公开(公告)号：US08673077B2

公开(公告)日：2014-03-18

申请号：US13984283

申请日：2012-03-02

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： C23C16/00 ,  H01L21/31

CPC分类号： H01L51/5012 ,  C23C14/042 ,  C23C14/243 ,  C23C14/564 ,  H01L51/0011 ,  H01L51/56 ,  H05B33/10

摘要： Vapor deposition particles (91) discharged from at least one vapor deposition source opening (61) pass through a plurality of limiting openings (82) of a limiting unit (80) and a plurality of mask openings (71) of a vapor deposition mask (70), and adhere to a substrate (10) that relatively moves along a second direction (10a) so as to form a coating film. The limiting unit includes a plurality of plate members stacked on one another. Accordingly, it is possible to efficiently form a vapor deposition coating film in which edge blurring is suppressed on a large-sized substrate at a low cost.

摘要翻译： 从至少一个气相沉积源开口（61）排出的气相沉积颗粒（91）通过限制单元（80）的多个限制开口（82）和气相沉积掩模的多个掩模开口（71） 70），并且粘附到沿着第二方向（10a）相对移动以形成涂膜的基板（10）。 限制单元包括彼此堆叠的多个板构件。 因此，可以以低成本有效地形成在大尺寸基板上抑制边缘模糊的气相沉积涂膜。

公开(公告)号：US08628904B2

公开(公告)日：2014-01-14

申请号：US12509054

申请日：2009-07-24

申请人： Moegi Iguchi ,  Satoshi Inoue ,  Koutarou Yoshihara ,  Masahiro Takagi

发明人： Moegi Iguchi ,  Satoshi Inoue ,  Koutarou Yoshihara ,  Masahiro Takagi

IPC分类号： G03G9/00

CPC分类号： G03G9/1133 ,  G03G9/1075 ,  G03G15/0868 ,  G03G15/0879

摘要： The present invention provides a carrier for replenishment including an associated particle in which single particles each having a core material and a resin layer covering the core material, are bound via the resin layer, the carrier being used in a developer for replenishment of a trickle development system, and the system including performing development while the developer for replenishment is replenished, upon development of a latent image on a latent image holding member using a development unit.

摘要翻译： 本发明提供了一种用于补充的载体，其包括相关联的颗粒，其中每个具有芯材料的单个颗粒和覆盖芯材料的树脂层经由树脂层结合，载体用于显影剂中用于补充涓流发展 系统，以及在使用显影单元在潜像保持构件上开发潜像时，补充补充显影剂时进行开发的系统。

公开(公告)号：US20140004641A1

公开(公告)日：2014-01-02

申请号：US14004896

申请日：2012-03-09

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/56

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H05B33/10

摘要： A vapor deposition device (1) performs a vapor deposition treatment to form a luminescent layer (47) having a predetermined pattern on a film formation substrate (40). The vapor deposition device includes: a nozzle (13) having a plurality of injection holes (16) from which vapor deposition particles (17), which constitute the luminescent layer, are injected toward the film formation substrate when the vapor deposition treatment is carried out; and a plurality of control plates (20) provided between the nozzle and the film formation substrate and restricting an incident angle, with respect to the film formation substrate, of the vapor deposition particles injected from the plurality of injection holes. The nozzle includes: a nozzle main body (14b) in a container shape having an opening (14c) on a surface thereof on a film formation substrate side and (ii) a plurality of blocks (15) covering the opening and separated from each other, each of the plurality of blocks having the plurality of injection holes. The above arrangement allows a vapor-deposited film pattern to be formed with high definition.

