公开(公告)号：US06232600B1

公开(公告)日：2001-05-15

申请号：US09309208

申请日：1999-05-10

Applicant: Eugene P. Marsh

Inventor： Eugene P. Marsh

IPC: H01J3726

CPC classification number: G01N23/2258 ,  H01J37/252 ,  H01J2237/2527

Abstract: An apparatus and method for mass spectrometric determination of contaminant components of a thin oxide surface layer of a semiconductor wafer use a movable mechanical stage to scan and raster a large area of the wafer in a continuous scanning motion. The mass of analyte is greatly increased, resulting in improved sensitivity to trace components in the surface layer by a factor of 10-100 or more. A light beam interferometer is used to determine non-planarity from e.g. warping of the wafer and provide a correction by maintaining a constant separation between the wafer and the extraction plate or adjusting the electrical bias of the wafer relative to the extraction bias.

Abstract translation: 用于质量测定半导体晶片的薄氧化物表面层的污染物组分的装置和方法使用可移动机械平台以连续的扫描运动扫描和光栅化晶片的大面积。 分析物的质量大大增加，导致对表面层中的痕量组分的改善的灵敏度提高10-100倍。 光束干涉仪用于确定例如非平面性的非平面性。 晶片翘曲并通过保持晶片和提取板之间的恒定间隔或调整晶片相对于提取偏压的电偏压来提供校正。

公开(公告)号：US5798524A

公开(公告)日：1998-08-25

申请号：US684973

申请日：1996-08-07

Applicant: Michael Karl Kundmann ,  Alexander Jozef Gubbens ,  Stuart Lawrence Friedman ,  Ondrej L. Krivanek

Inventor： Michael Karl Kundmann ,  Alexander Jozef Gubbens ,  Stuart Lawrence Friedman ,  Ondrej L. Krivanek

IPC: G01Q20/04 ,  G01Q30/02 ,  H01J37/05 ,  H01J37/244 ,  H01J37/252 ,  H01J37/26 ,  H01J47/00

CPC classification number: H01J37/05 ,  H01J37/252 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/24485 ,  H01J2237/24585 ,  H01J2237/2826

Abstract: An energy filtering system of an EFTEM is automatically adjusted using a computer. The computer inserts an energy-selecting slit into the beam path and begins monitoring the position of the electron beam through a combination of the current sensors integral to the slit and the readout of an electron camera. The beam is centered within the slit by adjusting an energy dispersing element while monitoring beam sensors. After initial alignment, the slit is retracted and a reference aperture is inserted at the entrance to the energy filter. The electron camera captures an image of the reference aperture and the computer analyzes the deviations of the aperture image from its known physical dimensions in order to evaluate the electron optical distortions and aberrations of the filter. The computer uses the determined optical parameters to adjust the distortion and aberration correcting optical elements of the filter, whose effects are known due to previous calibration. After correcting the imaging aberrations, the reference aperture is withdrawn, the slit reinserted, and an isochromatic surface of the filter at the plane of the slit is measured by scanning the beam across a slit edge while integrating the transmitted beam intensity on the electron camera. The isochromatic surface thus collected by the electron camera is analyzed by the computer to extract additional aberration coefficients of the filter system. These measured aberration coefficients are used to make calibrated corrections to the filter optics.

Abstract translation: 使用计算机自动调整EFTEM的能量过滤系统。 计算机将能量选择狭缝插入光束路径中，并开始通过整合到狭缝的电流传感器和电子照相机的读出的组合监视电子束的位置。 通过在监测光束传感器的同时调节能量分散元件，光束在狭缝内居中。 在初始对准之后，狭缝缩回并且在能量过滤器的入口处插入参考孔。 电子摄像机捕获参考光圈的图像，并且计算机分析孔径图像与其已知物理尺寸的偏差，以便评估滤光器的电子光学失真和像差。 计算机使用确定的光学参数来调整滤波器的失真和像差校正光学元件，其由于先前的校准而已知其影响。 在校正成像像差之后，取出参考孔径，重新插入缝隙，并且通过扫描横跨狭缝边缘的光束来测量滤光器在狭缝平面处的等色表面，同时将透射光束强度整合在电子照相机上。 由电子照相机收集的等色表面由计算机分析以提取滤光系统的附加像差系数。 这些测量的像差系数用于对滤光器光学元件进行校准校正。

