公开(公告)号：US08865396B2

公开(公告)日：2014-10-21

申请号：US12472728

申请日：2009-05-27

申请人： Hirofumi Takeguchi ,  Taro Yamamoto ,  Kousuke Yoshihara

发明人： Hirofumi Takeguchi ,  Taro Yamamoto ,  Kousuke Yoshihara

IPC分类号： G03C5/18 ,  G03C5/26 ,  G03F7/30

CPC分类号： G03F7/162 ,  G03F7/3021

摘要： A developing method including a developing step in which, while a wafer horizontally held by a spin chuck is being rotated, the wafer is developed by supplying a developer onto a surface of the wafer, wherein provided before the developing step is a pre-wetting step in which, simultaneously with the developer being supplied from a first nozzle that is located on a position near a central part of the surface of the rotating wafer, a deionized water as a second liquid is supplied from a second nozzle that is located on a position nearer to an outer peripheral part of the wafer than the first nozzle, to thereby spread out the developer in the rotating direction of the wafer by a wall that is formed by the deionized water flowing to the outer peripheral side of the wafer with the rotation of the wafer.

摘要翻译： 一种显影方法，其包括显影步骤，其中当由旋转卡盘水平保持的晶片正在旋转时，通过将显影剂供应到晶片的表面上来显影晶片，其中在显影步骤之前提供预润湿步骤 其中与来自位于旋转晶片表面的中心附近的位置的第一喷嘴一起供给显影剂，作为第二液体的去离子水从位于位置上的第二喷嘴供给 比第一喷嘴更靠近晶片的外周部分，从而通过由去离子水流到晶片的外周侧而形成的壁沿着晶片的旋转方向展开显影剂 晶圆。

公开(公告)号：US08851092B2

公开(公告)日：2014-10-07

申请号：US12366198

申请日：2009-02-05

申请人： Taro Yamamoto ,  Naoto Yoshitaka ,  Shuichi Nishikido ,  Yoichi Tokunaga

发明人： Taro Yamamoto ,  Naoto Yoshitaka ,  Shuichi Nishikido ,  Yoichi Tokunaga

IPC分类号： B08B3/00 ,  H01L21/67 ,  G03F7/16

CPC分类号： B05D3/105 ,  B05D3/065 ,  B05D5/06 ,  G03F7/168 ,  H01L21/67046 ,  H01L21/67051

摘要： A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.

摘要翻译： 清洁装置包括：第一基板保持部，其构造成保持基板的背面的第一区域，使得顶面保持面朝上; 第二基板保持部构造成保持基板的背面的第二区域，第二区域与第一区域不重叠，并旋转基板; 顶表面清洁喷嘴，其构造成将顶表面清洁流体供应到所述基板的顶表面; 斜面清洁喷嘴，其构造成将倾斜清洁流体供应到所述基板的斜面部分; 清洗液供给部，其构造成将后表面清洗液供给到由所述第一或第二基板保持部保持的基板的背面; 以及清洁部件，其构造成清洁由所述第一或第二基板保持部保持的所述基板的背面。

公开(公告)号：US20130118533A1

公开(公告)日：2013-05-16

申请号：US13811522

申请日：2011-07-12

申请人： Yasushi Takiguchi ,  Taro Yamamoto ,  Tsutomu Yamahata ,  Akihiro Fujimoto ,  Kouji Fujimura

发明人： Yasushi Takiguchi ,  Taro Yamamoto ,  Tsutomu Yamahata ,  Akihiro Fujimoto ,  Kouji Fujimura

IPC分类号： B08B3/04

CPC分类号： B08B3/04 ,  G03F7/3021 ,  H01L21/6715 ,  H01L21/6719

摘要： To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module 1 and a second processing module 2. On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing module 1 and the second liquid processing module 2. The common developing nozzle is configured to wait on an intermediate position between the modules 1 and 2.

