公开(公告)号：US20070210252A1

公开(公告)日：2007-09-13

申请号：US11673219

申请日：2007-02-09

申请人： Atsushi MIYAMOTO ,  Wataru Nagatomo ,  Ryoichi Matsuoka ,  Hidetoshi Morokuma

发明人： Atsushi MIYAMOTO ,  Wataru Nagatomo ,  Ryoichi Matsuoka ,  Hidetoshi Morokuma

IPC分类号： G21K7/00

CPC分类号： G01N23/20 ,  H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1536 ,  H01J2237/216 ,  H01J2237/2817

摘要： (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.

摘要翻译： （1）可以从CAD数据自动计算成像点的数量，坐标，成像顺序，成像位置的各部分，成像顺序，成像位置变化方法和成像条件，（2）输入信息和 用于成像配方创建的输出信息可以任意设定，并且（3）决定是否成功/成功的任意成像点的成像或处理，并且在确定失败的情况下，可以进行解除处理 成像点或成像序列改变。

公开(公告)号：US07230239B2

公开(公告)日：2007-06-12

申请号：US10918381

申请日：2004-08-16

申请人： Maki Tanaka ,  Hidetoshi Morokuma ,  Chie Shishido ,  Yuji Takagi

发明人： Maki Tanaka ,  Hidetoshi Morokuma ,  Chie Shishido ,  Yuji Takagi

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： G06T7/0004 ,  G01N23/225 ,  G01N2223/6116 ,  G06T2207/30148 ,  H01J2237/2814 ,  H01L22/12

摘要： A system for inspecting a pattern shape operates to detect secondary electrons from a specimen by irradiation of a focused electron beam and perform arithmetic processing on this detected signal. The detected signal waveform is divided into a plurality of regions on the basis of a variation of the signal quantity. The size of the divided regions is used for quantitative evaluation of a three dimensional shape of the specimen. This system, especially by displaying measurement results of the pattern shape for each divided signal waveform (bottom width in the final shape, resist bottom width, etching shift quantity, and etching slope-angle component by the exposure), permits an easy check on which a component varies and how the component varies in all shape variations. With this arrangement, a pattern cross section information effective in determining etching process conditions can be acquired using images by an in-line SEM capable of nondestructive observation.

摘要翻译： 用于检查图案形状的系统用于通过照射聚焦电子束来检测来自样品的二次电子，并对该检测信号进行运算处理。 检测信号波形根据信号量的变化被分成多个区域。 分割区域的大小用于样本的三维形状的定量评估。 该系统特别是通过显示每个分割信号波形（最终形状的底部宽度，抗蚀剂底部宽度，蚀刻偏移量和通过曝光的蚀刻倾斜角度分量）的图案形状的测量结果，可以容易地检查哪个 一个组件变化，以及组件在所有形状变化中的变化。 通过这种布置，可以通过能够进行非破坏性观察的直列SEM的图像来获取有效确定蚀刻工艺条件的图案横截面信息。

公开(公告)号：US07187345B2

公开(公告)日：2007-03-06

申请号：US11298590

申请日：2005-12-12

申请人： Atsushi Kobaru ,  Hidetoshi Morokuma ,  Hiroki Kawada ,  Sho Takami ,  Katsuhiro Sasada ,  Kouichi Yamamoto ,  Norio Satou ,  Kunio Nakanishi

发明人： Atsushi Kobaru ,  Hidetoshi Morokuma ,  Hiroki Kawada ,  Sho Takami ,  Katsuhiro Sasada ,  Kouichi Yamamoto ,  Norio Satou ,  Kunio Nakanishi

IPC分类号： G09G1/08 ,  G21K1/08 ,  H04N3/16

CPC分类号： H01J37/265 ,  H01J37/28 ,  H01J2237/1536 ,  H01J2237/31749

摘要： An image forming method and a charged particle beam apparatus suitable for suppressing the inclination of charging when scanning a two-dimensional area with a charged particle beam. A third scanning line located between a first scanning line and a second scanning line is scanned. After the first, second and third scanning lines have been scanned, a plurality of scanning lines are scanned between the first and third scanning lines and between the second and third scanning lines.

