公开(公告)号：US20050214976A1

公开(公告)日：2005-09-29

申请号：US11102108

申请日：2005-04-07

Applicant: Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

Inventor： Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

IPC: B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  G02B26/08 ,  H01L21/48

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

公开(公告)号：US20050213190A1

公开(公告)日：2005-09-29

申请号：US11034294

申请日：2005-01-11

Applicant: Satyadev Patel ,  Andrew Huibers

Inventor： Satyadev Patel ,  Andrew Huibers

IPC: B81C20060101 ,  G02B26/00 ,  G02B26/08 ,  G02F1/29 ,  H04N5/74

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

公开(公告)号：US20050088718A1

公开(公告)日：2005-04-28

申请号：US10627302

申请日：2003-07-24

Applicant: Satyadev Patel ,  Andrew Huibers

Inventor： Satyadev Patel ,  Andrew Huibers

IPC: B81C20060101 ,  G02B26/00 ,  G02B26/08 ,  G02F1/29 ,  H04N5/74

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

公开(公告)号：US20050078379A1

公开(公告)日：2005-04-14

申请号：US10969502

申请日：2004-10-19

Applicant: Andrew Huibers ,  Satyadev Patel ,  Peter Heureux ,  Robert Duboc ,  Regis Grasser

Inventor： Andrew Huibers ,  Satyadev Patel ,  Peter Heureux ,  Robert Duboc ,  Regis Grasser

IPC: G02B26/08 ,  G02B27/14

CPC classification number: G02B26/0841

Abstract: Disclosed herein is a micromirror-based display system having an improved contrast ratio with the deflection of the micromirrors accomplished through one addressing electrode associate with the micromirror.

Abstract translation: 本文公开了一种基于微镜的显示系统，其具有与通过与微镜相关联的一个寻址电极实现的微镜的偏转的改善的对比度。

公开(公告)号：US07787170B2

公开(公告)日：2010-08-31

申请号：US10869539

申请日：2004-06-15

Applicant: Satyadev Patel ,  Andrew G. Huibers ,  Peter Richards ,  Terry Tarn ,  Dietrich Dehlinger

Inventor： Satyadev Patel ,  Andrew G. Huibers ,  Peter Richards ,  Terry Tarn ,  Dietrich Dehlinger

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  B81C3/001 ,  Y10S359/90 ,  Y10T156/10

Abstract: The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.

Abstract translation: 本发明提供了一种微结构器件，其包括多个衬底，其中器件的部件形成在衬底上。 为了保持基板之间的间隙的均匀性，提供并分布在间隙中的多个支柱以防止间隙尺寸的减小。 可以通过将支柱结合到微结构的部件来防止间隙尺寸的增加。 或者，可以通过将间隙内的压力维持在微结构将在其中操作的压力以下来防止间隙尺寸的增加。 形成微反射镜和电极的基板的电接触可以通过许多方式制成，例如电接触区域，电接触焊盘和电接触弹簧。

公开(公告)号：US07751114B2

公开(公告)日：2010-07-06

申请号：US11774533

申请日：2007-07-06

Applicant: Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

Inventor： Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

IPC: G02B26/00 ,  G02B26/08 ,  G02F1/29

CPC classification number: G02B26/0841

Abstract: Disclosed herein are a system and apparatus for operating a device that comprises an array of micromirrors. The system and apparatus are usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation can be applied independently to the micromirrors. Alternatively, the reparation can be incorporated with a bias inversion process.

Abstract translation: 本文公开了一种用于操作包括微镜阵列的装置的系统和装置。 该系统和装置可用于在操作期间修复微镜阵列的卡滞微镜。 在ON状态下，对阵列中的微镜的镜面板进行两次连续刷新电压的修正，其中脉冲在时间上比微镜的特征振荡时间长。 可以独立地对微镜进行修补。 或者，可以用偏置反转处理来结合修补。

公开(公告)号：US07630085B2

公开(公告)日：2009-12-08

申请号：US11110557

申请日：2005-04-19

Applicant: Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

Inventor： Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

IPC: G01B11/02

CPC classification number: G01B9/02063 ,  G01B9/02058 ,  G01J3/453

Abstract: The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.

Abstract translation: 本发明提供了一种微结构器件，其包括多个衬底，其中器件的部件形成在衬底上。 为了保持基板之间的间隙的均匀性，提供并分布在间隙中的多个支柱以防止间隙尺寸的减小。 可以通过将支柱结合到微结构的部件来防止间隙尺寸的增加。 或者，可以通过将间隙内的压力维持在微结构将在其中操作的压力以下来防止间隙尺寸的增加。 形成微反射镜和电极的基板的电接触可以通过许多方式制成，例如电接触区域，电接触焊盘和电接触弹簧。

公开(公告)号：US20080218842A1

公开(公告)日：2008-09-11

申请号：US12103333

申请日：2008-04-15

Applicant: Satyadev Patel ,  James Dumphy ,  Peter Richards ,  Michel Combes

Inventor： Satyadev Patel ,  James Dumphy ,  Peter Richards ,  Michel Combes

IPC: G02B26/08

CPC classification number: G02B26/0841

Abstract: Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.

Abstract translation: 这里公开的是操作包括微镜阵列的装置的方法。 该方法包括可用于在操作期间修复微镜阵列的粘性微镜的过程。 修复过程在ON状态下，对阵列中的微镜的镜板施加两个连续的刷新电压，其中脉冲在时间上比微镜的特征振荡时间长。 修复过程可独立应用于微镜。 或者，修复过程可以结合偏置反转过程。

公开(公告)号：US07362493B2

公开(公告)日：2008-04-22

申请号：US11216930

申请日：2005-08-30

Applicant: Andrew Huibers ,  Satyadev Patel

Inventor： Andrew Huibers ,  Satyadev Patel

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

Abstract translation: 在显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。

公开(公告)号：US20070258129A1

公开(公告)日：2007-11-08

申请号：US11774533

申请日：2007-07-06

Applicant: Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

Inventor： Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: Disclosed herein are a system and apparatus for operating a device that comprises an array of micromirrors. The system and apparatus are usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation can be applied independently to the micromirrors. Alternatively, the reparation can be incorporated with a bias inversion process.

Abstract translation: 本文公开了一种用于操作包括微镜阵列的装置的系统和装置。 该系统和装置可用于在操作期间修复微镜阵列的卡滞微镜。 在ON状态下，对阵列中的微镜的镜面板进行两次连续刷新电压的修正，其中脉冲在时间上比微镜的特征振荡时间长。 可以独立地对微镜进行修补。 或者，可以用偏置反转处理来结合修补。