Method and apparatus for nucleic acid analysis

    公开(公告)号:US10294519B2

    公开(公告)日:2019-05-21

    申请号:US14233256

    申请日:2012-05-16

    IPC分类号: C12Q1/6834 C12N15/10

    摘要: A convenient method for nucleic acid analysis is provided, which enables 1000 or more types of nucleic acid to be analyzed collectively with high comprehensiveness and with a dynamic range of at least four digits. In particular, provided is a very effective analytical method especially for untranslated RNAs and microRNAs, of which the types of target nucleic acids is 10000 or lower. Nucleic acids can be analyzed conveniently and rapidly with high comprehensiveness and quantitative performance at single-molecule sensitivity and resolution by following the steps of: preparing a group of target nucleic acid fragments one molecule at a time and hybridizing the nucleic acid molecules, which have known base sequences and have been labeled with the fluorescence substances, with the group of the target nucleic acid fragments to detect the fluorescence substances labeling the hybridized nucleic acid molecules.

    Charged particle beam device and pattern measurement device

    公开(公告)号:US10290464B2

    公开(公告)日:2019-05-14

    申请号:US15759408

    申请日:2016-08-15

    摘要: The present invention provides a charged particle beam device capable of predicting the three-dimensional structure of a sample, without affecting the charge of the sample. The present invention provides a charged particle beam device characterized in that a first distance between the peak and the bottom of a first signal waveform obtained on the basis of irradiation with a charged particle beam having a first landing energy, and a second distance between the peak and the bottom of a second signal waveform obtained on the basis of irradiation with a charged particle beam having a second landing energy different from the first landing energy are obtained, and the distance between the peak and the bottom at a landing energy (zero, for instance) different from the first and second landing energies is obtained on the basis of the extrapolation of the first distance and the second distance.

    Automatic analysis apparatus
    84.
    发明授权

    公开(公告)号:US10267817B2

    公开(公告)日:2019-04-23

    申请号:US15326820

    申请日:2015-06-10

    摘要: Provided is an automatic analysis apparatus for inspecting blood coagulation, which is capable of miniaturizing device configuration and reducing device costs. The automatic analysis apparatus includes: a reaction container in which a specimen and a reagent are mixed with each other and the mixed solution is reacted; a sample dispensing mechanism which dispenses the specimen into the reaction container; a blood coagulation time measuring unit in which the reaction container is mounted to measure a coagulation time of the mixed solution within the reaction container; a reaction container accommodating unit which accommodates a plurality of reaction containers provided to the blood coagulation measuring unit; a reaction container transfer mechanism which grasps the reaction container and transfers the reaction container to the blood coagulation measuring unit; and a control unit which controls the reaction container transfer mechanism.

    Defect detection method and defect detection device and defect observation device provided with same

    公开(公告)号:US10267745B2

    公开(公告)日:2019-04-23

    申请号:US15673582

    申请日:2017-08-10

    摘要: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

    Plasma processing equipment and plasma generation equipment

    公开(公告)号:US10262835B2

    公开(公告)日:2019-04-16

    申请号:US15392060

    申请日:2016-12-28

    发明人: Ryoji Nishio

    IPC分类号: H01J37/32

    摘要: A plasma processing equipment includes a vacuum processing chamber, an insulating material, a gas inlet, a high frequency induction antenna provided at an upper outside of the vacuum processing chamber, a magnetic field coil, a yoke for controlling distribution of a magnetic field in the vacuum processing chamber, a high frequency power supply for generating plasma and supplying a high frequency current to the antenna, and a power supply for supplying power to the magnetic field coil. The antenna is divided into n high frequency induction antenna elements are arranged in tandem on one circle so that a high frequency current delayed sequentially by λ (wavelength of high frequency power supply)/n flows clockwise through the antenna elements arranged in tandem via a delay unit, and a magnetic field is applied from the magnetic field coil to generate electron cyclotron resonance (ECR) phenomenon.

    Defect inspecting method and defect inspecting apparatus

    公开(公告)号:US10254235B2

    公开(公告)日:2019-04-09

    申请号:US15806937

    申请日:2017-11-08

    摘要: A defect inspecting method and apparatus for inspecting a surface state including a defect on a wafer surface, in which a polarization state of a laser beam irradiated onto the wafer surface is connected into a specified polarization state, the converted laser beam having the specified polarization state is inserted onto the wafer surface, and a scattering light occurring from an irradiated region where the laser beam having the specified polarization state is irradiated, is separated into a first scattering light occurring due to a defect on the wafer and a second scattering light occurring due to a surface roughness on the wafer. An optical element for optical path division separates the first and second scattering lights approximately at the same time.

    Charged particle beam device
    89.
    发明授权

    公开(公告)号:US10249474B2

    公开(公告)日:2019-04-02

    申请号:US15618203

    申请日:2017-06-09

    摘要: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

    Manufacturing method of magnetoresistive element and vacuum processing apparatus

    公开(公告)号:US10243140B2

    公开(公告)日:2019-03-26

    申请号:US15251595

    申请日:2016-08-30

    摘要: The present invention is a manufacturing method for manufacturing a magnetoresistive element, including a first step for oxidizing or reducing a magnetic film constituting the magnetoresistive element and a metal oxidation film constituting the magnetoresistive element, and a second step performed after the first step, wherein in the second step, in a case where the magnetic film constituting the magnetoresistive element and the metal oxidation film constituting the magnetoresistive element are oxidized, the oxidized magnetic film constituting the magnetoresistive element or the oxidized metal oxidation film constituting the magnetoresistive element is selectively reduced, and in a case where the magnetic film constituting the magnetoresistive element and the metal oxidation film constituting the magnetoresistive element are reduced, the reduced magnetic film constituting the magnetoresistive element or the reduced metal oxidation film constituting the magnetoresistive element is selectively oxidized.