摘要翻译： 蒸镀装置（1）进行蒸镀处理，在成膜基板（40）上形成具有规定图案的发光层（47）。 气相沉积装置包括：具有多个喷射孔（16）的喷嘴（13），当进行气相沉积处理时，构成发光层的气相沉积颗粒（17）从该注入孔喷射到成膜基底 ; 以及设置在喷嘴和成膜基板之间的多个控制板（20），并且限制从多个喷射孔喷射的气相沉积颗粒相对于成膜基板的入射角。 喷嘴包括：容器形状的喷嘴主体（14b），其在成膜基板侧的表面上具有开口（14c），和（ii）覆盖开口并分离的多个块体（15） 所述多个块中的每个具有所述多个喷射孔。 上述布置允许以高清晰度形成气相沉积膜图案。

公开(公告)号：US20130291796A1

公开(公告)日：2013-11-07

申请号：US13980875

申请日：2012-01-13

申请人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

发明人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

IPC分类号： C23C16/448 ,  C23C16/04

CPC分类号： C23C16/448 ,  C23C14/243 ,  C23C16/042 ,  G03B37/06 ,  H01L51/0008

摘要： A crucible (50) of the present invention includes: an opening (55a) from which vapor deposition particles are injected toward a film formation substrate on which a film is to be formed; a focal point member (54a), provided so as to face the opening (55a), which reflects vapor deposition particles injected from the opening (55a); and a revolution paraboloid (55b) which reflects, toward the film formation substrate, vapor deposition particles which have been reflected by the focal point member (54a).

摘要翻译： 本发明的坩埚（50）包括：朝向要在其上形成膜的成膜基板上注入蒸镀颗粒的开口（55a） 设置成面对开口（55a）的焦点部件（54a），其反射从开口（55a）喷射的气相沉积粒子; 以及向所述成膜基板反射已被所述焦点部件（54a）反射的气相沉积粒子的旋转抛物面（55b）。

公开(公告)号：US20130280840A1

公开(公告)日：2013-10-24

申请号：US13997173

申请日：2011-12-19

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/56 ,  H01L21/02

CPC分类号： C23C16/45578 ,  C23C14/24 ,  C23C14/243 ,  H01L21/02263 ,  H01L51/001 ,  H01L51/56 ,  H05B33/10

摘要： A vapor deposition device (50) in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (60), the vapor deposition device including a vapor deposition source (80) that has an injection hole (81) from which vapor deposition particles are injected, a vapor deposition particle crucible (82) for supplying the vapor deposition particles to the vapor deposition source (80), and a rotation motor (86) for changing a distribution of the injection amount of the vapor deposition particles by rotating the vapor deposition source (80).

摘要翻译： 根据本发明的蒸镀装置（50）是在成膜基板（60）上形成膜的蒸镀装置，其特征在于，所述蒸镀装置具有：蒸镀源（80），具有喷射孔 ），用于将气相沉积粒子供给到气相沉积源（80）的气相沉积粒子坩埚（82）和用于改变蒸汽喷射量分布的旋转马达（86） 通过旋转气相沉积源（80）来沉积颗粒。

公开(公告)号：US20130276701A1

公开(公告)日：2013-10-24

申请号：US13976443

申请日：2011-12-20

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L31/18

CPC分类号： C23C16/4401 ,  C12M33/00 ,  C23C14/564 ,  H01L31/186 ,  H01L51/0011

摘要： A Film (7) is provided on at least a part of a surface of each of a vapor deposition preventing plate (3) and a shutter (4) of a vacuum chamber (5) on which surface vapor deposition particles are vapor-deposited, the film (7) being provided so as to be peeled off from the each of the vapor deposition preventing plate (3) and the shutter (4), and the film being made of a material differing in at least one of a melting point, a sublimation point, solubility in a given solvent, microbial biodegradability, and photodegradability from a material of which a vapor-deposited film that is formed on the film (7) is made.

摘要翻译： 在气相沉积颗粒被蒸镀的真空室（5）的气相沉积防止板（3）和快门（4）的每一个的表面的至少一部分上提供膜（7） 薄膜（7）设置成从每个防蒸镀板（3）和活门（4）上剥离，并且该薄膜由不同于熔点， 升华点，在给定溶剂中的溶解度，微生物生物降解性和由形成在膜（7）上的气相沉积膜的材料的光降解性）。

公开(公告)号：US20130199445A1

公开(公告)日：2013-08-08

申请号：US13879761

申请日：2011-10-12

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue

IPC分类号： C23C16/04

CPC分类号： H01L51/0011 ,  C23C14/042 ,  C23C14/12 ,  C23C14/24 ,  C23C14/50 ,  C23C16/042 ,  H01L27/3211 ,  H01L27/3244 ,  H01L51/001 ,  H01L51/56 ,  H01L2227/323 ,  H05B33/10

摘要： A vapor deposition device (50) disclosed, a partition wall (26) standing between film formation regions on a film formation substrate (200), includes: a mask unit (80) including a shadow mask (81) and a vapor deposition source (85) fixed in position relative to each other; contacting means for bringing the film formation substrate (200) and the shadow mask (81) into contact with each other at the partition wall (26); and moving means for moving at least a first one of the mask unit (80) and the film formation substrate (200) relative to a second one thereof in a state in which the contact caused by the contacting means is kept.

