公开(公告)号：US20080019013A1

公开(公告)日：2008-01-24

申请号：US11864193

申请日：2007-09-28

申请人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

发明人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

IPC分类号： G02B3/00

CPC分类号： G03F7/70966 ,  B24B13/00 ,  G02B1/02 ,  G02B3/00

摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

公开(公告)号：US07292388B2

公开(公告)日：2007-11-06

申请号：US10983569

申请日：2004-11-08

申请人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

发明人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

IPC分类号： G02B13/14

CPC分类号： G03F7/70966 ,  B24B13/00 ,  G02B1/02 ,  G02B3/00

摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

公开(公告)号：US20070195423A1

公开(公告)日：2007-08-23

申请号：US11657925

申请日：2007-01-25

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc ,  David Shafer ,  Wilhelm Ulrich ,  Rudolf Buenau ,  Hans-Juergen Mann ,  Alexander Epple

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc ,  David Shafer ,  Wilhelm Ulrich ,  Rudolf Buenau ,  Hans-Juergen Mann ,  Alexander Epple

IPC分类号： G02B3/00

CPC分类号： G02B27/0012 ,  G02B1/02 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70966 ,  G03F7/70975

摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

公开(公告)号：US07126765B2

公开(公告)日：2006-10-24

申请号：US11029788

申请日：2005-01-05

申请人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

发明人： Daniel Krähmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christof Zaczek

IPC分类号： G02B17/00 ,  G02B13/14

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

公开(公告)号：US07079331B2

公开(公告)日：2006-07-18

申请号：US11109316

申请日：2005-04-19

申请人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

发明人： Ulrich Weber ,  Alexander Kohl ,  Hubert Holderer ,  Armin Schoeppach ,  Erwin Gaber ,  Winfried Kaiser ,  Reiner Garreis ,  Toralf Gruner ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan

IPC分类号： G02B7/02 ,  G02B27/10 ,  G02B27/14 ,  G02B7/18 ,  G02F1/01

CPC分类号： G03F7/70825 ,  G02B7/008 ,  G02B7/1805 ,  G03F7/70891

摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.

摘要翻译： 本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。 分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在 分束器元件

公开(公告)号：US20060119750A1

公开(公告)日：2006-06-08

申请号：US11252598

申请日：2005-10-19

申请人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

发明人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

IPC分类号： G02F1/1335

CPC分类号： G02B17/0892 ,  G02B3/12 ,  G02B3/14 ,  G02B13/143 ,  G02B17/0812

摘要： An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

摘要翻译： 波长λ<= 200nm的紫外光的光学系统可以特别设计为用于微光刻的反射折射投影物镜，具有多个光学元件，包括由合成石英玻璃制成的光学元件或透明于 波长λ<= 200nm。 至少两个光学元件用于形成至少一个液体透镜组，该液体透镜组包括第一限定光学元件，第二限定光学元件和液体透镜，该液体透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 限定光学元件并且包含对波长λ<= 200nm的透明紫外光的液体。 这使得即使在难以校正色彩的系统的情况下也能够有效地校正色像差。

公开(公告)号：US20050254773A1

公开(公告)日：2005-11-17

申请号：US11185066

申请日：2005-07-20

申请人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

发明人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

IPC分类号： G02B7/00 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G02B6/00

CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振独立扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

公开(公告)号：US20050180023A1

公开(公告)日：2005-08-18

申请号：US11071699

申请日：2005-03-02

申请人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

发明人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02B1/02 ,  G02B5/30 ,  G02B13/14 ,  G03F7/20 ,  G02B3/00

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/705 ,  G03F7/70966 ,  Y10S359/90

摘要： A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimizing method, an optimizing function which takes at least one birefringence-related image aberration into account is minimized. The birefringence-related image aberration is determined from a calculation for a light ray passing through the fluoride crystal lenses. To the extent that the birefringence-related image aberration is a function of parameters of the light ray, it depends only on geometric parameters of the light ray. The numerical optimizing method is used to produce objectives in which an optical retardation as well as an asymmetry of the optical retardation are corrected. The lenses are arranged in homogeneous groups, where each homogeneous group is corrected for the optical retardation asymmetry.

摘要翻译： 数值优化方法用于减少物镜中的立方晶体结构的氟化物晶体材料的透镜中的固有双折射引起的有害影响，特别是微光刻系统的投影物镜。 在优化方法下，考虑到至少一个双折射相关图像像差的优化函数被最小化。 从通过氟化物晶体透镜的光线的计算确定双折射相关图像像差。 在双折射相关图像像差是光线参数的函数的程度上，其仅取决于光线的几何参数。 使用数值优化方法来产生其中光学延迟以及光学延迟的不对称性被校正的目标。 透镜被排列成均匀的组，其中每个均匀组被校正用于光学延迟不对称。

公开(公告)号：US09733395B2

公开(公告)日：2017-08-15

申请号：US13112357

申请日：2011-05-20

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

IPC分类号： G03B27/68 ,  G02B1/11 ,  G03F7/20

CPC分类号： G02B1/11 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

公开(公告)号：US09046787B2

公开(公告)日：2015-06-02

申请号：US13007039

申请日：2011-01-14

申请人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

发明人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70108 ,  G03F7/70141 ,  G03F7/70191

摘要： A projection exposure apparatus has a projection lens with an object plane, an image plane, an optical axis and a non-telecentric entrance pupil. The apparatus further comprises an illumination system having an intermediate field plane and a field stop. The field stop is positioned in or in close proximity to the intermediate field plane and defines an illuminated field in the object plane that does not contain the optical axis of the projection lens. The illumination system is configured such that, in the object plane, a mean of the angles formed between all principal rays emanating from the intermediate field plane on the one hand and the optical axis of the projection lens on the other hand differs from 0°.

摘要翻译： 投影曝光装置具有物镜面，像面，光轴和非远心入射光瞳的投影透镜。 该装置还包括具有中间场平面和场停止的照明系统。 场停止件位于中间场平面中或紧邻中间场平面，并且在物平面中限定不包含投影透镜的光轴的照明场。 照明系统被配置为使得在物平面中，从一方面从中间场平面发射的所有主光线与另一方面的投影透镜的光轴之间形成的角度的平均值不同于0°。