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公开(公告)号：US07090960B2
公开(公告)日：2006-08-15
申请号：US10330332
申请日：2002-12-30
IPC分类号： G03F7/038
CPC分类号： G03F7/0045 , G03F7/0382
摘要： A negative resist composition comprising (A) an alkali-soluble polymer, (B) a cross-linking agent forming cross-links between molecules of the alkali-soluble polymer (A) under the action of an acid and (C) a specified acid generator, which can satisfy all of performance requirements concerning sensitivity, resolution, pattern profile and line-edge roughness in the pattern formation by irradiation with electron beams or X-rays.
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公开(公告)号：US07033727B2
公开(公告)日：2006-04-25
申请号：US10668348
申请日：2003-09-24
申请人： Kunihiko Kodama
发明人： Kunihiko Kodama
IPC分类号： G03C1/73 , G03F7/038 , G03F7/039 , G03F7/30 , C07D335/00 , C07D409/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/123 , Y10S430/124 , Y10S430/128
摘要： A photosensitive composition of the present invention has excellent sensitivity and pattern profile, which comprises an acid generator having a specific structure.
摘要翻译： 本发明的感光性组合物具有优异的灵敏度和图案形状，其包括具有特定结构的酸发生剂。
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公开(公告)号：US06844132B2
公开(公告)日：2005-01-18
申请号：US10095086
申请日：2002-03-12
申请人： Kunihiko Kodama , Toshiaki Aoai
发明人： Kunihiko Kodama , Toshiaki Aoai
IPC分类号： C08K5/02 , C08K5/16 , C08K5/42 , C08K5/54 , C08L101/00 , C23F1/02 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , C23F1/02 , G03F7/0395 , G03F7/0397 , Y10S430/106
摘要： A positive photosensitive composition comprising (A) a compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation, (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer, (C) a basic compound, and (D) a fluorine and/or silicon surfactant.
摘要翻译： 一种正型光敏组合物，其包含（A）能够通过光化射线或辐射的照射产生具有2至4个碳原子的氟取代的链烷磺酸的化合物，（B）具有单环或多环脂环族烃结构的树脂，并被 酸增加在碱性显影剂中的溶解度的作用，（C）碱性化合物和（D）氟和/或硅表面活性剂。
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公开(公告)号：US06830867B2
公开(公告)日：2004-12-14
申请号：US10261655
申请日：2002-10-02
申请人： Kunihiko Kodama
发明人： Kunihiko Kodama
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/106 , Y10S430/122
摘要： A positive photosensitive composition containing (A) an acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer.
摘要翻译： 一种正型感光性组合物，其含有（A）能够通过用光化射线或辐射照射产生酸的具有本说明书中定义的式（I）表示的结构的酸发生剂和（B）具有单环或多环脂环烃 结构，并通过酸的作用分解，以增加在碱性显影剂中的溶解度。
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公开(公告)号：US06806023B2
公开(公告)日：2004-10-19
申请号：US09851113
申请日：2001-05-09
申请人： Shinichi Kanna , Kunihiko Kodama
发明人： Shinichi Kanna , Kunihiko Kodama
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106 , Y10S430/115
摘要： A positive radiation-sensitive composition comprising: (a) a resin whose solubility in an alkali developer increases by the action of an acid; (b) a compound which generates a carboxylic acid having a molecular weight of 100 or less upon irradiation with an actinic ray or a radiant ray; (c) a surfactant; and (d) a solvent.
摘要翻译： 一种正性辐射敏感性组合物，其包含：（a）其在碱性显影剂中的溶解度随着酸的作用而增加的树脂;（b）在光化反应下产生分子量为100以下的羧酸的化合物 射线或辐射线;（c）表面活性剂; 和（d）溶剂。
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公开(公告)号：US06756179B2
公开(公告)日：2004-06-29
申请号：US09953888
申请日：2001-09-18
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106 , Y10S430/11 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A positive resist composition comprises (A) a resin capable of decomposing by the action of an acid to increase solubility in an alkali developer, and (B) a compound capable of generating an aromatic sulfonic acid substituted with at least one group containing a fluorine atom upon irradiation with one of an actinic ray and radiation.
