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公开(公告)号:US11955354B2
公开(公告)日:2024-04-09
申请号:US17600086
申请日:2020-03-25
发明人: Tadaaki Kaneko
IPC分类号: F27D7/02 , C30B23/02 , C30B33/02 , F27B17/00 , F27D5/00 , F27D11/00 , H01L21/67 , H01L21/324
CPC分类号: H01L21/67109 , C30B23/02 , C30B33/02 , F27B17/0025 , F27D5/0037 , F27D7/02 , F27D11/00 , H01L21/324
摘要: Provided is a semiconductor substrate manufacturing device which is capable of uniformly heating the surface of a semiconductor substrate that has a relatively large diameter or major axis. The semiconductor substrate manufacturing device includes a container body for accommodating a semiconductor substrate and a heating furnace that has a heating chamber which accommodates the container body, and the heating furnace has a heating source in a direction intersecting the semiconductor substrate to be disposed inside the heating chamber.
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公开(公告)号:US11927394B2
公开(公告)日:2024-03-12
申请号:US17655240
申请日:2022-03-17
发明人: Tatsuya Yamaguchi , Toshiyuki Ito
CPC分类号: F27B17/0025 , F27D11/00 , F27D2007/026 , F27D2007/045 , F27D2009/0075
摘要: A heat treatment apparatus according to one aspect of the present disclosure includes a vertically long process chamber, a heater configured to heat the process chamber, and a cooler configured to cool the process chamber. The cooler includes a plurality of discharge holes provided at intervals along a longitudinal direction of the process chamber to discharge cooling fluid toward the process chamber and a plurality of shutters provided corresponding to the plurality of discharge holes. At least one of the plurality of shutters is configured to move to an open position independently of other shutters.
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公开(公告)号:US20230375272A1
公开(公告)日:2023-11-23
申请号:US18027488
申请日:2021-09-27
申请人: PAUL WURTH S.A.
CPC分类号: F27D7/02 , F27D3/16 , F27B1/16 , F27B1/24 , F27D99/0073 , F27D2007/023 , F27D2003/166
摘要: A shaft furnace, in particular a blast furnace, comprises includes an outer metal shell; a plurality of tuyeres arranged to inject hot blast into the shaft furnace; and means for injecting process gas in the shaft stack area, where the injector has a nozzle body with a peripheral wall extending along a longitudinal axis from a front portion, with at least one injection hole, to an opposite rear portion connected to a base member, where the nozzle body includes an inner gas channel for guiding process gas from an inlet port in the base member to the injection holes(s), nozzle body being mounted through an aperture in the metal shell in such a way that the front region with injection hole(s) is located on the inner side of the metal shell, whereas the rear portion is outside of the metal shell, and the base member includes a peripheral mounting portion configured for connecting the injector in a gas tight manner to a mounting unit surrounding the aperture in the metal shell.
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公开(公告)号:US11766718B2
公开(公告)日:2023-09-26
申请号:US17018334
申请日:2020-09-11
申请人: Desktop Metal, Inc.
发明人: Nathan Woodard
CPC分类号: B22F3/003 , B22F3/1021 , F27B5/04 , F27B5/14 , B22F3/225 , F27B2005/064 , F27D2001/1891 , F27D2007/023
摘要: A compound sintering furnace with managed contamination for debinding and sintering parts. An inner insulation layer is disposed within an outer insulation layer and has an internal hot face surrounding a work zone. A sealed housing surrounds the inner insulation layer and is composed of a refractory material capable of withstanding a service temperature greater than a debinding temperature and less than a sintering temperature. An outer heater system is configured to heat at least a portion of the sealed housing and externally heat the inner insulation layer to, in conjunction with an inner heater system, heat the work zone to the debinding temperature, and inhibit condensation of a binder within and upon the inner insulation layer during a debinding process. The inner heater system is configured to internally heat the inner insulation and heat the work zone to the sintering temperature.