摘要翻译： 为了提供一种液体处理装置，当水平保持在杯体中的基板通过向基板供应化学液体进行液体处理时，能够以较少数量的用于液体的喷嘴来处理具有高产量的基板的液体处理装置。 以液体工艺为例的显影过程，为两种显影方法准备了两种类型的显影喷嘴。 在喷嘴与该处理接合较长时间的方法中使用的显影喷嘴被单独地设置在第一处理模块1和第二处理模块2的每一个上。另一方面， 在第一液体处理模块1和第二液体处理模块2中共同使用在喷嘴与该工艺相比较短时间接合的方法中使用的显影喷嘴。公知的显影喷嘴被配置 等待模块1和2之间的中间位置。

公开(公告)号：US08393808B2

公开(公告)日：2013-03-12

申请号：US12710510

申请日：2010-02-23

申请人： Taro Yamamoto ,  Kousuke Yoshihara ,  Yuichi Yoshida

发明人： Taro Yamamoto ,  Kousuke Yoshihara ,  Yuichi Yoshida

IPC分类号： G03D5/00

CPC分类号： H01L21/027 ,  G03F7/3021 ,  H01L21/67051 ,  H01L21/6715

摘要： A method of developing a substrate including rotating the substrate and supplying a developing liquid from a discharge port of a developer nozzle onto the surface of the substrate, while moving the developer nozzle, disposed above the substrate, from a central portion towards a peripheral portion of the substrate, and supplying a first rinse liquid from a discharge port of a first rinse nozzle onto the surface of the substrate, while moving the first rinse nozzle, disposed above the substrate, from the central portion towards the peripheral portion of the substrate. The supplying of the developing liquid and the first rinse liquid are performed concurrently, with the first rinse nozzle being maintained nearer to a center of the substrate than the developer nozzle.

摘要翻译： 一种显影衬底的方法，包括使衬底旋转并将显影液从显影剂喷嘴的排出口供应到衬底的表面上，同时将位于衬底上方的显影剂喷嘴从中心部分朝向衬底的周边部分移动 并且将第一冲洗液从第一冲洗喷嘴的排出口提供到基板的表面上，同时将设置在基板上方的第一冲洗喷嘴从中心部分朝向基板的周边部分移动。 同时进行显影液和第一漂洗液的供给，第一冲洗喷嘴比显影剂喷嘴更靠近基板的中心。

公开(公告)号：US08387630B2

公开(公告)日：2013-03-05

申请号：US11681977

申请日：2007-03-05

申请人： Taro Yamamoto ,  Kousuke Yoshihara

发明人： Taro Yamamoto ,  Kousuke Yoshihara

IPC分类号： B08B3/04

CPC分类号： H01L21/6715 ,  H01L21/6708

摘要： The present invention improves recover percentage at which a mixed chemical solution discharged from a protective film removing device.The protective film removing device includes: a recovery line communicating with an atmosphere surrounding a substrate to recover a mixed chemical solution, an intermediate tank connected to the outlet end of the recovery line, a volatilization preventing liquid supply means for supplying a volatilization preventing liquid having a specific gravity smaller than that of the mixed chemical solution into the intermediate tank in advance, a transfer line having an inlet end connected to the intermediate tank and provided with a valve, a recovery tank connected to an outlet end of the transfer line, a liquid quantity monitoring means for monitoring a quantity of a liquid contained in the intermediate tank, and a control means for opening the valve of the transfer line to transfer the liquid contained in the intermediate tank to the recovery tank when it is decided that the quantity of the liquid contained in the intermediate tank reached a predetermined quantity on the basis of a signal provided by the liquid quantity monitoring means.

摘要翻译： 本发明提高从保护膜去除装置排出的混合化学溶液的回收率。 保护膜去除装置包括：与基板周围的气氛连通以回收混合化学溶液的回收管线，连接到回收管线出口端的中间罐，用于供应防挥发液体的挥发防止液体供应装置， 预先将比重小于混合化学溶液的比重，具有连接到中间罐并具有阀的入口端的输送管线，连接到输送管线的出口端的回收罐， 液体监测装置，用于监测包含在中间罐中的液体的量;以及控制装置，用于打开输送管线的阀门，以将包含在中间罐中的液体转移到回收罐中，当确定量 包含在中间罐中的液体基于信号产生器达到预定量 由液量监控装置维持。

公开(公告)号：US08337104B2

公开(公告)日：2012-12-25

申请号：US13024430

申请日：2011-02-10

申请人： Yasushi Takiguchi ,  Taro Yamamoto ,  Hiroshi Arima ,  Kousuke Yoshihara ,  Yuichi Yoshida

发明人： Yasushi Takiguchi ,  Taro Yamamoto ,  Hiroshi Arima ,  Kousuke Yoshihara ,  Yuichi Yoshida

IPC分类号： G03D5/00

CPC分类号： G03F7/3021

摘要： There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.

