system for scanning a beam of charged particles to control radiation dose distributions is implemented by deflecting the beam through a plurality of positions across a conveyor path along which an object to be irradiated is moved, and controlling the length of time the beam remains at each position in accordance with the radiation dose required at each position. The beam may be deflected by a single magnet beam scanning device supplied with a drive signal having a steplike waveform or by a series of sequentially operated, controllable deflection magnets arranged along a beam pipe to sequentially deflect the beam toward the object to be irradiated from different positions.

Abstract translation: 用于扫描带电粒子束以控制辐射剂量分布的方法和系统通过使束穿过穿过被照射物体移动的传送路径的多个位置偏转并且控制束保持的时间长度来实现 在每个位置根据每个位置所需的辐射剂量。 光束可以被提供有具有阶梯状波形的驱动信号的单个磁体束扫描装置或沿着光束管布置的一系列顺序操作的可控偏转磁体偏转，以使光束朝向不同的待辐射对象顺序地偏转 职位