公开(公告)号：US5650621A

公开(公告)日：1997-07-22

申请号：US534019

申请日：1995-09-26

Applicant: Ruriko Tsuneta ,  Hiroshi Kakibayashi

Inventor： Ruriko Tsuneta ,  Hiroshi Kakibayashi

IPC: H01J37/252 ,  H01J37/26

CPC classification number: H01J37/252 ,  H01J37/26

Abstract: The composition change and strained structure in a heterointerface or thin film of a multilayer thin film specimen are observed. When the composition change and strained structure are observed, comparison between a dark-field image and a bright-field image and comparison between two dark-field images are required. The position of an objective aperture disposed between the specimen and a detector is moved rapidly so that diffracted wave or transmitted wave corresponding to the dark-field image or bright-field image of a desired plane index is transmitted. As a result, the dark-field image or bright-field image of a desired plane index can be observed correspondingly to the position of the objective aperture.

Abstract translation: 观察到多层薄膜试样的异质界面或薄膜中的组成变化和应变结构。 当观察到组合物变化和应变结构时，需要在暗场图像和亮视场图像之间进行比较并且需要两个暗视场图像之间的比较。 设置在样本和检测器之间的物镜孔的位置快速移动，从而传输与所需平面指标的暗视场图像或亮场图像对应的衍射波或透射波。 结果，可以对应于物镜孔的位置来观察所需平面折射率的暗视场图像或明场图像。

公开(公告)号：US5369274A

公开(公告)日：1994-11-29

申请号：US623930

申请日：1991-02-11

Applicant: Wilhelm Brunger

Inventor： Wilhelm Brunger

IPC: G01N23/227 ,  G01Q30/02 ,  G01Q30/20 ,  H01J37/252 ,  H01J39/00

CPC classification number: G01N23/2273 ,  H01J37/252

Abstract: A commercially available Auger apparatus is developed in such a manner thatt is suitable for carrying out a high-resolution x-ray photoelectron spectroscopy. As a result, the stress to the material is low while the resolution capacity is high. The primary electron beam of an Auger probe impinges on the rear surface of the membrane and induces an x-ray radiation. This x-ray radiations triggers photoelectrons from the membrane surface which are used for the analysis of the uppermost atom layers of the surface. By means of a sample holder, which is designed as a Faraday cage, the electrons are kept back which are emitted from the rear surface of the membrane. The method is suitable for examining very fine structures in the .mu.- and sub-.mu.-range.

Abstract translation: PCT No.PCT / DE89 / 00398 Sec。 371日期1991年2月11日 102（e）日期1991年2月11日PCT提交1989年6月16日PCT公布。 WO89 / 12818 PCT公开号 日期为1989年12月28日。市售的俄歇仪器以适于进行高分辨率X射线光电子能谱的方式开发。 结果，材料的应力低，而分辨率高。 俄歇探针的一次电子束撞击膜的后表面并诱导X射线辐射。 这种X射线辐射从膜表面触发用于分析表面最上层原子层的光电子。 通过设计为法拉第笼的样品保持器，电子被保持回来，其从膜的后表面发射。 该方法适用于检测微量和微量级的非常精细的结构。

公开(公告)号：US5350921A

公开(公告)日：1994-09-27

申请号：US94955

申请日：1993-07-23

Applicant: Takashi Aoyama ,  Yutaka Misawa

Inventor： Takashi Aoyama ,  Yutaka Misawa

IPC: H01J37/252 ,  H01J37/26 ,  H01J37/295 ,  H01J49/26 ,  G01N23/00

CPC classification number: H01J37/252 ,  H01J37/265

Abstract: An analytical electron microscope automatically identifies objects in a sample on the basis of shape of the object, change of thickness of the object and/or change of element (such as change of element type or concentration). Therefore, the operator of the analytical electron microscope can specify a desired object, and an example or examples of that object in a sample can be identified automatically. The characteristics need to identify the object are determined by detecting the effect of the sample on the electron beam of the analytical electron microscope, using, for example, an energy dispersive type X-ray analyzer and an electron energy loss spectrometer. Once an example of the object has been identified, it may be analyzed further. The analytical electron microscope may also analyze a sample to identify and classify the objects present.