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公开(公告)号:US11761074B2
公开(公告)日:2023-09-19
申请号:US17124493
申请日:2020-12-17
发明人: Yukihiro Shingaki , Hirotaka Inoue
IPC分类号: F27D7/02 , C23C8/26 , C21D9/46 , C23C8/02 , C22C38/60 , H01F1/16 , C22C38/00 , C21D8/12 , C22C38/04 , C22C38/06 , C22C38/08 , C22C38/12 , C22C38/16 , C22C38/28 , C22C38/34 , C23F17/00 , F27B9/04 , F27D7/06
CPC分类号: C23C8/26 , C21D8/12 , C21D8/1222 , C21D8/1233 , C21D8/1272 , C21D8/1277 , C21D9/46 , C22C38/00 , C22C38/002 , C22C38/008 , C22C38/04 , C22C38/06 , C22C38/08 , C22C38/12 , C22C38/16 , C22C38/28 , C22C38/34 , C22C38/60 , C23C8/02 , C23F17/00 , H01F1/16 , F27B9/045 , F27D7/02 , F27D7/06
摘要: A nitriding apparatus for manufacturing a grain-oriented electrical steel sheet is provided. The nitriding apparatus includes: a nitriding gas supply pipe for introducing gas including at least ammonia or nitrogen; and a nitriding treatment portion for successively performing high-temperature nitriding and low-temperature nitriding in nitriding treatment. The nitriding treatment portion includes a high-temperature treatment portion for performing the high-temperature nitriding and a low-temperature treatment portion for performing the low-temperature nitriding, and the nitriding gas supply pipe to the high-temperature treatment portion includes a cooling device.
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公开(公告)号:US20230204290A1
公开(公告)日:2023-06-29
申请号:US18145331
申请日:2022-12-22
申请人: HPSP Co., Ltd.
发明人: Kun Young LIM
CPC分类号: F27D7/02 , F27D99/007 , F27D7/06 , F27D2001/0059
摘要: Provided is a high pressure heat treatment apparatus including: an internal chamber accommodating an object to be heat-treated; an external chamber including a housing and a partition plate partitioning the housing into a high-temperature zone accommodating the internal chamber and a low-temperature zone having a lower temperature than the high-temperature zone, the partition plate including a discharge hole for allowing the high-temperature zone and the low-temperature zone to communicate with each other; a gas supply module configured to supply a process gas for the heat treatment to the internal chamber at a first pressure higher than that of the atmosphere, and supply a protective gas to the high-temperature zone and the low-temperature zone at a second pressure set in relation to the first pressure; and a discharge module configured to open the discharge hole to discharge the protective gas in the high-temperature zone to the low-temperature zone.
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公开(公告)号:US20230194174A1
公开(公告)日:2023-06-22
申请号:US18068776
申请日:2022-12-20
申请人: HPSP Co., Ltd.
发明人: Kun Young LIM
CPC分类号: F27D7/02 , F27D7/06 , F27D2007/063 , F27D2021/0007
摘要: Provided is a gas management assembly for a high pressure heat-treatment apparatus, the assembly including: a housing having an inner space; a gas supply module disposed in the inner space and configured to supply a gas to internal and external chambers of the high pressure heat-treatment apparatus; a gas exhaust module disposed in the inner space and configured to exhaust the gas caused by heat treatment of an object from the internal chamber; a detection module connected to the gas exhaust module in the inner space and configured to detect the residual gas remaining in the internal chamber; and a control module configured to control at least one of the gas supply module and the gas exhaust module based on a detection result of the residual gas by the detection module.
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公开(公告)号:US20230064514A1
公开(公告)日:2023-03-02
申请号:US17792576
申请日:2021-01-13
发明人: Tomas Mach
摘要: A process of calcining aluminium hydroxide (Al2O3.3H2O) to form alumina (Al2O3), for example in an alumina plant, such as a Bayer process plant, is disclosed. The process comprises combusting hydrogen and oxygen and generating steam and heat 5 and using the heat to calcine aluminium hydroxide and form alumina and more steam. An apparatus is also disclosed.
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公开(公告)号:US11549753B2
公开(公告)日:2023-01-10
申请号:US15876826
申请日:2018-01-22
发明人: Robert C. Beesley , Mark Davidson
摘要: Heat shrink wrap product packaging oven or tunnel apparatus and processing methods are provided which incorporate or utilize airfoils in conjunction with hot air-providing side walls to desirably control impact of hot air onto a product wrapped with a tube of heat shrink wrap film and being conveyed on a conveyor thereby. In such heat shrink wrap product packaging apparatus and methods, such airfoils can be movable, e.g., rotatably moveable, relative to the side walls to vertically alter an air impact point onto the product.
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公开(公告)号:US20220090230A1
公开(公告)日:2022-03-24
申请号:US17414400
申请日:2018-12-21
申请人: ArcelorMittal
摘要: A steel strip annealing furnace with a dew point control system. The furnace/control system can be more readily controlled to the desired dew point than the prior art control system and can handle the set point changes required as different types of steel coils are continuously run therethrough.
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