摘要翻译： 提供了一种能够在减少显影液的使用量的同时在基板的整个表面上快速形成显影液的液膜的显影装置和显影方法。 显影装置包括在其中形成处理气氛的气密密封处理容器; 温度控制板，设置在处理容器内并将基板安装在其上; 气氛气体供给单元，其将包含显影液的雾和气体的气氛气体供给到所述处理容器内的所述基板的表面上; 以及第一温度控制单元，其将温度控制板控制为允许气氛气体在基板上冷凝的温度。 这里，处理容器的内壁保持在气氛气体几乎不凝结在内壁上的温度。

公开(公告)号：US08330934B2

公开(公告)日：2012-12-11

申请号：US12659066

申请日：2010-02-24

申请人： Hiroyuki Nagasaka ,  Taro Yamamoto ,  Osamu Hirakawa

发明人： Hiroyuki Nagasaka ,  Taro Yamamoto ,  Osamu Hirakawa

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature.

摘要翻译： 用于经由投影光学系统和液体将曝光光发射到基板上以暴露基板的曝光装置包括：供给液体的供给管; 一种回收液体的回收管; 连接供给管和回收管的连接管; 以及切换装置，其切换液体的流路，使得当液体供应停止时，流入供给管的液体经由连接管流向回收管。 该装置还可以包括连接到供应管的温度调节装置，其对供应管供给的液体进行温度调节，并且具有大致调节液体的温度的粗略温度调节器，以及微调温度调节器， 布置在粗调温器和供水管之间，并对该温度进行微调。

公开(公告)号：US20120183693A1

公开(公告)日：2012-07-19

申请号：US13424011

申请日：2012-03-19

申请人： Nobuhiro Ogata ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

发明人： Nobuhiro Ogata ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

IPC分类号： B05D3/00

CPC分类号： H01L21/67051

摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.

摘要翻译： 一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围​​绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

公开(公告)号：US08029624B2

公开(公告)日：2011-10-04

申请号：US11602390

申请日：2006-11-21

申请人： Kousuke Yoshihara ,  Junji Nakamura ,  Hirofumi Takeguchi ,  Taro Yamamoto

发明人： Kousuke Yoshihara ,  Junji Nakamura ,  Hirofumi Takeguchi ,  Taro Yamamoto

IPC分类号： B08B7/04

CPC分类号： H01L21/67051 ,  H01L21/67253

摘要： A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the substrate, and performing the rinse process under the selected condition.

摘要翻译： 用于漂洗其上具有曝光图案的基板的冲洗方法包括根据基板的表面状态的冲洗过程的预设条件，测量基板的表面状态，基于测量的表面状态选择冲洗过程的相应条件 并在所选择的条件下进行冲洗过程。

公开(公告)号：US20110200952A1

公开(公告)日：2011-08-18

申请号：US13024430

申请日：2011-02-10

申请人： Yasushi Takiguchi ,  Taro Yamamoto ,  Hiroshi Arima ,  Kousuke Yoshihara ,  Yuichi Yoshida

发明人： Yasushi Takiguchi ,  Taro Yamamoto ,  Hiroshi Arima ,  Kousuke Yoshihara ,  Yuichi Yoshida

IPC分类号： G03B27/52 ,  G03F7/30

CPC分类号： G03F7/3021

摘要： There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.

摘要翻译： 提供了一种能够在减少显影液的使用量的同时在基板的整个表面上快速形成显影液的液膜的显影装置和显影方法。 显影装置包括在其中形成处理气氛的气密密封处理容器; 温度控制板，设置在处理容器内并将基板安装在其上; 气氛气体供给单元，其将包含显影液的雾和气体的气氛气体供给到所述处理容器内的所述基板的表面上; 以及第一温度控制单元，其将温度控制板控制为允许气氛气体在基板上冷凝的温度。 这里，处理容器的内壁保持在气氛气体几乎不凝结在内壁上的温度。