摘要翻译： 一种适于在用带电粒子束扫描二维区域时抑制充电倾斜的图像形成方法和带电粒子束装置。 扫描位于第一扫描线和第二扫描线之间的第三扫描线。 在扫描第一，第二和第三扫描线之后，在第一扫描线和第三扫描线之间以及第二和第三扫描线之间扫描多条扫描线。

公开(公告)号：US07173268B2

公开(公告)日：2007-02-06

申请号：US10986910

申请日：2004-11-15

申请人： Maki Tanaka ,  Hidetoshi Morokuma ,  Chie Shishido ,  Yuji Takagi

发明人： Maki Tanaka ,  Hidetoshi Morokuma ,  Chie Shishido ,  Yuji Takagi

IPC分类号： G01N21/86

CPC分类号： H01J37/28 ,  H01J37/304 ,  H01J2237/2814 ,  H01J2237/2817 ,  H01J2237/30455

摘要： This invention provides a method of measuring semiconductor pattern dimensions capable of realizing a stable and highly precise pattern dimension measurement technique even when the pattern cross-sectional shapes are changed and making the calculation amount relatively small to reduce the calculation time. More specifically, the relationship between cross-sectional shapes of a pattern and measurement errors in a specified image processing technique is evaluated in advance by the electron beam simulation in a pattern measurement system in a length measuring SEM, and in the actual dimension measurement, dimensions of an evaluation objective pattern are measured from image signals of a scanning electron microscope, and errors of the dimensional measurement of the evaluation objective pattern are estimated and revised based on the relationship between cross-sectional shapes of a pattern and measurement errors evaluated in advance, thereby realizing highly precise measurement where dimensional errors depending on pattern solid shapes are eliminated.

摘要翻译： 本发明提供一种测量半导体图案尺寸的方法，即使当图案截面形状改变并使计算量相对较小以减少计算时间时，也能够实现稳定且高度精确的图案尺寸测量技术。 更具体地说，通过长度测量SEM中的图案测量系统中的电子束模拟预先评估图案的截面形状与特定图像处理技术中的测量误差之间的关系，并且在实际尺寸测量中，尺寸 根据扫描电子显微镜的图像信号测量评价对象图案，并且基于预先评估的图案的截面形状和测量误差之间的关系来估计和修正评估对象图案的尺寸测量的误差， 从而实现高精度测量，其中取消了取决于图形实心形状的尺寸误差。

公开(公告)号：US20060097158A1

公开(公告)日：2006-05-11

申请号：US11292002

申请日：2005-12-02

申请人： Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

发明人： Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  G01N23/04 ,  G01N23/225 ,  G06T7/74 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/222 ,  H01J2237/2817

摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.

公开(公告)号：US20060043293A1

公开(公告)日：2006-03-02

申请号：US11209759

申请日：2005-08-24

申请人： Takashi Doi ,  Noriaki Arai ,  Hidetoshi Morokuma ,  Katsumi Setoguchi ,  Fumihiro Sasajima ,  Maki Tanaka ,  Atsushi Miyamoto

发明人： Takashi Doi ,  Noriaki Arai ,  Hidetoshi Morokuma ,  Katsumi Setoguchi ,  Fumihiro Sasajima ,  Maki Tanaka ,  Atsushi Miyamoto

IPC分类号： G21K7/00 ,  G21K5/10

CPC分类号： G21K1/08 ,  G01N2223/07 ,  G01N2223/32 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1536 ,  H01J2237/216

摘要： A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified sample such as a pyramidal sample. The images before and after the tilting are acquired and processed to determine the tilt angle value and the distortion amount. The tilt angle adjustment and the adjustment for correction of the distortion are automated in accordance with a predetermined processing flow.

摘要翻译： 公开了一种用于使倾斜偏转器倾斜电子束的带电粒子束调节装置。 在电子束倾斜时产生的图像失真的电子束的倾斜角度调整和畸变调整是在金字塔形样品等特定的样品上进行的。 获取并处理倾斜之前和之后的图像以确定倾斜角度值和失真量。 根据预定的处理流程，自动地进行倾斜角调整和矫正矫正。

公开(公告)号：US20050236570A1

公开(公告)日：2005-10-27

申请号：US11104631

申请日：2005-04-13

申请人： Hidetoshi Morokuma ,  Noriaki Arai ,  Takashi Doi ,  Fumihiro Sasajima ,  Yoshihiro Kimura

发明人： Hidetoshi Morokuma ,  Noriaki Arai ,  Takashi Doi ,  Fumihiro Sasajima ,  Yoshihiro Kimura

IPC分类号： G21K5/04 ,  G21K1/08 ,  G21K7/00 ,  H01J37/153

CPC分类号： H01J37/21 ,  H01J37/153 ,  H01J2237/216 ,  H01J2237/221

摘要： In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.