摘要翻译： 正型抗蚀剂组合物包含（A）能够通过酸的作用分解以增加在碱性显影剂中的溶解度的树脂，和（B）能够产生被至少一个含氟原子的基团取代的芳族磺酸的化合物 在用光化射线和辐射之一照射时。
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公开(公告)号：US06699635B1
公开(公告)日：2004-03-02
申请号：US09471007
申请日：1999-12-23
IPC分类号： G03F7004
CPC分类号： G03F7/0048 , G03F7/0397 , Y10S430/106
摘要： A positive photosensitive composition suitable for resist pattern formation under exposure to far ultraviolet light of wavelengths of 250 nm or shorter, particularly 220 nm or shorther, comprising: (A) a resin comprising constitutional repeating units wherein particular ring structures are present and having groups capable of decomposing under the action of an acid to cause an increase of the solubility in an alkali developer, (B) a photo-acid generator capable of generating an acid upon irradiation with actinic rays or radiation, and (C) a fluorine-containing surfactant, a silicon-containing surfactant or a mixture thereof.
摘要翻译： 适合于在暴露于波长为250nm或更短，特别是220nm或更短的远紫外光下的抗蚀剂图案形成的正性感光性组合物，其包含：（A）包含结构重复单元的树脂，其中存在特定的环结构并具有基团 在酸的作用下分解，导致碱显影剂溶解度的增加，（B）能够在用光化学射线或辐射照射时产生酸的光酸发生剂，（C）含氟表面活性剂 ，含硅表面活性剂或其混合物。
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公开(公告)号：US06660446B2
公开(公告)日：2003-12-09
申请号：US09865539
申请日：2001-05-29
申请人： Kazuto Shimada , Tadahiro Sorori , Kunihiko Kodama
发明人： Kazuto Shimada , Tadahiro Sorori , Kunihiko Kodama
IPC分类号： G03F7039
CPC分类号： B41M5/368 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , Y10S430/145 , Y10S430/146
摘要： A heat-sensitive composition comprising a compound of a specific general formula which generates an acid or radical when heated, and a compound whose physical and chemical properties are irreversibly changed by an acid or radical.
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公开(公告)号：US06562981B2
公开(公告)日：2003-05-13
申请号：US10135809
申请日：2002-04-30
IPC分类号： C07D23502
CPC分类号： C09B57/12 , C07D487/04 , C09B67/0033 , C09B69/109 , C09K11/06 , Y10S428/917
摘要： A composition comprising (a) an effective amount of a guest chromophore embedded in a matrix of a host chromophore, or (b) a host chromophore and an effective amount of a guest chromophore both embedded in a polymer matrix, wherein the absorption spectrum of the guest chromophore overlaps with the fluorescence emission spectrum of the host chromophore, and wherein the host chromophore is selected from the group consisting of benzo [4,5]imidazo[2,1-a]isoindol-11-ones.
摘要翻译： 一种组合物，其包含（a）有效量的嵌入在主发色团的基质中的客体发色团，或（b）主体发色团和有效量的嵌入在聚合物基质中的客体发色团，其中所述吸收光谱 客体发色团与主发色团的荧光发射光谱重叠，其中主发色团选自苯并[4,5]咪唑并[2,1-a]异吲哚-11-酮。
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公开(公告)号：US06479211B1
公开(公告)日：2002-11-12
申请号：US09577884
申请日：2000-05-25
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Hajime Nakao
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Hajime Nakao
IPC分类号： G03F7039
CPC分类号： G03F7/0397 , G03F7/0048 , Y10S430/106
摘要： A positive photoresist composition for far ultraviolet exposure is disclosed, comprising a compound capable of generating an acid upon irradiation with actinic rays or radiation and a resin having a repeating unit represented by formula (I) and being capable of decomposing under the action of an acid to increase the solubility in alkali. The positive photoresist composition of the present invention may further comprise a fluorine-containing and/or silicon-containing surfactant, an acid decomposable resin, a compound capable of decomposing under the action of an acid to generate a sulfonic acid, and/or a specific solvent, according to the objects.
摘要翻译： 公开了一种用于远紫外线曝光的正性光致抗蚀剂组合物，其包含能够在光化射线或辐射照射时能够产生酸的化合物和具有由式（I）表示的重复单元并且能够在酸的作用下分解的树脂 以增加在碱中的溶解度。 本发明的正型光致抗蚀剂组合物可以进一步包含含氟和/或含硅表面活性剂，可酸分解树脂，能够在酸的作用下分解以产生磺酸的化合物和/或特定的 溶剂，根据目的。
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