摘要翻译： 一种蒸镀装置（50），其特征在于，在成膜基板（200）上的成膜区域之间配置有分隔壁（26），所述分隔壁包括：荫罩单元（80），其包括荫罩（81）和气相沉积源 85）相对于彼此固定在适当位置; 用于使成膜基板（200）和荫罩（81）在分隔壁（26）处相互接触的接触装置; 以及用于在保持由接触装置引起的接触的状态下相对于其第二个移动掩模单元（80）和成膜基板（200）中的至少第一个的移动装置。

公开(公告)号：US08339925B2

公开(公告)日：2012-12-25

申请号：US12893382

申请日：2010-09-29

申请人： Satoshi Inoue ,  Yuta Yoshida ,  Naoto Hashimoto ,  Suguru Takishima

发明人： Satoshi Inoue ,  Yuta Yoshida ,  Naoto Hashimoto ,  Suguru Takishima

IPC分类号： G11B7/00

CPC分类号： G11B7/1374 ,  G02B13/16 ,  G11B7/1376

摘要： An optical information recording/reproducing optical system, comprising a light source; an optical element converting a laser beam into a substantially collimated beam; and an objective lens, wherein a wavelength λ (unit: nm) of the laser beam falls within a range of 400 115° C., each of optical surfaces is configured not to have an optical thin film which contains at least one of or elements of titanium, tantalum, hafnium, zirconium, niobium, molybdenum and chromium, each of optical surfaces of the optical element is provided with an antireflection film made of one of or a mixture of at least two of silicon oxide, aluminum oxide, aluminum fluoride and magnesium fluoride, and a following condition is satisfied ∏ i = 1 n - 1 ⁢ ( 1 - R ( BL ) ⁢ i 100 ) - ∏ i = 1 n - 1 ⁢ ( 1 - R ( UV ) ⁢ i 100 ) > 0.05 .

摘要翻译： 一种光信息记录/再现光学系统，包括光源; 将激光束转换成基本上准直的光束的光学元件; 和物镜，其中激光束的波长λ（单位：nm）落在400 <λ<410的范围内，光学元件和物镜由相同的树脂材料或具有玻璃化转变的不同树脂材料制成 Tg> 115℃的温度下，每个光学表面被配置为不具有包含钛，钽，铪，锆，铌，钼和铬中的至少一种或元素的光学薄膜，每个光学表面 光学元件设置有由氧化硅，氧化铝，氟化铝和氟化镁中的至少两种中的一种或其混合物制成的抗反射膜，满足以下条件Πi = 1 n-1（1- R（BL）i 100） - Πi = 1 n - 1（1-R（UV）i 100）> 0.05。

公开(公告)号：US08217607B2

公开(公告)日：2012-07-10

申请号：US12279635

申请日：2006-10-12

申请人： Satoshi Inoue ,  Masayuki Kato ,  Kazushi Hirose ,  Yoshihiro Fujimura ,  Minoru Tanaka ,  Takao Koba ,  Hiroki Nishida ,  Takashi Inoue

发明人： Satoshi Inoue ,  Masayuki Kato ,  Kazushi Hirose ,  Yoshihiro Fujimura ,  Minoru Tanaka ,  Takao Koba ,  Hiroki Nishida ,  Takashi Inoue

IPC分类号： E05F15/16

CPC分类号： E05F15/46 ,  E05F11/445 ,  E05F15/695 ,  E05Y2900/55

摘要： An opening/closing control method for a window regulator, which is a method of performing opening/closing control with a pinching prevention function while determining a detection signal from a sensor based on a threshold value. The method includes setting the threshold value as a value offset from a reference value for control, and updating the reference value in correspondence to a value of the detection signal from the sensor in an initial stage of control, and each time when the value of the detection signal from the sensor continuously changes in a certain time within a range where the value of the detection signal from the sensor does not exceed the threshold value, the reference value is modified by a value corresponding to such a changed value.