Abstract translation: 分析电子显微镜根据物体的形状，物体的厚度变化和/或元素的变化（例如元件类型或浓度的变化）自动识别样品中的物体。 因此，分析电子显微镜的操作者可以指定期望的对象，并且可以自动识别样品中的该对象的示例或示例。 通过使用例如能量色散型X射线分析仪和电子能量损失光谱仪，通过检测样品对分析电子显微镜的电子束的影响来确定对象的特征。 一旦已经识别出对象的示例，则可以进一步分析该对象的示例。 分析电子显微镜还可以分析样品以鉴别和分类存在的物体。

公开(公告)号：US4880977A

公开(公告)日：1989-11-14

申请号：US197458

申请日：1988-05-23

Applicant: Ken Tomita ,  Seiichiro Mori

Inventor： Ken Tomita ,  Seiichiro Mori

IPC: H01J37/22 ,  H01J37/141 ,  H01J37/252 ,  H01J37/26

CPC classification number: H01J37/265 ,  H01J37/252

Abstract: An analytical electron microscope directs an electron beam onto a specimen. The beam is switched back and forth between two states in one of which the beam is finely focused to a size on the order of nanometers. In the other the beam is defocused to a size on the order of microns. A magnified image of a relatively broad region on the specimen irradiated with the defocused beam and a bright spot image are alternately displayed on a fluorescent screen. The bright spot image is obtained from a region on the specimen irradiated with the focused beam. The two images are displayed alternately at intervals shorter than the persistence time of the fluorescent screen to permit one to observe both images simultaneously. The operator moves the position at which the beam irradiates the specimen to bring the bright spot image into a desired region to be analyzed while observing the two images. Thus, the focused beam irradiates the specimen at the desired region. The resulting X-rays are detected, or a diffraction image produced in response to the irradiation of the focused beam is photographed.

Abstract translation: 分析电子显微镜将电子束引导到样品上。 光束在两个状态之间来回切换，其中一个光束被精细地聚焦到大约数量级的纳米。 另一方面，光束散焦到微米数量级。 在荧光屏上交替显示用散焦光束照射的样本上的相对宽的区域的放大图像和亮点图像。 从用聚焦光束照射的样本上的区域获得亮点图像。 两个图像以比荧光屏的持续时间短的间隔交替显示，以允许同时观察两个图像。 操作者移动光束照射样本的位置，使亮点图像进入要分析的所需区域，同时观察两个图像。 因此，聚焦光束在所需区域照射样本。 检测所得到的X射线，或者拍摄响应于聚焦束的照射而产生的衍射图像。

公开(公告)号：US4810879A

公开(公告)日：1989-03-07

申请号：US36899

申请日：1987-04-10

Applicant: Andrew R. Walker

Inventor： Andrew R. Walker

IPC: G01N23/22 ,  G01Q20/04 ,  H01J37/252 ,  H01J37/285 ,  H01J49/46 ,  H01J49/44

CPC classification number: H01J37/252 ,  H01J37/285 ,  H01J49/46 ,  H01J2237/053

Abstract: A charged particle energy analyzer, such as a microscope or spectrometer, includes a magnetic immersion lens 10 to focus charged particles emitted from an irradiated specimen 5 located within the magnetic field of the lens. A collecting aperture 18 defines the area of the irradiated specimen from which charged particles can be brought to a focus in the image plane of the lens but an aperture 21 in this plane selects and defines a much smaller area of the specimen from which the received particles are passed to a suitable energy analyzing means 25. The energy analyzing means 25 then performs energy analysis of the small selected area of the specimen by imaging the small area with emitted particles of a predetermined energy, or energy scanning the particles emitted from this area, so giving a chemical analysis of the small selected area of the specimen surface.

Abstract translation: 带电粒子能量分析仪，例如显微镜或光谱仪，包括用于聚焦从位于透镜的磁场内的照射样本5发射的带电粒子的磁浸透镜10。 收集孔18限定被照射的样品的面积，从中可以使带电粒子能够在透镜的图像平面中被聚焦，但是该平面中的孔21选择并限定样本的小得多的区域， 能量分析装置25然后通过用预定能量的发射颗粒成像小区域或扫描从该区域发射的颗粒的能量来对样本的小选区进行能量分析， 因此对样品表面的小选区进行化学分析。

公开(公告)号：US4785172A

公开(公告)日：1988-11-15

申请号：US947153

申请日：1986-12-29

Applicant: Randall L. Kubena ,  John W. Reeds

Inventor： Randall L. Kubena ,  John W. Reeds

IPC: G01Q30/02 ,  H01J37/244 ,  H01J37/252 ,  H01J49/02

CPC classification number: H01J37/252 ,  H01J37/244 ,  H01J49/025 ,  H01J2237/24435 ,  H01J2237/2446 ,  H01J2237/2449 ,  H01J2237/24585

Abstract: A secondary ion mass spectrometry system and method is described which operates several orders of magnitude more quickly than previous systems, and captures information that might previously have been missed. A parallel detection approach is used which simultaneously monitors all secondary ion masses of interest, as opposed to prior serial approaches which sense only one ion mass at a time. The secondary ions are spatially separated according to mass and sensed by a detector array. An ion-electron converter and amplifier, implemented as a microchannel plate assembly, is preferably interfaced between the mass separator and detector. The detector preferably uses an array of wires to collect charge emitted by the microchannel plate. The wires are coupled to output lines by an encoding scheme which allows many fewer output lines to be employed than there are wires.