摘要翻译： 在用于通过将带电粒子束照射在样本上来获得图像的装置中，需要调整如在光束倾斜的情况下不同于垂直入射而调节的光束的条件。 为此，该装置具有用于自动控制瞄光器，物镜和偏转器的控制器，从而校正像散，调整焦点并校正视野移动。 控制器具有用于禁止执行散光校正，聚焦调整和FOV偏移校正中的至少一个的选择器。

公开(公告)号：US20050133718A1

公开(公告)日：2005-06-23

申请号：US10995388

申请日：2004-11-24

申请人： Atsushi Miyamoto ,  Maki Tanaka ,  Hidetoshi Morokuma

发明人： Atsushi Miyamoto ,  Maki Tanaka ,  Hidetoshi Morokuma

IPC分类号： G01B15/04 ,  G01N23/00 ,  G01N23/225 ,  H01J37/28

CPC分类号： H01J37/28 ,  G01B15/04 ,  G01N23/2251 ,  H01J2237/226 ,  H01J2237/2814

摘要： It is predicted that an observational direction (or an incident direction of an electron beam) in an observed image actually obtained has some errors compared to a set value. The error portion affects the analysis of the observed image later. Therefore, a convergent electron beam is irradiated on a specimen with a known shape, electrons discharged from the specimen surface are detected, an image of the electron is obtained, an incident direction of the convergent electron beam is estimated based on a geometric deformation on an image of the specimen with a known shape, and a 3D shape or a shape of a cross section of a specimen to be observed from a SEM image of the specimen to be observed is obtained by use of the information of the incident direction of the estimated convergent electron beam.

摘要翻译： 预测实际获得的观察图像中的观察方向（或电子束的入射方向）与设定值相比具有一些误差。 错误部分稍后影响观察图像的分析。 因此，会聚电子束被照射在具有已知形状的样本上，检测从试样表面排出的电子，获得电子的图像，基于上述几何变形来估计会聚电子束的入射方向 通过使用估计的样本的入射方向的信息，获得具有已知形状的样本的图像，以及待观察的样本的SEM图像将要观察的样本的3D形状或截面形状 会聚电子束。

公开(公告)号：US09543135B2

公开(公告)日：2017-01-10

申请号：US13562435

申请日：2012-07-31

申请人： Shun Kumano ,  Masuyuki Sugiyama ,  Yuichiro Hashimoto ,  Hideki Hasegawa ,  Masuyoshi Yamada ,  Kazushige Nishimura ,  Hidetoshi Morokuma

发明人： Shun Kumano ,  Masuyuki Sugiyama ,  Yuichiro Hashimoto ,  Hideki Hasegawa ,  Masuyoshi Yamada ,  Kazushige Nishimura ,  Hidetoshi Morokuma

IPC分类号： H01J49/00 ,  H01J49/04

CPC分类号： H01J49/0431

摘要： A mass spectrometer for efficiently ionizing a sample with less carry-over. The ratio of the amount of sample gas to that of a whole headspace gas is increased by decreasing the pressure inside of a sample vessel in which the sample is sealed thereby efficiently ionizing the sample.

摘要翻译： 一种用于有效地电离样品的质谱仪，其携带较少。 样品气体与整个顶部空间气体的比例通过降低样品容器的内部压力而增加，其中样品被密封，从而有效地使样品电离。

公开(公告)号：US09184037B2

公开(公告)日：2015-11-10

申请号：US13527627

申请日：2012-06-20

申请人： Shun Kumano ,  Masuyuki Sugiyama ,  Yuichiro Hashimoto ,  Hideki Hasegawa ,  Masuyoshi Yamada ,  Hidetoshi Morokuma ,  Shuhei Hashiba

发明人： Shun Kumano ,  Masuyuki Sugiyama ,  Yuichiro Hashimoto ,  Hideki Hasegawa ,  Masuyoshi Yamada ,  Hidetoshi Morokuma ,  Shuhei Hashiba

IPC分类号： H01J49/00 ,  H01J49/04

CPC分类号： H01J49/0409 ,  H01J49/0495

摘要： A mass spectrometer including a sample attaching member of attaching a sample, an ionizing chamber including an introductory port of the sample attaching member and an ionization source of generating a sample ion, a vacuumed chamber having a mass analyzer of analyzing the sample ion, and an opening/closing mechanism provided between the ionizing chamber and the vacuumed chamber, in which the opening/closing mechanism is controlled from a closed state to an open state after introducing the sample attaching member into the ionizing chamber to thereby enable to perform ionization with inconsiderable fragmentation at a high sensitivity with a high throughput.

摘要翻译： 一种质谱仪，包括附着样品的样品附着构件，包括样品附着构件的入口的电离室和产生样品离子的离子源，具有分析样品离子的质量分析器的真空室，以及 设置在离子化室和真空室之间的开/关机构，其中将样品附着构件引入电离室之后，将开/关机构从关闭状态控制到打开状态，从而能够以不可分割的碎片进行电离 灵敏度高，吞吐量高。