摘要翻译： 一种用于窗口调节器的打开/关闭控制方法，其是在基于阈值确定来自传感器的检测信号的同时以防止夹持功能进行打开/关闭控制的方法。 该方法包括将阈值设置为与用于控制的参考值偏移的值，并且在初始控制阶段根据来自传感器的检测信号的值更新参考值，并且每当该值 在来自传感器的检测信号的值不超过阈值的范围内，来自传感器的检测信号在一定时间内连续变化，参考值被修改为与这样的改变值对应的值。

公开(公告)号：US08153662B2

公开(公告)日：2012-04-10

申请号：US12704643

申请日：2010-02-12

申请人： Keigo Tanaka ,  Satoshi Inoue ,  Norio Murai ,  Masayuki Matsukura ,  Kazutaka Nakamoto ,  Shuji Shirotori ,  Shinya Abe

发明人： Keigo Tanaka ,  Satoshi Inoue ,  Norio Murai ,  Masayuki Matsukura ,  Kazutaka Nakamoto ,  Shuji Shirotori ,  Shinya Abe

IPC分类号： A61K31/42 ,  A61K31/443 ,  C07D413/14

CPC分类号： A01N43/56 ,  A01N43/80 ,  C07D401/04 ,  C07D401/14 ,  C07D413/04 ,  C07D413/14 ,  C07D417/14

摘要： An object of the present invention is to provide an antifungal agent which has excellent antifungal effects and is superior in terms of its physical properties, safety and metabolic stability. According to the present invention, there is disclosed a compound represented by the following formula (I), or a salt thereof: wherein R1 represents a hydrogen atom, a halogen atom, an amino group, a C1-6 alkyl group, a C1-6 alkoxy group or a C1-6 alkoxy C1-6 alkyl group; R2 represents a hydrogen atom, a C1-6 alkyl group, an amino group or a di C1-6 alkylamino group; one of X and Y is a nitrogen atom while the other is a nitrogen atom or an oxygen atom; ring A represents a 5- or 6-member heteroaryl ring or a benzene ring which may have a halogen atom, or 1 or 2 C1-6 alkyl groups; Z represents a single bond, a methylene group, an ethylene group, an oxygen atom, a sulfur atom, —CH2O—, —OCH2—, —NH—, —CH2NH—, —NHCH2—, —CH2S—, or —SCH2—; R3 represents a hydrogen atom, a halogen atom, a C1-6 alkyl group, a C3-8 cycloalkyl group, a C6-10 aryl group, a 5- or 6-member heteroaryl group, or 5- or 6-member non-aromatic heterocyclic group which may have 1 or 2 substituents; and R4 represents a hydrogen atom or a halogen atom.

摘要翻译： 本发明的目的是提供一种具有优异的抗真菌作用并且在其物理性质，安全性和代谢稳定性方面优异的抗真菌剂。 根据本发明，公开了由下式（I）表示的化合物或其盐：其中R1表示氢原子，卤素原子，氨基，C1-6烷基，C1- 6烷氧基或C 1-6烷氧基C 1-6烷基; R2表示氢原子，C1-6烷基，氨基或二C1-6烷基氨基; X和Y之一是氮原子，而另一个是氮原子或氧原子; 环A表示可以具有卤素原子或1或2个C 1-6烷基的5或6元杂芳基环或苯环; Z表示单键，亚甲基，亚乙基，氧原子，硫原子，-CH 2 O - ， - OCH 2 - ， - NH - ， - CH 2 NH - ， - NHCH 2 - ， - CH 2 S-或-SCH 2 - ; R 3表示氢原子，卤素原子，C 1-6烷基，C 3-8环烷基，C 6-10芳基，5-或6-元杂芳基，或5-或6-元非 - 可以具有1或2个取代基的芳族杂环基; R4表示氢原子或卤素原子。