Abstract translation: 描述了二次离子质谱系统和方法，其操作比先前系统快几个数量级，并且捕获先前已经被遗漏的信息。 使用并行检测方法，其同时监测所有感兴趣的二次离子质量，而不是一次仅感测一个离子质量的先前的串联方法。 二次离子根据质量在空间上分离并由检测器阵列感测。 实现为微通道板组件的离子电子转换器和放大器优选地连接在质量分离器和检测器之间。 检测器优选使用阵列阵列来收集由微通道板发射的电荷。 导线通过编码方案耦合到输出线，该编码方案比使用导线允许使用更少的输出线。

公开(公告)号：US4564758A

公开(公告)日：1986-01-14

申请号：US575828

申请日：1984-02-01

Applicant: Georges Slodzian ,  Marcel Chaintreau ,  Roger Dennebouy

Inventor： Georges Slodzian ,  Marcel Chaintreau ,  Roger Dennebouy

IPC: G01Q30/02 ,  H01J37/02 ,  H01J37/252

CPC classification number: H01J37/252 ,  H01J37/026

Abstract: The invention provides a process and device for the ionic analysis of an insulating sample brought to a given negative potential, of the type in which a target on the surface of the sample to be analyzed is bombarded by means of a primary electron beam and negative ions emitted by the bombarded target are used for producing an ion image of the sample. An electron beam whose normal speed component cancels out just at level of the surface of the target is directed perpendicularly to the target.The device comprises for this purpose a filament, brought substantially to the same negative potential as the sample, which emits the electron beam. The electron beam, after emission, is deflected by a magnetic prism so as to be brought into coincidence with the optical axis of the negative ion beam emitted by the target.

Abstract translation: 本发明提供了一种用于离子分析的方法和装置，所述绝缘样品带到给定的负电位，其中待分析样品的表面上的靶通过一次电子束和负离子 由被轰击的靶发射的用于产生样品的离子图像。 其正常速度分量恰好在目标表面的水平上抵消的电子束垂直于目标。 该装置包括用于该目的的灯丝，其基本上带有与样品相同的负电位，其发射电子束。 发射后的电子束被磁性棱镜偏转，使其与目标发射的负离子束的光轴一致。

公开(公告)号：US4551599A

公开(公告)日：1985-11-05

申请号：US525413

申请日：1983-08-22

Applicant: Helmut Liebl

Inventor： Helmut Liebl

IPC: H01J37/12 ,  H01J37/244 ,  H01J37/252 ,  H01J37/26

CPC classification number: H01J37/252 ,  H01J37/12

Abstract: A combined objective and emission lens for a microbeam probe is described which is suitable for primary and secondary particles of the same charge sign, by which lens a bundle of primary rays of comparatively high energy can be focused on a very small spot of a plane sample surface and the secondary particles emitted by this spot can be collected into a collimated bundle of secondary rays which leaves the combined lens in a direction substantially opposite to the bundle of primary rays. In the present combined lens, the field strength between the sample surface and the lens electrode most closely adjacent to it is very high, in contrast to the known combined objective and emission lenses, so that a small emissivity of the secondary beam with a small diameter at the same time of the primary beam spot and an effective collection and collimation of the secondary particles are ensured. Certain embodiments can be changed over optionally to operation with primary and secondary particles of the same or opposite polarity.

Abstract translation: 描述了用于微束探针的组合的目标和发射透镜，其适用于相同电荷符号的初级和次级颗粒，通过该透镜，相对较高能量的一束主射线可以聚焦在平面样品的非常小的点上 表面和由该点发射的次级颗粒可以被收集成准直的二次射线束，其将组合透镜沿与主光束基本相反的方向离开。 在本发明的组合透镜中，与已知的组合物镜和发射透镜相反，样品表面与其最接近的透镜电极之间的场强非常高，使得具有小直径的次级束的小的发射率 同时保证了主光斑的有效收集和准直。 某些实施例可以任选地改变为具有相同或相反极性的初级和次级粒子的操作。